JP2008241566A - Thin-film temperature sensor, and outgoing line connection method thereof - Google Patents

Thin-film temperature sensor, and outgoing line connection method thereof Download PDF

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JP2008241566A
JP2008241566A JP2007084613A JP2007084613A JP2008241566A JP 2008241566 A JP2008241566 A JP 2008241566A JP 2007084613 A JP2007084613 A JP 2007084613A JP 2007084613 A JP2007084613 A JP 2007084613A JP 2008241566 A JP2008241566 A JP 2008241566A
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bump
temperature sensor
electrode
thin film
lead wire
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Hiroyuki Fukagawa
浩之 深河
Shigeru Takada
茂 高田
Yasushi Takizawa
康 滝沢
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Ishizuka Electronics Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To improve the connection strength between an electrode for composing a thin-film temperature sensor and a leader line. <P>SOLUTION: The thin-film temperature sensor 1 comprises: an insulating substrate 11; a heat-sensitive film 12 formed on one surface of the insulating substrate 11; a pair of electrode films 13 connected to the heat-sensitive film 12 electrically; a bump 14 formed on the pair of electrode films; and the leader line 15 connected to the bump electrically. The bump 14 is formed by a well known wire bump technique. The size of the bump is made larger than the diameter of the leader line 15. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、民生・産業分野で使用する各種電子機器・部品の温度検知、または温度補償に用いられる薄膜温度センサに関するものである。   The present invention relates to a thin film temperature sensor used for temperature detection or temperature compensation of various electronic devices and parts used in the consumer and industrial fields.

従来、温度センサの感熱部に用いられるセンサチップとして一般によく知られているものには、マンガン、コバルト、ニッケル等の金属酸化物の粉末成形体を焼結したサーミスタチップがある。このサーミスタチップを用いた温度センサは、チップの表裏面に電極が形成されていて、この電極面にはんだ付け等によって引出線を取り付けた構造のものである。このような構造の温度センサは、サーミスタチップの形状を小さくすることによって、熱応答性に優れた温度センサとして利用することができるものである。   2. Description of the Related Art Conventionally, a sensor chip used for a heat sensitive part of a temperature sensor is a thermistor chip obtained by sintering a powder compact of a metal oxide such as manganese, cobalt, or nickel. The temperature sensor using the thermistor chip has a structure in which electrodes are formed on the front and back surfaces of the chip, and a lead wire is attached to the electrode surface by soldering or the like. The temperature sensor having such a structure can be used as a temperature sensor having excellent thermal responsiveness by reducing the shape of the thermistor chip.

しかし、上記のように製作された金属酸化物の焼結体からなるサーミスタチップは、形状寸法を小さくするのに限界があるために、薄膜形成技術を用いた薄膜温度センサが開発され実用化されるようになった。この薄膜温度センサは、上記の金属酸化物の焼結体からなるチップに比べて熱容量が小さいために熱応答性に優れている温度センサである。この薄膜温度センサは、図4(a)に示すように、絶縁基板41上に感熱膜42と電極43をスパッタ法などによって形成した後、一表面上に形成された電極43面に引出線44をはんだや導電性接着剤のような接合材45で取り付けて接続したものや、図4(b)に示すように、絶縁基板41上に感熱膜42と電極43をスパッタ法などによって形成した後、電極43面に引出線44をレーザー溶接によって電気的に接続したものがある。   However, since the thermistor chip made of a sintered metal oxide produced as described above has a limit in reducing the shape and size, a thin film temperature sensor using a thin film formation technology has been developed and put into practical use. It became so. This thin film temperature sensor is a temperature sensor that is excellent in thermal response because it has a smaller heat capacity than a chip made of a sintered metal oxide. In this thin film temperature sensor, as shown in FIG. 4A, after a heat sensitive film 42 and an electrode 43 are formed on an insulating substrate 41 by a sputtering method or the like, a lead wire 44 is formed on the surface of the electrode 43 formed on one surface. After the heat-sensitive film 42 and the electrode 43 are formed on the insulating substrate 41 by a sputtering method or the like as shown in FIG. Some lead wires 44 are electrically connected to the electrode 43 surface by laser welding.

