JP2009043879A5 - - Google Patents

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Publication number
JP2009043879A5
JP2009043879A5 JP2007206531A JP2007206531A JP2009043879A5 JP 2009043879 A5 JP2009043879 A5 JP 2009043879A5 JP 2007206531 A JP2007206531 A JP 2007206531A JP 2007206531 A JP2007206531 A JP 2007206531A JP 2009043879 A5 JP2009043879 A5 JP 2009043879A5
Authority
JP
Japan
Prior art keywords
substrate
auxiliary plate
gap
holding
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007206531A
Other languages
English (en)
Japanese (ja)
Other versions
JP4961299B2 (ja
JP2009043879A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007206531A priority Critical patent/JP4961299B2/ja
Priority claimed from JP2007206531A external-priority patent/JP4961299B2/ja
Priority to TW097129417A priority patent/TW200923590A/zh
Priority to KR1020080076311A priority patent/KR20090015824A/ko
Priority to US12/188,168 priority patent/US7630056B2/en
Publication of JP2009043879A publication Critical patent/JP2009043879A/ja
Publication of JP2009043879A5 publication Critical patent/JP2009043879A5/ja
Application granted granted Critical
Publication of JP4961299B2 publication Critical patent/JP4961299B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007206531A 2007-08-08 2007-08-08 露光装置およびデバイス製造方法 Expired - Fee Related JP4961299B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007206531A JP4961299B2 (ja) 2007-08-08 2007-08-08 露光装置およびデバイス製造方法
TW097129417A TW200923590A (en) 2007-08-08 2008-08-01 Exposure apparatus and device manufacturing method
KR1020080076311A KR20090015824A (ko) 2007-08-08 2008-08-05 노광장치 및 디바이스 제조 방법
US12/188,168 US7630056B2 (en) 2007-08-08 2008-08-07 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007206531A JP4961299B2 (ja) 2007-08-08 2007-08-08 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009043879A JP2009043879A (ja) 2009-02-26
JP2009043879A5 true JP2009043879A5 (https=) 2010-09-16
JP4961299B2 JP4961299B2 (ja) 2012-06-27

Family

ID=40346177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007206531A Expired - Fee Related JP4961299B2 (ja) 2007-08-08 2007-08-08 露光装置およびデバイス製造方法

Country Status (4)

Country Link
US (1) US7630056B2 (https=)
JP (1) JP4961299B2 (https=)
KR (1) KR20090015824A (https=)
TW (1) TW200923590A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5001343B2 (ja) 2008-12-11 2012-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 流体抽出システム、液浸リソグラフィ装置、及び液浸リソグラフィ装置で使用される液浸液の圧力変動を低減する方法
NL2004305A (en) * 2009-03-13 2010-09-14 Asml Netherlands Bv Substrate table, immersion lithographic apparatus and device manufacturing method.
NL2006127A (en) * 2010-02-17 2011-08-18 Asml Netherlands Bv A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus.
JP5973064B2 (ja) * 2012-05-29 2016-08-23 エーエスエムエル ネザーランズ ビー．ブイ． 支持装置、リソグラフィ装置及びデバイス製造方法
KR101979893B1 (ko) 2012-05-29 2019-05-17 에이에스엠엘 네델란즈 비.브이. 대상물 홀더 및 리소그래피 장치
JP6466597B2 (ja) 2015-04-29 2019-02-06 エーエスエムエル ネザーランズ ビー．ブイ． サポート装置、リソグラフィ装置およびデバイス製造方法
JP6702753B2 (ja) 2016-02-17 2020-06-03 キヤノン株式会社 リソグラフィ装置、及び物品の製造方法
WO2017194247A1 (en) 2016-05-12 2017-11-16 Asml Netherlands B.V. Extraction body for lithographic apparatus
NL2020011A (en) * 2017-01-26 2018-08-01 Asml Netherlands Bv A lithography apparatus and a method of manufacturing a device
US12405539B2 (en) 2020-02-24 2025-09-02 Asml Netherlands B.V. Substrate support and substrate table

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101520591B1 (ko) * 2003-06-13 2015-05-14 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
JP3862678B2 (ja) * 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
JP2005175016A (ja) * 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
DE602004030481D1 (de) * 2003-12-15 2011-01-20 Nippon Kogaku Kk Bühnensystem, belichtungsvorrichtung und belichtungsverfahren
WO2005059977A1 (ja) * 2003-12-16 2005-06-30 Nikon Corporation ステージ装置、露光装置、及び露光方法
JP4826146B2 (ja) * 2004-06-09 2011-11-30 株式会社ニコン 露光装置、デバイス製造方法
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8102512B2 (en) * 2004-09-17 2012-01-24 Nikon Corporation Substrate holding device, exposure apparatus, and device manufacturing method
WO2006049134A1 (ja) * 2004-11-01 2006-05-11 Nikon Corporation 露光装置及びデバイス製造方法
WO2006064851A1 (ja) * 2004-12-15 2006-06-22 Nikon Corporation 基板保持装置、露光装置、及びデバイス製造方法
JP2006173527A (ja) * 2004-12-20 2006-06-29 Sony Corp 露光装置
TWI424260B (zh) * 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
JP4752320B2 (ja) * 2005-04-28 2011-08-17 株式会社ニコン 基板保持装置及び露光装置、基板保持方法、露光方法、並びにデバイス製造方法
JP2007019392A (ja) * 2005-07-11 2007-01-25 Canon Inc 露光装置
JP3997244B2 (ja) 2005-10-04 2007-10-24 キヤノン株式会社 露光装置及びデバイス製造方法
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) * 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8027019B2 (en) * 2006-03-28 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7900641B2 (en) * 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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