JP2004311975A5 - - Google Patents

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Publication number
JP2004311975A5
JP2004311975A5 JP2004076958A JP2004076958A JP2004311975A5 JP 2004311975 A5 JP2004311975 A5 JP 2004311975A5 JP 2004076958 A JP2004076958 A JP 2004076958A JP 2004076958 A JP2004076958 A JP 2004076958A JP 2004311975 A5 JP2004311975 A5 JP 2004311975A5
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JP
Japan
Prior art keywords
plasma
microwave
planar antenna
antenna member
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004076958A
Other languages
English (en)
Japanese (ja)
Other versions
JP4369264B2 (ja
JP2004311975A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2004076958A external-priority patent/JP4369264B2/ja
Priority to JP2004076958A priority Critical patent/JP4369264B2/ja
Priority to TW093107994A priority patent/TW200423213A/zh
Priority to KR1020057017916A priority patent/KR100767492B1/ko
Priority to US10/549,859 priority patent/US20060251828A1/en
Priority to PCT/JP2004/004070 priority patent/WO2004086483A1/ja
Priority to EP04722947A priority patent/EP1610369A4/en
Publication of JP2004311975A publication Critical patent/JP2004311975A/ja
Publication of JP2004311975A5 publication Critical patent/JP2004311975A5/ja
Publication of JP4369264B2 publication Critical patent/JP4369264B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004076958A 2003-03-25 2004-03-17 プラズマ成膜方法 Expired - Fee Related JP4369264B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2004076958A JP4369264B2 (ja) 2003-03-25 2004-03-17 プラズマ成膜方法
PCT/JP2004/004070 WO2004086483A1 (ja) 2003-03-25 2004-03-24 プラズマ成膜方法及びプラズマ成膜装置
KR1020057017916A KR100767492B1 (ko) 2003-03-25 2004-03-24 플라즈마 성막방법 및 플라즈마 성막장치
US10/549,859 US20060251828A1 (en) 2003-03-25 2004-03-24 Plasma film-forming method and plasma film-forming apparatus
TW093107994A TW200423213A (en) 2003-03-25 2004-03-24 Plasma filming method and plasma filming device
EP04722947A EP1610369A4 (en) 2003-03-25 2004-03-24 PLASMA FILM GENERATING METHOD AND PLASMA FILM GENERATING DEVICE

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003083292 2003-03-25
JP2004076958A JP4369264B2 (ja) 2003-03-25 2004-03-17 プラズマ成膜方法

Publications (3)

Publication Number Publication Date
JP2004311975A JP2004311975A (ja) 2004-11-04
JP2004311975A5 true JP2004311975A5 (enExample) 2006-09-21
JP4369264B2 JP4369264B2 (ja) 2009-11-18

Family

ID=33100373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004076958A Expired - Fee Related JP4369264B2 (ja) 2003-03-25 2004-03-17 プラズマ成膜方法

Country Status (6)

