JP2008034756A - 半導体装置、電子回路の製造方法および電子回路の製造装置 - Google Patents
半導体装置、電子回路の製造方法および電子回路の製造装置 Download PDFInfo
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- JP2008034756A JP2008034756A JP2006209144A JP2006209144A JP2008034756A JP 2008034756 A JP2008034756 A JP 2008034756A JP 2006209144 A JP2006209144 A JP 2006209144A JP 2006209144 A JP2006209144 A JP 2006209144A JP 2008034756 A JP2008034756 A JP 2008034756A
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Abstract
【解決手段】台21上にはんだ粒子11を層状に載置する第1の工程と、台21上に載置されたはんだ粒子11に、半導体チップ1のバンプ5を押し当てて、はんだ粒子11をバンプ5に圧着させる第2の工程と、バンプ5に圧着されたはんだ粒子11を用いて、半導体チップ1を回路基板4に接合する第3の工程とを含む。
【選択図】図1
Description
本発明の一実施形態について図1〜図3に基づいて説明すれば、以下の通りである。
V(20μm)/V(50μm)=((20/2)^3×25)/((50/2)^3×25)=2/5となる。
本発明の一実施形態について図4〜6に基づいて説明すれば、以下の通りである。
本発明の一実施形態について図7〜図8に基づいて説明すれば、以下の通りである。
本発明の一実施形態について図9〜図12に基づいて説明すれば、以下の通りである。
本発明の一実施形態について図13に基づいて説明すれば、以下の通りである。
本発明の一実施形態について図14に基づいて説明すれば、以下の通りである。
2 チップ状の電子部品(電子部品)
3 ウエハ
4、104 回路基板
5,105 バンプ(電極部、バンプ電極、電極形成面)
6,106 電極(電極部、電極形成面)
7 封止部
11、111 はんだ粒子
12 液体
13 フラックス
21 台21
31 押さえ板
32 加熱ツール(加熱部材)
41 圧着板(突起部、突起部を有する部材)
42 圧着棒(突起部、突起部を有する部材、棒状部材)
51 はんだ量検査ツール
114 アンダーフィル
Claims (25)
- はんだを用いて電子部品が回路基板上に接合される電子回路の製造方法であって、
台上にはんだ粒子を層状に載置する第1の工程と、
上記台上に載置されたはんだ粒子に、上記電子部品の電極部を押し当てて、はんだ粒子を該電極部に圧着させる第2の工程と、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合する第3の工程とを含むことを特徴とする電子回路の製造方法。 - 上記突起部が、上記電子部品のバンプ電極であることを特徴とする請求項1に記載の電子回路の製造方法。
- 上記電子部品の電極部が、該電極部の形成面において段差無く形成されており、
上記第2の工程では、
上記電子部品の電極形成面を上記台上のはんだ粒子に押し当てて、該電極形成面にはんだ粒子を仮圧着し、
さらに、上記電子部品の電極形成面を上記電子部品の電極部付近が凸に形成された押さえ板に押し付け、仮圧着されたはんだ粒子のうち電極部付近のはんだ粒子のみを本圧着させたのち、本圧着されなかったはんだ粒子を除去することを特徴とする請求項1に記載の電子回路の製造方法。 - 上記電子部品の電極部が、該電極部の形成面において段差無く形成されており、
上記第2の工程では、
上記電子部品の電極形成面を上記台上のはんだ粒子に押し当てて、該電極形成面にはんだ粒子を圧着し、
さらに、上記電子部品の電極部付近以外に圧着されたはんだ粒子に加熱部材を押し当てながら溶融されたはんだを押し広げることによって、電極部以外に圧着されたはんだ粒子を除去することを特徴とする請求項1に記載の電子回路の製造方法。 - はんだを用いて電子部品が回路基板上に接合される電子回路の製造方法であって、
台上にはんだ粒子を層状に載置する第1の工程と、
上記台上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記突起部に圧着させる第4の工程と、
上記突起部に圧着されたはんだ粒子を、上記電子部品または上記回路基板の電極部に転写する第5の工程と、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合する第3の工程とを含むことを特徴とする電子回路の製造方法。 - 上記突起部を有する部材は、上記第5の工程ではんだ粒子が転写される電極部のパターンと同様の凹凸パターンが形成されたものであることを特徴とする請求項5に記載の電子回路の製造方法。
- 上記突起部を有する部材は、その先端面積が上記電極部程度の棒状部材であり、
上記第4および第5の工程は、上記棒状部材の先端に圧着されたはんだ粒子を、上記電極部に転写することを複数回繰り返すことによって実施されることを特徴とする請求項5に記載の電子回路の製造方法。 - 上記第5の工程では、上記突起部に圧着されたはんだ粒子を溶融させて上記電極部に転写することを特徴とする請求項5に記載の電子回路の製造方法。
- 上記第1の工程では、
上記台上に液体を均一に塗布した上から、上記液体に付着するよりも多くのはんだ粒子を載置し、上記液体に付着しなかったはんだ粒子を台上から取り除くことによって均一なはんだ粒子の層を形成することを特徴とする請求項1または5に記載の電子回路の製造方法。 - 上記液体の塗布厚を、上記はんだ粒子の直径以下の厚さとすることを特徴とする請求項9に記載の電子回路の製造方法。
- はんだを用いて電子部品が回路基板上に接合される電子回路の製造方法であって、
上記回路基板上にはんだ粒子を層状に載置する第6の工程と、
