JP2009504711A - 接触的オキシ塩素化 - Google Patents
接触的オキシ塩素化 Download PDFInfo
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- JP2009504711A JP2009504711A JP2008526496A JP2008526496A JP2009504711A JP 2009504711 A JP2009504711 A JP 2009504711A JP 2008526496 A JP2008526496 A JP 2008526496A JP 2008526496 A JP2008526496 A JP 2008526496A JP 2009504711 A JP2009504711 A JP 2009504711A
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- 239000003054 catalyst Substances 0.000 claims abstract description 114
- 238000006243 chemical reaction Methods 0.000 claims abstract description 57
- 238000000034 method Methods 0.000 claims abstract description 49
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- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 13
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 42
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- 238000005470 impregnation Methods 0.000 claims description 15
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- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000002245 particle Substances 0.000 abstract description 20
- 239000000463 material Substances 0.000 abstract description 12
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- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 7
- 229910001431 copper ion Inorganic materials 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 239000008346 aqueous phase Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
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- 241000224487 Didymium Species 0.000 description 1
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Abstract
Description
この反応を行うために種々の選択肢が使用可能である。空気が酸素源として使用され得、もしくは酸素それ自身または不活性ガスと混合された酸素が使用され得る。また、この反応は固定床または流動床反応器中で行われ得る。流動床反応器が好ましい。
認識される。
ことにより得られる。好ましい触媒は、担体材料との共沈澱でなく含浸によって触媒に導入された銅を有する。触媒の中に銅を導入するための手法として含浸を使用することは、触媒活性を増加させるが、粘着性の危険も増大させる。
当業者の目的は、必要ならば反応を式の右側に進めるために、過剰のO2とHClを提供することにより、エチレンの変換を最大とすることであろうことが予期される。実際上、HClは極めて腐食性の高いガスであり、反応器流出物からこれを除去することは、高価な材料である苛性の消費を伴うために、HClの変換率を最大とする最優先の必要性が存在する。本発明の方法で使用される触媒は、この明細書中で定義した99.4%以上のHCl変換率をもたらす。
1.0.54のO2/2HCl比および210℃の反応温度における少なくとも99.4%の、好ましくは少なくとも99.6%のHCl変換率;
2.0.54のO2/2HCl比および210℃の反応温度における少なくとも98.5%の、好ましくは少なくとも99.0%のEDC変換率;
3.210℃の反応温度における0.52以下の、好ましくは0.50以下の粘着性に対する臨界O2/2HCl比。
ている。特に、平均粒子サイズは、40から80ミクロンの、好ましくは60から80ミクロンの範囲にあり得る。この明細書中での使用に好ましい耐火性酸化物はアルミナであり、最も好ましいのはガンマ−アルミナである。
触媒試料を図1に示すような設計のパイロット規模の反応器中で試験した。反応器10は38.1mmの内径11と3mmの壁厚12を有するガラス管である。熱電対14を反応器の中心軸に沿って取り付ける。設計が図2に詳細に示される、11個の邪魔板20を熱電対14に取り付ける。相互に81mmの間隔をあけた邪魔板を鋼管15により相互に接続する。
反応物質を反応器に入れた後、底部から110mmにおける反応器中の温度の読みが所望の値(多くの実験において210℃)で安定化するまで、加熱および冷却の設定に対して調整を行う。定常状態に達した後、すべての反応生成物を受けるために、反応生成物の受器を用意し、反応を3時間中断せずに続行する。
