JP2008244414A - 半導体光装置 - Google Patents
半導体光装置 Download PDFInfo
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- JP2008244414A JP2008244414A JP2007133059A JP2007133059A JP2008244414A JP 2008244414 A JP2008244414 A JP 2008244414A JP 2007133059 A JP2007133059 A JP 2007133059A JP 2007133059 A JP2007133059 A JP 2007133059A JP 2008244414 A JP2008244414 A JP 2008244414A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 79
- 230000003287 optical effect Effects 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000009792 diffusion process Methods 0.000 claims abstract description 4
- 230000002265 prevention Effects 0.000 claims abstract description 4
- 239000010410 layer Substances 0.000 claims abstract 16
- 239000012790 adhesive layer Substances 0.000 claims abstract 3
- 239000013078 crystal Substances 0.000 abstract description 4
- 230000006378 damage Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 238000002161 passivation Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 4
- XZXYQEHISUMZAT-UHFFFAOYSA-N 2-[(2-hydroxy-5-methylphenyl)methyl]-4-methylphenol Chemical compound CC1=CC=C(O)C(CC=2C(=CC=C(C)C=2)O)=C1 XZXYQEHISUMZAT-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229940107816 ammonium iodide Drugs 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
Abstract
【解決手段】半導体基板に形成された活性面にほぼ垂直方向または平行方向に発光または受光する半導体光装置において、活性面側に形成され、活性面と接続された電極は、その端部においてステップ形状またはテーパ形状を有する半導体光装置により、解決できる。半導体光装置の電極は、接着層/拡散防止層/Auの3層で形成され、ステップ形状またはテーパ形状は、Au層の膜厚差または接着層/拡散防止層/Auの膜厚さにより、形成される。
【選択図】図4
Description
図1において、半導体レーザ装置は、InP基板10に形成した活性層を含むストライプ60の左右に電極の容量調整用のPAD30を形成し、図示しないパッシベーション膜40を形成したあと、ストライプ60上にスルーホールを形成し、さらに電極膜20を形成した後、電極膜20をホトエッチングの手法で加工し、図1の右側のp電極を形成されている。なお、図示は省いたがn電極は、InP基板10の裏面研磨の後、InP基板10の裏面(下面)に形成されている。
上述した実施例は、半導体レーザ装置で説明したが、パッシベーション膜のスルーホールで活性層と接続する少なくともAu層を含む配線を有する半導体装置にも適用できる。
Claims (6)
- 半導体基板に形成された活性面にほぼ垂直方向または平行方向に発光または受光する半導体光装置において、
前記活性面側に形成され、前記活性面と接続された電極は、その端部においてステップ形状またはテーパ形状を有することを特徴とする半導体光装置。 - 請求項1に記載の半導体光装置であって、
前記電極は、Au層を含む複数層で形成され、
前記ステップ形状は、Au層の有無により、形成されていることを特徴とする半導体光装置。 - 請求項1に記載の半導体光装置であって、
前記電極は、Au層を含む複数層で形成され、
前記ステップ形状は、Au層の膜厚差により、形成されていることを特徴とする半導体光装置。 - 請求項3に記載の半導体光装置であって、
前記Au層の膜厚差は、リフトオフにより、形成されていることを特徴とする半導体光装置。 - 請求項1に記載の半導体光装置であって、
前記電極は、接着層と拡散防止層と電流層とから構成され、その端部の前記テーパ形状またはステップ形状は、リフトオフにより、形成されていることを特徴とする半導体光装置。 - 請求項1ないし請求項5のいずれか一つに記載の半導体光装置であって、
半導体発光装置または半導体受光装置であることを特徴とする半導体光装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007133059A JP2008244414A (ja) | 2007-02-27 | 2007-05-18 | 半導体光装置 |
CN2008100095307A CN101257057B (zh) | 2007-02-27 | 2008-01-30 | 半导体光装置 |
KR1020080009405A KR100946867B1 (ko) | 2007-02-27 | 2008-01-30 | 반도체 광 장치 및 반도체 광 소자의 제조 방법 |
EP08001844.3A EP1965474B1 (en) | 2007-02-27 | 2008-01-31 | Optical semiconductor device |
US12/023,177 US7687295B2 (en) | 2007-02-27 | 2008-01-31 | Method for manufacturing optical semiconductor device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007047352 | 2007-02-27 | ||
