JP2007146272A5 - - Google Patents

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Publication number
JP2007146272A5
JP2007146272A5 JP2006019302A JP2006019302A JP2007146272A5 JP 2007146272 A5 JP2007146272 A5 JP 2007146272A5 JP 2006019302 A JP2006019302 A JP 2006019302A JP 2006019302 A JP2006019302 A JP 2006019302A JP 2007146272 A5 JP2007146272 A5 JP 2007146272A5
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JP
Japan
Prior art keywords
target
film
pvd method
forming
powder
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JP2006019302A
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English (en)
Japanese (ja)
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JP4651547B2 (ja
JP2007146272A (ja
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Priority to JP2006019302A priority Critical patent/JP4651547B2/ja
Priority claimed from JP2006019302A external-priority patent/JP4651547B2/ja
Publication of JP2007146272A publication Critical patent/JP2007146272A/ja
Publication of JP2007146272A5 publication Critical patent/JP2007146272A5/ja
Application granted granted Critical
Publication of JP4651547B2 publication Critical patent/JP4651547B2/ja
Expired - Fee Related legal-status Critical Current
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JP2006019302A 2005-01-28 2006-01-27 Ｐｖｄ法による成膜方法及びｐｖｄ法に用いる成膜用ターゲット Expired - Fee Related JP4651547B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006019302A JP4651547B2 (ja) 2005-01-28 2006-01-27 Ｐｖｄ法による成膜方法及びｐｖｄ法に用いる成膜用ターゲット

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005020704 2005-01-28
JP2005166486 2005-06-07
JP2005310746 2005-10-26
JP2006019302A JP4651547B2 (ja) 2005-01-28 2006-01-27 Ｐｖｄ法による成膜方法及びｐｖｄ法に用いる成膜用ターゲット

Publications (3)

Publication Number Publication Date
JP2007146272A JP2007146272A (ja) 2007-06-14
JP2007146272A5 true JP2007146272A5 (enExample) 2009-02-12
JP4651547B2 JP4651547B2 (ja) 2011-03-16

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ID=38208027

Family Applications (1)

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JP2006019302A Expired - Fee Related JP4651547B2 (ja) 2005-01-28 2006-01-27 Ｐｖｄ法による成膜方法及びｐｖｄ法に用いる成膜用ターゲット

Country Status (1)

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JP (1) JP4651547B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5351132B2 (ja) * 2010-12-06 2013-11-27 パナソニック株式会社 多結晶型シリコン太陽電池パネルの製造方法
JP7542794B2 (ja) 2020-01-22 2024-09-02 学校法人同志社 ターゲット容器、成膜方法、及び、ターゲット容器製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3006632B2 (ja) * 1991-06-28 2000-02-07 エヌティエヌ株式会社 固体潤滑転がり軸受
JPH09176845A (ja) * 1995-12-25 1997-07-08 Olympus Optical Co Ltd スパッタ装置
JPH09176846A (ja) * 1995-12-27 1997-07-08 Olympus Optical Co Ltd スパッタリング装置
JP2003027225A (ja) * 2001-07-13 2003-01-29 Canon Inc スパッタリングターゲットおよびスパッタリング装置
JP2005126783A (ja) * 2003-10-24 2005-05-19 Olympus Corp スパッタリングターゲット

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