図4(a)に示すような構造の従来の薄膜温度センサは、電極43と引出線44とを接続する場合、電極43面に引出線44が接触するように位置決めしておき、接合材45によってその周囲を包み込むように塗布して接着固定する。しかし引出線44は、細いもので直径100μm程度と細いため、組み立て工程や劣悪な保管状況などで曲げられてしまうこともあり、電極43面の垂直方向や水平方向に暴れてセットし難い問題があった。   In the conventional thin film temperature sensor having the structure as shown in FIG. 4A, when the electrode 43 and the lead wire 44 are connected, the electrode 43 and the lead wire 44 are positioned so that the lead wire 44 contacts the surface of the electrode 43, and the bonding material 45. Apply and fix so as to wrap around it. However, since the lead wire 44 is thin and has a diameter of about 100 μm, the lead wire 44 may be bent in the assembly process or in a poor storage condition. there were.

更に、薄膜温度センサの電極43面に引出線44を接続するときに、電極43面が非常に小さいために接合材45を位置精度良く塗布ができなかったり、さらに接合材の塗布量のばらつき等の原因による接合不良から、電気的な導通不良やショート不良が発生することもあった。   Further, when the lead wire 44 is connected to the surface of the electrode 43 of the thin film temperature sensor, the surface of the electrode 43 is very small, so that the bonding material 45 cannot be applied with high positional accuracy, and the amount of application of the bonding material varies. In some cases, poor electrical continuity or short-circuiting may occur due to poor bonding due to the cause.

更に、近年薄膜サーミスタを形成するセンサチップの寸法が益々小さくなってきており、最近では、0.6mm×0.3mmの寸法のチップも現れ、今後さらに微細化の傾向にある。それに伴い、図6(b)に示すように、電極面に引出線をレーザー溶接によって、電気的に接合する方法で接続する方法も行われているが、レーザー光は、電極や絶縁基板に機械的ダメージを与え易く、電極と引出線が電気的、機械的に接続されていたとしても絶縁基板が機械的ダメージを受け、引出線を引っ張ると絶縁基板から破断し、十分な引っ張り強度を得ることができなくなることもあった。   Furthermore, in recent years, the dimensions of sensor chips forming thin film thermistors have become increasingly smaller, and recently, a chip having a size of 0.6 mm × 0.3 mm has appeared, and there is a trend toward further miniaturization in the future. Along with this, as shown in FIG. 6B, a method of electrically connecting a leader line to the electrode surface by laser welding is also performed, but the laser beam is mechanically applied to the electrode or the insulating substrate. Even if the electrode and the lead wire are electrically and mechanically connected, the insulating substrate is mechanically damaged, and when the lead wire is pulled, it breaks from the insulating substrate and obtains sufficient tensile strength. Sometimes it was not possible.

また、レーザー溶接による電極面と引出線の接続は、精度よく引出線を電極へ位置決めしてレーザーを照射しなくてはならず、前者同様に如何に電極面に引出線を位置精度よく配置するかが問題であった。   In addition, the connection between the electrode surface and the leader line by laser welding must be performed by accurately positioning the leader line to the electrode and irradiating the laser, and as with the former method, the leader line is arranged on the electrode face with high positional accuracy. It was a problem.

本発明は上記課題に鑑み、引出線と電極との接続強度を維持し、かつそれ程厳しい位置精度を要求することなく容易に接続できる薄膜温度センサ、およびその薄膜温度センサの引出線接続方法の課題を解消することにある。   In view of the above problems, the present invention maintains a connection strength between the lead wire and the electrode, and can easily connect without requiring so severe positional accuracy, and a problem of a lead wire connection method of the thin film temperature sensor Is to eliminate.

