JP2007525701A5 - - Google Patents
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- Publication number
- JP2007525701A5 JP2007525701A5 JP2006550023A JP2006550023A JP2007525701A5 JP 2007525701 A5 JP2007525701 A5 JP 2007525701A5 JP 2006550023 A JP2006550023 A JP 2006550023A JP 2006550023 A JP2006550023 A JP 2006550023A JP 2007525701 A5 JP2007525701 A5 JP 2007525701A5
- Authority
- JP
- Japan
- Prior art keywords
- lithographic printing
- radiation
- aryl
- alkyl
- single bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims 9
- 239000003999 initiator Substances 0.000 claims 7
- 230000005855 radiation Effects 0.000 claims 7
- 229910052799 carbon Inorganic materials 0.000 claims 6
- 125000004648 C2-C8 alkenyl group Chemical group 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 239000000178 monomer Substances 0.000 claims 3
- 125000004649 C2-C8 alkynyl group Chemical group 0.000 claims 2
- 125000001931 aliphatic group Chemical group 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000000623 heterocyclic group Chemical group 0.000 claims 2
- 150000004010 onium ions Chemical class 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 238000010526 radical polymerization reaction Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- -1 4-t-butylphenyl Chemical group 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 125000004958 1,4-naphthylene group Chemical group 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- 125000004204 2-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C(OC([H])([H])[H])C([H])=C1[H] 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102004003143A DE102004003143A1 (de) | 2004-01-21 | 2004-01-21 | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
| DE102004003143.6 | 2004-01-21 | ||
| PCT/EP2005/000489 WO2005071488A1 (en) | 2004-01-21 | 2005-01-19 | Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007525701A JP2007525701A (ja) | 2007-09-06 |
| JP2007525701A5 true JP2007525701A5 (enExample) | 2011-03-24 |
| JP4800972B2 JP4800972B2 (ja) | 2011-10-26 |
Family
ID=34800865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006550023A Expired - Fee Related JP4800972B2 (ja) | 2004-01-21 | 2005-01-19 | メルカプト官能化ラジカル重合可能モノマーを有する平版印刷版前駆体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7560221B2 (enExample) |
| EP (1) | EP1706790A1 (enExample) |
| JP (1) | JP4800972B2 (enExample) |
| CN (1) | CN1947061B (enExample) |
| DE (1) | DE102004003143A1 (enExample) |
| WO (1) | WO2005071488A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10356847B4 (de) * | 2003-12-05 | 2005-10-06 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| JP4411226B2 (ja) * | 2005-02-22 | 2010-02-10 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP2007086165A (ja) * | 2005-09-20 | 2007-04-05 | Fujifilm Corp | 感光性組成物、これを用いた平版印刷版原版及び画像記録方法 |
| CN100519691C (zh) * | 2006-09-29 | 2009-07-29 | 中国科学院长春应用化学研究所 | 近红外有机电致发光材料与器件及器件的制备方法 |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2196851A1 (en) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties |
| ATE555904T1 (de) | 2009-08-10 | 2012-05-15 | Eastman Kodak Co | Lithografische druckplattenvorläufer mit betahydroxy-alkylamid-vernetzern |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| JP5205505B2 (ja) * | 2010-12-28 | 2013-06-05 | 富士フイルム株式会社 | 平版印刷版原版及びその平版印刷方法 |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| EP3432070A4 (en) * | 2016-03-16 | 2019-09-25 | Toyobo Co., Ltd. | WATER DEVELOPABLE LIGHT-SENSITIVE RESIN COMPOSITION FOR FLEXO PRINTING AND LIGHT-SENSITIVATED RESIN PANEL FOR FLEXOGRAPHIC PREPARATION THEREOF |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2361769A1 (de) | 1973-12-12 | 1975-06-19 | Grace W R & Co | Ungesaettigte thiolverbindungen |
| DE3441787A1 (de) * | 1984-03-17 | 1985-09-19 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| US4604342A (en) * | 1984-03-17 | 1986-08-05 | E. I. Du Pont De Nemours And Company | Photopolymerizable mixture and recording material produced from it |
| JPS61172139A (ja) * | 1985-01-25 | 1986-08-02 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US5273862A (en) * | 1988-07-29 | 1993-12-28 | Hoechst Aktiengesellschaft | Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C. |
| US5514521A (en) * | 1990-08-22 | 1996-05-07 | Brother Kogyo Kabushiki Kaisha | Photocurable composition |
| JP3220498B2 (ja) * | 1992-03-06 | 2001-10-22 | 岡本化学工業株式会社 | 光重合性組成物 |
| US5695908A (en) * | 1994-12-27 | 1997-12-09 | Mitsubishi Paper Mills, Limited | Process for preparing printing plate |
| US5629354A (en) * | 1995-02-28 | 1997-05-13 | Eastman Kodak Company | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator |
| US5919600A (en) * | 1997-09-03 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Thermal waterless lithographic printing plate |
| JPH11116900A (ja) * | 1997-10-21 | 1999-04-27 | Tokuyama Corp | 接着性組成物 |
| CN1332266C (zh) * | 1999-03-03 | 2007-08-15 | 日立化成工业株式会社 | 光敏树脂组合物、使用光敏树脂组合物的感光性元件、蚀刻图形的制法及印刷线路板的制法 |
| JP4037015B2 (ja) * | 1999-09-22 | 2008-01-23 | 富士フイルム株式会社 | 光重合性組成物、画像形成材料及び平版印刷版用版材 |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
| US6309792B1 (en) * | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| US6884568B2 (en) * | 2000-10-17 | 2005-04-26 | Kodak Polychrome Graphics, Llc | Stabilized infrared-sensitive polymerizable systems |
-
2004
- 2004-01-21 DE DE102004003143A patent/DE102004003143A1/de not_active Withdrawn
-
2005
- 2005-01-19 JP JP2006550023A patent/JP4800972B2/ja not_active Expired - Fee Related
- 2005-01-19 US US10/586,509 patent/US7560221B2/en not_active Expired - Fee Related
- 2005-01-19 CN CN2005800026922A patent/CN1947061B/zh not_active Expired - Lifetime
- 2005-01-19 WO PCT/EP2005/000489 patent/WO2005071488A1/en not_active Ceased
- 2005-01-19 EP EP05701043A patent/EP1706790A1/en not_active Withdrawn
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