JP2008058899A - Exposure apparatus, exposure method and method for manufacturing display panel substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To stabilize the illuminance of exposure light in a short time and to rapidly start an exposure process. <P>SOLUTION: A lamp house 39 has an air inlet 39a and an exhaust outlet 39b and houses a lamp 31 to produce an air flow around the lamp 31. The air flowing around the lamp 31 absorbs heat of the lamp 31 to increase the temperature and is discharged through the exhaust outlet 39b. A variable damper 41 disposed adjacent to the exhaust outlet 39b has an adjusting plate 41a where air collides, and the amount of air discharged through the exhaust outlet 39b is adjusted by varying the inclination of the adjusting plate 41a. A temperature sensor 40 detects the temperature of air discharged through the exhaust outlet 39b. A cooling amount judging circuit 43 determines a necessary cooling amount of the lamp 31 from the detection result of the temperature sensor 40. A variable damper control circuit 44 controls the inclination of the adjusting plate 41a of the variable damper 41 based on the judgment result of the cooling amount judging circuit. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that performs exposure of a substrate, an exposure method, and a method of manufacturing a display panel substrate using the same in manufacturing a display panel substrate such as a liquid crystal display device.

  Manufacturing of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, etc. for liquid crystal display devices used as display panels is performed using an exposure apparatus, and photolithography. This is performed by forming a pattern on the substrate by a technique. The exposure apparatus transfers a mask pattern onto a substrate by irradiating the substrate coated with a photosensitive resin material (photoresist) with exposure light through the mask.

As a light source for generating exposure light of an exposure apparatus, a lamp in which high-pressure gas is enclosed in a bulb, such as a mercury lamp, a halogen lamp, or a kinocene lamp, is used. These lamps generate a large amount of heat, and if the temperature is too high, the bulb may burst, so it must be used while cooling. For example, Patent Document 1 discloses a cooling mechanism for an exposure illumination device.
Japanese Patent Laid-Open No. 2004-71782

  In general, the illuminance of exposure light varies depending on the surface temperature of the lamp. A specified value of the surface temperature is determined for the lamp, and when performing an exposure process, the surface temperature of the lamp must be kept at a specified value in order to stabilize the illuminance of the exposure light.

  Conventionally, in order to prevent the bulb surface from bursting due to the lamp surface temperature becoming excessively high, the temperature rise due to lamp heat generation and the temperature drop due to cooling are balanced when the lamp surface temperature is close to the specified value. In addition, the cooling capacity of the cooling mechanism was determined. For this reason, immediately after starting the lighting of the lamp, the cooling capacity of the cooling mechanism is unnecessarily high, and it takes time for the lamp surface temperature to reach the specified value, and the exposure process cannot be started quickly. There was a problem.

  When the amount of exposure light necessary for exposure differs depending on the size of the substrate and the type of photoresist, it is necessary to change the lamp capacity by replacing the lamp. In this case, since the amount of heat generated varies depending on the capacity of the lamp, the conventional cooling mechanism with a fixed cooling capacity cannot cope with lamps of various capacities.

  An object of the present invention is to stabilize the illuminance of exposure light in a short time and to start exposure processing quickly. Another object of the present invention is to stabilize the illuminance of exposure light even if the amount of exposure light necessary for exposure is different. Another object of the present invention is to manufacture a high-quality substrate with a short tact time.

  An exposure apparatus of the present invention is an exposure apparatus that exposes a substrate with exposure light generated from a lamp, and has an intake port and an exhaust port for a cooling medium, accommodates the lamp, and flows the cooling medium around the lamp. According to the surface temperature of the lamp house to be formed, adjusting means for adjusting the flow rate of the cooling medium flowing around the lamp by adjusting the amount of the cooling medium sucked or discharged from the intake port or the exhaust port, and the surface temperature of the lamp, And a control means for changing the cooling amount of the lamp by controlling the adjusting means.