第1の発明にかかる薄膜温度センサは、絶縁基板と、該絶縁基板の一表面に形成された感熱膜と、該感熱膜に電気的に接続された一対の電極膜と、該一対の電極膜上に形成されたバンプと、該バンプと電気的に接続された引出線とで構成されたことを特徴とする薄膜温度センサである。   A thin film temperature sensor according to a first invention includes an insulating substrate, a heat sensitive film formed on one surface of the insulating substrate, a pair of electrode films electrically connected to the heat sensitive film, and the pair of electrode films. A thin-film temperature sensor comprising a bump formed on the lead wire and a lead line electrically connected to the bump.

また、第2の発明にかかる薄膜温度センサは、請求項1の発明において、前記バンプが、ワイヤーバンプによって形成されていることを特徴とする薄膜温度センサである。   The thin film temperature sensor according to a second aspect of the present invention is the thin film temperature sensor according to the first aspect of the present invention, wherein the bump is formed by a wire bump.

また、第3の発明にかかる薄膜温度センサは、絶縁基板の一表面に形成された感熱膜と、該感熱膜に電気的に接続された一対の電極膜と、該電極膜上に形成されたバンプと、前記バンプと電気的に接続された引出線とで構成された薄膜温度センサにおいて、前記バンプ上に前記引出線を載置し、レーザー溶接の手段によって前記引出線を前記バンプに接続したことを特徴とする薄膜温度センサの引出線接続方法に関するものである。   A thin film temperature sensor according to a third aspect of the present invention is formed on a thermal film formed on one surface of an insulating substrate, a pair of electrode films electrically connected to the thermal film, and the electrode film. In the thin film temperature sensor composed of a bump and a lead wire electrically connected to the bump, the lead wire is placed on the bump, and the lead wire is connected to the bump by means of laser welding. The present invention relates to a lead wire connecting method for a thin film temperature sensor.

本発明の薄膜温度センサは、絶縁基板と、該絶縁基板の一表面に形成された感熱膜と、該感熱膜に電気的に接続された一対の電極膜と、該一対の電極膜上に形成されたバンプと、該バンプと電気的に接続された引出線とで構成されているので、バンプと引出線とが電気的、機械的に接続されて引っ張り強度が向上する。また本発明の薄膜温度センサは、引出線の直径よりも大きなバンプを電極に形成するので、電極面との接続面積が拡大され引っ張り強度が向上する。また本発明の薄膜温度センサは、引出線の直径よりも大きなバンプを電極に形成するので、従来のような厳しい引出線の位置精度を要求することなく容易にレーザー溶接できる。また本発明の薄膜温度センサは、バンプと引出線をレーザー溶接することにより、従来電極と引出線をはんだ付けによる接続よりも耐熱性を向上させることができる。また本発明の薄膜温度センサは、バンプと引出線とを電気的、機械的に接続することが出来るので、従来、電極と絶縁基板がレーザーによる機械的ダメージを受けてしまうのを改善でき、引っ張り強度を向上させることが出来る。   The thin film temperature sensor of the present invention is formed on an insulating substrate, a heat sensitive film formed on one surface of the insulating substrate, a pair of electrode films electrically connected to the heat sensitive film, and the pair of electrode films. Since the bump and the lead wire electrically connected to the bump are configured, the bump and the lead wire are electrically and mechanically connected to improve the tensile strength. Moreover, since the thin film temperature sensor of this invention forms a bump larger than the diameter of a leader line in an electrode, the connection area with an electrode surface is expanded and tensile strength improves. Moreover, since the thin film temperature sensor of the present invention forms bumps larger than the diameter of the lead wire on the electrode, laser welding can be easily performed without requiring strict lead wire position accuracy as in the prior art. Moreover, the thin film temperature sensor of this invention can improve heat resistance rather than the connection by soldering a conventional electrode and a leader line by laser-welding a bump and a leader line. In addition, since the thin film temperature sensor of the present invention can electrically and mechanically connect the bump and the lead wire, conventionally, the electrode and the insulating substrate can be improved from being mechanically damaged by the laser, and the tension can be improved. Strength can be improved.

