JP2007515689A - 交互の多層スタックを持つ２次元回折格子ネットワーク、その製法そしてそれらのネットワークを備える分光器 - Google Patents

交互の多層スタックを持つ２次元回折格子ネットワーク、その製法そしてそれらのネットワークを備える分光器 Download PDF

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JP2007515689A
JP2007515689A JP2006546289A JP2006546289A JP2007515689A JP 2007515689 A JP2007515689 A JP 2007515689A JP 2006546289 A JP2006546289 A JP 2006546289A JP 2006546289 A JP2006546289 A JP 2006546289A JP 2007515689 A JP2007515689 A JP 2007515689A
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grating
period
diffraction grating
stack
substrate
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Japanese (ja)
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フランソワ ポラック
ムーラ イディール
エリック ジュルデン
オードレ リヤール−クルー
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オリバ ジョビン イボン エス． アー． エス．
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2006546289A 2003-12-23 2004-12-23 交互の多層スタックを持つ２次元回折格子ネットワーク、その製法そしてそれらのネットワークを備える分光器 Pending JP2007515689A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0351192A FR2864252B1 (fr) 2003-12-23 2003-12-23 Reseau de diffraction a empilements multicouches alternes et son procede de fabrication et dispositifs spectroscopiques comportant ces reseaux
PCT/FR2004/050755 WO2005064364A1 (fr) 2003-12-23 2004-12-23 Reseau de diffraction bidimensionnel a empilements multicouches alternes et son procede de fabrication et dispositifs spectroscopiques comportant ces reseaux

Publications (1)

Publication Number Publication Date
JP2007515689A true JP2007515689A (ja) 2007-06-14

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JP2006546289A Pending JP2007515689A (ja) 2003-12-23 2004-12-23 交互の多層スタックを持つ２次元回折格子ネットワーク、その製法そしてそれらのネットワークを備える分光器

Country Status (6)

Country Link
US (1) US20050270647A1 (fr)
EP (1) EP1700141B8 (fr)
JP (1) JP2007515689A (fr)
DK (1) DK1700141T3 (fr)
FR (1) FR2864252B1 (fr)
WO (1) WO2005064364A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011145657A (ja) * 2009-12-18 2011-07-28 Nikon Corp 構造色発色体及びこれを用いたカメラ
JP2017096921A (ja) * 2015-09-29 2017-06-01 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングＤｒ． Ｊｏｈａｎｎｅｓ Ｈｅｉｄｅｎｈａｉｎ Ｇｅｓｅｌｌｓｃｈａｆｔ Ｍｉｔ Ｂｅｓｃｈｒａｎｋｔｅｒ Ｈａｆｔｕｎｇ 光学層システム
JP2021110838A (ja) * 2020-01-10 2021-08-02 株式会社日立エルジーデータストレージ 画像表示素子および装置

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010003446A1 (de) * 2010-03-30 2011-02-24 Carl Zeiss Smt Gmbh Reflektives optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102010017426A1 (de) 2010-06-17 2011-12-22 Karlsruher Institut für Technologie Gitter aus mindestens zwei Materialien für die Röntgenbildgebung
US8937717B2 (en) 2012-09-24 2015-01-20 Tornado Medical Systems, Inc. Multi-function spectrometer-on-chip with a single detector array
US10679762B2 (en) 2016-06-08 2020-06-09 Koninklijke Philips N.V. Analyzing grid for phase contrast imaging and/or dark-field imaging
CN109545179B (zh) * 2018-12-29 2022-02-15 江西师范大学 一种基于耐火材料的超宽带近完美光吸收体
TWI831898B (zh) * 2019-01-15 2024-02-11 德商卡爾蔡司Ｓｍｔ有限公司 藉由破壞性干涉抑制至少一目標波長的光學繞射元件
CN111324019B (zh) * 2020-02-25 2022-11-29 上海华力集成电路制造有限公司 一种同时获得多层间套刻精度的量测标识及量测方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306616A (ja) * 1993-04-21 1994-11-01 Asahi Glass Co Ltd 半導体素子の製造方法
JPH09304611A (ja) * 1996-05-09 1997-11-28 Oki Electric Ind Co Ltd 屈折率多次元周期構造の作製方法
JP2000292617A (ja) * 1999-04-06 2000-10-20 Nec Corp ホログラム素子
JP2002162513A (ja) * 2000-11-24 2002-06-07 Minolta Co Ltd 回折光学素子
JP2003114402A (ja) * 2001-10-02 2003-04-18 Sumitomo Electric Ind Ltd 光合分波器およびその調整方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798446A (en) * 1987-09-14 1989-01-17 The United States Of America As Represented By The United States Department Of Energy Aplanatic and quasi-aplanatic diffraction gratings
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
US5119231A (en) * 1990-06-15 1992-06-02 Honeywell Inc. Hybrid diffractive optical filter
US5958605A (en) * 1997-11-10 1999-09-28 Regents Of The University Of California Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306616A (ja) * 1993-04-21 1994-11-01 Asahi Glass Co Ltd 半導体素子の製造方法
JPH09304611A (ja) * 1996-05-09 1997-11-28 Oki Electric Ind Co Ltd 屈折率多次元周期構造の作製方法
JP2000292617A (ja) * 1999-04-06 2000-10-20 Nec Corp ホログラム素子
JP2002162513A (ja) * 2000-11-24 2002-06-07 Minolta Co Ltd 回折光学素子
JP2003114402A (ja) * 2001-10-02 2003-04-18 Sumitomo Electric Ind Ltd 光合分波器およびその調整方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011145657A (ja) * 2009-12-18 2011-07-28 Nikon Corp 構造色発色体及びこれを用いたカメラ
JP2017096921A (ja) * 2015-09-29 2017-06-01 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツングＤｒ． Ｊｏｈａｎｎｅｓ Ｈｅｉｄｅｎｈａｉｎ Ｇｅｓｅｌｌｓｃｈａｆｔ Ｍｉｔ Ｂｅｓｃｈｒａｎｋｔｅｒ Ｈａｆｔｕｎｇ 光学層システム
JP2021110838A (ja) * 2020-01-10 2021-08-02 株式会社日立エルジーデータストレージ 画像表示素子および装置
JP7341907B2 (ja) 2020-01-10 2023-09-11 株式会社日立エルジーデータストレージ 画像表示素子および装置

Also Published As

Publication number Publication date
DK1700141T3 (da) 2011-09-19
WO2005064364A1 (fr) 2005-07-14
EP1700141B8 (fr) 2011-10-05
EP1700141B1 (fr) 2011-06-15
US20050270647A1 (en) 2005-12-08
FR2864252A1 (fr) 2005-06-24
FR2864252B1 (fr) 2006-04-07
EP1700141A1 (fr) 2006-09-13

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