JP2009021561A5 - - Google Patents

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Publication number
JP2009021561A5
JP2009021561A5 JP2008139151A JP2008139151A JP2009021561A5 JP 2009021561 A5 JP2009021561 A5 JP 2009021561A5 JP 2008139151 A JP2008139151 A JP 2008139151A JP 2008139151 A JP2008139151 A JP 2008139151A JP 2009021561 A5 JP2009021561 A5 JP 2009021561A5
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JP
Japan
Prior art keywords
semiconductor
region
active layer
memory according
layer region
Prior art date
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Application number
JP2008139151A
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English (en)
Japanese (ja)
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JP2009021561A (ja
JP5305739B2 (ja
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Priority to JP2008139151A priority Critical patent/JP5305739B2/ja
Priority claimed from JP2008139151A external-priority patent/JP5305739B2/ja
Publication of JP2009021561A publication Critical patent/JP2009021561A/ja
Publication of JP2009021561A5 publication Critical patent/JP2009021561A5/ja
Application granted granted Critical
Publication of JP5305739B2 publication Critical patent/JP5305739B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008139151A 2007-06-12 2008-05-28 キャパシタレスメモリ Expired - Fee Related JP5305739B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008139151A JP5305739B2 (ja) 2007-06-12 2008-05-28 キャパシタレスメモリ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007154610 2007-06-12
JP2007154610 2007-06-12
JP2008139151A JP5305739B2 (ja) 2007-06-12 2008-05-28 キャパシタレスメモリ

Publications (3)

Publication Number Publication Date
JP2009021561A JP2009021561A (ja) 2009-01-29
JP2009021561A5 true JP2009021561A5 (enExample) 2011-04-28
JP5305739B2 JP5305739B2 (ja) 2013-10-02

Family

ID=40131457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008139151A Expired - Fee Related JP5305739B2 (ja) 2007-06-12 2008-05-28 キャパシタレスメモリ

Country Status (3)

Country Link
US (1) US7755105B2 (enExample)
JP (1) JP5305739B2 (enExample)
KR (1) KR101448899B1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7750368B2 (en) * 2008-06-13 2010-07-06 Macronix International Co., Ltd. Memory device
US8278167B2 (en) 2008-12-18 2012-10-02 Micron Technology, Inc. Method and structure for integrating capacitor-less memory cell with logic
CN104600074A (zh) * 2009-11-06 2015-05-06 株式会社半导体能源研究所 半导体装置
US20120019284A1 (en) * 2010-07-26 2012-01-26 Infineon Technologies Austria Ag Normally-Off Field Effect Transistor, a Manufacturing Method Therefor and a Method for Programming a Power Field Effect Transistor
KR20120060407A (ko) * 2010-12-02 2012-06-12 삼성전자주식회사 표시 기판, 이의 제조 방법 및 이를 포함하는 터치 표시 장치
TWI602303B (zh) 2011-01-26 2017-10-11 半導體能源研究所股份有限公司 半導體裝置及其製造方法
US8969924B2 (en) 2012-05-21 2015-03-03 The Board Of Trustees Of The Leland Stanford Junior University Transistor-based apparatuses, systems and methods
CN121040234A (zh) * 2024-03-28 2025-11-28 京东方科技集团股份有限公司 晶体管、驱动背板及制备方法和显示装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4727044A (en) 1984-05-18 1988-02-23 Semiconductor Energy Laboratory Co., Ltd. Method of making a thin film transistor with laser recrystallized source and drain
JPH0824131B2 (ja) * 1985-10-07 1996-03-06 株式会社日立製作所 電界効果トランジスタ
US4755865A (en) 1986-01-21 1988-07-05 Motorola Inc. Means for stabilizing polycrystalline semiconductor layers
US4899202A (en) 1988-07-08 1990-02-06 Texas Instruments Incorporated High performance silicon-on-insulator transistor with body node to source node connection
US5821563A (en) 1990-12-25 1998-10-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device free from reverse leakage and throw leakage
US5738731A (en) * 1993-11-19 1998-04-14 Mega Chips Corporation Photovoltaic device
JP3407232B2 (ja) 1995-02-08 2003-05-19 富士通株式会社 半導体記憶装置及びその動作方法
US5914504A (en) * 1995-06-16 1999-06-22 Imec Vzw DRAM applications using vertical MISFET devices
JPH1092952A (ja) 1996-09-18 1998-04-10 Toshiba Corp 半導体記憶装置
JPH11204661A (ja) * 1997-10-29 1999-07-30 Sony Corp 半導体メモリセル及びその製造方法
AU2685700A (en) * 1999-02-24 2000-09-14 Carlos J.R.P. Augusto Misfet
JP4216483B2 (ja) 2001-02-15 2009-01-28 株式会社東芝 半導体メモリ装置
US6861689B2 (en) * 2002-11-08 2005-03-01 Freescale Semiconductor, Inc. One transistor DRAM cell structure and method for forming
KR101019337B1 (ko) * 2004-03-12 2011-03-07 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 아몰퍼스 산화물 및 박막 트랜지스터
US7518196B2 (en) * 2005-02-23 2009-04-14 Intel Corporation Field effect transistor with narrow bandgap source and drain regions and method of fabrication

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