JP2009197318A5 - - Google Patents
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- Publication number
- JP2009197318A5 JP2009197318A5 JP2008241512A JP2008241512A JP2009197318A5 JP 2009197318 A5 JP2009197318 A5 JP 2009197318A5 JP 2008241512 A JP2008241512 A JP 2008241512A JP 2008241512 A JP2008241512 A JP 2008241512A JP 2009197318 A5 JP2009197318 A5 JP 2009197318A5
- Authority
- JP
- Japan
- Prior art keywords
- halides
- alloy plating
- alkyl
- electric
- plating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000007747 plating Methods 0.000 claims description 29
- 229910052757 nitrogen Inorganic materials 0.000 claims description 25
- -1 aluminum halide Chemical class 0.000 claims description 24
- 229910000914 Mn alloy Inorganic materials 0.000 claims description 17
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000011572 manganese Substances 0.000 claims description 9
- 229910052748 manganese Inorganic materials 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 150000004820 halides Chemical class 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 229920000620 organic polymer Polymers 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 7
- 125000006165 cyclic alkyl group Chemical group 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 229910018131 Al-Mn Inorganic materials 0.000 description 4
- 229910018461 Al—Mn Inorganic materials 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 4
- 239000004472 Lysine Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- AJRFBXAXVLBZMP-UHFFFAOYSA-M 1-methyl-3-propylimidazol-1-ium;bromide Chemical compound [Br-].CCCN1C=C[N+](C)=C1 AJRFBXAXVLBZMP-UHFFFAOYSA-M 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- SFHHFDBXQBNJAT-UHFFFAOYSA-M 1-methyl-2-propylpyrazol-1-ium;bromide Chemical compound [Br-].CCCN1C=CC=[N+]1C SFHHFDBXQBNJAT-UHFFFAOYSA-M 0.000 description 2
- PAYYUKPPZWOSMS-UHFFFAOYSA-M 1-methyl-2-propylpyrazol-1-ium;chloride Chemical compound [Cl-].CCCN1C=CC=[N+]1C PAYYUKPPZWOSMS-UHFFFAOYSA-M 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 2
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229940099607 manganese chloride Drugs 0.000 description 2
- 235000002867 manganese chloride Nutrition 0.000 description 2
- 239000011565 manganese chloride Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- FJEQTUWHWBFLAK-UHFFFAOYSA-M 1,1-dimethylpyrrolidin-1-ium;chloride Chemical compound [Cl-].C[N+]1(C)CCCC1 FJEQTUWHWBFLAK-UHFFFAOYSA-M 0.000 description 1
- QEIMBQONIVMYOA-UHFFFAOYSA-M 1,2-diethylpyrazol-1-ium;bromide Chemical compound [Br-].CCN1C=CC=[N+]1CC QEIMBQONIVMYOA-UHFFFAOYSA-M 0.000 description 1
- QDJNGYKMDNEXDS-UHFFFAOYSA-M 1,2-diethylpyrazol-1-ium;chloride Chemical compound [Cl-].CCN1C=CC=[N+]1CC QDJNGYKMDNEXDS-UHFFFAOYSA-M 0.000 description 1
