JP2009288051A5 - - Google Patents

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Publication number
JP2009288051A5
JP2009288051A5 JP2008140559A JP2008140559A JP2009288051A5 JP 2009288051 A5 JP2009288051 A5 JP 2009288051A5 JP 2008140559 A JP2008140559 A JP 2008140559A JP 2008140559 A JP2008140559 A JP 2008140559A JP 2009288051 A5 JP2009288051 A5 JP 2009288051A5
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JP
Japan
Prior art keywords
measurement
measuring
measured
shape
interference fringes
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JP2008140559A
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English (en)
Japanese (ja)
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JP5305741B2 (ja
JP2009288051A (ja
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Priority to JP2008140559A priority Critical patent/JP5305741B2/ja
Priority claimed from JP2008140559A external-priority patent/JP5305741B2/ja
Priority to US12/473,626 priority patent/US8243282B2/en
Publication of JP2009288051A publication Critical patent/JP2009288051A/ja
Publication of JP2009288051A5 publication Critical patent/JP2009288051A5/ja
Application granted granted Critical
Publication of JP5305741B2 publication Critical patent/JP5305741B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008140559A 2008-05-29 2008-05-29 測定方法 Expired - Fee Related JP5305741B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008140559A JP5305741B2 (ja) 2008-05-29 2008-05-29 測定方法
US12/473,626 US8243282B2 (en) 2008-05-29 2009-05-28 Interferometric shape measurement of different signs of curvature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008140559A JP5305741B2 (ja) 2008-05-29 2008-05-29 測定方法

Publications (3)

Publication Number Publication Date
JP2009288051A JP2009288051A (ja) 2009-12-10
JP2009288051A5 true JP2009288051A5 (enExample) 2011-07-14
JP5305741B2 JP5305741B2 (ja) 2013-10-02

Family

ID=41379387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008140559A Expired - Fee Related JP5305741B2 (ja) 2008-05-29 2008-05-29 測定方法

Country Status (2)

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US (1) US8243282B2 (enExample)
JP (1) JP5305741B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7880897B2 (en) * 2007-12-28 2011-02-01 Fujinon Corporation Light wave interferometer apparatus
JP5591063B2 (ja) * 2009-11-12 2014-09-17 キヤノン株式会社 測定方法及び測定装置
JP5955001B2 (ja) * 2012-01-25 2016-07-20 キヤノン株式会社 非球面形状計測方法、形状計測プログラム及び形状計測装置
CN104315973A (zh) * 2014-10-31 2015-01-28 中国科学院长春光学精密机械与物理研究所 一种双波长斐索激光干涉仪标准参考镜
JP6685741B2 (ja) * 2015-02-16 2020-04-22 キヤノン株式会社 形状計測方法、形状計測装置、プログラム、記録媒体及び光学素子の製造方法
EP3133369B1 (en) 2015-08-19 2017-12-20 Mitutoyo Corporation Methods for measuring a height map of multiple fields of view and combining them to a composite height map with minimized sensitivity to instrument drift

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62126305A (ja) * 1985-11-27 1987-06-08 Kyocera Corp 表面形状測定方法および装置
DE3836564A1 (de) * 1988-10-27 1990-05-03 Zeiss Carl Fa Verfahren zur pruefung von optischen elementen
JPH03156305A (ja) * 1989-11-14 1991-07-04 Matsushita Electric Works Ltd 非球面形状測定装置
JP3336640B2 (ja) * 1992-10-02 2002-10-21 富士写真光機株式会社 干渉計装置
JP3455264B2 (ja) * 1993-12-28 2003-10-14 ペンタックス株式会社 干渉計
US6781700B2 (en) * 2001-06-20 2004-08-24 Kuechel Michael Scanning interferometer for aspheric surfaces and wavefronts
US6956657B2 (en) * 2001-12-18 2005-10-18 Qed Technologies, Inc. Method for self-calibrated sub-aperture stitching for surface figure measurement
JP4062606B2 (ja) * 2003-01-20 2008-03-19 フジノン株式会社 低可干渉測定/高可干渉測定共用干渉計装置およびその測定方法
JP4794902B2 (ja) * 2005-05-11 2011-10-19 キヤノン株式会社 表面計測方法および装置
JP2008089356A (ja) * 2006-09-29 2008-04-17 Fujinon Corp 非球面測定用素子、該非球面測定用素子を用いた光波干渉測定装置と方法、非球面の形状補正方法、およびシステム誤差補正方法

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