JP2009086094A - マスクブランク及び転写用マスク - Google Patents

マスクブランク及び転写用マスク Download PDF

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Publication number
JP2009086094A
JP2009086094A JP2007253250A JP2007253250A JP2009086094A JP 2009086094 A JP2009086094 A JP 2009086094A JP 2007253250 A JP2007253250 A JP 2007253250A JP 2007253250 A JP2007253250 A JP 2007253250A JP 2009086094 A JP2009086094 A JP 2009086094A
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JP
Japan
Prior art keywords
mask
transfer
film
haze
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007253250A
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English (en)
Japanese (ja)
Other versions
JP2009086094A5 (enExample
Inventor
Masahiro Hashimoto
雅広 橋本
Masaru Tanabe
勝 田辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2007253250A priority Critical patent/JP2009086094A/ja
Priority to PCT/JP2008/067098 priority patent/WO2009041388A1/ja
Priority to TW097137086A priority patent/TW200921267A/zh
Publication of JP2009086094A publication Critical patent/JP2009086094A/ja
Publication of JP2009086094A5 publication Critical patent/JP2009086094A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007253250A 2007-09-28 2007-09-28 マスクブランク及び転写用マスク Pending JP2009086094A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007253250A JP2009086094A (ja) 2007-09-28 2007-09-28 マスクブランク及び転写用マスク
PCT/JP2008/067098 WO2009041388A1 (ja) 2007-09-28 2008-09-22 マスクブランク及び転写用マスク
TW097137086A TW200921267A (en) 2007-09-28 2008-09-26 Mask blank and transfer mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007253250A JP2009086094A (ja) 2007-09-28 2007-09-28 マスクブランク及び転写用マスク

Publications (2)

Publication Number Publication Date
JP2009086094A true JP2009086094A (ja) 2009-04-23
JP2009086094A5 JP2009086094A5 (enExample) 2010-10-07

Family

ID=40511273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007253250A Pending JP2009086094A (ja) 2007-09-28 2007-09-28 マスクブランク及び転写用マスク

Country Status (3)

Country Link
JP (1) JP2009086094A (enExample)
TW (1) TW200921267A (enExample)
WO (1) WO2009041388A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010008604A (ja) * 2008-06-25 2010-01-14 Hoya Corp マスクブランク及び転写用マスク
JP2011095347A (ja) * 2009-10-27 2011-05-12 Hoya Corp マスクブランク、転写用マスクおよび転写用マスクセット
US8361679B2 (en) 2009-10-09 2013-01-29 Samsung Electronics Co. Ltd. Phase shift masks
US8968970B2 (en) 2009-10-09 2015-03-03 Samsung Electronics Co., Ltd. Phase shift masks and methods of forming phase shift masks

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647953U (ja) * 1992-11-30 1994-06-28 京セラ株式会社 フォトマスク
JPH0784357A (ja) * 1993-09-14 1995-03-31 Nikon Corp 露光マスクおよび投影露光方法
JPH10112429A (ja) * 1996-10-07 1998-04-28 Nippon Telegr & Teleph Corp <Ntt> 光露光システム
JPH10125583A (ja) * 1996-10-24 1998-05-15 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク
JP2000284468A (ja) * 1999-03-31 2000-10-13 Canon Inc マスク構造体、該マスク構造体を用いた露光方法および露光装置、該マスク構造体を用いて作製された半導体デバイス、ならびに半導体デバイス製造方法
JP2003243292A (ja) * 2002-02-18 2003-08-29 Nikon Corp 反射マスク、露光装置及びその清掃方法
JP2003295428A (ja) * 2001-03-29 2003-10-15 Dainippon Printing Co Ltd パターン形成体の製造方法およびそれに用いるフォトマスク
JP2005175324A (ja) * 2003-12-12 2005-06-30 Nikon Corp マスク汚染防止方法、マスク汚染防止装置及び露光装置
JP2005186005A (ja) * 2003-12-26 2005-07-14 Dainippon Printing Co Ltd 光触媒含有層基板およびパターン形成体の製造方法
JP2006047539A (ja) * 2004-08-03 2006-02-16 Toppan Printing Co Ltd フォトマスク及びその製造方法
JP2006243162A (ja) * 2005-03-01 2006-09-14 Dainippon Printing Co Ltd 露光用マスクおよびその製造方法
JP2007184361A (ja) * 2006-01-05 2007-07-19 Asahi Glass Co Ltd 薄膜デバイス用ガラス基板およびその成膜方法
JP2008197234A (ja) * 2007-02-09 2008-08-28 Nsk Ltd 近接露光用フォトマスク、露光方法及び露光装置
JP2008286838A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光用マスク、パターン形成装置及びパターン形成方法

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647953U (ja) * 1992-11-30 1994-06-28 京セラ株式会社 フォトマスク
JPH0784357A (ja) * 1993-09-14 1995-03-31 Nikon Corp 露光マスクおよび投影露光方法
JPH10112429A (ja) * 1996-10-07 1998-04-28 Nippon Telegr & Teleph Corp <Ntt> 光露光システム
JPH10125583A (ja) * 1996-10-24 1998-05-15 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスク
JP2000284468A (ja) * 1999-03-31 2000-10-13 Canon Inc マスク構造体、該マスク構造体を用いた露光方法および露光装置、該マスク構造体を用いて作製された半導体デバイス、ならびに半導体デバイス製造方法
JP2003295428A (ja) * 2001-03-29 2003-10-15 Dainippon Printing Co Ltd パターン形成体の製造方法およびそれに用いるフォトマスク
JP2003243292A (ja) * 2002-02-18 2003-08-29 Nikon Corp 反射マスク、露光装置及びその清掃方法
JP2005175324A (ja) * 2003-12-12 2005-06-30 Nikon Corp マスク汚染防止方法、マスク汚染防止装置及び露光装置
JP2005186005A (ja) * 2003-12-26 2005-07-14 Dainippon Printing Co Ltd 光触媒含有層基板およびパターン形成体の製造方法
JP2006047539A (ja) * 2004-08-03 2006-02-16 Toppan Printing Co Ltd フォトマスク及びその製造方法
JP2006243162A (ja) * 2005-03-01 2006-09-14 Dainippon Printing Co Ltd 露光用マスクおよびその製造方法
JP2007184361A (ja) * 2006-01-05 2007-07-19 Asahi Glass Co Ltd 薄膜デバイス用ガラス基板およびその成膜方法
JP2008197234A (ja) * 2007-02-09 2008-08-28 Nsk Ltd 近接露光用フォトマスク、露光方法及び露光装置
JP2008286838A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光用マスク、パターン形成装置及びパターン形成方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010008604A (ja) * 2008-06-25 2010-01-14 Hoya Corp マスクブランク及び転写用マスク
US8361679B2 (en) 2009-10-09 2013-01-29 Samsung Electronics Co. Ltd. Phase shift masks
US8968970B2 (en) 2009-10-09 2015-03-03 Samsung Electronics Co., Ltd. Phase shift masks and methods of forming phase shift masks
JP2011095347A (ja) * 2009-10-27 2011-05-12 Hoya Corp マスクブランク、転写用マスクおよび転写用マスクセット

Also Published As

Publication number Publication date
TW200921267A (en) 2009-05-16
WO2009041388A1 (ja) 2009-04-02

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