ATE486302T1 - Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage - Google Patents

Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Info

Publication number
ATE486302T1
ATE486302T1 AT07114145T AT07114145T ATE486302T1 AT E486302 T1 ATE486302 T1 AT E486302T1 AT 07114145 T AT07114145 T AT 07114145T AT 07114145 T AT07114145 T AT 07114145T AT E486302 T1 ATE486302 T1 AT E486302T1
Authority
AT
Austria
Prior art keywords
lens
lens elements
microlithographic
exposure system
optical axis
Prior art date
Application number
AT07114145T
Other languages
German (de)
English (en)
Inventor
Daniel Kraehmer
Johannes Ruoff
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Application granted granted Critical
Publication of ATE486302T1 publication Critical patent/ATE486302T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
AT07114145T 2006-08-15 2007-08-10 Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage ATE486302T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82242706P 2006-08-15 2006-08-15
DE102006038398A DE102006038398A1 (de) 2006-08-15 2006-08-15 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Publications (1)

Publication Number Publication Date
ATE486302T1 true ATE486302T1 (de) 2010-11-15

Family

ID=38954802

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07114145T ATE486302T1 (de) 2006-08-15 2007-08-10 Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Country Status (8)

Country Link
US (1) US7679831B2 (https=)
EP (1) EP1890193B1 (https=)
JP (1) JP5317156B2 (https=)
KR (1) KR101388297B1 (https=)
CN (1) CN101126907B (https=)
AT (1) ATE486302T1 (https=)
DE (2) DE102006038398A1 (https=)
TW (1) TWI425245B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008087827A1 (ja) * 2007-01-16 2008-07-24 Nikon Corporation 結像光学系、露光装置、およびデバイス製造方法
JP2008216498A (ja) 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) * 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009086038A (ja) * 2007-09-27 2009-04-23 Canon Inc 投影光学系、露光装置及びデバイス製造方法
CN111302297A (zh) * 2020-02-17 2020-06-19 福建晶安光电有限公司 图形化镥铝石榴石晶片结构及其制备方法、包括该结构的发光装置封装件和投影仪

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2699706A (en) * 1949-11-08 1955-01-18 Boone Philip Ornamental object having birefringent and polarizing layers
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
DE60124524T2 (de) * 2000-04-25 2007-03-08 Asml Holding, N.V. Optisches reduktionssystem mit kontrolle der belichtungspolarisation
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
DE10133841A1 (de) * 2001-07-18 2003-02-06 Zeiss Carl Objektiv mit Kristall-Linsen
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US7075720B2 (en) 2002-08-22 2006-07-11 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in optical systems
US7239450B2 (en) * 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
JP2008532273A (ja) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト マイクロ・リソグラフィー投影露光装置のための光学システム
DE102006013560A1 (de) 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
DE102006025044A1 (de) 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
TWI425245B (zh) 2014-02-01
DE102006038398A1 (de) 2008-02-21
KR20080015755A (ko) 2008-02-20
US20080043331A1 (en) 2008-02-21
KR101388297B1 (ko) 2014-04-22
CN101126907B (zh) 2013-06-12
US7679831B2 (en) 2010-03-16
JP5317156B2 (ja) 2013-10-16
CN101126907A (zh) 2008-02-20
DE602007010060D1 (de) 2010-12-09
EP1890193B1 (en) 2010-10-27
TW200831943A (en) 2008-08-01
JP2008046641A (ja) 2008-02-28
EP1890193A1 (en) 2008-02-20

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