JP2008078636A5 - - Google Patents
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- Publication number
- JP2008078636A5 JP2008078636A5 JP2007215503A JP2007215503A JP2008078636A5 JP 2008078636 A5 JP2008078636 A5 JP 2008078636A5 JP 2007215503 A JP2007215503 A JP 2007215503A JP 2007215503 A JP2007215503 A JP 2007215503A JP 2008078636 A5 JP2008078636 A5 JP 2008078636A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light
- manufacturing
- semiconductor device
- electro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims 8
- 239000004065 semiconductor Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 230000031700 light absorption Effects 0.000 claims 2
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 230000001360 synchronised effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007215503A JP5276811B2 (ja) | 2006-08-25 | 2007-08-22 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006229093 | 2006-08-25 | ||
| JP2006229093 | 2006-08-25 | ||
| JP2007215503A JP5276811B2 (ja) | 2006-08-25 | 2007-08-22 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008078636A JP2008078636A (ja) | 2008-04-03 |
| JP2008078636A5 true JP2008078636A5 (enExample) | 2010-09-30 |
| JP5276811B2 JP5276811B2 (ja) | 2013-08-28 |
Family
ID=39350328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007215503A Expired - Fee Related JP5276811B2 (ja) | 2006-08-25 | 2007-08-22 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5276811B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5684488B2 (ja) | 2009-04-20 | 2015-03-11 | 富士フイルム株式会社 | 画像処理装置、画像処理方法およびプログラム |
| JP5540773B2 (ja) * | 2010-03-03 | 2014-07-02 | セイコーエプソン株式会社 | 表示シート、表示装置および電子機器 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AUPP699698A0 (en) * | 1998-11-06 | 1998-12-03 | Pacific Solar Pty Limited | Indirect laser patterning of resist |
| JP2004098087A (ja) * | 2002-09-05 | 2004-04-02 | Dainippon Screen Mfg Co Ltd | レーザ加工装置およびレーザ加工方法 |
| JP2004272162A (ja) * | 2003-03-12 | 2004-09-30 | Konica Minolta Holdings Inc | 画像駆動素子シート及びその製造方法 |
| JP4754848B2 (ja) * | 2004-03-03 | 2011-08-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
-
2007
- 2007-08-22 JP JP2007215503A patent/JP5276811B2/ja not_active Expired - Fee Related
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