  The exposure method of the present invention is an exposure method for exposing a substrate with exposure light generated from a lamp, wherein the lamp is housed in a lamp house, and an intake port and an exhaust port for a cooling medium are provided in the lamp house. The flow rate of the cooling medium flowing around the lamp is adjusted by forming a flow of the cooling medium around the lamp and adjusting the amount of the cooling medium sucked or discharged from the intake or exhaust port according to the surface temperature of the lamp. Thus, the cooling amount of the lamp is changed.

  Immediately after starting the lamp operation, the lamp surface temperature is low, so the amount of cooling of the lamp is small, the lamp surface temperature rises rapidly, and reaches the specified value in a short time. As the lamp surface temperature rises, the amount of cooling of the lamp increases, and the temperature rise due to heat generation of the lamp and the temperature drop due to cooling are balanced to maintain the lamp surface temperature at a specified value. Therefore, the illuminance of the exposure light is stabilized in a short time, and the exposure process can be started quickly. Moreover, since it can respond | correspond to the lamp | ramp of various capacity | capacitance from which the emitted-heat amount differs, the illumination intensity of exposure light is stabilized even if the light quantity of exposure light required for exposure differs.

  Furthermore, in the exposure apparatus of the present invention, the control means detects the temperature of the cooling medium discharged from the exhaust port, and the cooling amount determination circuit that determines the required cooling amount of the lamp from the detection result of the temperature sensor And a control circuit for controlling the adjusting means based on the determination result of the cooling amount determination circuit. Further, the exposure method of the present invention detects the temperature of the cooling medium discharged from the exhaust port of the lamp house, determines the required lamp cooling amount from the detection result, and based on the determination result, the intake port or the exhaust port The amount of the cooling medium sucked or discharged from the tank is adjusted.

  The temperature of the cooling medium discharged from the exhaust port of the lamp house varies according to the surface temperature of the lamp. The temperature of the cooling medium discharged from the exhaust port is detected, the required cooling amount of the lamp is determined from the detection result, and the amount of the cooling medium sucked or discharged from the intake port or the exhaust port is adjusted based on the determination result Therefore, the amount of cooling of the lamp is changed according to the surface temperature of the lamp without directly measuring the surface temperature of the lamp. Therefore, an expensive measuring instrument for directly measuring the surface temperature of the lamp is not required, and the apparatus is configured at low cost.

  Further, the exposure apparatus of the present invention is a variable damper having an adjustment plate provided with an adjustment plate adjacent to the intake port or the exhaust port and colliding with a cooling medium, and the control circuit has a determination result of the cooling amount determination circuit. This is a variable damper control circuit for controlling the inclination of the adjusting plate. Further, the exposure method of the present invention is provided with a variable damper having an adjustment plate that collides with a cooling medium adjacent to an intake port or an exhaust port of the lamp house, and based on a determination result of a required cooling amount of the lamp. The amount of the cooling medium sucked or discharged from the intake port or the exhaust port is adjusted by controlling the inclination of. The amount of the cooling medium sucked or discharged from the intake port or the exhaust port is adjusted with a simple configuration by the variable damper having the adjustment plate.

  In the exposure apparatus of the present invention, the adjusting means is an exhaust fan connected to the exhaust port, and the control circuit starts and stops the exhaust fan based on the determination result of the cooling amount determination circuit, or the exhaust fan This is an exhaust fan control circuit for controlling the number of rotations. In the exposure method of the present invention, an exhaust fan is connected to the exhaust port of the lamp house, and the exhaust fan is started and stopped or the number of revolutions of the exhaust fan is controlled based on the result of determining the required lamp cooling amount. Thus, the amount of the cooling medium discharged from the exhaust port is adjusted. The amount of the cooling medium discharged from the exhaust port is adjusted by a simple operation of starting and stopping the exhaust fan or controlling the rotation speed of the exhaust fan.

  Furthermore, in the exposure apparatus of the present invention, the lamp house accommodates a plurality of lamps and forms a flow of a cooling medium around each lamp. In the exposure method of the present invention, a plurality of lamps are accommodated in a lamp house, and a flow of a cooling medium is formed around each lamp. Even when a plurality of lamps are used as a light source for generating exposure light, the illuminance of the exposure light is stabilized in a short time, and the exposure process can be started quickly.

