JP2007193154A - Exposure device, exposure method and method for producing display panel substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To control the light quantity of exposure light by simple configuration over a wide range with high accuracy. <P>SOLUTION: A substrate is exposed with exposure light passing through a gap between a shutter 34a and a shutter 34b while keeping the gap between the shutter 34a and the shutter 34b in a predetermined width. In a standby state, one of the shutters is completely closed and the other is completely open. First the closed shutter starts to move and moves in an open direction thereof at a predetermined moving velocity, whereby a gap occurs between the two shutters when seen in a traveling direction of exposure light and the exposure light passes through the gap between the two shutters. When the gap between the two shutters attains to a predetermined width W, the open shutter starts to move and moves in a closing direction thereof at the predetermined moving velocity. The gap between the two shutters moves in the moving direction of the two shutters at the same velocity as the moving velocity of the two shutters while being kept in the predetermined width W. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an exposure apparatus for exposing a substrate, an exposure method, and a method for manufacturing a display panel substrate using the same in the manufacture of a display panel substrate such as a liquid crystal display device. The present invention relates to an exposure apparatus, an exposure method, and a method for manufacturing a display panel substrate using the same.

  The manufacture of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, etc. for liquid crystal display devices used as display panels is performed using an exposure apparatus, photolithography. This is performed by forming a pattern on the substrate by a technique. The exposure apparatus transfers a mask pattern onto a substrate by irradiating a substrate coated with a photosensitive resin material (photoresist) with exposure light via a photomask (hereinafter referred to as “mask”). .

Generally, an exposure light irradiation device of an exposure apparatus includes a light source that generates exposure light and a shutter that blocks exposure light generated by the light source, and adjusts the exposure time by adjusting the opening time of the shutter, The amount of exposure light is kept constant. As a shutter mechanism of such an exposure light irradiation apparatus, for example, there is one described in Patent Document 1.
Japanese Patent Laid-Open No. 11-67656

  The amount of exposure light is proportional to the illuminance of the exposure light and the exposure time. In recent years, as the size of a substrate increases with an increase in the screen size of a display panel, a light source having a higher luminance has been used as a light source of an exposure light irradiation apparatus. The higher the brightness of the light source, the higher the illuminance of the exposure light, the shorter the exposure time, the shorter the tact time, and the higher the throughput.

  On the other hand, in recent years, as high-sensitivity photoresists are put into practical use, the amount of exposure light necessary for exposure has been reduced. When the illuminance of exposure light is high and the amount of exposure light necessary for exposure is small, the shutter opening time must be shortened to shorten the exposure time. However, in the conventional technique in which two shutters are operated alternately as described in Patent Document 1, the shutter opening time cannot be made shorter than the operation time of each shutter.

  For this reason, conventionally, the input voltage of the lamp of the light source is lowered to lower the illuminance of the exposure light, or the light is reduced using a filter. The method of reducing the input voltage of the lamp takes time to stabilize the illuminance of the exposure light, and there is a restriction that the range in which the illuminance can be changed is about 100 to 85%. On the other hand, in the method using a filter, the filter is expensive, and there is a possibility that exposure unevenness occurs due to an adverse effect on the illuminance distribution of exposure light. Furthermore, there is a disadvantage that the illuminance of the exposure light cannot be changed unless the filter is replaced.

  An object of the present invention is to control the amount of exposure light in a wide range and with high accuracy with an inexpensive configuration. Another object of the present invention is to control the amount of exposure light with high accuracy without adversely affecting the illuminance distribution of the exposure light, particularly when the amount of exposure light necessary for exposure is small. Another object of the present invention is to manufacture a high-quality substrate with a short tact time.

  An exposure apparatus of the present invention includes a light source that generates exposure light, a first shutter that blocks exposure light generated by the light source, a first motor that moves the first shutter, and a first shutter that is parallel to the first shutter. A second shutter provided, a second motor for moving the second shutter, a control means for instructing the width of the gap between the first shutter and the second shutter and the moving speed of both shutters, and control Driving means for driving the first motor and the second motor in accordance with the instructions of the means, controlling both the motors synchronously, and maintaining the gap between the first shutter and the second shutter at a predetermined width; The substrate is exposed by the exposure light that has passed through the gap between the first shutter and the second shutter.

  In the exposure method of the present invention, the first shutter and the second shutter are provided in parallel, the width of the gap between the first shutter and the second shutter and the moving speed of both shutters are determined, The first motor that moves the second shutter and the second motor that moves the second shutter are synchronously controlled to maintain the gap between the first shutter and the second shutter at a predetermined width, while The substrate is exposed by exposure light that has passed through the gap between the first shutter and the second shutter.