触媒粘着性は、反応挙動において多数の異常を生じるので容易に観察される。反応器の上部の邪魔板上に集まる触媒材料の量と、サイクロン中で捕集される触媒材料の量増加として視認されるが、粘着性を反応物質により同伴される触媒量の増加として得る。加えて、反応器床は均質性が低下し、反応物質ガスの大きな泡が床中に生成する。更に、粘着性は未反応HClの増加を生じ、未反応HClを滴定により連続的に測定するにしたがって容易に検出される。
210℃の反応温度および0.56[モル/モル]のO2/2HCl比で上述のように試験ランを行う。3時間の試験ランの間に粘着性を観察したならば、臨界比を0.56よりも大きいとして示す。
。
HCl変換率は、反応時に変換される反応物質混合物中のHClのパーセントとして定義される。
EDC選択率は、EDCに変換される変換エチレンのパーセントとして定義される。EDCはこの反応の所望の生成物であるので、EDC選択率は大きな経済的意義がある。
Claims (22)
- オレフィン、O2およびHClを含有するフィードをオキシ塩素化触媒と接触させる段階を含んでなり、そのさいフィード中のO2/2HCl比が0.50から0.58の範囲にある、オレフィンを接触的オキシ塩素化する方法。
- O2/2HCl比が0.52から0.56の範囲にある、請求項1に記載の方法。
- オレフィンがエチレンである、請求項1もしくは2に記載の方法。
- オキシ塩素化触媒が少なくとも99.4%のHCl変換率、少なくとも98.5%のEDC選択率、および0.52モル/モル以下の粘着性に対する臨界酸素/塩酸比を有する、請求項1から3のいずれか一つに記載の方法。
- 邪魔板付き流動床反応器中で行われる、請求項1から4のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒がCuを含んでなる、請求項1から5のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が5.5重量%から14重量%のCuを含んでなる、請求項1から6のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が好ましくはMgを含むアルカリ土類金属を含んでなる、請求項1から7のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が0.2重量%から5重量%のMgを含んでなる、請求項1から8のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が1重量%未満のアルカリ金属を含んでなる、請求項1から9のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が1重量%未満のKを含んでなる、請求項10に記載のオキシ塩素化方法。
- オキシ塩素化触媒が稀土類金属または稀土類金属の混合物を含んでなる、請求項1から11のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が0.2重量%から5重量%の稀土類金属の混合物を含んでなる、請求項12に記載のオキシ塩素化方法。
- 稀土類金属の混合物がセリウムに富んでいる、請求項13に記載のオキシ塩素化方法。
- 稀土類金属の混合物がランタンに富んでいる、請求項13に記載のオキシ塩素化方法。
- オキシ塩素化触媒が耐火性酸化物の群から選択されるキャリアを含んでなる、請求項1から15のいずれか一つに記載のオキシ塩素化方法。
- 耐火性酸化物がアルミナである、請求項16に記載のオキシ塩素化方法。
- 耐火性酸化物がガンマ−アルミナである、請求項17に記載のオキシ塩素化方法。
- オキシ塩素化触媒が耐火性酸化物と銅化合物の共沈澱を含んでなる方法で製造される、請求項1から18のいずれか一つに記載のオキシ塩素化方法。
- オキシ塩素化触媒が銅化合物の水溶液による耐火性酸化物の含浸を含んでなる方法で製造される、請求項1から18のいずれか一つに記載のオキシ塩素化方法。
- 銅化合物がCuCl2である、請求項20に記載のオキシ塩素化方法。
- オキシ塩素化触媒が7.5重量%から11重量%のCu、好ましくは7.0重量%から10重量%のCuを含んでなる、請求項20もしくは21に記載のオキシ塩素化方法。
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JP2016518968A (ja) * | 2013-03-15 | 2016-06-30 | オキシ ヴィニールズ,エルピー | ジクロロエタンへのエチレンのオキシ塩素化のための触媒及びプロセス |
KR20170023966A (ko) * | 2014-06-23 | 2017-03-06 | 옥시 비닐스, 엘.피. | 디클로로에탄으로의 에틸렌의 옥시염소화를 위한 촉매 및 공정 |
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CN102463125A (zh) * | 2010-11-05 | 2012-05-23 | 中国石油化工股份有限公司 | 一种烯烃氧氯化催化剂及其制备方法和制备二氯乙烷的方法 |
CN104163750B (zh) * | 2013-05-17 | 2016-07-06 | 中化蓝天集团有限公司 | 1,1,1,2,3-五氯丙烷和1,1,2,3-四氯丙烯的制备方法 |
CN104163751B (zh) * | 2013-05-17 | 2016-09-28 | 中化蓝天集团有限公司 | 一种制备2-氯-3,3,3-三氟丙烯的方法 |
WO2023141486A1 (en) | 2022-01-19 | 2023-07-27 | Oxy Vinyls, Lp | Oxychlorination process |
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