JP2009038152A5 - - Google Patents

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Publication number
JP2009038152A5
JP2009038152A5 JP2007199894A JP2007199894A JP2009038152A5 JP 2009038152 A5 JP2009038152 A5 JP 2009038152A5 JP 2007199894 A JP2007199894 A JP 2007199894A JP 2007199894 A JP2007199894 A JP 2007199894A JP 2009038152 A5 JP2009038152 A5 JP 2009038152A5
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JP
Japan
Prior art keywords
optical system
refractive optical
refractive
optical
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007199894A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009038152A (ja
JP5118407B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007199894A priority Critical patent/JP5118407B2/ja
Priority claimed from JP2007199894A external-priority patent/JP5118407B2/ja
Priority to TW097120267A priority patent/TWI397781B/zh
Priority to KR1020080074836A priority patent/KR100992302B1/ko
Publication of JP2009038152A publication Critical patent/JP2009038152A/ja
Publication of JP2009038152A5 publication Critical patent/JP2009038152A5/ja
Application granted granted Critical
Publication of JP5118407B2 publication Critical patent/JP5118407B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007199894A 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法 Expired - Fee Related JP5118407B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法
TW097120267A TWI397781B (zh) 2007-07-31 2008-05-30 Optical system, exposure apparatus and apparatus manufacturing method
KR1020080074836A KR100992302B1 (ko) 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009038152A JP2009038152A (ja) 2009-02-19
JP2009038152A5 true JP2009038152A5 (zh) 2010-09-16
JP5118407B2 JP5118407B2 (ja) 2013-01-16

Family

ID=40439798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007199894A Expired - Fee Related JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Country Status (3)

Country Link
JP (1) JP5118407B2 (zh)
KR (1) KR100992302B1 (zh)
TW (1) TWI397781B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142501A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法
JP2002250865A (ja) * 2000-06-14 2002-09-06 Nikon Corp 投影光学系、露光装置、およびそれらの製造方法
US6975385B2 (en) 2002-11-08 2005-12-13 Canon Kabushiki Kaisha Projection optical system and exposure apparatus
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2005024814A (ja) * 2003-07-01 2005-01-27 Nikon Corp 投影光学系、露光装置および露光方法
EP1513019B1 (en) 2003-09-02 2012-07-25 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method

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