以下に本発明の実施例を説明する。図1は本発明の薄膜温度センサの斜視図、図2〜図3は組立図である。図1に示すように、本発明の薄膜温度センサ1は、絶縁基板11上に形成された感熱膜12と、周囲の温度変化を検知して前記感熱膜12の抵抗変化を信号として取り出す一対の電極膜13と、前記電極膜の表面に形成されたバンプ14と、前記バンプに電気的に接続された引出線15とから構成されている。   Examples of the present invention will be described below. FIG. 1 is a perspective view of a thin film temperature sensor of the present invention, and FIGS. As shown in FIG. 1, a thin film temperature sensor 1 of the present invention includes a heat sensitive film 12 formed on an insulating substrate 11 and a pair of sensors that detect a change in ambient temperature and take out a resistance change of the heat sensitive film 12 as a signal. The electrode film 13 is composed of a bump 14 formed on the surface of the electrode film, and a lead wire 15 electrically connected to the bump.

ここで、絶縁基板11は、アルミナ、サファイア、ジルコニア、窒化アルミなどの耐熱性、電気絶縁性に優れた材料が使われる。基板の厚みは、熱伝導率と機械的強度を考慮して、例えばアルミナ基板であれば150μm〜400μm程度が好ましい。また、感熱膜12は、マンガン、ニッケル、銅、コバルト、鉄などの金属酸化物の混合体からなるターゲットを用い、公知のスパッタ法などによって絶縁基板11上に形成された薄膜サーミスタ膜からなる。電極膜13は、プラチナ、ニッケル、金、銀などの金属からなるターゲットを用い、公知のスパッタ法などによって絶縁基板11上に上記金属の単層あるいは組み合わせで形成される。バンプ14は、金、銅、ニッケル等で形成される。また、引出線15に用いられる材料としては、線径100μm程度のジュメット線、銅覆鋼線(CP線)、ニッケルメッキ線などが適している。   Here, the insulating substrate 11 is made of a material having excellent heat resistance and electrical insulation, such as alumina, sapphire, zirconia, and aluminum nitride. In consideration of thermal conductivity and mechanical strength, the thickness of the substrate is preferably about 150 μm to 400 μm for an alumina substrate, for example. The heat sensitive film 12 is a thin film thermistor film formed on the insulating substrate 11 by a known sputtering method using a target made of a mixture of metal oxides such as manganese, nickel, copper, cobalt and iron. The electrode film 13 is formed of a single layer or a combination of the above metals on the insulating substrate 11 by a known sputtering method using a target made of a metal such as platinum, nickel, gold, or silver. The bump 14 is made of gold, copper, nickel or the like. Further, as a material used for the lead wire 15, a jumet wire, a copper-clad steel wire (CP wire), a nickel-plated wire or the like having a wire diameter of about 100 μm is suitable.

次に、本発明の薄膜温度センサの組立過程を図2〜図3を参照して説明する。   Next, the assembly process of the thin film temperature sensor of the present invention will be described with reference to FIGS.

図2(a)は、前記アルミナ基板11上に多数の感熱膜12と電極膜13からなる薄膜サーミスタをアレイ状に形成された基板の一部分を示す図であり、図2(b)は、基板をそれぞれのチップに切断し、バンプを形成した薄膜センサチップの斜視図である。   FIG. 2A is a view showing a part of a substrate in which a thin film thermistor made up of a large number of heat-sensitive films 12 and electrode films 13 is formed in an array on the alumina substrate 11, and FIG. FIG. 2 is a perspective view of a thin film sensor chip in which bumps are formed by cutting each chip.

