JP2007298944A5 - - Google Patents
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- Publication number
- JP2007298944A5 JP2007298944A5 JP2006341983A JP2006341983A JP2007298944A5 JP 2007298944 A5 JP2007298944 A5 JP 2007298944A5 JP 2006341983 A JP2006341983 A JP 2006341983A JP 2006341983 A JP2006341983 A JP 2006341983A JP 2007298944 A5 JP2007298944 A5 JP 2007298944A5
- Authority
- JP
- Japan
- Prior art keywords
- forming
- resolution pattern
- high resolution
- pattern according
- sacrificial film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 74
- 239000000463 material Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 11
- 239000010410 layer Substances 0.000 claims 9
- 230000007261 regionalization Effects 0.000 claims 5
- 239000000853 adhesive Substances 0.000 claims 4
- 230000001070 adhesive effect Effects 0.000 claims 4
- 229920000642 polymer Polymers 0.000 claims 4
- 238000007639 printing Methods 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 3
- 239000011241 protective layer Substances 0.000 claims 3
- 239000012790 adhesive layer Substances 0.000 claims 2
- 238000011109 contamination Methods 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229920006158 high molecular weight polymer Polymers 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 2
- 238000010884 ion-beam technique Methods 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 239000004094 surface-active agent Substances 0.000 claims 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims 1
- 239000004902 Softening Agent Substances 0.000 claims 1
- 239000006096 absorbing agent Substances 0.000 claims 1
- 239000013543 active substance Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 239000000356 contaminant Substances 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 230000002708 enhancing effect Effects 0.000 claims 1
- 238000005429 filling process Methods 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 238000007646 gravure printing Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000007644 letterpress printing Methods 0.000 claims 1
- 239000007791 liquid phase Substances 0.000 claims 1
- 238000007645 offset printing Methods 0.000 claims 1
- 238000007649 pad printing Methods 0.000 claims 1
- 239000012071 phase Substances 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 238000006552 photochemical reaction Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 claims 1
- 238000010022 rotary screen printing Methods 0.000 claims 1
- 238000007650 screen-printing Methods 0.000 claims 1
- 239000007790 solid phase Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000004528 spin coating Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2006-0039985 | 2006-05-03 | ||
| KR1020060039985A KR100690930B1 (ko) | 2006-05-03 | 2006-05-03 | 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007298944A JP2007298944A (ja) | 2007-11-15 |
| JP2007298944A5 true JP2007298944A5 (enExample) | 2009-11-05 |
| JP5289703B2 JP5289703B2 (ja) | 2013-09-11 |
Family
ID=38102672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006341983A Expired - Fee Related JP5289703B2 (ja) | 2006-05-03 | 2006-12-19 | 高解像度パターンの形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7517467B2 (enExample) |
| JP (1) | JP5289703B2 (enExample) |
| KR (1) | KR100690930B1 (enExample) |
| DE (1) | DE102006058559B4 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007084952A2 (en) * | 2006-01-18 | 2007-07-26 | Akrion Technologies, Inc. | Systems and methods for drying a rotating substrate |
| US8053168B2 (en) * | 2006-12-19 | 2011-11-08 | Palo Alto Research Center Incorporated | Printing plate and system using heat-decomposable polymers |
| JP4873160B2 (ja) * | 2007-02-08 | 2012-02-08 | トヨタ自動車株式会社 | 接合方法 |
| DE102007007183A1 (de) * | 2007-02-14 | 2008-08-21 | Man Roland Druckmaschinen Ag | Verfahren zur Herstellung von Druckformen |
| US20090107546A1 (en) * | 2007-10-29 | 2009-04-30 | Palo Alto Research Center Incorporated | Co-extruded compositions for high aspect ratio structures |
| US8013300B2 (en) * | 2008-06-20 | 2011-09-06 | Carl Zeiss Nts, Llc | Sample decontamination |