  The method for producing a display panel substrate of the present invention is to transfer the mask pattern onto the substrate using any one of the exposure apparatuses or exposure methods described above. By using the above exposure apparatus or exposure method, the illuminance of the exposure light is stabilized in a short time, and the exposure process can be started quickly, so that a high-quality substrate is manufactured with a short tact time.

  According to the exposure apparatus and exposure method of the present invention, the flow rate of the cooling medium flowing around the lamp is adjusted by adjusting the amount of the cooling medium sucked or discharged from the intake port or the exhaust port according to the surface temperature of the lamp. By adjusting and changing the cooling amount of the lamp, the illuminance of the exposure light can be stabilized in a short time, and the exposure process can be started quickly. Moreover, since it can respond | correspond to the lamp | ramp of various capacity | capacitance from which the emitted-heat amount differs, even if the light quantity of exposure light required for exposure differs, the illumination intensity of exposure light can be stabilized.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the temperature of the cooling medium discharged from the exhaust port of the lamp house is detected, and from the detection result, the necessary cooling amount of the lamp is determined, and based on the determination result, The amount of cooling of the lamp can be changed according to the surface temperature of the lamp without directly measuring the surface temperature of the lamp by adjusting the amount of the cooling medium sucked or discharged from the intake or exhaust port. . Therefore, an expensive measuring instrument for directly measuring the surface temperature of the lamp is not required, and the apparatus can be configured at low cost.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the amount of the cooling medium sucked or discharged from the intake port or the exhaust port can be adjusted with a simple configuration by the variable damper having the adjustment plate.

  Further, according to the exposure apparatus and the exposure method of the present invention, the amount of the cooling medium discharged from the exhaust port is adjusted by a simple operation of starting and stopping the exhaust fan or controlling the rotation speed of the exhaust fan. be able to.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, a plurality of lamps are housed in a lamp house, and a flow of a cooling medium is formed around each lamp, thereby providing a plurality of lamps as a light source that generates exposure light. Even when used, the illuminance of the exposure light can be stabilized in a short time, and the exposure process can be started quickly.

  According to the method for manufacturing a display panel substrate of the present invention, the illuminance of exposure light can be stabilized in a short time and the exposure process can be started quickly, so that a high-quality substrate can be manufactured in a short tact time. it can.

  FIG. 1 is a view showing the schematic arrangement of an exposure apparatus according to an embodiment of the present invention. This embodiment shows an example of a proximity exposure apparatus that transfers a mask pattern to a substrate by providing a minute gap (proximity gap) between the mask and the substrate. The exposure apparatus includes a base 3, an X guide 4, an X stage 5, a Y guide 6, a Y stage 7, a θ stage 8, a Z-tilt mechanism 9, a chuck 10, a mask holder 20, and an exposure light irradiation device 30. Has been. In addition to these, the exposure apparatus includes a carry-in unit for carrying in the substrate 1, a carry-out unit for carrying out the substrate 1, a temperature control unit for managing the temperature in the apparatus, and the like.

  In FIG. 1, the chuck 10 is at an exposure position where the substrate 1 is exposed. The mask 2 is held by the mask holder 20 above the exposure position. The substrate 1 is mounted on the chuck 10 by a carry-in unit (not shown) at a delivery position away from the exposure position, and is recovered from the chuck 10 by a carry-out unit (not shown).

  The chuck 10 is mounted on the θ stage 8 via a Z-tilt mechanism 9, and a Y stage 7 and an X stage 5 are provided below the θ stage 8. The X stage 5 moves in the X direction (the horizontal direction in the drawing) along the X guide 4 provided on the base 3. As the X stage 5 moves in the X direction, the chuck 10 moves between the delivery position and the exposure position. The Y stage 7 moves in the Y direction (the drawing depth direction) along the Y guide 6 provided on the X stage 5. The θ stage 8 rotates in the θ direction, and the Z-tilt mechanism 9 moves and tilts in the Z direction (vertical direction in the drawing).

  At the exposure position, the substrate 1 is positioned by moving the X stage 5 in the X direction, moving the Y stage 7 in the Y direction, and rotating the θ stage 8 in the θ direction. Further, the gap control between the mask 2 and the substrate 1 is performed by the movement and tilt of the Z-tilt mechanism 9 in the Z direction.

