JP2009177027A5 - - Google Patents

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Publication number
JP2009177027A5
JP2009177027A5 JP2008015449A JP2008015449A JP2009177027A5 JP 2009177027 A5 JP2009177027 A5 JP 2009177027A5 JP 2008015449 A JP2008015449 A JP 2008015449A JP 2008015449 A JP2008015449 A JP 2008015449A JP 2009177027 A5 JP2009177027 A5 JP 2009177027A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2008015449A
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JP5277646B2 (ja
JP2009177027A (ja
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Priority to JP2008015449A priority Critical patent/JP5277646B2/ja
Priority claimed from JP2008015449A external-priority patent/JP5277646B2/ja
Priority to US12/811,940 priority patent/US8003421B2/en
Priority to PCT/JP2009/000101 priority patent/WO2009093418A1/ja
Priority to TW098101943A priority patent/TWI398021B/zh
Publication of JP2009177027A publication Critical patent/JP2009177027A/ja
Publication of JP2009177027A5 publication Critical patent/JP2009177027A5/ja
Application granted granted Critical
Publication of JP5277646B2 publication Critical patent/JP5277646B2/ja
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JP2008015449A 2008-01-25 2008-01-25 化合物半導体基板の製造方法 Active JP5277646B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008015449A JP5277646B2 (ja) 2008-01-25 2008-01-25 化合物半導体基板の製造方法
US12/811,940 US8003421B2 (en) 2008-01-25 2009-01-14 Method for manufacturing compound semiconductor substrate, compound semiconductor substrate and light emitting device
PCT/JP2009/000101 WO2009093418A1 (ja) 2008-01-25 2009-01-14 化合物半導体基板の製造方法および化合物半導体基板並びに発光素子
TW098101943A TWI398021B (zh) 2008-01-25 2009-01-19 A method for producing a compound semiconductor substrate, a compound semiconductor substrate, and a light-emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008015449A JP5277646B2 (ja) 2008-01-25 2008-01-25 化合物半導体基板の製造方法

Publications (3)

Publication Number Publication Date
JP2009177027A JP2009177027A (ja) 2009-08-06
JP2009177027A5 true JP2009177027A5 (ja) 2010-08-12
JP5277646B2 JP5277646B2 (ja) 2013-08-28

Family

ID=40900930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008015449A Active JP5277646B2 (ja) 2008-01-25 2008-01-25 化合物半導体基板の製造方法

Country Status (4)

Country Link
US (1) US8003421B2 (ja)
JP (1) JP5277646B2 (ja)
TW (1) TWI398021B (ja)
WO (1) WO2009093418A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012120798A1 (ja) * 2011-03-09 2012-09-13 信越半導体株式会社 化合物半導体基板及び化合物半導体基板の製造方法並びに発光素子
WO2019224966A1 (ja) * 2018-05-24 2019-11-28 三菱電機株式会社 Iii―v族化合物半導体装置の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3507716B2 (ja) 1998-12-25 2004-03-15 シャープ株式会社 半導体発光素子の製造方法
JP3543295B2 (ja) 1999-03-17 2004-07-14 シャープ株式会社 化合物半導体の結晶成長方法および半導体発光素子
EP1065734B1 (en) * 1999-06-09 2009-05-13 Kabushiki Kaisha Toshiba Bonding type semiconductor substrate, semiconductor light emitting element, and preparation process thereof.
US6388274B1 (en) * 1999-06-18 2002-05-14 Showa Denko Kabushiki Kaisha Epitaxial wafer for infrared light-emitting device and light-emitting device using the same
JP4091261B2 (ja) 2000-10-31 2008-05-28 株式会社東芝 半導体発光素子及びその製造方法
JP2003023177A (ja) * 2001-07-06 2003-01-24 Sharp Corp 半導体発光素子の製造方法
JP2004260109A (ja) * 2003-02-27 2004-09-16 Shin Etsu Handotai Co Ltd 発光素子の製造方法、複合透光性基板及び発光素子
JP2004296707A (ja) * 2003-03-26 2004-10-21 Shin Etsu Handotai Co Ltd 発光素子の製造方法、複合透光性基板及び発光素子
JP4569859B2 (ja) * 2003-11-19 2010-10-27 信越半導体株式会社 発光素子の製造方法
JP2005277218A (ja) * 2004-03-25 2005-10-06 Shin Etsu Handotai Co Ltd 発光素子及びその製造方法
JP2006135215A (ja) * 2004-11-09 2006-05-25 Hitachi Cable Ltd 半導体発光素子の製造方法
JP4974043B2 (ja) * 2006-01-31 2012-07-11 信越半導体株式会社 発光素子およびその製造方法
JP5019756B2 (ja) * 2006-02-09 2012-09-05 昭和電工株式会社 発光ダイオード及びその製造方法

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