JP2007506991A - シート材ウエブのための照射ステーション - Google Patents
シート材ウエブのための照射ステーション Download PDFInfo
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Liquid Crystal (AREA)
- Treatment Of Fiber Materials (AREA)
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
マスクテープ91及びシート材92のウエブに与えられた光学マークが位置合せされる。
2,5 マスクテープ
3,6 シート材
7 制御手段
11,41 放射源
12 フィルタ
13,16 支持装置
14 誘導レール
15 遮蔽版
17,47 張力印加装置
18 照射域
172,181,182,183,184,185 ローラー
173 調整ホイール
Claims (24)
- シート材(3,6)のウエブの1つまたはそれより多くの層における部分的にデザインが施された領域の作成のための、前記シート材(3,6)のウエブを照射するための1つまたはそれより多くの放射源(11,41)を有する、照射ステーション(1,4)において、前記照射ステーション(1,4)が様々な光学特性を示す部分的にデザインが施された領域を有するマスクテープ(2,5)を有し、前記照射ステーション(1,4)が前記マスクテープ(2,5)を誘導するため及び/または前記シート材(3,6)のウエブを誘導するための2つまたはそれより多くの誘導手段(181,182,183,184;461,462,82,83)を有し、前記誘導手段は前記1つまたはそれより多くの放射源(11,41)と前記シート材(3,6)のウエブの間の光路において前記マスクテープ(2,5)が照射域を通って誘導されるように配置され、前記照射ステーション(1,4)が前記シート材(3,6)のウエブの速度と同じ速度で前記マスクテープ(2,5)に前記照射域を通って進行させるための結合手段(182,183;7)を有することを特徴とする照射ステーション。
- 前記照射ステーション(4)が、照射が位置合せされて行われるような態様で前記シート材(6)のウエブに対して前記マスクテープ(5)の位置を調節する、目合せシステム(7,75,76,71)を有することを特徴とする請求項1に記載の照射ステーション。
- 前記照射ステーション(1,4)が前記マスクテープ(2,5)に張力をかけるための張力印加装置(17,47)を有することを特徴とする請求項1または2に記載の照射ステーション。
- 前記結合手段が少なくとも1つのローラー(182,183)の形態にあり、前記マスクテープ(2)が前記シート材(3)のウエブとともに進行させられるように、前記少なくとも1つのローラー(182,183)を通って前記シート材(3)のウエブ及び前記マスクテープ(2)が重畳関係で誘導されることを特徴とする請求項1から3のいずれかに記載の照射ステーション。
- 前記結合手段が、前記シート材(3)のウエブ及び前記マスクテープ(2)を誘導するための前記照射域の両側に配置された2つのローラー(182,183)及び前記マスクテープを誘導するため及び前記マスクテープ(2)と前記シート材(3)のウエブの間に接触圧を生じさせるための前記照射域の両側に配置された2つのローラー(181,184)を有することを特徴とする請求項4に記載の照射ステーション。
- 前記照射ステーション(4)が前記マスクテープ(5)を第1の速度で進行させるための駆動手段(71)を有し、前記結合手段が駆動システム(71)を調整する制御装置(7)の形態にあって、前記制御装置が前記第1の速度を前記シート材(6)のウエブの速度に同期化させることを特徴とする請求項1から3のいずれかに記載の照射ステーション。
- 前記マスクテープ(2,5)がエンドレスウエブであることを特徴とする請求項1から6のいずれかに記載の照射ステーション。
- 前記マスクテープが、前記マスクテープを供給する第1のリール(94)から前記マスクテープを受け取る第2のリール(95)に誘導される、有端ウエブ(91)であることを特徴とする請求項1から6に記載の照射ステーション。
- 前記マスクテープが1つまたはそれより多くのカスタム化パターン付領域を有することを特徴とする請求項1から8のいずれかに記載の照射ステーション。
- 前記マスクテープが書換可能なマスクテープであることを特徴とする請求項1から9のいずれかに記載の照射ステーション。
- 前記マスクテープ(2)が一回または数回反復されるパターン付領域(23,24,25,26)を有することを特徴とする請求項1から10のいずれかに記載の照射ステーション。
- 前記マスクテープが透過特性及び/または吸収特性及び/または反射特性を示す部分的にデザインが施された領域を有することを特徴とする請求項1から11のいずれかに記載の照射ステーション。
- 前記マスクテープが様々な光屈折率を示す部分的にデザインが施された領域を有することを特徴とする請求項1から12のいずれかに記載の照射ステーション。
- 前記マスクテープ(2)が様々な偏光特性を示す部分的にデザインが施された領域を有することを特徴とする請求項1から13のいずれかに記載の照射ステーション。
- 前記マスクテープが、入射光が偏光される偏光方向が連続的に変化する領域を有することを特徴とする請求項14に記載の照射ステーション。
- 前記マスクテープが、入射光が偏光される偏光方向が相異なる隣接領域を有することを特徴とする請求項14に記載の照射ステーション。
- 前記マスクテープが、入射光が偏光される領域及び前記入射光が偏光されない領域のそれぞれを隣接して有することを特徴とする請求項14に記載の照射ステーション。
- 前記照射ステーションが前記1つまたはそれより多くの放射源と前記マスクテープの間の光路に配置された、光フィルタ、特に、偏光子及び/またはバンドパスフィルタを有することを特徴とする請求項1から17のいずれかに記載の照射ステーション。
