JP2009286041A5 - - Google Patents

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Publication number
JP2009286041A5
JP2009286041A5 JP2008142312A JP2008142312A JP2009286041A5 JP 2009286041 A5 JP2009286041 A5 JP 2009286041A5 JP 2008142312 A JP2008142312 A JP 2008142312A JP 2008142312 A JP2008142312 A JP 2008142312A JP 2009286041 A5 JP2009286041 A5 JP 2009286041A5
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JP
Japan
Prior art keywords
compound
gas barrier
outermost surface
cvd method
barrier film
Prior art date
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Application number
JP2008142312A
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English (en)
Japanese (ja)
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JP2009286041A (ja
JP5223466B2 (ja
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Priority to JP2008142312A priority Critical patent/JP5223466B2/ja
Priority claimed from JP2008142312A external-priority patent/JP5223466B2/ja
Publication of JP2009286041A publication Critical patent/JP2009286041A/ja
Publication of JP2009286041A5 publication Critical patent/JP2009286041A5/ja
Application granted granted Critical
Publication of JP5223466B2 publication Critical patent/JP5223466B2/ja
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JP2008142312A 2008-05-30 2008-05-30 ガスバリア性フィルム及びその製造方法 Active JP5223466B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008142312A JP5223466B2 (ja) 2008-05-30 2008-05-30 ガスバリア性フィルム及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008142312A JP5223466B2 (ja) 2008-05-30 2008-05-30 ガスバリア性フィルム及びその製造方法

Publications (3)

Publication Number Publication Date
JP2009286041A JP2009286041A (ja) 2009-12-10
JP2009286041A5 true JP2009286041A5 (de) 2011-07-14
JP5223466B2 JP5223466B2 (ja) 2013-06-26

Family

ID=41455727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008142312A Active JP5223466B2 (ja) 2008-05-30 2008-05-30 ガスバリア性フィルム及びその製造方法

Country Status (1)

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JP (1) JP5223466B2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5394867B2 (ja) * 2009-09-17 2014-01-22 富士フイルム株式会社 ガスバリア膜およびガスバリアフィルム
KR101461346B1 (ko) * 2010-07-27 2014-11-14 코니카 미놀타 가부시키가이샤 가스 배리어성 필름, 가스 배리어성 필름의 제조 방법 및 전자 디바이스
CN103237657A (zh) * 2010-12-06 2013-08-07 柯尼卡美能达株式会社 气体阻隔性膜、气体阻隔性膜的制造方法及电子器件
WO2015146999A1 (ja) 2014-03-25 2015-10-01 住友金属鉱山株式会社 被覆はんだ材料およびその製造方法
JP6427478B2 (ja) * 2015-11-04 2018-11-21 学校法人慶應義塾 薄膜積層フィルム、その製造方法及びその製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001158976A (ja) * 1999-12-02 2001-06-12 Showa Aluminum Kan Kk 大気圧低温プラズマにより処理したｄｉ缶及びその製造方法
JP2002225170A (ja) * 2001-01-30 2002-08-14 Matsushita Electric Ind Co Ltd 気体遮蔽性フィルム、その製造方法およびそれを用いた真空断熱体
JP2003291247A (ja) * 2002-04-05 2003-10-14 Matsushita Electric Ind Co Ltd 複合材料及びその製造方法
WO2006129543A1 (ja) * 2005-06-01 2006-12-07 Konica Minolta Business Technologies, Inc. 中間転写体、中間転写体の製造装置、中間転写体の製造方法、及び画像形成装置

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