- QJKFAOGSPNKIFY-UHFFFAOYSA-M 1,2-dimethylpyrazol-1-ium;bromide Chemical compound [Br-].CN1C=CC=[N+]1C QJKFAOGSPNKIFY-UHFFFAOYSA-M 0.000 description 1
- SYEJGWDUBPYTOR-UHFFFAOYSA-M 1,2-dimethylpyrazol-1-ium;chloride Chemical compound [Cl-].CN1C=CC=[N+]1C SYEJGWDUBPYTOR-UHFFFAOYSA-M 0.000 description 1
- XUZFNEAIMDGBMY-UHFFFAOYSA-M 1,3-dibutylimidazol-1-ium;bromide Chemical compound [Br-].CCCCN1C=C[N+](CCCC)=C1 XUZFNEAIMDGBMY-UHFFFAOYSA-M 0.000 description 1
- YHQWECCOTSKSQC-UHFFFAOYSA-M 1,3-dibutylimidazol-1-ium;chloride Chemical compound [Cl-].CCCCN1C=C[N+](CCCC)=C1 YHQWECCOTSKSQC-UHFFFAOYSA-M 0.000 description 1
- CIKIMCLALRWQLU-UHFFFAOYSA-M 1,3-diethylimidazol-1-ium;bromide Chemical compound [Br-].CCN1C=C[N+](CC)=C1 CIKIMCLALRWQLU-UHFFFAOYSA-M 0.000 description 1
- YSNRFLSZENCKRS-UHFFFAOYSA-M 1,3-diethylimidazol-1-ium;chloride Chemical compound [Cl-].CCN1C=C[N+](CC)=C1 YSNRFLSZENCKRS-UHFFFAOYSA-M 0.000 description 1
- SKNNBMMWHRMJHX-UHFFFAOYSA-M 1,3-dimethylimidazol-1-ium;bromide Chemical compound [Br-].CN1C=C[N+](C)=C1 SKNNBMMWHRMJHX-UHFFFAOYSA-M 0.000 description 1
- IIJSFQFJZAEKHB-UHFFFAOYSA-M 1,3-dimethylimidazol-1-ium;chloride Chemical compound [Cl-].CN1C=C[N+](C)=C1 IIJSFQFJZAEKHB-UHFFFAOYSA-M 0.000 description 1
- BOOXKGZZTBKJFE-UHFFFAOYSA-M 1-butyl-1-methylpyrrolidin-1-ium;chloride Chemical compound [Cl-].CCCC[N+]1(C)CCCC1 BOOXKGZZTBKJFE-UHFFFAOYSA-M 0.000 description 1
- DXVBBMSWHDSSPW-UHFFFAOYSA-N 1-butyl-1h-pyrazol-1-ium;bromide Chemical compound [Br-].CCCC[NH+]1C=CC=N1 DXVBBMSWHDSSPW-UHFFFAOYSA-N 0.000 description 1
- AESBACLQLRCOLY-UHFFFAOYSA-M 1-butyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCCCN1C=CC=[N+]1C AESBACLQLRCOLY-UHFFFAOYSA-M 0.000 description 1
- DXYVZQCZGRAFNX-UHFFFAOYSA-M 1-butyl-2-methylpyrazol-2-ium;chloride Chemical compound [Cl-].CCCCN1C=CC=[N+]1C DXYVZQCZGRAFNX-UHFFFAOYSA-M 0.000 description 1
- JXIJPHVMDSPMTP-UHFFFAOYSA-N 1-butylpyrrolidin-1-ium;chloride Chemical compound Cl.CCCCN1CCCC1 JXIJPHVMDSPMTP-UHFFFAOYSA-N 0.000 description 1
- JZZVIWVVEXOIIC-UHFFFAOYSA-M 1-ethyl-1-methylpyrrolidin-1-ium;chloride Chemical compound [Cl-].CC[N+]1(C)CCCC1 JZZVIWVVEXOIIC-UHFFFAOYSA-M 0.000 description 1
- SKGNWPJSJGAIPV-UHFFFAOYSA-N 1-ethyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CCN1C=C[NH+]=C1 SKGNWPJSJGAIPV-UHFFFAOYSA-N 0.000 description 1
- WZLJIIAUVGOWMI-UHFFFAOYSA-M 1-ethyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCN1C=CC=[N+]1C WZLJIIAUVGOWMI-UHFFFAOYSA-M 0.000 description 1
- GWQYPLXGJIXMMV-UHFFFAOYSA-M 1-ethyl-3-methylimidazol-3-ium;bromide Chemical compound [Br-].CCN1C=C[N+](C)=C1 GWQYPLXGJIXMMV-UHFFFAOYSA-M 0.000 description 1
- BMQZYMYBQZGEEY-UHFFFAOYSA-M 1-ethyl-3-methylimidazolium chloride Chemical compound [Cl-].CCN1C=C[N+](C)=C1 BMQZYMYBQZGEEY-UHFFFAOYSA-M 0.000 description 1
