JP2008504692A - 高キャパシタンスのタンタルフレークス及びその生産方法 - Google Patents
高キャパシタンスのタンタルフレークス及びその生産方法 Download PDFInfo
- Publication number
- JP2008504692A JP2008504692A JP2007518303A JP2007518303A JP2008504692A JP 2008504692 A JP2008504692 A JP 2008504692A JP 2007518303 A JP2007518303 A JP 2007518303A JP 2007518303 A JP2007518303 A JP 2007518303A JP 2008504692 A JP2008504692 A JP 2008504692A
- Authority
- JP
- Japan
- Prior art keywords
- flake
- tantalum
- thickness
- powder
- grinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims abstract description 121
- 229910052715 tantalum Inorganic materials 0.000 title claims abstract description 99
- 238000004519 manufacturing process Methods 0.000 title description 5
- 238000000227 grinding Methods 0.000 claims abstract description 72
- 239000000843 powder Substances 0.000 claims abstract description 71
- 238000000034 method Methods 0.000 claims abstract description 43
- 239000002245 particle Substances 0.000 claims abstract description 25
- 239000003990 capacitor Substances 0.000 claims abstract description 20
- 230000008569 process Effects 0.000 claims abstract description 19
- 238000009826 distribution Methods 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000003801 milling Methods 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- 239000002253 acid Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000011109 contamination Methods 0.000 description 5
- 238000002386 leaching Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 238000010298 pulverizing process Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001238 wet grinding Methods 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002484 cyclic voltammetry Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000009837 dry grinding Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
- B22F1/068—Flake-like particles
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58349804P | 2004-06-28 | 2004-06-28 | |
PCT/US2005/022425 WO2006012279A2 (en) | 2004-06-28 | 2005-06-23 | High capacitance tantalum flakes and methods of producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008504692A true JP2008504692A (ja) | 2008-02-14 |
JP2008504692A5 JP2008504692A5 (de) | 2008-08-21 |
Family
ID=35004322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007518303A Pending JP2008504692A (ja) | 2004-06-28 | 2005-06-23 | 高キャパシタンスのタンタルフレークス及びその生産方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060070492A1 (de) |
JP (1) | JP2008504692A (de) |
CN (1) | CN101010160A (de) |
DE (1) | DE112005001499T5 (de) |
WO (1) | WO2006012279A2 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007273710A (ja) * | 2006-03-31 | 2007-10-18 | Nichicon Corp | 固体電解コンデンサ用素子の製造方法 |
JP2018020315A (ja) * | 2013-03-13 | 2018-02-08 | ケメット エレクトロニクス コーポレーション | 薄片粉末を製造するための低エネルギーの粉砕 |
JP2018021230A (ja) * | 2016-08-03 | 2018-02-08 | 太平洋セメント株式会社 | 金属タンタル粒子の製造法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007130483A2 (en) * | 2006-05-05 | 2007-11-15 | Cabot Corporation | Tantalum powder with smooth surface and methods of manufacturing same |
US7154742B1 (en) * | 2006-05-10 | 2006-12-26 | Kemet Electronics Corporation | Fluted anode with improved capacitance and capacitor comprising same |
US20080229880A1 (en) * | 2007-03-23 | 2008-09-25 | Reading Alloys, Inc. | Production of high-purity tantalum flake powder |
US20080233420A1 (en) * | 2007-03-23 | 2008-09-25 | Mccracken Colin G | Production of high-purity tantalum flake powder |
US8405956B2 (en) * | 2009-06-01 | 2013-03-26 | Avx Corporation | High voltage electrolytic capacitors |