先ず、図2(a)に示すように、厚み約250μmのアルミナ基板11を用いて、公知のスパッタ法などの方法で薄膜サーミスタ膜からなる感熱膜12と、感熱膜12の抵抗変化を取り出す出力端子としての電極膜13が形成される。前述したように、感熱膜12としては、金属酸化物からなるサーミスタ膜12が、また電極膜13としては、例えば白金の薄膜、または白金の薄膜の上に金の薄膜が積層された積層膜が用いられる。これら感熱膜12と電極膜13の構成の一例については、本出願人が以前に出願した特開平6−61012号に開示されている。   First, as shown in FIG. 2A, using an alumina substrate 11 having a thickness of about 250 μm, a heat sensitive film 12 made of a thin film thermistor film and a resistance change of the heat sensitive film 12 are extracted by a known sputtering method or the like. An electrode film 13 as a terminal is formed. As described above, the thermosensitive film 12 is a thermistor film 12 made of a metal oxide, and the electrode film 13 is, for example, a platinum thin film or a laminated film in which a gold thin film is laminated on a platinum thin film. Used. An example of the configuration of the heat sensitive film 12 and the electrode film 13 is disclosed in Japanese Patent Application Laid-Open No. 6-61012 filed previously by the present applicant.

次に、図2(b)に示すように、電極膜13に金ワイヤーを用いワイヤーバンプを形成する。バンプは、公知のワイヤーバンプの技術で形成される。バンプの大きさは、引出線の直径100μmより大きくする。バンプを大きくすることによって、引出線をセットする位置が多少ずれたとしてもバンプ上に引出線が載っている限りは、レーザー溶接が可能となる。次に、個々の薄膜センサチップを得るために、基板11は図2(b)の点線に示すようにダイシング装置などによって切断される。図2(c)に示すように、本実施例では約0.6mm×0.3mmの寸法に各々切断された。   Next, as shown in FIG. 2B, a wire bump is formed on the electrode film 13 using a gold wire. The bump is formed by a known wire bump technique. The size of the bump is made larger than the diameter of the leader line of 100 μm. By enlarging the bump, laser welding can be performed as long as the leader line is placed on the bump even if the position where the leader line is set is slightly shifted. Next, in order to obtain individual thin film sensor chips, the substrate 11 is cut by a dicing apparatus or the like as shown by the dotted lines in FIG. As shown in FIG. 2 (c), in this example, each was cut to a size of about 0.6 mm × 0.3 mm.

次に、図3(a)、(b)に示すように、バンプ上に、直径約100μmのジュメット線からなる引出線15を載置する。次に、レーザー溶接機を用い、レーザー光21をバンプ14上に載置した引出線15に照射し、引出線15とバンプ14とを接続させて、薄膜温度センサ1が完成する。   Next, as shown in FIGS. 3A and 3B, a leader line 15 made of a jumet line having a diameter of about 100 μm is placed on the bump. Next, using a laser welding machine, the laser beam 21 is irradiated onto the lead wire 15 placed on the bump 14, and the lead wire 15 and the bump 14 are connected to complete the thin film temperature sensor 1.

上記の製造方法で完成した薄膜温度センサの引っ張り強度は、従来例で示した図4(b)の構造の薄膜温度センサが平均100グラムであったのに対し、平均150グラムの強度を保つことができた。   The tensile strength of the thin film temperature sensor completed by the above manufacturing method is to maintain an average strength of 150 grams as compared with the average thin film temperature sensor having the structure of FIG. I was able to.

また図示はしないが、耐候性能の向上させるために、感熱膜と引出線を覆うガラスなどの外装材を感熱膜12と引出線15上に被覆しても良い。ガラスを感熱膜12と引出線15に被覆する方法としては、ペースト状のガラスを感熱膜12と引出線15上にディスペンサーなどで塗布し、高温で焼成する方法がある。また、本発明の薄膜温度センサ1は、100度程度の環境で使用することを意図した場合には、感熱膜12や引出線15の被覆材としてガラスを用いるのではなく、エポキシなどの樹脂材料を用いても良い。   Although not shown, an exterior material such as glass covering the heat-sensitive film and the lead wire may be coated on the heat-sensitive film 12 and the lead wire 15 in order to improve the weather resistance. As a method of covering the heat sensitive film 12 and the lead wire 15 with glass, there is a method of applying paste-like glass on the heat sensitive film 12 and the lead wire 15 with a dispenser or the like and baking at high temperature. In addition, when the thin film temperature sensor 1 of the present invention is intended to be used in an environment of about 100 degrees, glass is not used as a covering material for the heat sensitive film 12 and the lead wire 15 but a resin material such as epoxy. May be used.