  Since the substrate is exposed by the exposure light that has passed through the gap between the first shutter and the second shutter while keeping the gap between the first shutter and the second shutter at a predetermined width, the amount of exposure light is: It depends on the width of the gap between the first shutter and the second shutter and the moving speed of both shutters. Increasing the width of the gap between the first shutter and the second shutter or slowing the moving speed of both shutters increases the amount of exposure light. If the width of the gap between the first shutter and the second shutter is narrowed or the moving speed of both shutters is increased, the amount of exposure light decreases. By adjusting the width of the gap between the first shutter and the second shutter and the moving speed of both shutters, the amount of exposure light is controlled over a wide range and with high accuracy. In particular, when the amount of exposure light necessary for exposure is small, the amount of exposure light is controlled with high accuracy without adversely affecting the illuminance distribution of the exposure light.

  Furthermore, the exposure apparatus of the present invention further includes a measuring unit that measures the amount of exposure light that has passed through the gap between the first shutter and the second shutter, and the control unit uses the first result based on the measurement result of the measuring unit. The width of the gap between the shutter and the second shutter or the moving speed of both shutters is adjusted.

  Further, the exposure method of the present invention measures the amount of exposure light that has passed through the gap between the first shutter and the second shutter, and based on the measurement result, the gap between the first shutter and the second shutter. It adjusts the width or the moving speed of both shutters.

  The amount of exposure light actually passing through the gap between the first shutter and the second shutter is measured, and the width of the gap between the first shutter and the second shutter or the moving speed of both shutters is measured based on the measurement result. Therefore, the amount of exposure light is controlled with higher accuracy.

  The method for producing a display panel substrate of the present invention is to transfer the mask pattern onto the substrate using any one of the exposure apparatuses or exposure methods described above. By using the above exposure apparatus or exposure method, the amount of exposure light is controlled over a wide range and with high accuracy, and even when the amount of exposure light necessary for exposure is small, exposure unevenness is not required and exposure is necessary. Even when the amount of exposure light is large, exposure is performed in a short exposure time. Therefore, a high-quality substrate is manufactured with a short tact time.

  According to the exposure apparatus and the exposure method of the present invention, the exposure light having passed through the gap between the first shutter and the second shutter while keeping the gap between the first shutter and the second shutter at a predetermined width. By exposing the substrate, the amount of exposure light can be controlled over a wide range and with high accuracy with an inexpensive configuration. In particular, when the amount of exposure light necessary for exposure is small, the amount of exposure light can be controlled with high accuracy without adversely affecting the illuminance distribution of the exposure light.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, the amount of exposure light that has passed through the gap between the first shutter and the second shutter is measured, and the first shutter and the second shutter are measured based on the measurement result. By adjusting the width of the gap with the shutter or the moving speed of both shutters, the amount of exposure light can be controlled with higher accuracy.

  According to the method for manufacturing a display panel substrate of the present invention, the amount of exposure light can be controlled over a wide range and with high accuracy, so that even when the amount of exposure light required for exposure is small, exposure unevenness does not occur. In addition, even when the amount of exposure light necessary for exposure is large, exposure can be performed with a short exposure time. Therefore, a high-quality substrate can be manufactured with a short tact time.

  FIG. 1 is a view showing the schematic arrangement of an exposure apparatus according to an embodiment of the present invention. This embodiment shows an example of a proximity type exposure apparatus that provides a minute gap (proximity gap) between a mask and a substrate and transfers the mask pattern to the substrate. The exposure apparatus includes a base 3, an X guide 4, an X stage 5, a Y guide 6, a Y stage 7, a θ stage 8, a Z-tilt mechanism 9, a chuck 10, a mask holder 20, an exposure light irradiation device 30, and an input / output device 40. The integrated illuminometer 50, the control device 60, and the motor drive circuit 70 are configured. In addition to these, the exposure apparatus includes a carry-in unit for carrying in the substrate 1, a carry-out unit for carrying out the substrate 1, a temperature control unit for managing the temperature in the apparatus, and the like.

  In FIG. 1, the chuck 10 is at an exposure position where the substrate 1 is exposed. The mask 2 is held by the mask holder 20 above the exposure position. The substrate 1 is mounted on the chuck 10 by a carry-in unit (not shown) at a delivery position away from the exposure position, and is recovered from the chuck 10 by a carry-out unit (not shown).

  The chuck 10 is mounted on the θ stage 8 via a Z-tilt mechanism 9, and a Y stage 7 and an X stage 5 are provided below the θ stage 8. The X stage 5 moves in the X direction (the horizontal direction in the drawing) along the X guide 4 provided on the base 3. As the X stage 5 moves in the X direction, the chuck 10 moves between the delivery position and the exposure position. The Y stage 7 moves in the Y direction (the drawing depth direction) along the Y guide 6 provided on the X stage 5. The θ stage 8 rotates in the θ direction, and the Z-tilt mechanism 9 moves and tilts in the Z direction (vertical direction in the drawing).

