JP2009104110A - 露光装置及びその制御方法 - Google Patents
露光装置及びその制御方法 Download PDFInfo
- Publication number
- JP2009104110A JP2009104110A JP2008159675A JP2008159675A JP2009104110A JP 2009104110 A JP2009104110 A JP 2009104110A JP 2008159675 A JP2008159675 A JP 2008159675A JP 2008159675 A JP2008159675 A JP 2008159675A JP 2009104110 A JP2009104110 A JP 2009104110A
- Authority
- JP
- Japan
- Prior art keywords
- optical module
- module assembly
- exposure
- assembly assemblies
- separation distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070105929A KR20090040531A (ko) | 2007-10-22 | 2007-10-22 | 노광 장치 및 그 제어방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009104110A true JP2009104110A (ja) | 2009-05-14 |
Family
ID=40459077
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008159675A Pending JP2009104110A (ja) | 2007-10-22 | 2008-06-18 | 露光装置及びその制御方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2009104110A (zh) |
KR (1) | KR20090040531A (zh) |
CN (1) | CN101419408B (zh) |
DE (1) | DE102008031020A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012242454A (ja) * | 2011-05-16 | 2012-12-10 | V Technology Co Ltd | 露光装置及び遮光板 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104290523A (zh) * | 2014-09-26 | 2015-01-21 | 郑晓东 | 在薄型玻璃表面加工精细纹路或图案的方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006334894A (ja) * | 2005-06-01 | 2006-12-14 | Konica Minolta Medical & Graphic Inc | 画像記録装置 |
JP2007003934A (ja) * | 2005-06-24 | 2007-01-11 | Sharp Corp | マルチヘッド露光装置および露光方法 |
JP2007108559A (ja) * | 2005-10-17 | 2007-04-26 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4373731B2 (ja) | 2003-07-22 | 2009-11-25 | 富士フイルム株式会社 | 描画装置及び描画方法 |
-
2007
- 2007-10-22 KR KR1020070105929A patent/KR20090040531A/ko not_active Application Discontinuation
-
2008
- 2008-06-18 JP JP2008159675A patent/JP2009104110A/ja active Pending
- 2008-06-19 CN CN2008101259959A patent/CN101419408B/zh active Active
- 2008-06-30 DE DE200810031020 patent/DE102008031020A1/de not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006334894A (ja) * | 2005-06-01 | 2006-12-14 | Konica Minolta Medical & Graphic Inc | 画像記録装置 |
JP2007003934A (ja) * | 2005-06-24 | 2007-01-11 | Sharp Corp | マルチヘッド露光装置および露光方法 |
JP2007108559A (ja) * | 2005-10-17 | 2007-04-26 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012242454A (ja) * | 2011-05-16 | 2012-12-10 | V Technology Co Ltd | 露光装置及び遮光板 |
Also Published As
Publication number | Publication date |
---|---|
DE102008031020A1 (de) | 2009-04-23 |
CN101419408B (zh) | 2011-11-09 |
CN101419408A (zh) | 2009-04-29 |
KR20090040531A (ko) | 2009-04-27 |
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