JP2009099976A5 - - Google Patents

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Publication number
JP2009099976A5
JP2009099976A5 JP2008249357A JP2008249357A JP2009099976A5 JP 2009099976 A5 JP2009099976 A5 JP 2009099976A5 JP 2008249357 A JP2008249357 A JP 2008249357A JP 2008249357 A JP2008249357 A JP 2008249357A JP 2009099976 A5 JP2009099976 A5 JP 2009099976A5
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JP
Japan
Prior art keywords
slots
plasma processing
processing apparatus
waveguide
slot
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Application number
JP2008249357A
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English (en)
Japanese (ja)
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JP5066502B2 (ja
JP2009099976A (ja
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Priority to JP2008249357A priority Critical patent/JP5066502B2/ja
Priority claimed from JP2008249357A external-priority patent/JP5066502B2/ja
Publication of JP2009099976A publication Critical patent/JP2009099976A/ja
Publication of JP2009099976A5 publication Critical patent/JP2009099976A5/ja
Application granted granted Critical
Publication of JP5066502B2 publication Critical patent/JP5066502B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008249357A 2007-09-28 2008-09-27 プラズマ処理装置 Expired - Fee Related JP5066502B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008249357A JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007254270 2007-09-28
JP2007254270 2007-09-28
JP2008249357A JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2009099976A JP2009099976A (ja) 2009-05-07
JP2009099976A5 true JP2009099976A5 (enExample) 2011-09-29
JP5066502B2 JP5066502B2 (ja) 2012-11-07

Family

ID=40702627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008249357A Expired - Fee Related JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

Country Status (1)

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JP (1) JP5066502B2 (enExample)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0319332A (ja) * 1989-06-16 1991-01-28 Hitachi Ltd マイクロ波プラズマ処理装置
JPH10284292A (ja) * 1997-04-03 1998-10-23 Sumitomo Metal Ind Ltd プラズマ処理方法、プラズマ処理装置、半導体装置の製造方法及び電界強度分布制御装置
JP4847636B2 (ja) * 1999-04-16 2011-12-28 クデラ ヨゼフ プラズマ発生機及びこのプラズマ発生機を備えたプラズマ処理装置
JP2006324551A (ja) * 2005-05-20 2006-11-30 Shibaura Mechatronics Corp プラズマ発生装置及びプラズマ処理装置
JP4576291B2 (ja) * 2005-06-06 2010-11-04 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP4677918B2 (ja) * 2006-02-09 2011-04-27 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

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