JP2008511115A5 - - Google Patents
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- Publication number
- JP2008511115A5 JP2008511115A5 JP2007529134A JP2007529134A JP2008511115A5 JP 2008511115 A5 JP2008511115 A5 JP 2008511115A5 JP 2007529134 A JP2007529134 A JP 2007529134A JP 2007529134 A JP2007529134 A JP 2007529134A JP 2008511115 A5 JP2008511115 A5 JP 2008511115A5
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- directed
- deflected
- workpiece
- directing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60354404P | 2004-08-24 | 2004-08-24 | |
| US60/603,544 | 2004-08-24 | ||
| PCT/IL2005/000913 WO2006021958A2 (en) | 2004-08-24 | 2005-08-24 | Directed multi-deflected ion beam milling of a work piece and determining and controlling extent thereof |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008511115A JP2008511115A (ja) | 2008-04-10 |
| JP2008511115A5 true JP2008511115A5 (https=) | 2008-07-03 |
| JP5254613B2 JP5254613B2 (ja) | 2013-08-07 |
Family
ID=35677383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007529134A Expired - Lifetime JP5254613B2 (ja) | 2004-08-24 | 2005-08-24 | 被加工物の有向多偏向イオンビームミリングならびにその程度の決定および制御 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20080078750A1 (https=) |
| EP (1) | EP1787310A2 (https=) |
| JP (1) | JP5254613B2 (https=) |
| KR (3) | KR20070101204A (https=) |
| CN (1) | CN101069260B (https=) |
| WO (1) | WO2006021958A2 (https=) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101069260B (zh) * | 2004-08-24 | 2012-09-26 | 西拉半导体工程实验室有限公司 | 工件的离子束铣削及其程度的确定和控制 |
| DE102007046783A1 (de) * | 2007-09-29 | 2009-04-23 | Carl Zeiss Nts Gmbh | Vorrichtung zur Ablenkung oder Einlenkung eines Teilchenstrahls |
| US8232532B2 (en) * | 2009-06-23 | 2012-07-31 | Hitachi Global Storage Technologies Netherlands B.V. | Off-axis ion milling device for manufacture of magnetic recording media and method for using the same |
| SG177822A1 (en) * | 2010-07-06 | 2012-02-28 | Camtek Ltd | Method and system for preparing a sample |
| SG177823A1 (en) * | 2010-07-06 | 2012-02-28 | Camtek Ltd | Method and system for preparing a lamella |
| US9330885B2 (en) * | 2011-06-30 | 2016-05-03 | Seagate Technology Llc | Method of stack patterning using a ion etching |
| CA2791249C (en) * | 2011-11-10 | 2014-02-25 | Semiconductor Insights Inc. | Method and system for ion beam delayering of a sample and control thereof |
| US20160048066A1 (en) * | 2013-08-07 | 2016-02-18 | Sakai Display Products Corporation | Method for Manufacturing Display Panel and Display Panel |
| US9911573B2 (en) * | 2014-03-09 | 2018-03-06 | Ib Labs, Inc. | Methods, apparatuses, systems and software for treatment of a specimen by ion-milling |
| US10354836B2 (en) | 2014-03-09 | 2019-07-16 | Ib Labs, Inc. | Methods, apparatuses, systems and software for treatment of a specimen by ion-milling |
| US9779914B2 (en) | 2014-07-25 | 2017-10-03 | E.A. Fischione Instruments, Inc. | Apparatus for preparing a sample for microscopy |
| CN105957789B (zh) * | 2015-03-09 | 2020-05-12 | Ib实验室有限公司 | 用于通过离子铣处理试样的方法、设备、系统和软件 |
| US9779910B1 (en) * | 2016-09-13 | 2017-10-03 | Qualcomm Incorporated | Utilization of voltage contrast during sample preparation for transmission electron microscopy |
| WO2018140903A2 (en) * | 2017-01-27 | 2018-08-02 | Howard Hughes Medical Institute | Enhanced fib-sem systems for large-volume 3d imaging |
| US11119012B2 (en) | 2017-04-25 | 2021-09-14 | Ib Labs, Inc. | Device and method for cleaving a liquid sample |