  An exposure light irradiation device 30 is provided above the mask holder 20. The exposure light irradiation device 30 includes a lamp 31, a condensing mirror 32, a first plane mirror 33, a lens 34, a shutter 35, a collimator lens 36, a second plane mirror 37, a power source 38, and a lamp cooling mechanism. . In FIG. 1, only the lamp house 39 of the lamp cooling mechanism is shown.

  As the lamp 31, a lamp in which high-pressure gas is enclosed in a bulb, such as a mercury lamp, a halogen lamp, or a kinocene lamp, is used. The lamp 31 is turned on when a voltage is applied from the power source 38 to generate exposure light.

  The exposure light generated by the lamp 31 is condensed by the condenser mirror 32 and reflected by the first plane mirror 33. The exposure light reflected by the first plane mirror 33 is incident on a lens 34 such as a fly-eye lens or a lot lens, and is transmitted through the lens 34 so that the illuminance distribution becomes uniform. When the shutter 35 is open, the exposure light transmitted through the lens 34 is transmitted through the collimator lens 36 to become a parallel light beam, reflected by the second plane mirror 37, and irradiated onto the mask 2.

  FIG. 2 is a diagram showing a lamp cooling mechanism according to an embodiment of the present invention. The lamp cooling mechanism of this embodiment includes a lamp house 39, a temperature sensor 40, a variable damper 41, an exhaust fan 42, a cooling amount determination circuit 43, and a variable damper control circuit 44.

  The lamp house 39 accommodates a lamp 31, a condenser mirror 32, a first plane mirror 33, and a lens 34. The lamp house 39 has an air inlet 39 a at a position below the lamp 31 and an air outlet 39 b at a position above the lamp 31. An exhaust fan 42 is connected to the exhaust port 39b via a variable damper 41. When the exhaust fan 42 is started, air in the lamp house 39 is exhausted from the exhaust port 39b, and air is sucked in from the intake port 39a to supplement the air into the lamp house 39.

  An opening through which the lamp 31 penetrates is provided at the bottom of the condenser mirror 32, and the air sucked from the intake port 39a passes through the opening of the condenser mirror 32 and surrounds the lamp 31 as indicated by an arrow. The lamp 31 is cooled. The air flowing around the lamp 31 absorbs the heat of the lamp 31 and rises in temperature, and is discharged from the exhaust port 39b.

  A variable damper 41 is provided adjacent to the exhaust port 39b between the exhaust port 39b and the exhaust fan 44. The variable damper 41 has an adjustment plate 41a with which air collides, and changes the inclination of the adjustment plate 41a to adjust the amount of air discharged from the exhaust port 39b.

  The temperature sensor 40 detects the temperature of the air discharged from the exhaust port 39b. The cooling amount determination circuit 43 determines the necessary cooling amount of the lamp 31 from the detection result of the temperature sensor 40. The variable damper control circuit 44 controls the inclination of the adjustment plate 41 a of the variable damper 41 based on the determination result of the cooling amount determination circuit 43.

  FIG. 3 is a view showing a lamp cooling mechanism according to another embodiment of the present invention. The present embodiment is different from the embodiment shown in FIG. 2 in that the variable damper 41 is provided adjacent to the intake port 39a. Other components are the same as those of the embodiment shown in FIG. The variable damper 41 has an adjustment plate 41a with which air collides, and changes the inclination of the adjustment plate 41a to adjust the amount of air sucked from the intake port 39a.

  The temperature sensor 40 detects the temperature of the air discharged from the exhaust port 39b. The cooling amount determination circuit 43 determines the necessary cooling amount of the lamp 31 from the detection result of the temperature sensor 40. The variable damper control circuit 44 controls the inclination of the adjustment plate 41 a of the variable damper 41 based on the determination result of the cooling amount determination circuit 43.

