JP2008544531A5 - - Google Patents

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Publication number
JP2008544531A5
JP2008544531A5 JP2008517389A JP2008517389A JP2008544531A5 JP 2008544531 A5 JP2008544531 A5 JP 2008544531A5 JP 2008517389 A JP2008517389 A JP 2008517389A JP 2008517389 A JP2008517389 A JP 2008517389A JP 2008544531 A5 JP2008544531 A5 JP 2008544531A5
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JP
Japan
Prior art keywords
optical system
illumination optical
field
facet
raster
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008517389A
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English (en)
Japanese (ja)
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JP2008544531A (ja
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Publication date
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Priority claimed from PCT/EP2006/005857 external-priority patent/WO2006136353A1/en
Publication of JP2008544531A publication Critical patent/JP2008544531A/ja
Publication of JP2008544531A5 publication Critical patent/JP2008544531A5/ja
Pending legal-status Critical Current

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JP2008517389A 2005-06-21 2006-06-19 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系 Pending JP2008544531A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69270005P 2005-06-21 2005-06-21
PCT/EP2006/005857 WO2006136353A1 (en) 2005-06-21 2006-06-19 A double-facetted illumination system with attenuator elements on the pupil facet mirror

Publications (2)

Publication Number Publication Date
JP2008544531A JP2008544531A (ja) 2008-12-04
JP2008544531A5 true JP2008544531A5 (cg-RX-API-DMAC7.html) 2009-08-06

Family

ID=36764368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008517389A Pending JP2008544531A (ja) 2005-06-21 2006-06-19 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系

Country Status (4)

Country Link
US (1) US20080165925A1 (cg-RX-API-DMAC7.html)
EP (1) EP1894063A1 (cg-RX-API-DMAC7.html)
JP (1) JP2008544531A (cg-RX-API-DMAC7.html)
WO (1) WO2006136353A1 (cg-RX-API-DMAC7.html)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006059024A1 (de) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil
US7990520B2 (en) 2006-12-18 2011-08-02 Carl Zeiss Smt Gmbh Microlithography illumination systems, components and methods
JP5218994B2 (ja) * 2007-02-20 2013-06-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の１次光源を有する光学要素
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
US8908151B2 (en) * 2008-02-14 2014-12-09 Nikon Corporation Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system
JP5182588B2 (ja) * 2008-04-29 2013-04-17 株式会社ニコン オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
DE102008001511A1 (de) 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
DE102008049586A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie
WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102009045491A1 (de) * 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Beleuchtungsoptik
CN102612667B (zh) * 2009-11-18 2015-06-17 Asml荷兰有限公司 光刻设备以及器件制造方法
CN102695988B (zh) * 2009-12-23 2015-09-02 Asml荷兰有限公司 光刻设备以及器件制造方法
DE102011077234A1 (de) 2011-06-08 2012-12-13 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
EP2689427B1 (en) 2011-03-23 2017-05-03 Carl Zeiss SMT GmbH Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011005940A1 (de) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
DE102011076658A1 (de) * 2011-05-30 2012-05-10 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithographie
DE102012010093A1 (de) * 2012-05-23 2013-11-28 Carl Zeiss Smt Gmbh Facettenspiegel
DE102012212453A1 (de) * 2012-07-17 2014-01-23 Carl Zeiss Smt Gmbh Beleuchtungsoptik
DE102012212664A1 (de) * 2012-07-19 2014-01-23 Carl Zeiss Smt Gmbh Verfahren zum Einstellen eines Beleuchtungssettings
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
KR102445217B1 (ko) 2014-07-08 2022-09-20 코닝 인코포레이티드 재료를 레이저 가공하는 방법 및 장치
KR20170028943A (ko) * 2014-07-14 2017-03-14 코닝 인코포레이티드 조정가능한 레이저 빔 촛점 라인을 사용하여 투명한 재료를 처리하는 방법 및 시스템
CN107922237B (zh) 2015-03-24 2022-04-01 康宁股份有限公司 显示器玻璃组合物的激光切割和加工
DE102015217603A1 (de) * 2015-09-15 2017-03-16 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithografie
KR102078294B1 (ko) 2016-09-30 2020-02-17 코닝 인코포레이티드 비-축대칭 빔 스폿을 이용하여 투명 워크피스를 레이저 가공하기 위한 기기 및 방법
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
DE102017203246A1 (de) 2017-02-28 2018-08-30 Carl Zeiss Smt Gmbh Verfahren zur Korrektur eines Spiegels für den Wellenlängenbereich von 5 nm bis 20 nm

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3158691B2 (ja) * 1992-08-07 2001-04-23 株式会社ニコン 露光装置及び方法、並びに照明光学装置
WO1999036832A1 (en) * 1998-01-19 1999-07-22 Nikon Corporation Illuminating device and exposure apparatus
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
EP0955641B1 (de) * 1998-05-05 2004-04-28 Carl Zeiss Beleuchtungssystem insbesondere für die EUV-Lithographie
US6438199B1 (en) * 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6225027B1 (en) * 1998-08-06 2001-05-01 Euv Llc Extreme-UV lithography system
US6195201B1 (en) * 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
WO2001009684A1 (de) * 1999-07-30 2001-02-08 Carl Zeiss Steuerung der beleuchtungsverteilung in der austrittspupille eines euv-beleuchtungssystems
US7209287B2 (en) * 2000-09-18 2007-04-24 Vincent Lauer Confocal optical scanning device
TW519574B (en) * 2000-10-20 2003-02-01 Nikon Corp Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same
JP3836418B2 (ja) * 2001-09-07 2006-10-25 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ リソグラフィ装置およびデバイスの製造方法
SG121762A1 (en) * 2002-03-18 2006-05-26 Asml Netherlands Bv Lithographic apparatus, and device manufacturing method
EP1349009B1 (en) * 2002-03-18 2009-02-04 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
EP1649324B1 (en) * 2003-07-30 2011-03-16 Carl Zeiss SMT GmbH An illumination system for microlithography
EP1692566A4 (en) * 2003-10-09 2009-02-25 Merlin Technology Ltd Liabilit PROJECTION RECEPTION SURFACE, WHICH WORKS IN AMBIENT LIGHT

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