JP2007149203A - テクスチャ加工方法及び加工スラリー - Google Patents
テクスチャ加工方法及び加工スラリー Download PDFInfo
- Publication number
- JP2007149203A JP2007149203A JP2005341337A JP2005341337A JP2007149203A JP 2007149203 A JP2007149203 A JP 2007149203A JP 2005341337 A JP2005341337 A JP 2005341337A JP 2005341337 A JP2005341337 A JP 2005341337A JP 2007149203 A JP2007149203 A JP 2007149203A
- Authority
- JP
- Japan
- Prior art keywords
- cluster
- diamond
- range
- processing
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002002 slurry Substances 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000010432 diamond Substances 0.000 claims abstract description 218
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 205
- 239000000758 substrate Substances 0.000 claims abstract description 91
- 239000012535 impurity Substances 0.000 claims abstract description 60
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 48
- 239000000460 chlorine Substances 0.000 claims abstract description 30
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 29
- 239000002245 particle Substances 0.000 claims abstract description 25
- 239000002612 dispersion medium Substances 0.000 claims abstract description 14
- 239000011164 primary particle Substances 0.000 claims abstract description 8
- 238000012545 processing Methods 0.000 claims description 131
- 239000000654 additive Substances 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 230000000996 additive effect Effects 0.000 claims description 11
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 9
- 239000000194 fatty acid Substances 0.000 claims description 9
- 229930195729 fatty acid Natural products 0.000 claims description 9
- 150000004665 fatty acids Chemical class 0.000 claims description 9
- 239000000835 fiber Substances 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 7
- 239000004744 fabric Substances 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 150000002334 glycols Chemical class 0.000 claims description 4
- 239000004745 nonwoven fabric Substances 0.000 claims description 4
- 239000002759 woven fabric Substances 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 2
- 238000010306 acid treatment Methods 0.000 description 28
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 18
- 238000010298 pulverizing process Methods 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 15
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 13
- 239000002253 acid Substances 0.000 description 13
- 229910017604 nitric acid Inorganic materials 0.000 description 13
- 238000004880 explosion Methods 0.000 description 12
- -1 glycol compound Chemical class 0.000 description 12
- 230000003746 surface roughness Effects 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 229910002804 graphite Inorganic materials 0.000 description 8
- 239000010439 graphite Substances 0.000 description 8
- 238000000227 grinding Methods 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 238000000926 separation method Methods 0.000 description 8
- 239000003082 abrasive agent Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000011259 mixed solution Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- 239000002360 explosive Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000003672 processing method Methods 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-OUBTZVSYSA-N Carbon-13 Chemical compound [13C] OKTJSMMVPCPJKN-OUBTZVSYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- SPSSULHKWOKEEL-UHFFFAOYSA-N 2,4,6-trinitrotoluene Chemical compound CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O SPSSULHKWOKEEL-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000015 trinitrotoluene Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- LPMBTLLQQJBUOO-KTKRTIGZSA-N (z)-n,n-bis(2-hydroxyethyl)octadec-9-enamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)N(CCO)CCO LPMBTLLQQJBUOO-KTKRTIGZSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-NJFSPNSNSA-N Carbon-14 Chemical compound [14C] OKTJSMMVPCPJKN-NJFSPNSNSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AOMUHOFOVNGZAN-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)dodecanamide Chemical compound CCCCCCCCCCCC(=O)N(CCO)CCO AOMUHOFOVNGZAN-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N isopropyl alcohol Natural products CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229940031957 lauric acid diethanolamide Drugs 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000010299 mechanically pulverizing process Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- XGZOMURMPLSSKQ-UHFFFAOYSA-N n,n-bis(2-hydroxyethyl)octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)N(CCO)CCO XGZOMURMPLSSKQ-UHFFFAOYSA-N 0.000 description 1