Country Link
US (1) US20060251828A1 (enExample)
EP (1) EP1610369A4 (enExample)
JP (1) JP4369264B2 (enExample)
KR (1) KR100767492B1 (enExample)
TW (1) TW200423213A (enExample)
WO (1) WO2004086483A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1115147A4 (en) * 1999-05-26 2007-05-02 Tadahiro Ohmi DEVICE FOR PLASMA TREATMENT
JP2006135303A (ja) * 2004-10-05 2006-05-25 Tokyo Electron Ltd プラズマ成膜方法及びプラズマ成膜装置、並びにプラズマ成膜装置に用いられる記憶媒体
JP4664119B2 (ja) * 2005-05-17 2011-04-06 東京エレクトロン株式会社 プラズマ処理装置
JP5162108B2 (ja) 2005-10-28 2013-03-13 日新電機株式会社 プラズマ生成方法及び装置並びにプラズマ処理装置
WO2007108394A1 (ja) * 2006-03-17 2007-09-27 National Institute Of Advanced Industrial Science And Technology 積層体及び炭素膜堆積方法
KR100980529B1 (ko) * 2006-03-27 2010-09-06 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치
JP5082411B2 (ja) * 2006-12-01 2012-11-28 東京エレクトロン株式会社 成膜方法
KR100898128B1 (ko) * 2007-07-30 2009-05-18 한국생산기술연구원 잉크젯 프린팅과 플라즈마 표면처리법을 이용한 미세패턴제작방법
JP2009088267A (ja) * 2007-09-28 2009-04-23 Tokyo Electron Ltd 成膜方法、成膜装置、記憶媒体及び半導体装置
US8800483B2 (en) 2009-05-08 2014-08-12 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
JP5514310B2 (ja) * 2010-06-28 2014-06-04 東京エレクトロン株式会社 プラズマ処理方法
US9530621B2 (en) * 2014-05-28 2016-12-27 Tokyo Electron Limited Integrated induction coil and microwave antenna as an all-planar source
EP3384063B1 (en) * 2015-12-02 2019-09-18 Basf Se Process for the generation of thin inorganic films
JP6664047B2 (ja) * 2016-03-31 2020-03-13 株式会社昭和真空 成膜装置及び成膜方法
JP6899693B2 (ja) * 2017-04-14 2021-07-07 東京エレクトロン株式会社 プラズマ処理装置及び制御方法
US10546724B2 (en) * 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US10490386B2 (en) 2017-06-27 2019-11-26 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
US10861667B2 (en) 2017-06-27 2020-12-08 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
WO2021183373A1 (en) 2020-03-13 2021-09-16 Vandermeulen Peter F Methods and systems for medical plasma treatment and generation of plasma activated media
CN117616877A (zh) * 2022-06-21 2024-02-27 株式会社日立高新技术 等离子处理装置以及加热装置

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
US5134965A (en) * 1989-06-16 1992-08-04 Hitachi, Ltd. Processing apparatus and method for plasma processing
US5698036A (en) * 1995-05-26 1997-12-16 Tokyo Electron Limited Plasma processing apparatus
US5803975A (en) * 1996-03-01 1998-09-08 Canon Kabushiki Kaisha Microwave plasma processing apparatus and method therefor
JP4356117B2 (ja) * 1997-01-29 2009-11-04 財団法人国際科学振興財団 プラズマ装置
US5800621A (en) * 1997-02-10 1998-09-01 Applied Materials, Inc. Plasma source for HDP-CVD chamber
TW376547B (en) * 1997-03-27 1999-12-11 Matsushita Electric Industrial Co Ltd Method and apparatus for plasma processing
JP3515347B2 (ja) * 1997-11-27 2004-04-05 東京エレクトロン株式会社 半導体デバイスの製造方法及び半導体デバイス
DE69836146T2 (de) * 1997-11-27 2007-08-23 Tokyo Electron Ltd. Plasma-abscheidung von filmen
JP3189781B2 (ja) * 1998-04-08 2001-07-16 日本電気株式会社 半導体装置の製造方法
JP4361625B2 (ja) * 1998-10-05 2009-11-11 東京エレクトロン株式会社 半導体装置及びその製造方法
US6870123B2 (en) * 1998-10-29 2005-03-22 Canon Kabushiki Kaisha Microwave applicator, plasma processing apparatus having same, and plasma processing method
US6652709B1 (en) * 1999-11-02 2003-11-25 Canon Kabushiki Kaisha Plasma processing apparatus having circular waveguide, and plasma processing method
JP2001308071A (ja) * 2000-04-26 2001-11-02 Canon Inc Ｅ面分岐を有する導波管を用いたプラズマ処理装置及びプラズマ処理方法
JP4478352B2 (ja) * 2000-03-29 2010-06-09 キヤノン株式会社 プラズマ処理装置及びプラズマ処理方法並びに構造体の製造方法
JP2002220668A (ja) * 2000-11-08 2002-08-09 Daikin Ind Ltd 成膜ガスおよびプラズマ成膜方法
JP5010781B2 (ja) * 2001-03-28 2012-08-29 忠弘 大見 プラズマ処理装置

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