| US8200106B2 (en) * | 2009-06-11 | 2012-06-12 | Canon Kabushiki Kaisha | Image forming apparatus with image forming condition control feature based on difference in patch densities |
| KR100969172B1 (ko) * | 2009-06-22 | 2010-07-14 | 한국기계연구원 | 마스크 템플릿을 이용한 미세패턴 형성방법 |
| WO2011073258A1 (de) * | 2009-12-16 | 2011-06-23 | F. Hoffmann-La Roche Ag | Detektion der zersetzung von enzymen in einem testelement durch kontrollierte freisetzung von geschütztem analyt |
| JP6058640B2 (ja) * | 2011-05-23 | 2017-01-11 | オーエルイーディーワークス ゲーエムベーハーＯＬＥＤＷｏｒｋｓ ＧｍｂＨ | パターン化された層を製作するための製作装置 |
| GB2508915A (en) * | 2012-12-14 | 2014-06-18 | Mahle Int Gmbh | A thrust washer for a sliding bearing |
| CN105518065B (zh) | 2013-09-06 | 2020-03-10 | 索尔维特殊聚合物意大利有限公司 | 导电组件 |
| EP3195337A4 (en) * | 2014-08-01 | 2018-04-11 | Western Michigan University Research Foundation | Self-supported electronic devices |
| JP2017534479A (ja) | 2014-08-27 | 2017-11-24 | スリーエム イノベイティブ プロパティズ カンパニー | 電気多層積層転写フィルム |
| KR101654519B1 (ko) * | 2015-04-14 | 2016-09-06 | 서울대학교 산학협력단 | 나노스케일 3차원 구조 제작 장치 및 방법 |
| CA3001848C (en) * | 2015-10-15 | 2023-09-19 | Board Of Regents, The University Of Texas System | Versatile process for precision nanoscale manufacturing |
| EP3159740B1 (de) * | 2015-10-22 | 2018-08-01 | Flint Group Germany GmbH | Verfahren zu generativen herstellung von reliefdruckformen |
| JP6678430B2 (ja) * | 2015-11-06 | 2020-04-08 | 株式会社Ｎｂｃメッシュテック | スクリーン印刷による薄膜細線パターンの形成方法 |
| CN105293937A (zh) * | 2015-11-29 | 2016-02-03 | 杭州柳茶医药科技有限公司 | 一种防水玻璃及其制作工艺 |
| EP3417475B1 (en) * | 2016-02-15 | 2023-04-19 | Newport Corporation | Method of selectively varying the wetting characteristics of a surface |
| US10746612B2 (en) | 2016-11-30 | 2020-08-18 | The Board Of Trustees Of Western Michigan University | Metal-metal composite ink and methods for forming conductive patterns |
| KR102402471B1 (ko) * | 2020-12-22 | 2022-05-26 | 주식회사 셀코스 | 표면 코팅의 균일도 향상을 위한 코팅 방법 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991011307A1 (fr) | 1990-01-25 | 1991-08-08 | Dai Nippon Insatsu Kabushiki Kaisha | Procede et matiere pour former des films epais textures |
| US6756181B2 (en) * | 1993-06-25 | 2004-06-29 | Polyfibron Technologies, Inc. | Laser imaged printing plates |
| JPH0722732A (ja) * | 1993-06-30 | 1995-01-24 | Sumitomo Metal Ind Ltd | 微細配線の形成方法 |
| JPH0794848A (ja) * | 1993-09-27 | 1995-04-07 | Sumitomo Kinzoku Ceramics:Kk | 導体層パターンの形成方法 |
| US6074893A (en) * | 1993-09-27 | 2000-06-13 | Sumitomo Metal Industries, Ltd. | Process for forming fine thick-film conductor patterns |
| JP3971489B2 (ja) | 1997-08-26 | 2007-09-05 | 太陽インキ製造株式会社 | ガラスペースト組成物及びそれを用いたプラズマディスプレイパネルの背面板の製造方法 |
| JP3686749B2 (ja) | 1997-11-04 | 2005-08-24 | 太陽インキ製造株式会社 | パターン状無機質焼成被膜及びプラズマディスプレイパネルの製造方法 |
| DE69939514D1 (de) * | 1998-03-17 | 2008-10-23 | Seiko Epson Corp | Verfahren zur herstellung einer strukturierten dünnschichtvorrichtung |
| JPH11297213A (ja) * | 1998-04-09 | 1999-10-29 | Dainippon Printing Co Ltd | プラズマディスプレイパネル用蛍光面とその形成方法 |
| JP2000260309A (ja) * | 1999-03-05 | 2000-09-22 | Matsushita Electric Ind Co Ltd | ガス放電パネルの製造方法 |
| JP3982231B2 (ja) * | 2001-10-19 | 2007-09-26 | セイコーエプソン株式会社 | カラーフィルタの製造方法とカラーフィルタ及び液晶装置並びに電子機器 |
| JP2005285616A (ja) * | 2004-03-30 | 2005-10-13 | Seiko Epson Corp | 薄膜形成方法、電気光学装置の製造方法、カラーフィルタの製造方法および液滴吐出装置 |
| JP2006024695A (ja) * | 2004-07-07 | 2006-01-26 | Nec Lcd Technologies Ltd | ナノ粒子インクを用いた配線形成方法 |
| EP1796918A1 (en) * | 2004-09-03 | 2007-06-20 | Koninklijke Philips Electronics N.V. | Method and apparatus for application of a pattern, element and device provided with such a pattern |
| JP2006073450A (ja) * | 2004-09-06 | 2006-03-16 | Idemitsu Kosan Co Ltd | 色変換基板及びその製造方法並びに有機ｅｌ表示装置 |
| US8796583B2 (en) * | 2004-09-17 | 2014-08-05 | Eastman Kodak Company | Method of forming a structured surface using ablatable radiation sensitive material |
-
2006
- 2006-05-03 KR KR1020060039985A patent/KR100690930B1/ko active Active
- 2006-12-12 DE DE102006058559A patent/DE102006058559B4/de not_active Expired - Fee Related
- 2006-12-19 JP JP2006341983A patent/JP5289703B2/ja not_active Expired - Fee Related
- 2006-12-19 US US11/612,636 patent/US7517467B2/en not_active Expired - Fee Related
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