- OEUPQULTDYTGGS-UHFFFAOYSA-N 1-ethylpyrrolidin-1-ium;chloride Chemical compound Cl.CCN1CCCC1 OEUPQULTDYTGGS-UHFFFAOYSA-N 0.000 description 1
- AAYSMYJPAJCXCJ-UHFFFAOYSA-M 1-hexyl-2-methylpyrazol-2-ium;bromide Chemical compound [Br-].CCCCCCN1C=CC=[N+]1C AAYSMYJPAJCXCJ-UHFFFAOYSA-M 0.000 description 1
- PXOAHFAVUCZMFZ-UHFFFAOYSA-M 1-hexyl-2-methylpyrazol-2-ium;chloride Chemical compound [Cl-].CCCCCCN1C=CC=[N+]1C PXOAHFAVUCZMFZ-UHFFFAOYSA-M 0.000 description 1
- OOKUTCYPKPJYFV-UHFFFAOYSA-N 1-methyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CN1C=C[NH+]=C1 OOKUTCYPKPJYFV-UHFFFAOYSA-N 0.000 description 1
- STCBHSHARMAIOM-UHFFFAOYSA-N 1-methyl-1h-imidazol-1-ium;chloride Chemical compound Cl.CN1C=CN=C1 STCBHSHARMAIOM-UHFFFAOYSA-N 0.000 description 1
- JOLFMOZUQSZTML-UHFFFAOYSA-M 1-methyl-3-propylimidazol-1-ium;chloride Chemical compound [Cl-].CCCN1C=C[N+](C)=C1 JOLFMOZUQSZTML-UHFFFAOYSA-M 0.000 description 1
- WIGRVUWJNPVKPB-UHFFFAOYSA-N 1-methylpyrrolidin-1-ium;chloride Chemical compound Cl.CN1CCCC1 WIGRVUWJNPVKPB-UHFFFAOYSA-N 0.000 description 1
- XXZFCJVFXKCILB-UHFFFAOYSA-N 1-methylpyrrolidine;hydrobromide Chemical compound [Br-].C[NH+]1CCCC1 XXZFCJVFXKCILB-UHFFFAOYSA-N 0.000 description 1
- JJSMKFMMHVAWBK-UHFFFAOYSA-N 1-octyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CCCCCCCC[N+]=1C=CNC=1 JJSMKFMMHVAWBK-UHFFFAOYSA-N 0.000 description 1
- RRMCUJFIZQNXQL-UHFFFAOYSA-N 1-propyl-1h-imidazol-1-ium;bromide Chemical compound [Br-].CCC[NH+]1C=CN=C1 RRMCUJFIZQNXQL-UHFFFAOYSA-N 0.000 description 1
- RZPFMIUPVMYKEO-UHFFFAOYSA-N 2-butyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCCC[NH+]1C=CC=N1 RZPFMIUPVMYKEO-UHFFFAOYSA-N 0.000 description 1
- FYQCZRZXGKSJGD-UHFFFAOYSA-N 2-hexyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].CCCCCC[NH+]1C=CC=N1 FYQCZRZXGKSJGD-UHFFFAOYSA-N 0.000 description 1
- WAZMNAJKBTUSFY-UHFFFAOYSA-N 2-hexyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCCCCC[NH+]1C=CC=N1 WAZMNAJKBTUSFY-UHFFFAOYSA-N 0.000 description 1
- TUODQTJBSURDDW-UHFFFAOYSA-N 2-methyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].C[NH+]1C=CC=N1 TUODQTJBSURDDW-UHFFFAOYSA-N 0.000 description 1
- HLGHIKBHXHNJQP-UHFFFAOYSA-N 2-methyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].C[NH+]1C=CC=N1 HLGHIKBHXHNJQP-UHFFFAOYSA-N 0.000 description 1
- YVJYCLNKTRASAI-UHFFFAOYSA-N 2-propyl-1h-pyrazol-2-ium;bromide Chemical compound [Br-].CCC[NH+]1C=CC=N1 YVJYCLNKTRASAI-UHFFFAOYSA-N 0.000 description 1
- CEXCVJQRVZRCBE-UHFFFAOYSA-N 2-propyl-1h-pyrazol-2-ium;chloride Chemical compound [Cl-].CCC[NH+]1C=CC=N1 CEXCVJQRVZRCBE-UHFFFAOYSA-N 0.000 description 1
- ABDVJABGTGHCPI-UHFFFAOYSA-N 3-ethyl-1h-imidazol-3-ium;chloride Chemical compound Cl.CCN1C=CN=C1 ABDVJABGTGHCPI-UHFFFAOYSA-N 0.000 description 1
