JP2009038152A5 - - Google Patents
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- Publication number
- JP2009038152A5 JP2009038152A5 JP2007199894A JP2007199894A JP2009038152A5 JP 2009038152 A5 JP2009038152 A5 JP 2009038152A5 JP 2007199894 A JP2007199894 A JP 2007199894A JP 2007199894 A JP2007199894 A JP 2007199894A JP 2009038152 A5 JP2009038152 A5 JP 2009038152A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- refractive optical
- refractive
- optical
- movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical Effects 0.000 claims 36
- 239000000758 substrate Substances 0.000 claims 3
- 201000009310 astigmatism Diseases 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007199894A JP5118407B2 (ja) | 2007-07-31 | 2007-07-31 | 光学系、露光装置及びデバイス製造方法 |
TW097120267A TWI397781B (zh) | 2007-07-31 | 2008-05-30 | Optical system, exposure apparatus and apparatus manufacturing method |
KR1020080074836A KR100992302B1 (ko) | 2007-07-31 | 2008-07-31 | 광학계, 노광장치 및 디바이스 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007199894A JP5118407B2 (ja) | 2007-07-31 | 2007-07-31 | 光学系、露光装置及びデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009038152A JP2009038152A (ja) | 2009-02-19 |
JP2009038152A5 true JP2009038152A5 (zh) | 2010-09-16 |
JP5118407B2 JP5118407B2 (ja) | 2013-01-16 |
Family
ID=40439798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007199894A Expired - Fee Related JP5118407B2 (ja) | 2007-07-31 | 2007-07-31 | 光学系、露光装置及びデバイス製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5118407B2 (zh) |
KR (1) | KR100992302B1 (zh) |
TW (1) | TWI397781B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5595001B2 (ja) * | 2009-10-06 | 2014-09-24 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
JP5595015B2 (ja) * | 2009-11-16 | 2014-09-24 | キヤノン株式会社 | 投影光学系、露光装置およびデバイス製造方法 |
JP6041541B2 (ja) * | 2012-06-04 | 2016-12-07 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP7005364B2 (ja) * | 2018-01-29 | 2022-01-21 | キヤノン株式会社 | 投影光学系、露光装置、物品の製造方法及び調整方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10142501A (ja) * | 1996-11-06 | 1998-05-29 | Nikon Corp | 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法 |
JP2002250865A (ja) * | 2000-06-14 | 2002-09-06 | Nikon Corp | 投影光学系、露光装置、およびそれらの製造方法 |
US6975385B2 (en) | 2002-11-08 | 2005-12-13 | Canon Kabushiki Kaisha | Projection optical system and exposure apparatus |
US7158215B2 (en) * | 2003-06-30 | 2007-01-02 | Asml Holding N.V. | Large field of view protection optical system with aberration correctability for flat panel displays |
JP2005024814A (ja) * | 2003-07-01 | 2005-01-27 | Nikon Corp | 投影光学系、露光装置および露光方法 |
EP1513019B1 (en) | 2003-09-02 | 2012-07-25 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus and device fabricating method |
-
2007
- 2007-07-31 JP JP2007199894A patent/JP5118407B2/ja not_active Expired - Fee Related
-
2008
- 2008-05-30 TW TW097120267A patent/TWI397781B/zh not_active IP Right Cessation
- 2008-07-31 KR KR1020080074836A patent/KR100992302B1/ko active IP Right Grant
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