JP2007242994A5 - - Google Patents
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- Publication number
- JP2007242994A5 JP2007242994A5 JP2006065382A JP2006065382A JP2007242994A5 JP 2007242994 A5 JP2007242994 A5 JP 2007242994A5 JP 2006065382 A JP2006065382 A JP 2006065382A JP 2006065382 A JP2006065382 A JP 2006065382A JP 2007242994 A5 JP2007242994 A5 JP 2007242994A5
- Authority
- JP
- Japan
- Prior art keywords
- electric double
- current collector
- polarizable electrode
- double layer
- layer capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003990 capacitor Substances 0.000 claims description 39
- 239000008151 electrolyte solution Substances 0.000 claims description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 239000003792 electrolyte Substances 0.000 claims description 18
- 231100000078 corrosive Toxicity 0.000 claims description 16
- 231100001010 corrosive Toxicity 0.000 claims description 16
- 150000002500 ions Chemical class 0.000 claims description 16
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 238000005260 corrosion Methods 0.000 claims description 9
- 239000011230 binding agent Substances 0.000 claims description 6
- 239000006229 carbon black Substances 0.000 claims description 6
- 239000011888 foil Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 60
- 230000001629 suppression Effects 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 9
- RUOJZAUFBMNUDX-UHFFFAOYSA-N Propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 5
- -1 fluorine ions Chemical class 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 150000002822 niobium compounds Chemical class 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 150000003482 tantalum compounds Chemical class 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- AHJGWYVYYLJJFQ-UHFFFAOYSA-N 1,2,3-trimethylimidazol-1-ium;tetrafluoroborate Chemical compound F[B-](F)(F)F.CC=1N(C)C=C[N+]=1C AHJGWYVYYLJJFQ-UHFFFAOYSA-N 0.000 description 1
- FBPIPPWLOCMHGR-UHFFFAOYSA-N 1,3-dimethylimidazol-1-ium;tetrafluoroborate Chemical compound F[B-](F)(F)F.CN1C=C[N+](C)=C1 FBPIPPWLOCMHGR-UHFFFAOYSA-N 0.000 description 1
- HVVRUQBMAZRKPJ-UHFFFAOYSA-N 1,3-dimethylimidazolium Chemical compound CN1C=C[N+](C)=C1 HVVRUQBMAZRKPJ-UHFFFAOYSA-N 0.000 description 1
- KNIWGPCMWBGRBE-UHFFFAOYSA-N 1-ethyl-2,3-dimethylimidazol-3-ium;tetrafluoroborate Chemical compound F[B-](F)(F)F.CCN1C=C[N+](C)=C1C KNIWGPCMWBGRBE-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K AlF3 Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K [O-]P([O-])([O-])=O Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- MHCAFGMQMCSRGH-UHFFFAOYSA-N aluminum;hydrate Chemical compound O.[Al] MHCAFGMQMCSRGH-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N silicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- XJRAKUDXACGCHA-UHFFFAOYSA-N tetraethylazanium;tetrafluoroborate Chemical compound F[B-](F)(F)F.CC[N+](CC)(CC)CC XJRAKUDXACGCHA-UHFFFAOYSA-N 0.000 description 1
- ODGCEQLVLXJUCC-UHFFFAOYSA-N tetrafluoroborate Chemical compound F[B-](F)(F)F ODGCEQLVLXJUCC-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OHZMHURLSZDGTO-UHFFFAOYSA-N triethyl(methyl)azanium;tetrafluoroborate Chemical compound F[B-](F)(F)F.CC[N+](C)(CC)CC OHZMHURLSZDGTO-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006065382A JP2007242994A (ja) | 2006-03-10 | 2006-03-10 | 電気二重層キャパシタ |
| KR1020087014549A KR100994639B1 (ko) | 2006-02-16 | 2007-02-14 | 전기 이중층 캐패시터 |
| PCT/JP2007/052628 WO2007094366A1 (ja) | 2006-02-16 | 2007-02-14 | 電気二重層キャパシタ |
| CN200780005783.0A CN101385103B (zh) | 2006-02-16 | 2007-02-14 | 双电层电容器 |
| EP07714181.0A EP1962308B1 (de) | 2006-02-16 | 2007-02-14 | Elektrischer doppelschichtkondensator |
| US12/159,950 US7924548B2 (en) | 2006-02-16 | 2007-02-14 | Electric double layer capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006065382A JP2007242994A (ja) | 2006-03-10 | 2006-03-10 | 電気二重層キャパシタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007242994A JP2007242994A (ja) | 2007-09-20 |
| JP2007242994A5 true JP2007242994A5 (de) | 2008-11-27 |
Family
ID=38588225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006065382A Pending JP2007242994A (ja) | 2006-02-16 | 2006-03-10 | 電気二重層キャパシタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007242994A (de) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61203616A (ja) * | 1985-03-07 | 1986-09-09 | 松下電器産業株式会社 | 電気二重層コンデンサ |
| JP2006024727A (ja) * | 2004-07-08 | 2006-01-26 | Tdk Corp | 電気化学素子 |
-
2006
- 2006-03-10 JP JP2006065382A patent/JP2007242994A/ja active Pending
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