US9105401B2 (en) | 2011-12-02 | 2015-08-11 | Avx Corporation | Wet electrolytic capacitor containing a gelled working electrolyte |
CN104858436B (zh) * | 2014-02-21 | 2018-01-16 | 宁夏东方钽业股份有限公司 | 高可靠高比容电解电容器用钽粉的制备方法 |
CN105051225A (zh) * | 2014-02-21 | 2015-11-11 | 宁夏东方钽业股份有限公司 | 一种钽粉的湿式球磨方法及由该方法制备的钽粉 |
CZ309286B6 (cs) * | 2014-11-03 | 2022-07-20 | Ningxia Orient Tantalum Industry Co., Ltd | Způsob výroby tantalového prášku |
CN110234451B (zh) | 2017-01-17 | 2021-10-15 | 凯米特电子公司 | 改进的线到阳极连接 |
CN106847511B (zh) * | 2017-02-14 | 2018-11-23 | 中国科学院合肥物质科学研究院 | 一种高比表面钽电容器阳极钽箔及其制备方法 |
US11289276B2 (en) * | 2018-10-30 | 2022-03-29 | Global Advanced Metals Japan K.K. | Porous metal foil and capacitor anodes made therefrom and methods of making same |
US20220080502A1 (en) * | 2020-09-14 | 2022-03-17 | Kemet Electronics Corporation | Freeze Drying and Tumble Drying of Flake Powder |
CN112620636B (zh) * | 2020-12-15 | 2021-09-03 | 江门富祥电子材料有限公司 | 一种耐高压片形钽粉的生产方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3779717A (en) * | 1972-07-12 | 1973-12-18 | Kawecki Berylco Ind | Nickel-tantalum addition agent for incorporating tantalum in molten nickel systems |
US4441927A (en) * | 1982-11-16 | 1984-04-10 | Cabot Corporation | Tantalum powder composition |
US4520430A (en) * | 1983-01-28 | 1985-05-28 | Union Carbide Corporation | Lead attachment for tantalum anode bodies |
US4555268A (en) * | 1984-12-18 | 1985-11-26 | Cabot Corporation | Method for improving handling properties of a flaked tantalum powder composition |
US4574333A (en) * | 1985-06-12 | 1986-03-04 | Union Carbide Corporation | Low density tantalum anode bodies |
US4684399A (en) * | 1986-03-04 | 1987-08-04 | Cabot Corporation | Tantalum powder process |
US5580367A (en) * | 1987-11-30 | 1996-12-03 | Cabot Corporation | Flaked tantalum powder and method of using same flaked tantalum powder |
US5211741A (en) * | 1987-11-30 | 1993-05-18 | Cabot Corporation | Flaked tantalum powder |
US5261942A (en) * | 1987-11-30 | 1993-11-16 | Cabot Corporation | Tantalum powder and method of making same |
US4940490A (en) * | 1987-11-30 | 1990-07-10 | Cabot Corporation | Tantalum powder |
US5242481A (en) * | 1989-06-26 | 1993-09-07 | Cabot Corporation | Method of making powders and products of tantalum and niobium |
US5217526A (en) * | 1991-05-31 | 1993-06-08 | Cabot Corporation | Fibrous tantalum and capacitors made therefrom |
US5245514A (en) * | 1992-05-27 | 1993-09-14 | Cabot Corporation | Extruded capacitor electrode and method of making the same |
US5448447A (en) * | 1993-04-26 | 1995-09-05 | Cabot Corporation | Process for making an improved tantalum powder and high capacitance low leakage electrode made therefrom |
JP3801660B2 (ja) * | 1994-05-30 | 2006-07-26 | ローム株式会社 | タンタル固体電解コンデンサ用コンデンサ素子の製造方法 |
US5993513A (en) * | 1996-04-05 | 1999-11-30 | Cabot Corporation | Method for controlling the oxygen content in valve metal materials |
US5954856A (en) * | 1996-04-25 | 1999-09-21 | Cabot Corporation | Method of making tantalum metal powder with controlled size distribution and products made therefrom |
CZ300529B6 (cs) * | 1997-02-19 | 2009-06-10 | H.C. Starck Gmbh | Práškový tantal, zpusob jeho výroby a z nej vyrobené anody a kondezátory |
CZ301097B6 (cs) * | 1997-02-19 | 2009-11-04 | H.C. Starck Gmbh | Tantalový prášek sestávající z aglomerátu, zpusob jeho výroby a z nej získané slinuté anody |
JP2894326B2 (ja) * | 1997-06-30 | 1999-05-24 | 日本電気株式会社 | タンタル粉末及びそれを用いた固体電解コンデンサ |
US6576038B1 (en) * | 1998-05-22 | 2003-06-10 | Cabot Corporation | Method to agglomerate metal particles and metal particles having improved properties |
