JP2008056955A - 炭素膜形成方法 - Google Patents

炭素膜形成方法 Download PDF

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Publication number
JP2008056955A
JP2008056955A JP2006232577A JP2006232577A JP2008056955A JP 2008056955 A JP2008056955 A JP 2008056955A JP 2006232577 A JP2006232577 A JP 2006232577A JP 2006232577 A JP2006232577 A JP 2006232577A JP 2008056955 A JP2008056955 A JP 2008056955A
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JP
Japan
Prior art keywords
carbon film
carbon
substrate
plasma
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006232577A
Other languages
English (en)
Japanese (ja)
Inventor
Masayoshi Umeno
正義 梅野
Yashichi Kawahara
弥七 河原
Haruhisa Ota
晴久 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil Corp filed Critical Nippon Oil Corp
Priority to JP2006232577A priority Critical patent/JP2008056955A/ja
Priority to PCT/JP2007/064176 priority patent/WO2008026395A1/fr
Publication of JP2008056955A publication Critical patent/JP2008056955A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2006232577A 2006-08-29 2006-08-29 炭素膜形成方法 Pending JP2008056955A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006232577A JP2008056955A (ja) 2006-08-29 2006-08-29 炭素膜形成方法
PCT/JP2007/064176 WO2008026395A1 (fr) 2006-08-29 2007-07-18 Procédé de formation de film carbone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006232577A JP2008056955A (ja) 2006-08-29 2006-08-29 炭素膜形成方法

Publications (1)

Publication Number Publication Date
JP2008056955A true JP2008056955A (ja) 2008-03-13

Family

ID=39135682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006232577A Pending JP2008056955A (ja) 2006-08-29 2006-08-29 炭素膜形成方法

Country Status (2)

Country Link
JP (1) JP2008056955A (fr)
WO (1) WO2008026395A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008201982A (ja) * 2007-02-22 2008-09-04 Idemitsu Kosan Co Ltd 多環脂環式化合物を前駆体物質とする薄膜、及びその製造方法
JP2008229968A (ja) * 2007-03-19 2008-10-02 Mitsubishi Plastics Ind Ltd ダイヤモンドライクカーボン膜コーティングガスバリア性フィルム
JP2009280876A (ja) * 2008-05-23 2009-12-03 Masayoshi Umeno 炭素膜形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62103367A (ja) * 1985-10-28 1987-05-13 Nippon Telegr & Teleph Corp <Ntt> 炭素膜の合成方法
JP2646439B2 (ja) * 1988-07-13 1997-08-27 富士通株式会社 ダイヤモンドの気相合成方法および装置
JPH02138469A (ja) * 1988-11-16 1990-05-28 Hitachi Ltd ダイアモンド表面を有する真空用材料、この真空用材料の表面処理法、ダイアモンド膜表面の作製法、真空用材料を用いた真空容器とその部品，真空内駆動機構，電子放出源，真空内ヒータおよび蒸着源容器
JPH0437616A (ja) * 1990-06-01 1992-02-07 Canon Inc 光学素子成形用型及びその製造方法
JPH06157193A (ja) * 1992-11-25 1994-06-03 Semiconductor Energy Lab Co Ltd 炭素膜形成方法
ZA954295B (en) * 1994-06-03 1996-11-25 Mobil Oil Corp Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008201982A (ja) * 2007-02-22 2008-09-04 Idemitsu Kosan Co Ltd 多環脂環式化合物を前駆体物質とする薄膜、及びその製造方法
JP2008229968A (ja) * 2007-03-19 2008-10-02 Mitsubishi Plastics Ind Ltd ダイヤモンドライクカーボン膜コーティングガスバリア性フィルム
JP2009280876A (ja) * 2008-05-23 2009-12-03 Masayoshi Umeno 炭素膜形成方法

Also Published As

Publication number Publication date
WO2008026395A1 (fr) 2008-03-06

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