JP2008504692A - 高キャパシタンスのタンタルフレークス及びその生産方法 - Google Patents

高キャパシタンスのタンタルフレークス及びその生産方法 Download PDF

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Publication number
JP2008504692A
JP2008504692A JP2007518303A JP2007518303A JP2008504692A JP 2008504692 A JP2008504692 A JP 2008504692A JP 2007518303 A JP2007518303 A JP 2007518303A JP 2007518303 A JP2007518303 A JP 2007518303A JP 2008504692 A JP2008504692 A JP 2008504692A
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JP
Japan
Prior art keywords
flake
tantalum
thickness
powder
grinding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007518303A
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English (en)
Japanese (ja)
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JP2008504692A5 (de
Inventor
チウ,ヨンチィアン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of JP2008504692A publication Critical patent/JP2008504692A/ja
Publication of JP2008504692A5 publication Critical patent/JP2008504692A5/ja
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/045Alloys based on refractory metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • B22F1/052Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/06Metallic powder characterised by the shape of the particles
    • B22F1/068Flake-like particles
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02Alloys based on vanadium, niobium, or tantalum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/042Electrodes or formation of dielectric layers thereon characterised by the material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/048Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052Sintered electrodes
    • H01G9/0525Powder therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00Supplementary information concerning processes or compositions relating to powder metallurgy
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10Processes characterised by the sequence of their steps

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
JP2007518303A 2004-06-28 2005-06-23 高キャパシタンスのタンタルフレークス及びその生産方法 Pending JP2008504692A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58349804P 2004-06-28 2004-06-28
PCT/US2005/022425 WO2006012279A2 (en) 2004-06-28 2005-06-23 High capacitance tantalum flakes and methods of producing the same

Publications (2)

Publication Number Publication Date
JP2008504692A true JP2008504692A (ja) 2008-02-14
JP2008504692A5 JP2008504692A5 (de) 2008-08-21

Family

ID=35004322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007518303A Pending JP2008504692A (ja) 2004-06-28 2005-06-23 高キャパシタンスのタンタルフレークス及びその生産方法

Country Status (5)

Country Link
US (1) US20060070492A1 (de)
JP (1) JP2008504692A (de)
CN (1) CN101010160A (de)
DE (1) DE112005001499T5 (de)
WO (1) WO2006012279A2 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273710A (ja) * 2006-03-31 2007-10-18 Nichicon Corp 固体電解コンデンサ用素子の製造方法
JP2018020315A (ja) * 2013-03-13 2018-02-08 ケメット エレクトロニクス コーポレーション 薄片粉末を製造するための低エネルギーの粉砕
JP2018021230A (ja) * 2016-08-03 2018-02-08 太平洋セメント株式会社 金属タンタル粒子の製造法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007130483A2 (en) * 2006-05-05 2007-11-15 Cabot Corporation Tantalum powder with smooth surface and methods of manufacturing same
US7154742B1 (en) * 2006-05-10 2006-12-26 Kemet Electronics Corporation Fluted anode with improved capacitance and capacitor comprising same
US20080229880A1 (en) * 2007-03-23 2008-09-25 Reading Alloys, Inc. Production of high-purity tantalum flake powder
US20080233420A1 (en) * 2007-03-23 2008-09-25 Mccracken Colin G Production of high-purity tantalum flake powder
US8405956B2 (en) * 2009-06-01 2013-03-26 Avx Corporation High voltage electrolytic capacitors
US9105401B2 (en) 2011-12-02 2015-08-11 Avx Corporation Wet electrolytic capacitor containing a gelled working electrolyte
CN104858436B (zh) * 2014-02-21 2018-01-16 宁夏东方钽业股份有限公司 高可靠高比容电解电容器用钽粉的制备方法
CN105051225A (zh) * 2014-02-21 2015-11-11 宁夏东方钽业股份有限公司 一种钽粉的湿式球磨方法及由该方法制备的钽粉
CZ309286B6 (cs) * 2014-11-03 2022-07-20 Ningxia Orient Tantalum Industry Co., Ltd Způsob výroby tantalového prášku
CN110234451B (zh) 2017-01-17 2021-10-15 凯米特电子公司 改进的线到阳极连接
CN106847511B (zh) * 2017-02-14 2018-11-23 中国科学院合肥物质科学研究院 一种高比表面钽电容器阳极钽箔及其制备方法
US11289276B2 (en) * 2018-10-30 2022-03-29 Global Advanced Metals Japan K.K. Porous metal foil and capacitor anodes made therefrom and methods of making same
US20220080502A1 (en) * 2020-09-14 2022-03-17 Kemet Electronics Corporation Freeze Drying and Tumble Drying of Flake Powder
CN112620636B (zh) * 2020-12-15 2021-09-03 江门富祥电子材料有限公司 一种耐高压片形钽粉的生产方法