US6348113B1 (en) * | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
JP3871824B2 (ja) * | 1999-02-03 | 2007-01-24 | キャボットスーパーメタル株式会社 | 高容量コンデンサー用タンタル粉末 |
US6517892B1 (en) * | 1999-05-24 | 2003-02-11 | Showa Denko K.K. | Solid electrolytic capacitor and method for producing the same |
US6660057B1 (en) * | 1999-10-01 | 2003-12-09 | Showa Denko K.K. | Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body |
US6563695B1 (en) * | 1999-11-16 | 2003-05-13 | Cabot Supermetals K.K. | Powdered tantalum, niobium, production process thereof, and porous sintered body and solid electrolytic capacitor using the powdered tantalum or niobium |
US6432161B1 (en) * | 2000-02-08 | 2002-08-13 | Cabot Supermetals K.K. | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder |
IL151549A0 (en) * | 2000-03-01 | 2003-04-10 | Cabot Corp | Nitrided valve metals and processes for making the same |
JP3792129B2 (ja) * | 2001-03-01 | 2006-07-05 | 新光電気工業株式会社 | キャパシタ、キャパシタ内蔵回路基板及びそれらの製造方法 |
US6687117B2 (en) * | 2002-01-31 | 2004-02-03 | Wilson Greatbatch Technologies, Inc. | Electrolytes for capacitors |
WO2004110684A2 (en) * | 2003-06-10 | 2004-12-23 | Cabot Corporation | Tantalum powders and methods of producing same |
-
2005
- 2005-06-23 US US11/165,616 patent/US20060070492A1/en not_active Abandoned
- 2005-06-23 CN CNA2005800291612A patent/CN101010160A/zh active Pending
- 2005-06-23 DE DE112005001499T patent/DE112005001499T5/de not_active Withdrawn
- 2005-06-23 WO PCT/US2005/022425 patent/WO2006012279A2/en active Application Filing
- 2005-06-23 JP JP2007518303A patent/JP2008504692A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007273710A (ja) * | 2006-03-31 | 2007-10-18 | Nichicon Corp | 固体電解コンデンサ用素子の製造方法 |
JP2018020315A (ja) * | 2013-03-13 | 2018-02-08 | ケメット エレクトロニクス コーポレーション | 薄片粉末を製造するための低エネルギーの粉砕 |
JP2018021230A (ja) * | 2016-08-03 | 2018-02-08 | 太平洋セメント株式会社 | 金属タンタル粒子の製造法 |
Also Published As
Publication number | Publication date |
---|---|
US20060070492A1 (en) | 2006-04-06 |
WO2006012279A3 (en) | 2006-03-02 |
WO2006012279A2 (en) | 2006-02-02 |
CN101010160A (zh) | 2007-08-01 |
DE112005001499T5 (de) | 2007-05-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2008504692A (ja) | 高キャパシタンスのタンタルフレークス及びその生産方法 | |
JP6563968B2 (ja) | タンタル粉末およびこれを含むキャパシターアノード | |
JP4972249B2 (ja) | 窒素化ニオブ粉末及びニオブ電解キャパシター | |
CN1082550C (zh) | 制造尺寸分布可控的钽金属粉末的方法及用该法制成的产物 | |
TW464568B (en) | High capacitance niobium powders and electrolytic capacitor anodes | |
US3647415A (en) | Tantalum powder for sintered capacitors | |
JP5684453B2 (ja) | 金属粉末の熱処理方法およびそれにより製造された製品 | |
JP4773355B2 (ja) | ニオブ酸化物及び酸素が低減したニオブ酸化物の製造方法 | |
JP2012169631A5 (de) | ||
JPH0778241B2 (ja) | タンタル粉末組成物の製造方法 | |
JP4275951B2 (ja) | 酸化ニオブの製造方法 | |
CN101808770A (zh) | 利用回收的废料作为源材料制备钽粉末的方法 | |
WO2016026092A1 (zh) | 一种复合钽粉及其制备方法及该钽粉制备的电容器阳极 | |
WO2015124094A1 (zh) | 高可靠高比容电解电容器用钽粉的制备方法 | |
EP2933040A1 (de) | Verfahren zur herstellung eines feinen wolframpulvers | |
JP4567291B2 (ja) | 酸化ニオブの製造方法 | |
JP2010509761A (ja) | 固体コンデンサアノードの製造における粉末改質 | |
WO2014104178A1 (ja) | ニオブコンデンサ陽極用化成体及びその製造方法 | |
WO2014104177A1 (ja) | ニオブコンデンサ陽極用化成体及びその製造方法 | |
KR100484686B1 (ko) | 탄탈륨분말의크기조절방법,크기분포가조절된탄탈륨금속분말의제조방법및그로부터제조되는생성물 | |
JP2024049800A (ja) | フレーク金属粉末、フレーク金属粉末の製造方法、導電性ペースト、積層セラミック電子部品の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080620 |
|
A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20080620 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080620 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100820 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100907 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20110222 |