JP2008046641A5 - - Google Patents

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Publication number
JP2008046641A5
JP2008046641A5 JP2007211846A JP2007211846A JP2008046641A5 JP 2008046641 A5 JP2008046641 A5 JP 2008046641A5 JP 2007211846 A JP2007211846 A JP 2007211846A JP 2007211846 A JP2007211846 A JP 2007211846A JP 2008046641 A5 JP2008046641 A5 JP 2008046641A5
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JP
Japan
Prior art keywords
lens
projection objective
crystal
members
orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007211846A
Other languages
English (en)
Japanese (ja)
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JP5317156B2 (ja
JP2008046641A (ja
Filing date
Publication date
Priority claimed from DE102006038398A external-priority patent/DE102006038398A1/de
Application filed filed Critical
Publication of JP2008046641A publication Critical patent/JP2008046641A/ja
Publication of JP2008046641A5 publication Critical patent/JP2008046641A5/ja
Application granted granted Critical
Publication of JP5317156B2 publication Critical patent/JP5317156B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007211846A 2006-08-15 2007-08-15 マイクロリソグラフィ投影露光装置の投影対物レンズ Expired - Fee Related JP5317156B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US82242706P 2006-08-15 2006-08-15
DE102006038398A DE102006038398A1 (de) 2006-08-15 2006-08-15 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
US60/822427 2006-08-15
DE102006038398.2 2006-08-15

Publications (3)

Publication Number Publication Date
JP2008046641A JP2008046641A (ja) 2008-02-28
JP2008046641A5 true JP2008046641A5 (https=) 2010-09-30
JP5317156B2 JP5317156B2 (ja) 2013-10-16

Family

ID=38954802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007211846A Expired - Fee Related JP5317156B2 (ja) 2006-08-15 2007-08-15 マイクロリソグラフィ投影露光装置の投影対物レンズ

Country Status (8)

Country Link
US (1) US7679831B2 (https=)
EP (1) EP1890193B1 (https=)
JP (1) JP5317156B2 (https=)
KR (1) KR101388297B1 (https=)
CN (1) CN101126907B (https=)
AT (1) ATE486302T1 (https=)
DE (2) DE102006038398A1 (https=)
TW (1) TWI425245B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008087827A1 (ja) * 2007-01-16 2008-07-24 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
JP2008216498A (ja) 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) * 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009086038A (ja) * 2007-09-27 2009-04-23 Canon Inc 投影光学系、露光装置及びデバイス製造方法
CN111302297A (zh) * 2020-02-17 2020-06-19 福建晶安光电有限公司 图形化镥铝石榴石晶片结构及其制备方法、包括该结构的发光装置封装件和投影仪

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2699706A (en) * 1949-11-08 1955-01-18 Boone Philip Ornamental object having birefringent and polarizing layers
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
DE60124524T2 (de) * 2000-04-25 2007-03-08 Asml Holding, N.V. Optisches reduktionssystem mit kontrolle der belichtungspolarisation
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
DE10133841A1 (de) * 2001-07-18 2003-02-06 Zeiss Carl Objektiv mit Kristall-Linsen
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US7075720B2 (en) 2002-08-22 2006-07-11 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in optical systems
US7239450B2 (en) * 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
JP2008532273A (ja) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト マイクロ・リソグラフィー投影露光装置のための光学システム
DE102006013560A1 (de) 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
DE102006025044A1 (de) 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

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