また本実施例においては、図示しないが、引出線14としてジュメット線を用いた例について開示したが、これに限定されるものではなく、材料として上記した以外に42アロイやコバールなどの金属板を所望の形状に成形したリードフレームを用い、表面を金、銀、ニッケルなどのメッキ処理を施したリードフレーム状の引出線を用いてもよい。   In the present embodiment, although not shown, an example using a dumet wire as the lead wire 14 has been disclosed. A lead frame formed into a desired shape may be used, and a lead frame lead wire having a surface plated with gold, silver, nickel or the like may be used.

本発明は、民生・産業分野を問わず各種電子機器・部品の温度検知または温度補償に用いられる薄膜温度センサに利用可能である。   INDUSTRIAL APPLICABILITY The present invention can be used for a thin film temperature sensor used for temperature detection or temperature compensation of various electronic devices and parts regardless of consumer or industrial fields.

本発明の薄膜温度センサの斜視図である。It is a perspective view of the thin film temperature sensor of this invention. 本発明の薄膜温度センサの組立図である。It is an assembly drawing of the thin film temperature sensor of this invention. 本発明の薄膜温度センサの組立図である。It is an assembly drawing of the thin film temperature sensor of this invention. 従来の薄膜温度センサの斜視図である。It is a perspective view of the conventional thin film temperature sensor.

符号の説明Explanation of symbols

1 薄膜温度センサ
11 絶縁基板
12 感熱膜
13 電極膜
14 バンプ
15 引出線
21 レーザー光
DESCRIPTION OF SYMBOLS 1 Thin film temperature sensor 11 Insulating substrate 12 Thermal film 13 Electrode film 14 Bump 15 Leader 21 Laser beam

Claims (3)

絶縁基板と、該絶縁基板の一表面に形成された感熱膜と、該感熱膜に電気的に接続された一対の電極膜と、該一対の電極膜上に形成されたバンプと、該バンプと電気的に接続された引出線とで構成されたことを特徴とする薄膜温度センサ。   An insulating substrate; a thermal film formed on one surface of the insulating substrate; a pair of electrode films electrically connected to the thermal film; a bump formed on the pair of electrode films; A thin-film temperature sensor comprising an electrically connected lead wire. 前記バンプが、ワイヤーバンプによって形成されていることを特徴とする請求項1に記載の薄膜温度センサ。   The thin film temperature sensor according to claim 1, wherein the bump is formed of a wire bump. 絶縁基板の一表面に形成された感熱膜と、該感熱膜に電気的に接続された一対の電極膜と、該電極膜上に形成されたバンプと、前記バンプと電気的に接続された引出線とで構成された薄膜温度センサにおいて、前記バンプ上に前記引出線を載置し、レーザー溶接の手段によって前記引出線を前記バンプに接続したことを特徴とする薄膜温度センサの引出線接続方法。   A heat-sensitive film formed on one surface of the insulating substrate, a pair of electrode films electrically connected to the heat-sensitive film, a bump formed on the electrode film, and a drawer electrically connected to the bump A thin film temperature sensor comprising a wire, wherein the lead wire is placed on the bump, and the lead wire is connected to the bump by means of laser welding. .
JP2007084613A 2007-03-28 2007-03-28 Thin-film temperature sensor, and outgoing line connection method thereof Pending JP2008241566A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010197163A (en) * 2009-02-24 2010-09-09 Mitsubishi Materials Corp Thin-film temperature sensor and method for manufacturing the same
JP2010197165A (en) * 2009-02-24 2010-09-09 Mitsubishi Materials Corp Thin-film temperature sensor and method for manufacturing the same
JP2018109586A (en) * 2017-01-06 2018-07-12 三菱マテリアル株式会社 Temperature sensor
WO2018203475A1 (en) * 2017-05-01 2018-11-08 Semitec株式会社 Temperature sensor and device equipped with temperature sensor
KR20190059910A (en) 2016-10-07 2019-05-31 세미텍 가부시키가이샤 Welding electronic components, mounting board and temperature sensor
JP2020095157A (en) * 2018-12-12 2020-06-18 キヤノン株式会社 Image heating device and image formation device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201863A (en) * 1993-12-28 1995-08-04 Matsushita Electron Corp Semiconductor substrate device and manufacture of circuit device
JPH09203910A (en) * 1996-01-29 1997-08-05 Hitachi Ltd Linear solid switching element and its production as well as plane display element formed by using this linear solid switching element as pixel selcting means
JP2003247897A (en) * 2002-02-26 2003-09-05 Ishizuka Electronics Corp Temperature sensor
JP2006253257A (en) * 2005-03-09 2006-09-21 Seiko Epson Corp Semiconductor apparatus
JP2006310415A (en) * 2005-04-27 2006-11-09 Renesas Technology Corp Module

