JP2009104110A - 露光装置及びその制御方法 - Google Patents

露光装置及びその制御方法 Download PDF

Info

Publication number
JP2009104110A
JP2009104110A JP2008159675A JP2008159675A JP2009104110A JP 2009104110 A JP2009104110 A JP 2009104110A JP 2008159675 A JP2008159675 A JP 2008159675A JP 2008159675 A JP2008159675 A JP 2008159675A JP 2009104110 A JP2009104110 A JP 2009104110A
Authority
JP
Japan
Prior art keywords
optical module
module assembly
exposure
assembly assemblies
separation distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008159675A
Other languages
English (en)
Japanese (ja)
Inventor
Ul Tae Kim
乙 泰 金
Seishin Ri
成 進 李
Sang Hyun Park
相 玄 朴
Sang Woo Bae
▲祥▼ 佑 ベ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JP2009104110A publication Critical patent/JP2009104110A/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008159675A 2007-10-22 2008-06-18 露光装置及びその制御方法 Pending JP2009104110A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070105929A KR20090040531A (ko) 2007-10-22 2007-10-22 노광 장치 및 그 제어방법

Publications (1)

Publication Number Publication Date
JP2009104110A true JP2009104110A (ja) 2009-05-14

Family

ID=40459077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008159675A Pending JP2009104110A (ja) 2007-10-22 2008-06-18 露光装置及びその制御方法

Country Status (4)

Country Link
JP (1) JP2009104110A (zh)
KR (1) KR20090040531A (zh)
CN (1) CN101419408B (zh)
DE (1) DE102008031020A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012242454A (ja) * 2011-05-16 2012-12-10 V Technology Co Ltd 露光装置及び遮光板

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104290523A (zh) * 2014-09-26 2015-01-21 郑晓东 在薄型玻璃表面加工精细纹路或图案的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006334894A (ja) * 2005-06-01 2006-12-14 Konica Minolta Medical & Graphic Inc 画像記録装置
JP2007003934A (ja) * 2005-06-24 2007-01-11 Sharp Corp マルチヘッド露光装置および露光方法
JP2007108559A (ja) * 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4373731B2 (ja) 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006334894A (ja) * 2005-06-01 2006-12-14 Konica Minolta Medical & Graphic Inc 画像記録装置
JP2007003934A (ja) * 2005-06-24 2007-01-11 Sharp Corp マルチヘッド露光装置および露光方法
JP2007108559A (ja) * 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012242454A (ja) * 2011-05-16 2012-12-10 V Technology Co Ltd 露光装置及び遮光板

Also Published As

Publication number Publication date
DE102008031020A1 (de) 2009-04-23
CN101419408B (zh) 2011-11-09
CN101419408A (zh) 2009-04-29
KR20090040531A (ko) 2009-04-27

Similar Documents

Publication Publication Date Title
JP5211487B2 (ja) 露光方法及び露光装置並びにマイクロデバイスの製造方法
US8253923B1 (en) Optical imaging writer system
JP4486323B2 (ja) 画素位置特定方法、画像ずれ補正方法、および画像形成装置
US20060119819A1 (en) Projection exposure mask, projection exposure apparatus, and projection exposure method
WO2020151000A1 (zh) 数字化双面光刻或曝光系统和方法
JP2007101592A (ja) 走査型露光装置及びマイクロデバイスの製造方法
TW201335719A (zh) 曝光裝置及曝光方法
US8431328B2 (en) Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
WO2009150901A1 (ja) 露光装置および露光方法
JP2009104110A (ja) 露光装置及びその制御方法
JP4235972B2 (ja) パターン描画装置およびパターン描画方法
JP4144059B2 (ja) 走査型露光装置
JP2009170681A (ja) 露光装置、露光方法及びデバイス製造方法
KR20010062572A (ko) 노광 방법
JPH09134864A (ja) 露光方法
JP6139870B2 (ja) 露光方法、露光装置および物品の製造方法
JP2004119570A (ja) 露光量設定方法、露光方法およびこれを用いた露光装置
KR101794650B1 (ko) 마스크리스 노광 장치
JP5245456B2 (ja) 露光装置、露光方法及びデバイス製造方法
JP4361763B2 (ja) 露光装置および露光方法
JP2004184994A (ja) 露光方法および露光装置ならびに処理装置
JPH1064782A (ja) 走査型露光装置
KR100589055B1 (ko) 노광 방법 및 이를 수행하기 위한 노광 장치
JP2002072491A (ja) プリント基板製造装置
JP2024032060A (ja) 露光装置および露光方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101215

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110104

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110404

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110407

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110427

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120306

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120731