  FIG. 4 is a view showing a lamp cooling mechanism according to still another embodiment of the present invention. In this embodiment, FIG. 3 shows that a plurality of lamps 31 and a condensing mirror 32 are accommodated in the lamp house 39 and that the variable damper control circuit 44 controls the plurality of variable dampers 41 separately. Different from the embodiment described above. Other components are the same as those of the embodiment shown in FIG. As shown by the arrows, the air sucked from the air inlet 39a flows around the lamps 31 through the openings of the condenser mirrors 32, and cools the lamps 31. The air that flows around each lamp 31 absorbs the heat of each lamp 31 and rises in temperature, and is discharged from the exhaust port 39b.

  The temperature sensor 40 detects the temperature of the air discharged from the exhaust port 39b. The cooling amount determination circuit 43 determines the necessary cooling amount of the lamp 31 from the detection result of the temperature sensor 40. The variable damper control circuit 44 controls the inclination of the adjustment plate 41 a of the variable damper 41 separately based on the determination result of the cooling amount determination circuit 43.

  According to the embodiment shown in FIGS. 2 to 4, the variable damper 41 having the adjustment plate 41 a is used to adjust the amount of air sucked or discharged from the intake port 39 a or the exhaust port 39 b with a simple configuration. Can do.

  FIG. 5 is a view showing a lamp cooling mechanism according to still another embodiment of the present invention. The lamp cooling mechanism of the present embodiment includes a lamp house 39, a temperature sensor 40, an exhaust fan 42, a cooling amount determination circuit 43, and an exhaust fan control circuit 45.

  The lamp house 39 accommodates a lamp 31, a condenser mirror 32, a first plane mirror 33, and a lens 34. The lamp house 39 has an air inlet 39 a at a position below the lamp 31 and an air outlet 39 b at a position above the lamp 31. An exhaust fan 42 is connected to the exhaust port 39b. When the exhaust fan 42 is started, air in the lamp house 39 is exhausted from the exhaust port 39b, and air is sucked in from the intake port 39a to supplement the air into the lamp house 39. The exhaust fan 42 adjusts the amount of air discharged from the exhaust port 39b by switching between start and stop or by changing the rotation speed.

  An opening through which the lamp 31 penetrates is provided at the bottom of the condenser mirror 32, and the air sucked from the intake port 39a passes through the opening of the condenser mirror 32 and surrounds the lamp 31 as indicated by an arrow. The lamp 31 is cooled. The air flowing around the lamp 31 absorbs the heat of the lamp 31 and rises in temperature, and is discharged from the exhaust port 39b.

  The temperature sensor 40 detects the temperature of the air discharged from the exhaust port 39b. The cooling amount determination circuit 43 determines the necessary cooling amount of the lamp 31 from the detection result of the temperature sensor 40. The exhaust fan control circuit 45 starts and stops the exhaust fan 42 or controls the rotation speed of the exhaust fan 42 based on the determination result of the cooling amount determination circuit 43.

  FIG. 6 is a view showing a lamp cooling mechanism according to still another embodiment of the present invention. The present embodiment is different from the embodiment shown in FIG. 5 in that a plurality of lamps 31 and a condensing mirror 32 are accommodated in the lamp house 39. Other components are the same as those of the embodiment shown in FIG. As shown by the arrows, the air sucked from the air inlet 39a flows around the lamps 31 through the openings of the condenser mirrors 32, and cools the lamps 31. The air that flows around each lamp 31 absorbs the heat of each lamp 31 and rises in temperature, and is discharged from the exhaust port 39b.

  According to the embodiment shown in FIGS. 5 and 6, the amount of air exhausted from the exhaust port 39b by a simple operation of starting and stopping the exhaust fan 42 or controlling the rotational speed of the exhaust fan 42. Can be adjusted.

  In the embodiment described above, the temperature of the air exhausted from the exhaust port 39 b changes according to the surface temperature of the lamp 31. The temperature of the air discharged from the exhaust port 39b is detected, the required cooling amount of the lamp 31 is determined from the detection result, and the amount of air sucked or discharged from the intake port 39a or the exhaust port 39b based on the determination result Therefore, the cooling amount of the lamp 31 is changed according to the surface temperature of the lamp 31 without directly measuring the surface temperature of the lamp 31.

