JP2009302346A5 - - Google Patents

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Publication number
JP2009302346A5
JP2009302346A5 JP2008156018A JP2008156018A JP2009302346A5 JP 2009302346 A5 JP2009302346 A5 JP 2009302346A5 JP 2008156018 A JP2008156018 A JP 2008156018A JP 2008156018 A JP2008156018 A JP 2008156018A JP 2009302346 A5 JP2009302346 A5 JP 2009302346A5
Authority
JP
Japan
Prior art keywords
fixing device
substrate temperature
adhesive layer
temperature adjusting
temperature adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008156018A
Other languages
English (en)
Japanese (ja)
Other versions
JP5049891B2 (ja
JP2009302346A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008156018A priority Critical patent/JP5049891B2/ja
Priority claimed from JP2008156018A external-priority patent/JP5049891B2/ja
Priority to US12/482,482 priority patent/US8641825B2/en
Publication of JP2009302346A publication Critical patent/JP2009302346A/ja
Publication of JP2009302346A5 publication Critical patent/JP2009302346A5/ja
Application granted granted Critical
Publication of JP5049891B2 publication Critical patent/JP5049891B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008156018A 2008-06-13 2008-06-13 基板温調固定装置 Expired - Fee Related JP5049891B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008156018A JP5049891B2 (ja) 2008-06-13 2008-06-13 基板温調固定装置
US12/482,482 US8641825B2 (en) 2008-06-13 2009-06-11 Substrate temperature regulation fixed apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008156018A JP5049891B2 (ja) 2008-06-13 2008-06-13 基板温調固定装置

Publications (3)

Publication Number Publication Date
JP2009302346A JP2009302346A (ja) 2009-12-24
JP2009302346A5 true JP2009302346A5 (enExample) 2011-04-14
JP5049891B2 JP5049891B2 (ja) 2012-10-17

Family

ID=41413681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008156018A Expired - Fee Related JP5049891B2 (ja) 2008-06-13 2008-06-13 基板温調固定装置

Country Status (2)

Country Link
US (1) US8641825B2 (enExample)
JP (1) JP5049891B2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5143184B2 (ja) * 2010-05-07 2013-02-13 日本碍子株式会社 ウエハー載置装置の製造方法
JP5829509B2 (ja) * 2011-12-20 2015-12-09 東京エレクトロン株式会社 載置台及びプラズマ処理装置
KR20150013627A (ko) * 2012-04-26 2015-02-05 어플라이드 머티어리얼스, 인코포레이티드 Ｅｓｃ 본딩 접착제 부식을 방지하기 위한 방법들 및 장치
JP6162428B2 (ja) * 2013-02-27 2017-07-12 日本特殊陶業株式会社 支持装置
US9623503B2 (en) * 2013-10-31 2017-04-18 Semes Co., Ltd. Support unit and substrate treating device including the same
JP6219178B2 (ja) * 2014-01-20 2017-10-25 株式会社ディスコ プラズマエッチング装置
JP5811513B2 (ja) * 2014-03-27 2015-11-11 Toto株式会社 静電チャック
DE102014008029B4 (de) 2014-05-28 2023-05-17 Asml Netherlands B.V. Elektrostatische Haltevorrichtung mit einer Elektroden-Trägerscheibe und Verfahren zur Herstellung der Haltevorrichtung
DE102014008031B4 (de) 2014-05-28 2020-06-25 Berliner Glas Kgaa Herbert Kubatz Gmbh & Co. Elektrostatische Haltevorrichtung mit einer Keramik-Elektrode und Verfahren zur Herstellung einer solchen Haltevorrichtung
DE102014008030A1 (de) * 2014-05-28 2015-12-03 Berliner Glas Kgaa Herbert Kubatz Gmbh & Co Verfahren zur Herstellung einer elektrostatischen Haltevorrichtung
DE102014007903B4 (de) 2014-05-28 2025-04-03 ASML Netherlands B.V. Elektrostatische Haltevorrichtung mit Noppen-Elektroden und Verfahren zu deren Herstellung
CN105441904B (zh) * 2014-06-18 2018-06-26 中微半导体设备(上海)有限公司 气体喷淋装置、化学气相沉积装置和方法
JP6413646B2 (ja) * 2014-10-31 2018-10-31 住友大阪セメント株式会社 静電チャック装置
US10475688B2 (en) * 2015-02-18 2019-11-12 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device, and semiconductor manufacturing device
US10269557B2 (en) 2015-10-20 2019-04-23 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus of processing semiconductor substrate
KR102623545B1 (ko) * 2018-12-17 2024-01-10 삼성전자주식회사 반도체 소자 제조 장치
JP6839314B2 (ja) * 2019-03-19 2021-03-03 日本碍子株式会社 ウエハ載置装置及びその製法
EP3977207A1 (en) * 2019-05-29 2022-04-06 ASML Holding N.V. Split double sided wafer and reticle clamps
JP7365221B2 (ja) * 2019-12-12 2023-10-19 日本特殊陶業株式会社 半導体製造装置用部品、保持装置、および半導体製造装置用部品の製造方法
JP7633794B2 (ja) * 2020-03-26 2025-02-20 三星電子株式会社 静電チャック装置
US11575335B2 (en) 2020-03-26 2023-02-07 Samsung Electronics Co., Ltd. Electrostatic chuck device
JP7681593B2 (ja) * 2020-06-26 2025-05-22 日本特殊陶業株式会社 接合体、および静電チャック
KR102608903B1 (ko) * 2021-04-12 2023-12-04 삼성전자주식회사 플라즈마 식각 장치 및 방법
JP7698590B2 (ja) * 2022-01-19 2025-06-25 日本特殊陶業株式会社 保持装置および保持装置の製造方法