- IATNTPRVOWFGAL-UHFFFAOYSA-N 3-octyl-1h-imidazol-3-ium;chloride Chemical compound [Cl-].CCCCCCCC[NH+]1C=CN=C1 IATNTPRVOWFGAL-UHFFFAOYSA-N 0.000 description 1
- DHILVHZCFOSZSW-UHFFFAOYSA-N 3-propyl-1h-imidazol-3-ium;chloride Chemical compound [Cl-].CCCN1C=C[NH+]=C1 DHILVHZCFOSZSW-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 210000001787 dendrite Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008241512A JP5299814B2 (ja) | 2008-01-22 | 2008-09-19 | 常温溶融塩浴を用いた電気Ａｌ−Ｚｒ−Ｍｎ合金めっき浴、そのめっき浴を用いためっき方法及びＡｌ−Ｚｒ−Ｍｎ合金めっき皮膜 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008011961 | 2008-01-22 | ||
| JP2008011961 | 2008-01-22 | ||
| JP2008241512A JP5299814B2 (ja) | 2008-01-22 | 2008-09-19 | 常温溶融塩浴を用いた電気Ａｌ−Ｚｒ−Ｍｎ合金めっき浴、そのめっき浴を用いためっき方法及びＡｌ−Ｚｒ−Ｍｎ合金めっき皮膜 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009197318A JP2009197318A (ja) | 2009-09-03 |
| JP2009197318A5 true JP2009197318A5 (enrdf_load_stackoverflow) | 2010-12-24 |
| JP5299814B2 JP5299814B2 (ja) | 2013-09-25 |
Family
ID=41141139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008241512A Expired - Fee Related JP5299814B2 (ja) | 2008-01-22 | 2008-09-19 | 常温溶融塩浴を用いた電気Ａｌ−Ｚｒ−Ｍｎ合金めっき浴、そのめっき浴を用いためっき方法及びＡｌ−Ｚｒ−Ｍｎ合金めっき皮膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5299814B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009173977A (ja) * | 2008-01-22 | 2009-08-06 | Dipsol Chem Co Ltd | 常温溶融塩浴を用いた電気Ａｌ又はＡｌ合金めっき浴及びそれを用いるめっき方法 |
| GB2470590B (en) | 2009-05-29 | 2014-07-23 | Astron Advanced Materials Ltd | Electrodeposition of elemental zirconium |
| US10030312B2 (en) * | 2009-10-14 | 2018-07-24 | Massachusetts Institute Of Technology | Electrodeposited alloys and methods of making same using power pulses |
| JP5529663B2 (ja) | 2010-07-28 | 2014-06-25 | 京セラ株式会社 | 入力装置 |
| US8821707B2 (en) | 2010-08-04 | 2014-09-02 | Dipsol Chemicals Co., Ltd. | Electric Al or Al alloy plating bath using room temperature molten salt bath and plating method using the same |
| EP2623643A4 (en) * | 2010-09-30 | 2015-03-04 | Hitachi Ltd | ALUMINUMGALVANISIERUNGSLÖSUNG |
| JP2014156614A (ja) * | 2011-04-11 | 2014-08-28 | Hitachi Ltd | 電気アルミニウムめっき液 |
| JP2017206739A (ja) | 2016-05-18 | 2017-11-24 | 住友電気工業株式会社 | アルミニウム合金及びアルミニウム合金の製造方法 |
| CN110168144B (zh) * | 2017-01-05 | 2021-10-12 | Tdk株式会社 | MnAl合金的制造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6270593A (ja) * | 1985-09-20 | 1987-04-01 | Nisshin Steel Co Ltd | 電気アルミニウムめつき浴およびそのめつき浴によるめつき方法 |
| JP3061281B2 (ja) * | 1990-03-30 | 2000-07-10 | 日新製鋼株式会社 | Ａｌ―Ｍｎ合金電気めっき浴 |
| JP3034635B2 (ja) * | 1991-05-21 | 2000-04-17 | ディップソール株式会社 | 電気アルミニウムめっき浴 |
| JPH0665781A (ja) * | 1992-08-24 | 1994-03-08 | Sumitomo Metal Ind Ltd | Ａｌ合金被覆金属材 |
-
2008
- 2008-09-19 JP JP2008241512A patent/JP5299814B2/ja not_active Expired - Fee Related
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