JP5066502B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP5066502B2
JP5066502B2 JP2008249357A JP2008249357A JP5066502B2 JP 5066502 B2 JP5066502 B2 JP 5066502B2 JP 2008249357 A JP2008249357 A JP 2008249357A JP 2008249357 A JP2008249357 A JP 2008249357A JP 5066502 B2 JP5066502 B2 JP 5066502B2
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Japan
Prior art keywords
planar antenna
slot
slots
stub
waveguide
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Expired - Fee Related
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JP2008249357A
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Japanese (ja)
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JP2009099976A5 (enExample
JP2009099976A (ja
Inventor
龍作 太田
光 足立
敏雄 中西
篤 植田
松潤 康
モルズ、ポール
ヴェンツェ、ピーター、エル・ジー
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2008249357A priority Critical patent/JP5066502B2/ja
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Publication of JP2009099976A5 publication Critical patent/JP2009099976A5/ja
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JP2008249357A 2007-09-28 2008-09-27 プラズマ処理装置 Expired - Fee Related JP5066502B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008249357A JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007254270 2007-09-28
JP2007254270 2007-09-28
JP2008249357A JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2009099976A JP2009099976A (ja) 2009-05-07
JP2009099976A5 JP2009099976A5 (enExample) 2011-09-29
JP5066502B2 true JP5066502B2 (ja) 2012-11-07

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ID=40702627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008249357A Expired - Fee Related JP5066502B2 (ja) 2007-09-28 2008-09-27 プラズマ処理装置

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JP (1) JP5066502B2 (enExample)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0319332A (ja) * 1989-06-16 1991-01-28 Hitachi Ltd マイクロ波プラズマ処理装置
JPH10284292A (ja) * 1997-04-03 1998-10-23 Sumitomo Metal Ind Ltd プラズマ処理方法、プラズマ処理装置、半導体装置の製造方法及び電界強度分布制御装置
JP4847636B2 (ja) * 1999-04-16 2011-12-28 クデラ ヨゼフ プラズマ発生機及びこのプラズマ発生機を備えたプラズマ処理装置
JP2006324551A (ja) * 2005-05-20 2006-11-30 Shibaura Mechatronics Corp プラズマ発生装置及びプラズマ処理装置
JP4576291B2 (ja) * 2005-06-06 2010-11-04 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP4677918B2 (ja) * 2006-02-09 2011-04-27 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

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Publication number Publication date
JP2009099976A (ja) 2009-05-07

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