上記回路基板上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記回路基板の電極部に圧着させる第7の工程と、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合する第3の工程とを含むことを特徴とする電子回路の製造方法。 - 上記突起部を有する部材は、上記回路基板の電極部のパターンと同様の凹凸パターンが形成されたものであることを特徴とする請求項11に記載の電子回路の製造方法。
- 上記突起部を有する部材は、その先端面積が上記電極部程度の棒状部材であり、
上記第7の工程は、上記棒状部材を押し当てて該はんだ粒子を上記回路基板の電極部に圧着させることを複数回繰り返すことによって実施されることを特徴とする請求項11に記載の電子回路の製造方法。 - 上記突起部を有する部材は、バンプ電極を有する電子部品であることを特徴とする請求項11に記載の電子回路の製造方法。
- 上記第6の工程では、
上記回路基板上に液体を均一に塗布した上から、上記液体に付着するよりも多くのはんだ粒子を載置し、上記液体に付着しなかったはんだ粒子を回路基板上から取り除くことによって均一なはんだ粒子の層を形成することを特徴とする請求項11に記載の電子回路の製造方法。 - 上記液体の塗布厚を、上記はんだ粒子の直径以下の厚さとすることを特徴とする請求項15に記載の電子回路の製造方法。
- 上記第2の工程後、かつ上記第3の工程前に、
上記電子部品の電極部に圧着されたはんだ粒子の不足を検出し、はんだ粒子の不足が検出された電極部にはんだ粒子を供給する第8の工程を有し、
上記第8の工程は、台上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記突起部に圧着させ、上記突起部に圧着されたはんだ粒子を、はんだ粒子の不足が検出された電極部に転写する工程であることを特徴とする請求項1に記載の電子回路の製造方法。 - 上記第5の工程後、かつ上記第3の工程前に、
上記電子部品または上記回路基板の電極部に圧着されたはんだ粒子の不足を検出し、はんだ粒子の不足が検出された電極部にはんだ粒子を供給する第8の工程を有し、
上記第8の工程は、台上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記突起部に圧着させ、上記突起部に圧着されたはんだ粒子を、はんだ粒子の不足が検出された電極部に転写する工程であることを特徴とする請求項5に記載の電子回路の製造方法。 - 上記第7の工程後、かつ上記第3の工程前に、
上記回路基板の電極部に圧着されたはんだ粒子の不足を検出し、はんだ粒子の不足が検出された電極部にはんだ粒子を供給する第8の工程を有し、
上記第8の工程は、台上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記突起部に圧着させ、上記突起部に圧着されたはんだ粒子を、はんだ粒子の不足が検出された電極部に転写する工程であることを特徴とする請求項11に記載の電子回路の製造方法。 - はんだを用いて電子部品が回路基板上に接合される電子回路の製造方法であって、
上記請求項1または5に記載の方法によって上記電子部品の電極部に付着されたはんだ粒子を溶融させて、上記電子部品の電極部をはんだでプリコートし、
上記請求項5または11に記載の方法によって上記回路基板の電極部に付着されたはんだ粒子を溶融させて、上記回路基板の電極部をはんだでプリコートし、
電極部がはんだでプリコートされた上記電子部品と上記回路基板とを対向させて接触させた状態で上記はんだを溶融させ、該はんだに作用する表面張力によって上記電子部品と上記回路基板とを位置合わせすることを特徴とする電子回路の製造方法。 - 半導体素子がはんだを用いて回路基板上に接合された半導体装置の製造方法であって、
上記半導体素子を上記回路基板に接合するにあたって、上記請求項1ないし20のいずれかに記載の電子回路の製造方法が用いられることを特徴とする電子回路の製造方法。 - 請求項1〜21のいずれか1項に記載の電子回路の製造方法によって製造されていることを特徴とする半導体装置。
- はんだを用いて電子部品が回路基板上に接合される電子回路の製造装置であって、
台上に層状に載置されたはんだ粒子に、上記電子部品の電極部を押し当てて、はんだ粒子を該電極部に圧着させ、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合することを特徴とする電子回路の製造装置。 - はんだを用いて電子部品が回路基板上に接合される電子回路の製造装置であって、
台上に層状に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記突起部に圧着させ、
上記突起部に圧着されたはんだ粒子を、上記電子部品または上記回路基板の電極部に転写させ、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合することを特徴とする電子回路の製造装置。 - はんだを用いて電子部品が回路基板上に接合される電子回路の製造装置であって、
回路基板上にはんだ粒子を層状に載置し、
上記回路基板上に載置されたはんだ粒子に、突起部を有する部材を押し当てて、該はんだ粒子を上記回路基板の電極部に圧着させ、
上記電極部に圧着されたはんだ粒子を用いて、上記電子部品を上記回路基板に接合することを特徴とする電子回路の製造装置。
Priority Applications (3)
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JP2006209144A JP4156637B2 (ja) | 2006-07-31 | 2006-07-31 | 半導体装置、電子回路の製造方法および電子回路の製造装置 |
PCT/JP2007/062596 WO2008015853A1 (en) | 2006-07-31 | 2007-06-22 | Semiconductor device, and process and apparatus for manufacturing of electronic circuit |