  Immediately after starting the lighting of the lamp 31, since the surface temperature of the lamp 31 is low, the cooling amount of the lamp 31 is small, the surface temperature of the lamp 31 rapidly rises and reaches the specified value in a short time. As the surface temperature of the lamp 31 increases, the amount of cooling of the lamp 31 increases, and the temperature increase due to heat generation of the lamp 31 and the temperature decrease due to cooling are balanced, and the surface temperature of the lamp 31 is maintained at a specified value. . Therefore, the illuminance of the exposure light is stabilized in a short time, and the exposure process can be started quickly. Moreover, since it can respond | correspond to the lamp | ramp of various capacity | capacitance from which the emitted-heat amount differs, the illumination intensity of exposure light is stabilized even if the light quantity of exposure light required for exposure differs.

  According to the embodiment described above, the flow rate of air flowing around the lamp 31 is adjusted by adjusting the amount of air sucked or discharged from the intake port 39a or the exhaust port 39b according to the surface temperature of the lamp 31. By adjusting and changing the cooling amount of the lamp 31, the illuminance of the exposure light can be stabilized in a short time, and the exposure process can be started quickly. Moreover, since it can respond | correspond to the lamp | ramp of various capacity | capacitance from which the emitted-heat amount differs, even if the light quantity of exposure light required for exposure differs, the illumination intensity of exposure light can be stabilized.

  Further, the temperature of the air discharged from the exhaust port 39b of the lamp house 39 is detected, and the necessary cooling amount of the lamp 31 is determined from the detection result. Based on the determination result, the intake or exhaust air from the intake port 39a or the exhaust port 39b is determined. By adjusting the amount of air discharged, the cooling amount of the lamp 31 can be changed according to the surface temperature of the lamp 31 without directly measuring the surface temperature of the lamp 31. Therefore, an expensive measuring instrument for directly measuring the surface temperature of the lamp 31 is not necessary, and the apparatus can be configured at low cost.

  Further, according to the embodiment shown in FIGS. 4 and 6, a light source that generates exposure light by housing a plurality of lamps 31 in a lamp house 39 and forming a flow of air around each lamp 31. Even when a plurality of lamps are used, the illuminance of the exposure light can be stabilized in a short time, and the exposure process can be started quickly.

  In the embodiment described above, air is used as a cooling medium for cooling the lamp 31, but the present invention is not limited to this, and a gas other than air may be used as the cooling medium. In the embodiment described above, the lamp house 39 is provided with the two air inlets 39a. However, one or three or more air inlets may be provided. Similarly, in the embodiment described above, one exhaust port 39b is provided in the lamp house 39, but two or more exhaust ports may be provided.

  The present invention can be applied not only to a proximity exposure apparatus but also to a projection exposure apparatus that projects a mask pattern onto a substrate using a lens or a mirror.

  By transferring the mask pattern to the substrate using the exposure apparatus or the exposure method of the present invention, the illuminance of the exposure light can be stabilized in a short time, and the exposure process can be started quickly. Can be manufactured with a short tact time.

  For example, FIG. 7 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film formation step (step 101), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on a glass substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step 102), a photosensitive resin material (photoresist) is applied by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step 101). In the exposure step (step 103), the mask pattern is transferred to the photoresist film using a proximity exposure apparatus, a projection exposure apparatus, or the like. In the development step (step 104), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step 105), a portion of the thin film formed in the thin film formation process (step 101) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step 106), the photoresist film that has finished the role of the mask in the etching step (step 105) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the glass substrate.

  FIG. 8 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step 201), a black matrix is formed on the glass substrate by processes such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step 202), a colored pattern is formed on the glass substrate by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step 203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step 204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 7, in the exposure process (step 103), in the color filter substrate manufacturing process shown in FIG. 8, in the black matrix forming process (step 201) and the colored pattern forming process (step 202). In this exposure process, the exposure apparatus or the exposure method of the present invention can be applied.