- 239000002113 nanodiamond Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
- B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
- B24B21/12—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving a contact wheel or roller pressing the belt against the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005341337A JP2007149203A (ja) | 2005-11-28 | 2005-11-28 | テクスチャ加工方法及び加工スラリー |
| US11/605,497 US7374473B2 (en) | 2005-11-28 | 2006-11-27 | Texturing slurry and texturing method by using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005341337A JP2007149203A (ja) | 2005-11-28 | 2005-11-28 | テクスチャ加工方法及び加工スラリー |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007149203A true JP2007149203A (ja) | 2007-06-14 |
| JP2007149203A5 JP2007149203A5 (enExample) | 2009-01-22 |
Family
ID=38088139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005341337A Pending JP2007149203A (ja) | 2005-11-28 | 2005-11-28 | テクスチャ加工方法及び加工スラリー |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7374473B2 (enExample) |
| JP (1) | JP2007149203A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010080022A (ja) * | 2008-09-29 | 2010-04-08 | Showa Denko Kk | 垂直磁気記録媒体の製造方法 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4936424B2 (ja) * | 2005-10-31 | 2012-05-23 | 日本ミクロコーティング株式会社 | 研磨材及びその製造方法 |
| US10100266B2 (en) | 2006-01-12 | 2018-10-16 | The Board Of Trustees Of The University Of Arkansas | Dielectric nanolubricant compositions |
| JP5603013B2 (ja) | 2006-01-12 | 2014-10-08 | ザ ボード オブ トラスティーズ オブ ザ ユニバーシティ オブ アーカンソー | ナノ粒子組成物およびその製法並びに使用法 |
| JP5599547B2 (ja) * | 2006-12-01 | 2014-10-01 | Ｍｉｐｏｘ株式会社 | 硬質結晶基板研磨方法及び油性研磨スラリー |
| US9064836B1 (en) | 2010-08-09 | 2015-06-23 | Sandisk Semiconductor (Shanghai) Co., Ltd. | Extrinsic gettering on semiconductor devices |
| US8486870B1 (en) | 2012-07-02 | 2013-07-16 | Ajay P. Malshe | Textured surfaces to enhance nano-lubrication |
| US8476206B1 (en) | 2012-07-02 | 2013-07-02 | Ajay P. Malshe | Nanoparticle macro-compositions |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000136376A (ja) * | 1998-08-28 | 2000-05-16 | Hiroshi Ishizuka | ダイヤモンド研磨材粒子及びその製法 |
| JP2004259417A (ja) * | 2003-02-24 | 2004-09-16 | Nihon Micro Coating Co Ltd | 磁気ハードディスク基板及びその製造方法 |
| JP2005310324A (ja) * | 2004-04-26 | 2005-11-04 | Nihon Micro Coating Co Ltd | 垂直磁気記録ディスク用ガラス基板及びその製造方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4475981A (en) * | 1983-10-28 | 1984-10-09 | Ampex Corporation | Metal polishing composition and process |
| WO1993001129A1 (fr) * | 1991-07-03 | 1993-01-21 | Novosibirsky Zavod Iskusstvennogo Volokna | Composition au carbone et son procede d'obtention |
| US5207759A (en) * | 1991-09-20 | 1993-05-04 | Hmt Technology Corporation | Texturing slurry and method |
| RU2041165C1 (ru) * | 1993-02-12 | 1995-08-09 | Научно-производственное объединение "Алтай" | Алмазоуглеродное вещество и способ его получения |
| US5899794A (en) * | 1996-12-26 | 1999-05-04 | Mitsubishi Chemical Corporation | Texturing method |
| US6280489B1 (en) * | 1999-10-29 | 2001-08-28 | Nihon Micro Coating Co., Ltd. | Polishing compositions |
| US6126515A (en) * | 1999-12-15 | 2000-10-03 | Nihon Micro Coating Co., Ltd. | Liquid slurry containing polyhedral monocrystalline alumina |
| JP2002030275A (ja) * | 2000-07-17 | 2002-01-31 | Nihon Micro Coating Co Ltd | テクスチャ加工液及び方法 |
| US6972135B2 (en) * | 2002-11-18 | 2005-12-06 | Komag, Inc. | Texturing of magnetic disk substrates |
-
2005
- 2005-11-28 JP JP2005341337A patent/JP2007149203A/ja active Pending
-
2006
- 2006-11-27 US US11/605,497 patent/US7374473B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000136376A (ja) * | 1998-08-28 | 2000-05-16 | Hiroshi Ishizuka | ダイヤモンド研磨材粒子及びその製法 |
| JP2004259417A (ja) * | 2003-02-24 | 2004-09-16 | Nihon Micro Coating Co Ltd | 磁気ハードディスク基板及びその製造方法 |
| JP2005310324A (ja) * | 2004-04-26 | 2005-11-04 | Nihon Micro Coating Co Ltd | 垂直磁気記録ディスク用ガラス基板及びその製造方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010080022A (ja) * | 2008-09-29 | 2010-04-08 | Showa Denko Kk | 垂直磁気記録媒体の製造方法 |
| US8398870B2 (en) | 2008-09-29 | 2013-03-19 | Showa Denko K.K. | Method for manufacturing perpendicular magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070123153A1 (en) | 2007-05-31 |
| US7374473B2 (en) | 2008-05-20 |
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