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US2567162A (en) * 1948-01-14 1951-09-04 Du Pont Coated electrical conductor and method of making same
US3431160A (en) * 1963-09-06 1969-03-04 Usui Kokusai Sangyo Kk Method of making a wear-resistant sliding-surface structure
JPH03104893U (enExample) * 1990-02-08 1991-10-30
JPH07153820A (ja) * 1993-11-30 1995-06-16 Kyocera Corp 半導体製造用サセプタおよびその製造方法
US5766750A (en) * 1994-08-25 1998-06-16 W. L. Gore & Associates, Inc. Process for making an adhesive-filler polymer film composite
US6280584B1 (en) * 1998-07-29 2001-08-28 Applied Materials, Inc. Compliant bond structure for joining ceramic to metal
JP2000317761A (ja) 1999-03-01 2000-11-21 Toto Ltd 静電チャックおよび吸着方法
JP3805134B2 (ja) 1999-05-25 2006-08-02 東陶機器株式会社 絶縁性基板吸着用静電チャック
JP2001291760A (ja) * 2000-01-31 2001-10-19 Hitachi Chem Co Ltd 剥離方法及び剥離用テープ
JP2003224180A (ja) 2002-01-28 2003-08-08 Kyocera Corp ウエハ支持部材
JP4034145B2 (ja) * 2002-08-09 2008-01-16 住友大阪セメント株式会社 サセプタ装置
JP4397271B2 (ja) * 2003-05-12 2010-01-13 東京エレクトロン株式会社 処理装置
JP4514587B2 (ja) * 2004-11-29 2010-07-28 京セラ株式会社 基板保持部材
JP4218899B2 (ja) * 2005-07-19 2009-02-04 コミコ株式会社 静電チャックを備える基板ホルダ及びその製造方法
JP2007048998A (ja) * 2005-08-11 2007-02-22 Seiko Epson Corp 吸着装置および描画装置
US7651571B2 (en) * 2005-12-22 2010-01-26 Kyocera Corporation Susceptor
JP5183058B2 (ja) * 2006-07-20 2013-04-17 アプライド マテリアルズ インコーポレイテッド 急速温度勾配コントロールによる基板処理
US9275887B2 (en) 2006-07-20 2016-03-01 Applied Materials, Inc. Substrate processing with rapid temperature gradient control
JP2008034465A (ja) * 2006-07-26 2008-02-14 Nisshinbo Ind Inc ウエハ固定装置

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