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201863A (en) * 1993-12-28 1995-08-04 Matsushita Electron Corp Semiconductor substrate device and manufacture of circuit device
JPH09203910A (en) * 1996-01-29 1997-08-05 Hitachi Ltd Linear solid switching element and its production as well as plane display element formed by using this linear solid switching element as pixel selcting means
JP2003247897A (en) * 2002-02-26 2003-09-05 Ishizuka Electronics Corp Temperature sensor
JP2006253257A (en) * 2005-03-09 2006-09-21 Seiko Epson Corp Semiconductor apparatus
JP2006310415A (en) * 2005-04-27 2006-11-09 Renesas Technology Corp Module

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010197163A (en) * 2009-02-24 2010-09-09 Mitsubishi Materials Corp Thin-film temperature sensor and method for manufacturing the same
JP2010197165A (en) * 2009-02-24 2010-09-09 Mitsubishi Materials Corp Thin-film temperature sensor and method for manufacturing the same
US11215514B2 (en) 2016-10-07 2022-01-04 Semitec Corporation Electronic component for welding, mounted board and temperature sensor
DE112017005109T5 (en) 2016-10-07 2019-08-14 Semitec Corporation ELECTRONIC COMPONENT FOR WELDING, MOUNTED BOARD AND TEMPERATURE SENSOR
KR20190059910A (en) 2016-10-07 2019-05-31 세미텍 가부시키가이샤 Welding electronic components, mounting board and temperature sensor
JP2018109586A (en) * 2017-01-06 2018-07-12 三菱マテリアル株式会社 Temperature sensor
JPWO2018203475A1 (en) * 2017-05-01 2019-06-27 Semitec株式会社 Device equipped with temperature sensor and temperature sensor
JP6502588B2 (en) * 2017-05-01 2019-04-17 Semitec株式会社 Device equipped with temperature sensor and temperature sensor
CN110573848A (en) * 2017-05-01 2019-12-13 世美特株式会社 Temperature sensor and device provided with temperature sensor
WO2018203475A1 (en) * 2017-05-01 2018-11-08 Semitec株式会社 Temperature sensor and device equipped with temperature sensor
US11460353B2 (en) 2017-05-01 2022-10-04 Semitec Corporation Temperature sensor and device equipped with temperature sensor
JP2020095157A (en) * 2018-12-12 2020-06-18 キヤノン株式会社 Image heating device and image formation device
JP7246908B2 (en) 2018-12-12 2023-03-28 キヤノン株式会社 Image heating device and image forming device

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