JP2007133059A JP2008244414A (ja) | 2007-02-27 | 2007-05-18 | 半導体光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008244414A true JP2008244414A (ja) | 2008-10-09 |
Family
ID=39891658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007133059A Pending JP2008244414A (ja) | 2007-02-27 | 2007-05-18 | 半導体光装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008244414A (ja) |
KR (1) | KR100946867B1 (ja) |
CN (1) | CN101257057B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014145973A (ja) * | 2013-01-30 | 2014-08-14 | Japan Oclaro Inc | 半導体光変調器及び光通信モジュール |
JP2018049300A (ja) * | 2017-12-28 | 2018-03-29 | 日本オクラロ株式会社 | 半導体光変調器及び光通信モジュール |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111341743B (zh) * | 2018-12-19 | 2024-04-16 | 株式会社村田制作所 | 电子部件 |
CN111463330B (zh) * | 2019-01-18 | 2022-07-29 | 成都辰显光电有限公司 | 微型发光二极管芯片及其制造方法与转移方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04239772A (ja) * | 1991-01-23 | 1992-08-27 | Furukawa Electric Co Ltd:The | 半導体素子用電極 |
JP2005072203A (ja) * | 2003-08-22 | 2005-03-17 | Seiko Epson Corp | 端子電極、半導体装置、半導体モジュール、電子機器および半導体装置の製造方法 |
WO2005096399A1 (ja) * | 2004-03-31 | 2005-10-13 | Nichia Corporation | 窒化物半導体発光素子 |
JP2006100369A (ja) * | 2004-09-28 | 2006-04-13 | Sharp Corp | 半導体レーザ素子およびその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2817769B2 (ja) | 1994-12-28 | 1998-10-30 | 日本電気株式会社 | 光増幅装置及びそれを用いた半導体レーザ装置,並びにそれらの駆動方法 |
JP2004335530A (ja) * | 2003-04-30 | 2004-11-25 | Mitsubishi Electric Corp | リッジ導波路型半導体レーザ |
JP4956928B2 (ja) | 2004-09-28 | 2012-06-20 | 日亜化学工業株式会社 | 半導体装置 |
JP2006324582A (ja) | 2005-05-20 | 2006-11-30 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
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2007
- 2007-05-18 JP JP2007133059A patent/JP2008244414A/ja active Pending
-
2008
- 2008-01-30 CN CN2008100095307A patent/CN101257057B/zh active Active
- 2008-01-30 KR KR1020080009405A patent/KR100946867B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04239772A (ja) * | 1991-01-23 | 1992-08-27 | Furukawa Electric Co Ltd:The | 半導体素子用電極 |
JP2005072203A (ja) * | 2003-08-22 | 2005-03-17 | Seiko Epson Corp | 端子電極、半導体装置、半導体モジュール、電子機器および半導体装置の製造方法 |
WO2005096399A1 (ja) * | 2004-03-31 | 2005-10-13 | Nichia Corporation | 窒化物半導体発光素子 |
JP2006100369A (ja) * | 2004-09-28 | 2006-04-13 | Sharp Corp | 半導体レーザ素子およびその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014145973A (ja) * | 2013-01-30 | 2014-08-14 | Japan Oclaro Inc | 半導体光変調器及び光通信モジュール |
JP2018049300A (ja) * | 2017-12-28 | 2018-03-29 | 日本オクラロ株式会社 | 半導体光変調器及び光通信モジュール |
Also Published As
Publication number | Publication date |
---|---|
KR20080079591A (ko) | 2008-09-01 |
CN101257057B (zh) | 2011-04-27 |
KR100946867B1 (ko) | 2010-03-09 |
CN101257057A (zh) | 2008-09-03 |
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