JP2008227064A - 基板処理装置及び電極構造体 - Google Patents
基板処理装置及び電極構造体 Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 73
- 238000001816 cooling Methods 0.000 claims abstract description 15
- 238000003860 storage Methods 0.000 claims description 12
- 230000004308 accommodation Effects 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 abstract description 33
- 230000002159 abnormal effect Effects 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 110
- 238000009826 distribution Methods 0.000 description 42
- 230000005684 electric field Effects 0.000 description 15
- 238000005530 etching Methods 0.000 description 11
- 239000003507 refrigerant Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- -1 for example Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical group [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
Abstract
【解決手段】基板処理装置10は、順に積層された、天井電極板25、冷却板26及び上部電極支持体27を有する円板状のシャワーヘッド24を備え、上部電極支持体27は上部高周波電源30に接続され、冷却板26は中央バッファ室34と周縁バッファ室35とを内部に有し、上部電極支持体27には2つのクランプ38が中央バッファ室34に対応する位置に配置され、且つ2つのクランプ40が周縁バッファ室35に対応する位置に配置され、各クランプ38,40はそれぞれガス供給系39,41に接続され、2つのクランプ38は、シャワーヘッド中心を中心とする円周上において180°±3°毎に配置され、2つのクランプ40も、シャワーヘッド中心を中心とする円周上において180°±3°毎に配置されている。
【選択図】図1
Description
まず、基板処理装置10においてウエハWにエッチング処理を施した際、ウエハWにおけるアーキングの発生の有無を観測したところ、アーキングの発生は確認されなかった。また、ウエハWの表面における電荷分布を観測したところ、電荷分布は同心円分布となり、円周方向に関して電荷の偏在の発生は確認されなかった。
まず、図7の電極構造体70を備える基板処理装置(以下、「従来の基板処理装置」という。)においてウエハWにエッチング処理を施した際、ウエハWにおけるアーキングの発生の有無を観測したところ、接続部74a,74bが配置される位置とシャワーヘッド71の中心に関して対称の位置においてアーキングの発生を確認した。また、ウエハWの表面における電荷分布を観測したところ、接続部74a,74bが配置される位置とシャワーヘッド71の中心に関して対称の位置において電荷の偏在の発生を確認した。
W ウエハ
10 基板処理装置
11 チャンバ
13 サセプタ
14 ESC
19 下部高周波電源
24 シャワーヘッド
34 中央バッファ室
35 周縁バッファ室
38,40 クランプ
39 中央ガス供給系
41 周縁ガス供給系
Claims (5)
- 円板状の基板を収容する収容室と、該収容室内に配置されて前記基板を載置する載置台と、高周波電源と、処理ガスを供給するガス供給装置と、前記高周波電源と接続され且つ少なくとも1つのガス供給系を介して前記ガス供給装置と接続される円板状の電極構造体とを備える基板処理装置において、
前記電極構造体は、前記載置台と対向して配置され、内部に少なくとも1つのバッファ室を有し、且つ前記ガス供給系と接続される複数の接続部を有し、
各前記バッファ室は、多数のガス穴を介して前記収容室内と連通すると共に、前記複数の接続部を介して前記ガス供給系と連通し、
各前記バッファ室に関し、前記複数の接続部は、前記電極構造体の中心を中心とする円周上において均等間隔に配置されることを特徴とする基板処理装置。 - 前記電極構造体は内部に複数の前記バッファ室を有し、
全前記バッファ室に対応する前記接続部の合計数をnとした場合、各前記接続部は、前記電極構造体の中心を中心とする回転角度で360°/n±3°毎に配置されることを特徴とする請求項1記載の基板処理装置。 - 前記電極構造体は、前記収容室側から順に積層された天井電極板、冷却板及び上部電極体によって構成され、該天井電極板、前記冷却板及び前記上部電極体は導電性材料からなり、
前記複数の接続部は前記上部電極体に配置され、該上部電極体は前記高周波電源と接続されることを特徴とする請求項1又は2記載の基板処理装置。 - 前記ガス供給系は少なくとも前記接続部に接続される部分が絶縁性材料からなることを特徴とする請求項1乃至3のいずれか1項に記載の基板処理装置。
- 円板状の基板を収容する収容室と、該収容室内に配置されて前記基板を載置する載置台と、高周波電源と、処理ガスを供給するガス供給装置とを備える基板処理装置が有する電極構造体において、
円板状を呈すると共に、前記高周波電源と接続され且つ少なくとも1つのガス供給系を介して前記ガス供給装置と接続され、
前記載置台と対向して配置され、内部に少なくとも1つのバッファ室を有し、且つ前記ガス供給系と接続される複数の接続部を有し、
各前記バッファ室は、多数のガス穴を介して前記収容室内と連通すると共に、前記複数の接続部を介して前記ガス供給系と連通し、
各前記バッファ室に関し、前記複数の接続部は、前記電極構造体の中心を中心とする円周上において均等間隔に配置されることを特徴とする電極構造体。
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JP2007061749A JP4928991B2 (ja) | 2007-03-12 | 2007-03-12 | 基板処理装置 |
US12/029,728 US8282770B2 (en) | 2007-03-12 | 2008-02-12 | Substrate processing apparatus and electrode structure |
US13/617,665 US8480849B2 (en) | 2007-03-12 | 2012-09-14 | Substrate processing apparatus and electrode structure |
US13/922,892 US8758551B2 (en) | 2007-03-12 | 2013-06-20 | Substrate processing apparatus and electrode structure |
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JP2007061749A JP4928991B2 (ja) | 2007-03-12 | 2007-03-12 | 基板処理装置 |
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JP2011272198A Division JP5426647B2 (ja) | 2011-12-13 | 2011-12-13 | 基板処理装置 |
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KR102656203B1 (ko) * | 2017-12-19 | 2024-04-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 다중-구역 가스 분배 시스템들 및 방법들 |
US11581165B2 (en) | 2017-12-19 | 2023-02-14 | Applied Materials, Inc. | Multi-zone gas distribution systems and methods |
KR20230058530A (ko) * | 2017-12-19 | 2023-05-03 | 어플라이드 머티어리얼스, 인코포레이티드 | 다중-구역 가스 분배 시스템들 및 방법들 |
WO2021252096A1 (en) * | 2020-06-10 | 2021-12-16 | Lam Research Corporation | Split showerhead cooling plate |
Also Published As
Publication number | Publication date |
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US20080223523A1 (en) | 2008-09-18 |
US20130276982A1 (en) | 2013-10-24 |
US8758551B2 (en) | 2014-06-24 |
US8282770B2 (en) | 2012-10-09 |
US8480849B2 (en) | 2013-07-09 |
US20130008606A1 (en) | 2013-01-10 |
JP4928991B2 (ja) | 2012-05-09 |
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