DK1700141T3 - Todimensionalt brydningsgitter til alternerende flerlagsstabling og spektro-skopisk apparat med dette gitter - Google Patents

Todimensionalt brydningsgitter til alternerende flerlagsstabling og spektro-skopisk apparat med dette gitter

Info

Publication number
DK1700141T3
DK1700141T3 DK04816602.9T DK04816602T DK1700141T3 DK 1700141 T3 DK1700141 T3 DK 1700141T3 DK 04816602 T DK04816602 T DK 04816602T DK 1700141 T3 DK1700141 T3 DK 1700141T3
Authority
DK
Denmark
Prior art keywords
grating
dimensional refractive
spectroscopic apparatus
multilayer stacking
alternating multilayer
Prior art date
Application number
DK04816602.9T
Other languages
English (en)
Inventor
Francois Polack
Mourad Idir
Erick Jourdain
Audrey Liard-Cloup
Original Assignee
Horiba Jobin Yvon Sas
Synchrotron Soleil
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Jobin Yvon Sas, Synchrotron Soleil filed Critical Horiba Jobin Yvon Sas
Application granted granted Critical
Publication of DK1700141T3 publication Critical patent/DK1700141T3/da

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Optical Elements Other Than Lenses (AREA)
DK04816602.9T 2003-12-23 2004-12-23 Todimensionalt brydningsgitter til alternerende flerlagsstabling og spektro-skopisk apparat med dette gitter DK1700141T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0351192A FR2864252B1 (fr) 2003-12-23 2003-12-23 Reseau de diffraction a empilements multicouches alternes et son procede de fabrication et dispositifs spectroscopiques comportant ces reseaux
PCT/FR2004/050755 WO2005064364A1 (fr) 2003-12-23 2004-12-23 Reseau de diffraction bidimensionnel a empilements multicouches alternes et son procede de fabrication et dispositifs spectroscopiques comportant ces reseaux

Publications (1)

Publication Number Publication Date
DK1700141T3 true DK1700141T3 (da) 2011-09-19

Family

ID=34630637

Family Applications (1)

Application Number Title Priority Date Filing Date
DK04816602.9T DK1700141T3 (da) 2003-12-23 2004-12-23 Todimensionalt brydningsgitter til alternerende flerlagsstabling og spektro-skopisk apparat med dette gitter

Country Status (6)

Country Link
US (1) US20050270647A1 (da)
EP (1) EP1700141B8 (da)
JP (1) JP2007515689A (da)
DK (1) DK1700141T3 (da)
FR (1) FR2864252B1 (da)
WO (1) WO2005064364A1 (da)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5740937B2 (ja) * 2009-12-18 2015-07-01 株式会社ニコン 構造色発色体及びこれを用いたカメラ
DE102010003446A1 (de) * 2010-03-30 2011-02-24 Carl Zeiss Smt Gmbh Reflektives optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102010017426A1 (de) 2010-06-17 2011-12-22 Karlsruher Institut für Technologie Gitter aus mindestens zwei Materialien für die Röntgenbildgebung
US8937717B2 (en) 2012-09-24 2015-01-20 Tornado Medical Systems, Inc. Multi-function spectrometer-on-chip with a single detector array
DE102015218702A1 (de) * 2015-09-29 2017-03-30 Dr. Johannes Heidenhain Gmbh Optisches Schichtsystem
US10679762B2 (en) 2016-06-08 2020-06-09 Koninklijke Philips N.V. Analyzing grid for phase contrast imaging and/or dark-field imaging
CN109545179B (zh) * 2018-12-29 2022-02-15 江西师范大学 一种基于耐火材料的超宽带近完美光吸收体
TWI831898B (zh) * 2019-01-15 2024-02-11 德商卡爾蔡司Ｓｍｔ有限公司 藉由破壞性干涉抑制至少一目標波長的光學繞射元件
JP7341907B2 (ja) * 2020-01-10 2023-09-11 株式会社日立エルジーデータストレージ 画像表示素子および装置
CN111324019B (zh) * 2020-02-25 2022-11-29 上海华力集成电路制造有限公司 一种同时获得多层间套刻精度的量测标识及量测方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4798446A (en) * 1987-09-14 1989-01-17 The United States Of America As Represented By The United States Department Of Energy Aplanatic and quasi-aplanatic diffraction gratings
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
US5119231A (en) * 1990-06-15 1992-06-02 Honeywell Inc. Hybrid diffractive optical filter
JPH06306616A (ja) * 1993-04-21 1994-11-01 Asahi Glass Co Ltd 半導体素子の製造方法
JP3369399B2 (ja) * 1996-05-09 2003-01-20 沖電気工業株式会社 屈折率多次元周期構造の作製方法
US5958605A (en) * 1997-11-10 1999-09-28 Regents Of The University Of California Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography
JP3371846B2 (ja) * 1999-04-06 2003-01-27 日本電気株式会社 ホログラム素子
JP4359713B2 (ja) * 2000-11-24 2009-11-04 コニカミノルタホールディングス株式会社 回折光学素子
JP2003114402A (ja) * 2001-10-02 2003-04-18 Sumitomo Electric Ind Ltd 光合分波器およびその調整方法

Also Published As

Publication number Publication date
JP2007515689A (ja) 2007-06-14
WO2005064364A1 (fr) 2005-07-14
EP1700141B8 (fr) 2011-10-05
EP1700141B1 (fr) 2011-06-15
US20050270647A1 (en) 2005-12-08
FR2864252A1 (fr) 2005-06-24
FR2864252B1 (fr) 2006-04-07
EP1700141A1 (fr) 2006-09-13

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