1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention. It is a figure which shows the lamp cooling mechanism by one embodiment of this invention. It is a figure which shows the lamp cooling mechanism by other embodiment of this invention. It is a figure which shows the lamp cooling mechanism by further another embodiment of this invention. It is a figure which shows the lamp cooling mechanism by further another embodiment of this invention. It is a figure which shows the lamp cooling mechanism by further another embodiment of this invention. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate 2 Mask 3 Base 4 X guide 5 X stage 6 Y guide 7 Y stage 8 θ stage 9 Z-tilt mechanism 10 Chuck 20 Mask holder 30 Exposure light irradiation device 31 Lamp 32 Condensing mirror 33 First plane mirror 34 Lens 35 Shutter 36 Collimator lens 37 Second plane mirror 38 Power supply 39 Lamp house 39a Inlet 39b Exhaust outlet 40 Temperature sensor 41 Variable damper 41a Adjusting plate 42 Exhaust fan 43 Cooling amount determination circuit 44 Variable damper control circuit 45 Exhaust fan control circuit

Claims (12)

An exposure apparatus that exposes a substrate with exposure light generated from a lamp,
A lamp house having an inlet and an outlet for the cooling medium, accommodating the lamp and forming a flow of the cooling medium around the lamp;
Adjusting means for adjusting a flow rate of the cooling medium flowing around the lamp by adjusting an amount of the cooling medium sucked or discharged from the intake port or the exhaust port;
An exposure apparatus comprising: control means for changing the cooling amount of the lamp by controlling the adjusting means in accordance with the surface temperature of the lamp. The control means includes a temperature sensor for detecting a temperature of a cooling medium discharged from the exhaust port;
A cooling amount determination circuit that determines a required cooling amount of the lamp from the detection result of the temperature sensor;
The exposure apparatus according to claim 1, further comprising: a control circuit that controls the adjustment unit based on a determination result of the cooling amount determination circuit. The adjusting means is a variable damper provided adjacent to the intake port or the exhaust port and having an adjustment plate with which a cooling medium collides,
The exposure apparatus according to claim 2, wherein the control circuit is a variable damper control circuit that controls an inclination of the adjustment plate based on a determination result of the cooling amount determination circuit. The adjusting means is an exhaust fan connected to the exhaust port;
3. The exhaust circuit according to claim 2, wherein the control circuit is an exhaust fan control circuit that starts and stops the exhaust fan or controls the rotational speed of the exhaust fan based on a determination result of the cooling amount determination circuit. The exposure apparatus described in 1.   The exposure apparatus according to claim 1, wherein the lamp house accommodates a plurality of lamps and forms a flow of a cooling medium around each of the lamps. An exposure method for exposing a substrate with exposure light generated from a lamp,
House the lamp in the lamphouse,
Provide the cooling medium intake and exhaust ports in the lamp house to form a flow of the cooling medium around the lamp,
Depending on the lamp surface temperature, the amount of cooling medium sucked or discharged from the air intake or exhaust port is adjusted, the flow rate of the cooling medium flowing around the lamp is adjusted, and the amount of cooling of the lamp is changed. A featured exposure method. Detect the temperature of the cooling medium discharged from the lamphouse exhaust port,
From the detection result, determine the required cooling amount of the lamp,
The exposure method according to claim 6, wherein the amount of the cooling medium sucked or discharged from the intake port or the exhaust port is adjusted based on the determination result. A variable damper having an adjustment plate with which a cooling medium collides is provided adjacent to the inlet or outlet of the lamp house,
8. The amount of the cooling medium sucked or discharged from the intake port or the exhaust port is controlled by controlling the inclination of the adjustment plate based on the determination result of the required lamp cooling amount. Exposure method. Connect an exhaust fan to the exhaust port of the lamp house,
Based on the determination result of the required cooling amount of the lamp, the exhaust fan is started and stopped, or the number of revolutions of the exhaust fan is controlled to adjust the amount of the cooling medium discharged from the exhaust port. The exposure method according to claim 7. Multiple lamps are housed in a lamp house,
The exposure method according to claim 6, wherein a flow of a cooling medium is formed around each lamp.   6. A method of manufacturing a display panel substrate, comprising: transferring a mask pattern onto a substrate using the exposure apparatus according to claim 1.   A method for manufacturing a display panel substrate, wherein a mask pattern is transferred to a substrate using the exposure method according to claim 6.

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