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US3779717A (en) * 1972-07-12 1973-12-18 Kawecki Berylco Ind Nickel-tantalum addition agent for incorporating tantalum in molten nickel systems
US4441927A (en) * 1982-11-16 1984-04-10 Cabot Corporation Tantalum powder composition
US4520430A (en) * 1983-01-28 1985-05-28 Union Carbide Corporation Lead attachment for tantalum anode bodies
US4555268A (en) * 1984-12-18 1985-11-26 Cabot Corporation Method for improving handling properties of a flaked tantalum powder composition
US4574333A (en) * 1985-06-12 1986-03-04 Union Carbide Corporation Low density tantalum anode bodies
US4684399A (en) * 1986-03-04 1987-08-04 Cabot Corporation Tantalum powder process
US5580367A (en) * 1987-11-30 1996-12-03 Cabot Corporation Flaked tantalum powder and method of using same flaked tantalum powder
US5211741A (en) * 1987-11-30 1993-05-18 Cabot Corporation Flaked tantalum powder
US5261942A (en) * 1987-11-30 1993-11-16 Cabot Corporation Tantalum powder and method of making same
US4940490A (en) * 1987-11-30 1990-07-10 Cabot Corporation Tantalum powder
US5242481A (en) * 1989-06-26 1993-09-07 Cabot Corporation Method of making powders and products of tantalum and niobium
US5217526A (en) * 1991-05-31 1993-06-08 Cabot Corporation Fibrous tantalum and capacitors made therefrom
US5245514A (en) * 1992-05-27 1993-09-14 Cabot Corporation Extruded capacitor electrode and method of making the same
US5448447A (en) * 1993-04-26 1995-09-05 Cabot Corporation Process for making an improved tantalum powder and high capacitance low leakage electrode made therefrom
JP3801660B2 (ja) * 1994-05-30 2006-07-26 ローム株式会社 タンタル固体電解コンデンサ用コンデンサ素子の製造方法
US5993513A (en) * 1996-04-05 1999-11-30 Cabot Corporation Method for controlling the oxygen content in valve metal materials
US5954856A (en) * 1996-04-25 1999-09-21 Cabot Corporation Method of making tantalum metal powder with controlled size distribution and products made therefrom
CZ300529B6 (cs) * 1997-02-19 2009-06-10 H.C. Starck Gmbh Práškový tantal, zpusob jeho výroby a z nej vyrobené anody a kondezátory
CZ301097B6 (cs) * 1997-02-19 2009-11-04 H.C. Starck Gmbh Tantalový prášek sestávající z aglomerátu, zpusob jeho výroby a z nej získané slinuté anody
JP2894326B2 (ja) * 1997-06-30 1999-05-24 日本電気株式会社 タンタル粉末及びそれを用いた固体電解コンデンサ
US6576038B1 (en) * 1998-05-22 2003-06-10 Cabot Corporation Method to agglomerate metal particles and metal particles having improved properties
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
JP3871824B2 (ja) * 1999-02-03 2007-01-24 キャボットスーパーメタル株式会社 高容量コンデンサー用タンタル粉末
US6517892B1 (en) * 1999-05-24 2003-02-11 Showa Denko K.K. Solid electrolytic capacitor and method for producing the same
US6660057B1 (en) * 1999-10-01 2003-12-09 Showa Denko K.K. Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body
US6563695B1 (en) * 1999-11-16 2003-05-13 Cabot Supermetals K.K. Powdered tantalum, niobium, production process thereof, and porous sintered body and solid electrolytic capacitor using the powdered tantalum or niobium
US6432161B1 (en) * 2000-02-08 2002-08-13 Cabot Supermetals K.K. Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder
IL151549A0 (en) * 2000-03-01 2003-04-10 Cabot Corp Nitrided valve metals and processes for making the same
JP3792129B2 (ja) * 2001-03-01 2006-07-05 新光電気工業株式会社 キャパシタ、キャパシタ内蔵回路基板及びそれらの製造方法
US6687117B2 (en) * 2002-01-31 2004-02-03 Wilson Greatbatch Technologies, Inc. Electrolytes for capacitors
WO2004110684A2 (en) * 2003-06-10 2004-12-23 Cabot Corporation Tantalum powders and methods of producing same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273710A (ja) * 2006-03-31 2007-10-18 Nichicon Corp 固体電解コンデンサ用素子の製造方法
JP2018020315A (ja) * 2013-03-13 2018-02-08 ケメット エレクトロニクス コーポレーション 薄片粉末を製造するための低エネルギーの粉砕
JP2018021230A (ja) * 2016-08-03 2018-02-08 太平洋セメント株式会社 金属タンタル粒子の製造法

Also Published As

Publication number Publication date
US20060070492A1 (en) 2006-04-06
WO2006012279A3 (en) 2006-03-02
WO2006012279A2 (en) 2006-02-02
CN101010160A (zh) 2007-08-01
DE112005001499T5 (de) 2007-05-10

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