JP2008507067A - 多層光ディスクとその製造方法および装置 - Google Patents
多層光ディスクとその製造方法および装置 Download PDFInfo
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
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Classifications
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
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- G11B7/257—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of layers having properties involved in recording or reproduction, e.g. optical interference layers or sensitising layers or dielectric layers, which are protecting the recording layers
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
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- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
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- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
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- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
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- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Laminated Bodies (AREA)
Abstract
【選択図】図4
Description
容量15GBの3層反射光ディスク、
容量20GBの4層反射光ディスク、
容量25GBの5層反射光ディスク、
容量30GBの6層反射光ディスク等
を製造するための生産ラインを実現することが可能である。
Claims (22)
- 基板を成形して情報ピットの形の表面レリーフおよびその間の空間を有するデータ層を持つようにし、前記データ層を部分的反射層でコーティングして基板構造を形成するステップと、
前記基板構造上に情報ピットの形の表面レリーフおよびその間の空間を有する少なくとも1層の光学的に透明な層を形成するステップと、
前記少なくとも1層の光学的に透明な層の表面を部分的反射層でコーティングするステップとを含む、多層光担体の製造方法。 - 表面レリーフを有する前記少なくとも1層の光学的に透明な層が、基板上に層毎に形成される、請求項1に記載の方法。
- 前記少なくとも部分的反射層が誘電体材料を含む、請求項1に記載の方法。
- 前記少なくとも部分的反射層が半導体材料を含む、請求項1に記載の方法。
- 前記少なくとも部分的反射層でのコーティングが真空中の熱噴霧を含む、請求項1に記載の方法。
- 前記部分的反射層の材料が、DLC、SixCy、SiCyHz、TiO2、TiNからなるグループより選択される、請求項1に記載の方法。
- 前記部分的反射層の材料がSiである、請求項4に記載の方法。
- 前記誘電体材料が、前記表面レリーフを有する光学的に透明な層の屈折率とは異なる屈折率を有する、請求項3に記載の方法。
- 前記基板が、ポリメチルメタクリラート、ポリアクリルメタクリラート、ポリアリールメタクリラート、ポリアルキルアクリラート、ポリアリールアクリラート、ポリアクリロニトリル、ポリブタジエン、ポリイゾプレン、ポリエチレンテレフタラート、ポリクロロプレン、ポリエチレンアジパート、ポリアミド、ポリエチレンターフタラート、ポリクロロプレン、ポリエチレンアジパート、ポリアミド、ポリビニルクロリド、ポリビニルフルオリド、ポリビニルアルコール、ポリビニルブチラール、ポリスチロール、ポリアルキルスチロール、ポリハロゲンスチロール、ポリオキシメチレン、ポリエチレンオキシド、ポリプロピレンオキシド、ポリテトラメチレンオキシド、ポリテトラメチレンアジパート、ポリビニルナフタレン、ポリアリラート、ポリテトラフルオロエチレン、ポリウレタン、ポリメチルシロキサン、ポリビニルアルキルエーテル、ポリビニルアセタート、ポリイゾブチレン、ポリビニルシンナマート、ポリビニルフェノールおよびそのアルキルならびにアリールエーテル、ポリエステル、ポリビニルピロリドンおよび/またはポリカーボナート以外のそのコポリマーからなるグループより選択されるポリマーベースを含む、請求項1に記載の方法。
- 第1基板を成形して情報ピットの形の表面レリーフおよびその間の空間を有するデータ層を持つようにし、前記データ層を部分的反射層でコーティングして第1基板構造を形成するステップと、
少なくとも1つの追加基板を成形して、情報ピットの形の表面レリーフおよびその間の空間を有するデータ層を持つようにし、前記データ層を部分的反射層でコーティングして少なくとも1つの追加基板構造を形成するステップと、
前記少なくとも第1の基板構造上に、情報ピットの形の表面レリーフおよびその間の空間を有する少なくとも1層の光学的に透明な層を形成するステップと、
前記少なくとも1層の光学的に透明な層の表面を部分的反射層でコーティングするステップと、
前記第1および少なくとも1つの追加基板構造を互いにその間の接着性材料で接触させるステップとを含む、多層光担体の製造方法。 - 前記少なくとも1つの追加基板上に、情報ピットの形の表面レリーフおよびその間の空間を有する少なくとも1層の光学的に透明な層を形成し、前記表面を部分的反射層でコーティングするステップをさらに含む、請求項10に記載の方法。
- 表面レリーフを有する前記複数の光学的に透明な層を形成するステップが射出成形を含む、請求項10に記載の方法。
- 表面レリーフを有する前記複数の光学的に透明な層を形成するステップが射出成形を含む、請求項11に記載の方法。
- 表面レリーフを有する前記複数の光学的に透明な層を形成するステップがフォトポリマー複製を含む、請求項10に記載の方法。
- 表面レリーフを有する前記複数の光学的に透明な層を形成するステップがフォトポリマー複製を含む、請求項11に記載の方法。
- 前記少なくとも部分的反射層が誘電体材料を含む、請求項10に記載の方法。
- 前記少なくとも部分的反射層が半導体材料を含む、請求項10に記載の方法。
- 前記少なくとも部分的反射層でコーティングするステップが真空中の熱噴霧を含む、請求項10に記載の方法。
- 前記部分的反射層の材料が、DLC、SixCy、SiCyHz、TiO2、TiNからなるグループより選択される、請求項16に記載の方法。
- 前記部分的反射層の材料がSiである、請求項17に記載の方法。
- 前記誘電体材料が、表面レリーフを有する前記光学的に透明な層の屈折率とは異なる屈折率を有する、請求項16に記載の方法。
- 前記基板が、ポリメチルメタクリラート、ポリアクリルメタクリラート、ポリアリールメタクリラート、ポリアルキルアクリラート、ポリアリールアクリラート、ポリアクリロニトリル、ポリブタジエン、ポリイゾプレン、ポリエチレンテレフタラート、ポリクロロプレン、ポリエチレンアジパート、ポリアミド、ポリエチレンターフタラート、ポリクロロプレン、ポリエチレンアジパート、ポリアミド、ポリビニルクロリド、ポリビニルフルオリド、ポリビニルアルコール、ポリビニルブチラール、ポリスチロール、ポリアルキルスチロール、ポリハロゲンスチロール、ポリオキシメチレン、ポリエチレンオキシド、ポリプロピレンオキシド、ポリテトラメチレンオキシド、ポリテトラメチレンアジパート、ポリビニルナフタレン、ポリアリラート、ポリテトラフルオロエチレン、ポリウレタン、ポリメチルシロキサン、ポリビニルアルキルエーテル、ポリビニルアセタート、ポリイゾブチレン、ポリビニルシンナマート、ポリビニルフェノールおよびそのアルキルならびにアリールエーテル、ポリエステル、ポリビニルピロリドンおよび/またはポリカーボナート以外のそのコポリマーからなるグループより選択されるポリマーベースを含む、請求項10に記載の方法。
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JP5308059B2 (ja) * | 2008-04-25 | 2013-10-09 | 株式会社ミツトヨ | 光電式エンコーダ用スケール |
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US9275671B2 (en) | 2011-06-09 | 2016-03-01 | Case Western Reserve University | Optical information storage medium |
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