TW096124357A TW200822252A (en) | 2006-07-31 | 2007-07-04 | Semiconductor apparatus, method for producing electronic circuit, and apparatus for producing electronic circuit |
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WO2016104459A1 (ja) * | 2014-12-26 | 2016-06-30 | 千住金属工業株式会社 | はんだ転写シート、はんだバンプ及びはんだ転写シートを用いたはんだプリコート方法 |
US9865565B2 (en) | 2015-12-08 | 2018-01-09 | Amkor Technology, Inc. | Transient interface gradient bonding for metal bonds |
US10037957B2 (en) | 2016-11-14 | 2018-07-31 | Amkor Technology, Inc. | Semiconductor device and method of manufacturing thereof |
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DE102014109766B3 (de) * | 2014-07-11 | 2015-04-02 | Heraeus Deutschland GmbH & Co. KG | Verfahren zum Herstellen eines Substratadapters, Substratadapter und Verfahren zum Kontaktieren eines Halbleiterelements |
EP3113215A1 (en) * | 2015-06-30 | 2017-01-04 | IMEC vzw | Method and device for inspection of a semiconductor device |
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JPH0696826A (ja) * | 1992-09-11 | 1994-04-08 | Ricoh Co Ltd | 電気回路部品の製造方法 |
JP3264072B2 (ja) * | 1994-01-20 | 2002-03-11 | 三菱電機株式会社 | 電子部品およびその製造方法 |
JPH08153956A (ja) * | 1994-11-30 | 1996-06-11 | Sanyo Electric Co Ltd | プリント基板への半田供給方法及び装置 |
JP3822834B2 (ja) * | 2002-04-12 | 2006-09-20 | 新日本製鐵株式会社 | リペア方法及び装置 |
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- 2006-07-31 JP JP2006209144A patent/JP4156637B2/ja not_active Expired - Fee Related
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2007
- 2007-06-22 WO PCT/JP2007/062596 patent/WO2008015853A1/ja active Application Filing
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WO2016104459A1 (ja) * | 2014-12-26 | 2016-06-30 | 千住金属工業株式会社 | はんだ転写シート、はんだバンプ及びはんだ転写シートを用いたはんだプリコート方法 |
JP2016127074A (ja) * | 2014-12-26 | 2016-07-11 | 千住金属工業株式会社 | はんだ転写シート、はんだバンプ及びはんだ転写シートを用いたはんだプリコート方法 |
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TWI622146B (zh) * | 2014-12-26 | 2018-04-21 | 千住金屬工業股份有限公司 | Solder transfer sheet, solder bump, and solder pre-coating method using solder transfer sheet |
US10111342B2 (en) | 2014-12-26 | 2018-10-23 | Senju Metal Industry Co., Ltd. | Solder transfer sheet, solder bump, and solder precoating method using solder transfer sheet |
US9865565B2 (en) | 2015-12-08 | 2018-01-09 | Amkor Technology, Inc. | Transient interface gradient bonding for metal bonds |
KR102061420B1 (ko) * | 2015-12-08 | 2019-12-31 | 앰코 테크놀로지 인코포레이티드 | 금속 본드를 위한 임시적 인터페이스 그래디언트 본딩 |
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Also Published As
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JP4156637B2 (ja) | 2008-09-24 |
TW200822252A (en) | 2008-05-16 |
WO2008015853A1 (en) | 2008-02-07 |
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