  At the exposure position, the substrate 1 is positioned by moving the X stage 5 in the X direction, moving the Y stage 7 in the Y direction, and rotating the θ stage 8 in the θ direction. Further, the gap control between the mask 2 and the substrate 1 is performed by the movement and tilt of the Z-tilt mechanism 9 in the Z direction.

  An exposure light irradiation device 30 is provided above the mask holder 20. The exposure light irradiation device 30 includes a lamp 31, a condenser mirror 32, a first plane mirror 33, shutters 34a and 34b, a lens 35, a second plane mirror 36, and motors 37a and 37b.

  The exposure light generated by the lamp 31 is condensed by the condenser mirror 32 and reflected by the first plane mirror 33. The exposure light reflected by the first plane mirror 33 passes through the gap between the shutter 34a and the shutter 34b, enters the lens 35 such as a fly-eye lens or a lot lens, and passes through the lens 35 to become a parallel beam bundle. The exposure light transmitted through the lens 35 is reflected by the second plane mirror 36 and is applied to the mask 2.

  The shutters 34a and 34b are flat slide shutters and are installed in parallel to each other and slide in the depth direction of the drawing. The motors 37a and 37b are composed of linear motors, for example, and are driven by a motor drive circuit 70 to move the shutters 34a and 34b, respectively.

  Information such as the size of the substrate 1, the exposure time, and the amount of exposure light necessary for exposure of the substrate 1 is input to the input / output device 40. The control device 60 determines the width of the gap between the shutter 34 a and the shutter 34 b and the moving speed of both shutters based on the information input to the input / output device 40, and outputs an operation instruction signal to the motor drive circuit 70. The motor drive circuit 70 drives the motor 37a and the motor 37b in accordance with the operation instruction signal from the control device 60, synchronously controls both motors, and keeps the gap between the shutter 34a and the shutter 34b at the designated width. Move both shutters at the indicated moving speed.

  FIG. 2 is a diagram for explaining the operation of the shutter. This figure has shown the state which looked at shutter 34a, 34b of FIG. 1 from the top. Although FIG. 2 shows the case where the shutter 34a is opened and the shutter 34b is closed, the shutter 34b may be opened and the shutter 34a may be closed.

  In the standby state, as shown in FIG. 2A, one shutter (shutter 34a) is completely closed and the other shutter (shutter 34b) is completely opened. At this time, the two shutters partially overlap each other when viewed in the traveling direction of the exposure light, and there is no gap between the two shutters.

  First, the closed shutter (shutter 34a) starts to move, and moves at an instructed moving speed in the opening direction (downward in the drawing). As a result, a gap is generated between the two shutters when viewed in the traveling direction of the exposure light, and the exposure light passes through the gap between the two shutters.

  Subsequently, as shown in FIG. 2 (b), when the gap between the two shutters reaches the designated width W, the opened shutter (shutter 34b) starts to move and instructs in the closing direction (downward in the drawing). Move at the specified movement speed. As shown in FIGS. 2B, 2C, and 2D, the two shutters move in the moving direction of the two shutters (downward in the drawing) while the gap between the two shutters is maintained at the designated width W. Move at the same speed as

  The closed shutter (shutter 34a) stops moving when it is fully opened as shown in FIG. 2 (d). On the other hand, the opened shutter (shutter 34b) stops moving when it is completely closed as shown in FIG. When the movement of the two shutters ends, the motor drive circuit 70 outputs an operation end signal to the control device 60.

  In the present embodiment, before the actual exposure process is started, the shutters 34a and 34b are experimentally operated to measure the amount of exposure light that has passed through the gap between the shutter 34a and the shutter 34b. Based on the measurement result, the width of the gap between the shutter 34a and the shutter 34b or the moving speed of both shutters is adjusted.

  In FIG. 1, the integrated illuminometer 50 measures the amount of exposure light that has passed through the gap between the shutter 34 a and the shutter 34 b, and outputs the measurement result to the control device 60. The control device 60 compares the measurement result of the integrated illuminometer 50 with the amount of exposure light necessary for exposure of the substrate 1 input to the input / output device 40, and determines whether or not the amount of exposure light is appropriate.

  When determining that the amount of exposure light is not appropriate, the control device 60 changes the width of the gap between the shutter 34a and the shutter 34b or the moving speed of both shutters based on the comparison result. Then, a new operation instruction signal is output to the motor drive circuit 70, and the shutters 34a and 34b are operated again on a trial basis.

  When it is determined that the amount of exposure light is appropriate, the control device 60 displays the amount of exposure light on the input / output device 40 and starts actual exposure processing. The exposure apparatus exposes the substrate 1 with the exposure light that has passed through the gap between the shutter 34a and the shutter 34b.