| CA3120208A1 (en) * | 2018-11-21 | 2020-05-28 | Techinsights Inc. | Ion beam delayering system and method, topographically enhanced delayered sample produced thereby, and imaging methods and systems related thereto |
| US11440151B2 (en) * | 2019-06-07 | 2022-09-13 | Applied Materials Israel Ltd. | Milling a multi-layered object |
| US10971618B2 (en) | 2019-08-02 | 2021-04-06 | Applied Materials Israel Ltd. | Generating milled structural elements with a flat upper surface |
| US11276557B2 (en) | 2019-09-17 | 2022-03-15 | Applied Materials Israel Ltd. | Forming a vertical surface |
| US10903044B1 (en) * | 2020-02-12 | 2021-01-26 | Applied Materials Israel Ltd. | Filling empty structures with deposition under high-energy SEM for uniform DE layering |
| WO2022174187A2 (en) * | 2021-02-15 | 2022-08-18 | E.A. Fischione Instruments, Inc. | System and method for uniform ion milling |
| US11784025B1 (en) | 2022-05-10 | 2023-10-10 | Plasma-Therm Nes Llc | Integral sweep in ion beam system |
| US12288668B2 (en) | 2023-05-11 | 2025-04-29 | Applied Materials Israel Ltd. | Entropy based image processing for focused ion beam delayer-edge slices detection |
| ES3010110B2 (es) * | 2023-09-29 | 2025-12-18 | Consejo Superior Investigacion | Sistema de fabricacion de contactos electricos y metodo de fabricacion asociado |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US563879A (en) * | 1896-07-14 | Automatic valve | ||
| JPS5013851Y1 (https=) * | 1970-03-17 | 1975-04-28 | ||
| US4209698A (en) * | 1971-12-28 | 1980-06-24 | Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. | Transmission-type charged particle beam apparatus |
| JPS5013851U (https=) * | 1973-06-06 | 1975-02-13 | ||
| JPS5271354A (en) * | 1975-12-11 | 1977-06-14 | Nippon Electric Co | Electron beam welding machine |
| US4128765A (en) * | 1976-10-29 | 1978-12-05 | Joseph Franks | Ion beam machining techniques and apparatus |
| JPS61240553A (ja) * | 1985-04-18 | 1986-10-25 | Jeol Ltd | イオンビ−ム描画装置 |
| JP2706471B2 (ja) * | 1987-09-30 | 1998-01-28 | 日本真空技術株式会社 | 静電掃引型イオン注入機用平行掃引装置 |
| JPH0233848A (ja) * | 1988-07-22 | 1990-02-05 | Hitachi Ltd | 二次イオン質量分析装置 |
| US5173582A (en) * | 1988-10-31 | 1992-12-22 | Fujitsu Limited | Charged particle beam lithography system and method |
| US4923585A (en) * | 1988-11-02 | 1990-05-08 | Arch Development Corporation | Sputter deposition for multi-component thin films |
| JP2881649B2 (ja) * | 1989-03-22 | 1999-04-12 | 日本真空技術株式会社 | イオン注入装置 |
| KR950004968B1 (ko) * | 1991-10-15 | 1995-05-16 | 가부시키가이샤 도시바 | 투영노광 장치 |
| JPH0613013A (ja) * | 1992-06-29 | 1994-01-21 | Sumitomo Electric Ind Ltd | イオンビームを集束して加工を行う装置 |
| US5650378A (en) * | 1992-10-02 | 1997-07-22 | Fujikura Ltd. | Method of making polycrystalline thin film and superconducting oxide body |
| JP3119959B2 (ja) * | 1993-02-05 | 2000-12-25 | セイコーインスツルメンツ株式会社 | 集束イオンビーム装置および加工観察装置 |
| JPH0817800A (ja) * | 1994-06-29 | 1996-01-19 | Hitachi Ltd | 集束イオンビーム装置およびそれを用いた試料加工方法 |
| US5989779A (en) * | 1994-10-18 | 1999-11-23 | Ebara Corporation | Fabrication method employing and energy beam source |
| US5628659A (en) * | 1995-04-24 | 1997-05-13 | Microelectronics And Computer Corporation | Method of making a field emission electron source with random micro-tip structures |
| DE29507225U1 (de) * | 1995-04-29 | 1995-07-13 | Grünewald, Wolfgang, Dr.rer.nat., 09122 Chemnitz | Ionenstrahlpräparationsvorrichtung für die Elektronenmikroskopie |
