JP2008511714A5 - - Google Patents

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JP2008511714A5
JP2008511714A5 JP2007529355A JP2007529355A JP2008511714A5 JP 2008511714 A5 JP2008511714 A5 JP 2008511714A5 JP 2007529355 A JP2007529355 A JP 2007529355A JP 2007529355 A JP2007529355 A JP 2007529355A JP 2008511714 A5 JP2008511714 A5 JP 2008511714A5
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Japan
Prior art keywords
oxyl
trimethyl
diethyl
resins
dioxa
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JP2007529355A
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JP5245046B2 (ja
JP2008511714A (ja
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Priority claimed from PCT/EP2005/054146 external-priority patent/WO2006024621A1/en
Publication of JP2008511714A publication Critical patent/JP2008511714A/ja
Publication of JP2008511714A5 publication Critical patent/JP2008511714A5/ja
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Publication of JP5245046B2 publication Critical patent/JP5245046B2/ja
Expired - Fee Related legal-status Critical Current
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Claims (2)

  1. UV硬化性の着色又は非着色ウレタン樹脂、アクリル樹脂、ポリエステル樹脂及びエポキシ樹脂のための缶内安定剤(in-can stabilizer)としての、
    2,6−ジエチル−2,3,6−トリメチル−4−ヒドロキシピペリジン−1−オキシル
    Figure 2008511714

    2,6−ジエチル−2,3,6−トリメチル−4−オキソピペリジン−1−オキシル
    Figure 2008511714

    7,9−ジエチル−6,7,9−トリメチル−1,4−ジオキサ−8−アザ−スピロ[4.5]デカン−8−オキシル
    Figure 2008511714

    オクタデカン酸3,8,10−トリエチル−7,8,10−トリメチル−1,5−ジオキサ−9−アザ−スピロ[5.5]ウンデカ−3−イルメチルエステル−9−オキシル
    Figure 2008511714

    1−t−ブチル−3,3,5,5−テトラエチル−ピペラジン−2−オン−4−オキシル
    Figure 2008511714

    1−t−オクチル−3,3−ジエチル−5,5−ジメチル−ピペラジン−2−オン−4−オキシル
    Figure 2008511714

    tert−ブチル−(1−ジエチルホスホノ−2,2−ジメチル)−アミン−N−オキシル
    Figure 2008511714

    から選択される、安定した高度立体障害ニトロキシルラジカルの使用。
  2. 重ね刷り用ワニス及びインクのための缶内安定剤としての、請求項1記載の安定した高度立体障害ニトロキシルラジカルの使用。
JP2007529355A 2004-09-03 2005-08-24 缶内安定剤 Expired - Fee Related JP5245046B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04104248.2 2004-09-03
EP04104248 2004-09-03
PCT/EP2005/054146 WO2006024621A1 (en) 2004-09-03 2005-08-24 In-can stabilizers

Publications (3)

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JP2008511714A JP2008511714A (ja) 2008-04-17
JP2008511714A5 true JP2008511714A5 (ja) 2008-10-16
JP5245046B2 JP5245046B2 (ja) 2013-07-24

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JP2007529355A Expired - Fee Related JP5245046B2 (ja) 2004-09-03 2005-08-24 缶内安定剤

Country Status (7)

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US (2) US20070225397A1 (ja)
EP (2) EP1873199A1 (ja)
JP (1) JP5245046B2 (ja)
AT (1) ATE390457T1 (ja)
DE (1) DE602005005692T2 (ja)
TW (1) TWI449739B (ja)
WO (1) WO2006024621A1 (ja)

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EP3917703A1 (en) 2019-01-29 2021-12-08 Basf Se Security element
CN113811409A (zh) 2019-05-06 2021-12-17 巴斯夫欧洲公司 包含银纳米片的组合物
EP4017938A1 (en) 2019-08-19 2022-06-29 Basf Se A process for the production of fingerprint texture free liquid crystal films
CN114641388A (zh) 2019-11-07 2022-06-17 巴斯夫欧洲公司 用于3d打印中的水洗性组合物
CN115279518A (zh) 2020-04-23 2022-11-01 巴斯夫欧洲公司 包含片状过渡金属颗粒的组合物
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EP4288229A1 (en) 2021-02-03 2023-12-13 Basf Se Compositions, comprising silver nanoplatelets
WO2022238468A1 (en) 2021-05-12 2022-11-17 Basf Se Compositions, comprising platelet-shaped transition metal particles
WO2023072740A1 (en) 2021-10-26 2023-05-04 Basf Se A method for producing interference elements

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