  In the present embodiment, the amount of exposure light depends on the width of the gap between the shutter 34a and the shutter 34b and the moving speed of both shutters. Increasing the width of the gap between the shutter 34a and the shutter 34b or slowing the moving speed of both shutters increases the amount of exposure light. When the width of the gap between the shutter 34a and the shutter 34b is narrowed or the moving speed of both shutters is increased, the amount of exposure light decreases.

  According to the embodiment described above, the substrate 1 is exposed with the exposure light that has passed through the gap between the shutter 34a and the shutter 34b while keeping the gap between the shutter 34a and the shutter 34b at a predetermined width. With the configuration, the amount of exposure light can be controlled over a wide range and with high accuracy. In particular, when the amount of exposure light necessary for exposure is small, the amount of exposure light can be controlled with high accuracy without adversely affecting the illuminance distribution of the exposure light.

  Further, the amount of exposure light passing through the gap between the shutter 34a and the shutter 34b is measured, and the exposure light is adjusted by adjusting the width of the gap between the shutter 34a and the shutter 34b or the moving speed of both shutters based on the measurement result. Can be controlled with higher accuracy.

  By transferring the mask pattern to the substrate using the exposure apparatus or exposure method of the present invention, the amount of exposure light can be controlled over a wide range and with high accuracy, so the amount of exposure light required for exposure is small. In this case, exposure can be performed with a short exposure time without causing uneven exposure and also when the amount of exposure light necessary for exposure is large. Therefore, a high-quality substrate can be manufactured with a short tact time.

  For example, FIG. 3 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film formation step (step 101), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on a glass substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step 102), a photosensitive resin material (photoresist) is applied by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step 101). In the exposure step (step 103), the mask pattern is transferred to the photoresist film using a proximity exposure apparatus, a projection exposure apparatus, or the like. In the development step (step 104), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step 105), a portion of the thin film formed in the thin film formation process (step 101) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step 106), the photoresist film that has finished the role of the mask in the etching step (step 105) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the glass substrate.

  FIG. 4 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step 201), a black matrix is formed on the glass substrate by processes such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step 202), a colored pattern is formed on the glass substrate by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step 203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step 204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 3, in the exposure process (step 103), in the color filter substrate manufacturing process shown in FIG. 4, in the black matrix forming process (step 201) and the colored pattern forming process (step 202). In this exposure process, the exposure apparatus or the exposure method of the present invention can be applied.

1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention. It is a figure explaining operation | movement of a shutter. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate 2 Mask 3 Base 4 X guide 5 X stage 6 Y guide 7 Y stage 8 θ stage 9 Z-tilt mechanism 10 Chuck 20 Mask holder 30 Exposure light irradiation device 31 Lamp 32 Condensing mirror 33 First plane mirror 34a, 34b Shutter 35 Lens 36 Second plane mirror 37a, 37b Motor 40 Input / output device 50 Integrated illuminance meter 60 Controller 70 Motor drive circuit

Claims (6)

A light source that generates exposure light;
A first shutter that blocks exposure light generated by the light source;
A first motor that moves the first shutter;
A second shutter provided in parallel with the first shutter;
A second motor for moving the second shutter;
Control means for instructing the width of the gap between the first shutter and the second shutter and the moving speed of both shutters;
The first motor and the second motor are driven in accordance with instructions from the control means, and both the motors are synchronously controlled to keep the gap between the first shutter and the second shutter at a predetermined width. Driving means,
An exposure apparatus that exposes a substrate with exposure light that has passed through a gap between the first shutter and the second shutter. Measuring means for measuring the amount of exposure light that has passed through the gap between the first shutter and the second shutter;
2. The control unit according to claim 1, wherein the control unit adjusts a width of a gap between the first shutter and the second shutter or a moving speed of both shutters based on a measurement result of the measurement unit. Exposure device. The first shutter and the second shutter are provided in parallel,
Determine the width of the gap between the first shutter and the second shutter and the moving speed of both shutters;
The first motor that moves the first shutter and the second motor that moves the second shutter are controlled synchronously, and the gap between the first shutter and the second shutter is kept at a predetermined width. ,
An exposure method comprising exposing a substrate with exposure light that has passed through a gap between a first shutter and a second shutter. Measure the amount of exposure light that has passed through the gap between the first shutter and the second shutter;
4. The exposure method according to claim 3, wherein the width of the gap between the first shutter and the second shutter or the moving speed of both shutters is adjusted based on the measurement result.   A method for producing a display panel substrate, comprising: transferring a mask pattern onto the substrate using the exposure apparatus according to claim 1.   5. A method for producing a display panel substrate, wherein a mask pattern is transferred to a substrate using the exposure method according to claim 3.

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