- 前記照射ステーション(1,4)が前記1つまたはそれより多くの放射源(11,41)と前記マスクテープ(2,5)の間の光路に配置されたコリメータ(13,42)を有することを特徴とする請求項1から18のいずれかに記載の照射ステーション。
- 前記放射源(11,41)が光源、特にUVランプであることを特徴とする請求項1から19のいずれかに記載の照射ステーション。
- 前記照射ステーションが、前記照射域にない前記シート材(3,6)のウエブの領域から前記放射源(11,41)の放射を遮蔽するような形につくられた遮蔽板(15,43,44)を有することを特徴とする請求項1から20のいずれかに記載の照射ステーション。
- 様々な光学特性を示す部分的にデザインが施された領域を有するセキュリティ素子において、前記光変化素子が請求項1から21のいずれかに記載の前記照明ステーションを用いて作成されることを特徴とするセキュリティ素子。
- 前記セキュリティ素子が、銀行券、クレジットカード等のための光セキュリティ素子であることを特徴とする請求項22に記載のセキュリティ素子。
- 前記セキュリティ素子がフィルムであることを特徴とする請求項22に記載のセキュリティ素子。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10330421A DE10330421A1 (de) | 2003-07-04 | 2003-07-04 | Belichtungsstation für Folienbahnen |
PCT/DE2004/001398 WO2005006075A1 (de) | 2003-07-04 | 2004-07-01 | Belichtungsstation für folienbahnen |
Publications (3)
Publication Number | Publication Date |
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JP2007506991A true JP2007506991A (ja) | 2007-03-22 |
JP2007506991A5 JP2007506991A5 (ja) | 2007-08-16 |
JP4566191B2 JP4566191B2 (ja) | 2010-10-20 |
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JP2006517950A Expired - Fee Related JP4566191B2 (ja) | 2003-07-04 | 2004-07-01 | シート材ウエブのための照射ステーション |
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US (1) | US7476493B2 (ja) |
EP (1) | EP1642169B1 (ja) |
JP (1) | JP4566191B2 (ja) |
KR (1) | KR101176085B1 (ja) |
CN (1) | CN100545744C (ja) |
AT (1) | ATE362621T1 (ja) |
DE (2) | DE10330421A1 (ja) |
ES (1) | ES2287738T3 (ja) |
MY (1) | MY141898A (ja) |
PL (1) | PL1642169T3 (ja) |
RU (1) | RU2355008C2 (ja) |
TW (1) | TW200528928A (ja) |
WO (1) | WO2005006075A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005215686A (ja) * | 2004-02-02 | 2005-08-11 | Lg Electron Inc | 露光装置 |
WO2011129369A1 (ja) * | 2010-04-13 | 2011-10-20 | 株式会社ニコン | 露光装置、基板処理装置及びデバイス製造方法 |
KR20170013844A (ko) * | 2015-07-28 | 2017-02-07 | 주식회사 엘지화학 | 포토마스크, 상기 포토마스크를 포함하는 적층체, 상기 포토마스크의 제조방법, 상기 포토마스크를 이용하는 패턴형성장치 및 상기 포토마스크를 이용하는 패턴형성방법 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102005029640A1 (de) * | 2005-06-25 | 2006-12-28 | Eforma | Verfahren und Vorrichtung zum Herstellen eines beliebigen Musters aus einer metallischen oder metallisierten Schicht auf einem Substrat |
DE102007044482A1 (de) | 2007-09-18 | 2009-03-19 | Giesecke & Devrient Gmbh | Sicherheitselement mit Tamper Evident-Effekt |
EP2469339B1 (en) * | 2010-12-21 | 2017-08-30 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN102323719B (zh) * | 2011-06-30 | 2014-09-03 | 丹阳博昱科技有限公司 | 一种连续曝光方法和装置 |
US20140054065A1 (en) * | 2012-08-21 | 2014-02-27 | Abner D. Joseph | Electrical circuit trace manufacturing for electro-chemical sensors |
