JP2009016541A5 - - Google Patents

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Publication number
JP2009016541A5
JP2009016541A5 JP2007176202A JP2007176202A JP2009016541A5 JP 2009016541 A5 JP2009016541 A5 JP 2009016541A5 JP 2007176202 A JP2007176202 A JP 2007176202A JP 2007176202 A JP2007176202 A JP 2007176202A JP 2009016541 A5 JP2009016541 A5 JP 2009016541A5
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JP
Japan
Prior art keywords
laser
cylindrical lens
light
convex
convex cylindrical
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Application number
JP2007176202A
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English (en)
Japanese (ja)
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JP2009016541A (ja
JP5288583B2 (ja
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Priority to JP2007176202A priority Critical patent/JP5288583B2/ja
Priority claimed from JP2007176202A external-priority patent/JP5288583B2/ja
Publication of JP2009016541A publication Critical patent/JP2009016541A/ja
Publication of JP2009016541A5 publication Critical patent/JP2009016541A5/ja
Application granted granted Critical
Publication of JP5288583B2 publication Critical patent/JP5288583B2/ja
Expired - Fee Related legal-status Critical Current
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JP2007176202A 2007-07-04 2007-07-04 半導体装置の作製方法 Expired - Fee Related JP5288583B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007176202A JP5288583B2 (ja) 2007-07-04 2007-07-04 半導体装置の作製方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007176202A JP5288583B2 (ja) 2007-07-04 2007-07-04 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2009016541A JP2009016541A (ja) 2009-01-22
JP2009016541A5 true JP2009016541A5 (enrdf_load_stackoverflow) 2010-07-08
JP5288583B2 JP5288583B2 (ja) 2013-09-11

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ID=40357099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007176202A Expired - Fee Related JP5288583B2 (ja) 2007-07-04 2007-07-04 半導体装置の作製方法

Country Status (1)

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JP (1) JP5288583B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5148730B2 (ja) * 2011-05-18 2013-02-20 昭和オプトロニクス株式会社 ファイバ転送レーザ光学系
FR2989388B1 (fr) * 2012-04-17 2019-10-18 Saint-Gobain Glass France Procede d'obtention d'un substrat muni d'un revetement
JP5980043B2 (ja) 2012-08-22 2016-08-31 住友重機械工業株式会社 レーザ照射装置
DE102017126453A1 (de) * 2017-11-10 2019-05-16 Amphos GmbH Verfahren zur Laserverstärkung
JP7265743B2 (ja) * 2018-09-18 2023-04-27 株式会社オプトピア 光源装置及びそれを用いたラインビームホモジェナイザ
KR102688794B1 (ko) * 2019-01-11 2024-07-29 삼성디스플레이 주식회사 레이저 결정화 장치
KR102758708B1 (ko) * 2020-05-13 2025-01-22 삼성디스플레이 주식회사 레이저 장치 및 표시 장치의 제조 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09129573A (ja) * 1995-07-25 1997-05-16 Semiconductor Energy Lab Co Ltd レーザーアニール方法およびレーザーアニール装置
JP3191702B2 (ja) * 1996-11-25 2001-07-23 住友重機械工業株式会社 ビームホモジナイザ
JP2003053578A (ja) * 2001-08-15 2003-02-26 Sumitomo Heavy Ind Ltd レーザビームのプロファイル調整方法及び装置
JP2005129916A (ja) * 2003-09-30 2005-05-19 Semiconductor Energy Lab Co Ltd ビームホモジナイザ、レーザ照射装置、半導体装置の作製方法
KR20080039449A (ko) * 2005-08-02 2008-05-07 칼 짜이스 레이저 옵틱스 게엠베하 선 초점을 생성하기 위한 광학 시스템, 그러한 광학시스템을 이용하는 스캐닝 시스템, 및 기판의 레이저 공정방법

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