| EP0840940B1 (de) * | 1995-07-25 | 2000-06-14 | Nmi Naturwissenschaftliches Und Medizinisches Intitut An Der Universität Tübingen In Reutlingen | Verfahren und vorrichtung zur ionendünnung in einem hochauflösenden transmissionselektronenmikroskop |
| US5637879A (en) * | 1996-03-20 | 1997-06-10 | Schueler; Bruno W. | Focused ion beam column with electrically variable blanking aperture |
| US5922179A (en) * | 1996-12-20 | 1999-07-13 | Gatan, Inc. | Apparatus for etching and coating sample specimens for microscopic analysis |
| JP3397151B2 (ja) * | 1998-12-10 | 2003-04-14 | 日本電気株式会社 | 固体撮像素子の駆動方法 |
| DE69918958T2 (de) * | 1998-12-29 | 2005-01-05 | Fei Co., Hillsboro | Rasterelektronenmikroskop mit einem ortssensitiven detektor |
| US6635880B1 (en) * | 1999-10-05 | 2003-10-21 | Varian Semiconductor Equipment Associates, Inc. | High transmission, low energy beamline architecture for ion implanter |
| US6331227B1 (en) * | 1999-12-14 | 2001-12-18 | Epion Corporation | Enhanced etching/smoothing of dielectric surfaces |
| US6768110B2 (en) * | 2000-06-21 | 2004-07-27 | Gatan, Inc. | Ion beam milling system and method for electron microscopy specimen preparation |
| EP1184891B1 (en) * | 2000-09-04 | 2008-10-29 | Lucent Technologies Inc. | Electron beam lithography |
| JP2004510295A (ja) * | 2000-09-20 | 2004-04-02 | エフ・イ−・アイ・カンパニー | 荷電粒子ビームシステムにおける同時の映像化と照射のためのリアルタイムモニタリング |
| US6355494B1 (en) * | 2000-10-30 | 2002-03-12 | Intel Corporation | Method and apparatus for controlling material removal from a semiconductor substrate using induced current endpointing |
| DE60144508D1 (de) * | 2000-11-06 | 2011-06-09 | Hitachi Ltd | Verfahren zur Herstellung von Proben |
| JP2002270128A (ja) * | 2001-03-09 | 2002-09-20 | Seiko Instruments Inc | 集束イオンビーム装置およびそれを用いた加工方法 |
| JP4302933B2 (ja) * | 2002-04-22 | 2009-07-29 | 株式会社日立ハイテクノロジーズ | イオンビームによる穴埋め方法及びイオンビーム装置 |
| EP1388883B1 (en) * | 2002-08-07 | 2013-06-05 | Fei Company | Coaxial FIB-SEM column |
| US7150811B2 (en) * | 2002-11-26 | 2006-12-19 | Pei Company | Ion beam for target recovery |
| US8110814B2 (en) * | 2003-10-16 | 2012-02-07 | Alis Corporation | Ion sources, systems and methods |
| US6992288B2 (en) * | 2004-03-12 | 2006-01-31 | Applied Materials, Israel, Ltd. | Apparatus and method for directing gas towards a specimen |
| CN101069260B (zh) * | 2004-08-24 | 2012-09-26 | 西拉半导体工程实验室有限公司 | 工件的离子束铣削及其程度的确定和控制 |
| EP1956630A1 (en) * | 2007-02-06 | 2008-08-13 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Achromatic mass separator |
| JP2013502100A (ja) * | 2009-08-11 | 2013-01-17 | アルカテル−ルーセント | e−MBMSシステム内でトラフィックをトリミングする方法およびその方法を実施するBM−SC |
-
2005
- 2005-08-24 CN CN2005800364115A patent/CN101069260B/zh not_active Expired - Fee Related
- 2005-08-24 KR KR1020077006880A patent/KR20070101204A/ko not_active Ceased
- 2005-08-24 WO PCT/IL2005/000913 patent/WO2006021958A2/en not_active Ceased
- 2005-08-24 EP EP05774726A patent/EP1787310A2/en not_active Withdrawn
- 2005-08-24 US US11/661,201 patent/US20080078750A1/en not_active Abandoned
- 2005-08-24 JP JP2007529134A patent/JP5254613B2/ja not_active Expired - Lifetime
- 2005-08-24 KR KR1020127021756A patent/KR101355280B1/ko not_active Expired - Lifetime
- 2005-08-24 KR KR1020137024937A patent/KR20130135320A/ko not_active Ceased
-
2012
- 2012-07-17 US US13/550,628 patent/US20130180843A1/en not_active Abandoned
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