DE102015100520A1 (de) * | 2015-01-14 | 2016-07-28 | Leonhard Kurz Stiftung & Co. Kg | Mehrschichtkörper und Verfahren zu dessen Herstellung |
CN116360219A (zh) * | 2021-12-21 | 2023-06-30 | 宁德时代新能源科技股份有限公司 | 曝光装置 |
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- 2004-07-01 RU RU2006103260/28A patent/RU2355008C2/ru not_active IP Right Cessation
- 2004-07-01 EP EP04738841A patent/EP1642169B1/de active Active
- 2004-07-01 US US10/562,418 patent/US7476493B2/en not_active Expired - Fee Related
- 2004-07-01 DE DE502004003844T patent/DE502004003844D1/de active Active
- 2004-07-01 AT AT04738841T patent/ATE362621T1/de active
- 2004-07-01 WO PCT/DE2004/001398 patent/WO2005006075A1/de active IP Right Grant
- 2004-07-01 KR KR1020067000087A patent/KR101176085B1/ko active IP Right Grant
- 2004-07-01 JP JP2006517950A patent/JP4566191B2/ja not_active Expired - Fee Related
- 2004-07-01 ES ES04738841T patent/ES2287738T3/es active Active
- 2004-07-01 PL PL04738841T patent/PL1642169T3/pl unknown
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005215686A (ja) * | 2004-02-02 | 2005-08-11 | Lg Electron Inc | 露光装置 |
WO2011129369A1 (ja) * | 2010-04-13 | 2011-10-20 | 株式会社ニコン | 露光装置、基板処理装置及びデバイス製造方法 |
JPWO2011129369A1 (ja) * | 2010-04-13 | 2013-07-18 | 株式会社ニコン | 露光装置、基板処理装置及びデバイス製造方法 |
KR20170013844A (ko) * | 2015-07-28 | 2017-02-07 | 주식회사 엘지화학 | 포토마스크, 상기 포토마스크를 포함하는 적층체, 상기 포토마스크의 제조방법, 상기 포토마스크를 이용하는 패턴형성장치 및 상기 포토마스크를 이용하는 패턴형성방법 |
JP2018525652A (ja) * | 2015-07-28 | 2018-09-06 | エルジー・ケム・リミテッド | フォトマスク、前記フォトマスクを含む積層体、前記フォトマスクの製造方法、前記フォトマスクを用いるパターン形成装置および前記フォトマスクを用いるパターン形成方法 |
KR102080963B1 (ko) * | 2015-07-28 | 2020-02-24 | 주식회사 엘지화학 | 포토마스크, 상기 포토마스크를 포함하는 적층체, 상기 포토마스크의 제조방법, 상기 포토마스크를 이용하는 패턴형성장치 및 상기 포토마스크를 이용하는 패턴형성방법 |
US10732500B2 (en) | 2015-07-28 | 2020-08-04 | Lg Chem, Ltd. | Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask |
Also Published As
Publication number | Publication date |
---|---|
RU2006103260A (ru) | 2006-06-10 |
US20070095465A1 (en) | 2007-05-03 |
ES2287738T3 (es) | 2007-12-16 |
KR101176085B1 (ko) | 2012-08-22 |
EP1642169B1 (de) | 2007-05-16 |
TW200528928A (en) | 2005-09-01 |
CN1816771A (zh) | 2006-08-09 |
DE502004003844D1 (de) | 2007-06-28 |
RU2355008C2 (ru) | 2009-05-10 |
ATE362621T1 (de) | 2007-06-15 |
KR20060036079A (ko) | 2006-04-27 |
CN100545744C (zh) | 2009-09-30 |
MY141898A (en) | 2010-07-16 |
DE10330421A1 (de) | 2005-02-03 |
WO2005006075A1 (de) | 2005-01-20 |
EP1642169A1 (de) | 2006-04-05 |
US7476493B2 (en) | 2009-01-13 |
JP4566191B2 (ja) | 2010-10-20 |
TWI368109B (ja) | 2012-07-11 |
PL1642169T3 (pl) | 2007-10-31 |
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