JP2007131943A5 - - Google Patents
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- Publication number
- JP2007131943A5 JP2007131943A5 JP2006274848A JP2006274848A JP2007131943A5 JP 2007131943 A5 JP2007131943 A5 JP 2007131943A5 JP 2006274848 A JP2006274848 A JP 2006274848A JP 2006274848 A JP2006274848 A JP 2006274848A JP 2007131943 A5 JP2007131943 A5 JP 2007131943A5
- Authority
- JP
- Japan
- Prior art keywords
- yttrium oxide
- composite
- composite structure
- fine particles
- polycrystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 12
- 239000000443 aerosol Substances 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 5
- 239000004973 liquid crystal related substance Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006274848A JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
| KR1020087008410A KR100983952B1 (ko) | 2005-10-12 | 2006-10-10 | 복합구조물 |
| US12/083,065 US7897268B2 (en) | 2005-10-12 | 2006-10-10 | Composite structure |
| PCT/JP2006/320203 WO2007043520A1 (ja) | 2005-10-12 | 2006-10-10 | 複合構造物 |
| CN2006800375538A CN101283118B (zh) | 2005-10-12 | 2006-10-10 | 复合结构物 |
| TW095137582A TWI315356B (en) | 2005-10-12 | 2006-10-12 | Composite structure body |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005298223 | 2005-10-12 | ||
| JP2005298223 | 2005-10-12 | ||
| JP2006274848A JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007131943A JP2007131943A (ja) | 2007-05-31 |
| JP2007131943A5 true JP2007131943A5 (https=) | 2011-02-17 |
| JP5093745B2 JP5093745B2 (ja) | 2012-12-12 |
Family
ID=37942756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006274848A Expired - Fee Related JP5093745B2 (ja) | 2005-10-12 | 2006-10-06 | 複合構造物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7897268B2 (https=) |
| JP (1) | JP5093745B2 (https=) |
| KR (1) | KR100983952B1 (https=) |
| CN (1) | CN101283118B (https=) |
| TW (1) | TWI315356B (https=) |
| WO (1) | WO2007043520A1 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103348454B (zh) * | 2010-12-01 | 2016-04-06 | 株式会社东芝 | 等离子体蚀刻装置部件及其制造方法 |
| TW201334035A (zh) * | 2011-10-06 | 2013-08-16 | 葛林陀德德拉威公司 | 抗電漿蝕刻膜，承載抗電漿蝕刻膜之物品及相關的方法 |
| KR101637801B1 (ko) * | 2012-05-22 | 2016-07-07 | 가부시끼가이샤 도시바 | 플라즈마 처리 장치용 부품 및 플라즈마 처리 장치용 부품의 제조 방법 |
| JP5656036B2 (ja) * | 2013-03-28 | 2015-01-21 | Toto株式会社 | 複合構造物 |
| JP5888458B2 (ja) * | 2014-06-26 | 2016-03-22 | Toto株式会社 | 耐プラズマ性部材及びその製造方法 |
| JP2016008352A (ja) * | 2014-06-26 | 2016-01-18 | Toto株式会社 | 耐プラズマ性部材 |
| JP6808168B2 (ja) | 2015-12-24 | 2021-01-06 | Toto株式会社 | 耐プラズマ性部材 |
| US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
| JP7165748B2 (ja) * | 2018-12-05 | 2022-11-04 | 京セラ株式会社 | プラズマ処理装置用部材およびこれを備えるプラズマ処理装置 |
| WO2020218265A1 (ja) * | 2019-04-26 | 2020-10-29 | 京セラ株式会社 | プラズマ処理装置用部材およびプラズマ処理装置 |
| KR102490570B1 (ko) * | 2022-05-23 | 2023-01-20 | 주식회사 코미코 | 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막 |
| TW202409316A (zh) * | 2022-08-19 | 2024-03-01 | 日商Ａｇｃ股份有限公司 | 釔質保護膜及其製造方法以及構件 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3655402B2 (ja) | 1996-09-03 | 2005-06-02 | 日本放送協会 | 光メモリ材料およびその製造方法 |
| JP3265481B2 (ja) * | 1999-04-23 | 2002-03-11 | 独立行政法人産業技術総合研究所 | 脆性材料超微粒子成形体の低温成形法 |
| JP3348154B2 (ja) * | 1999-10-12 | 2002-11-20 | 独立行政法人産業技術総合研究所 | 複合構造物及びその作製方法並びに作製装置 |
| JP4205912B2 (ja) | 2002-08-13 | 2009-01-07 | 時田シーブイディーシステムズ株式会社 | 透明な酸化イットリウム膜とその製造方法 |
| JP4006535B2 (ja) | 2003-11-25 | 2007-11-14 | 独立行政法人産業技術総合研究所 | 半導体または液晶製造装置部材およびその製造方法 |
| JP3864958B2 (ja) * | 2004-02-02 | 2007-01-10 | 東陶機器株式会社 | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| JP2005217349A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| JP2005217350A (ja) | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
| TW200724506A (en) * | 2005-10-07 | 2007-07-01 | Ohara Kk | Inorganic composition |
| JP2007109828A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 耐プラズマ性部材 |
| JP2007109827A (ja) * | 2005-10-12 | 2007-04-26 | Toto Ltd | 静電チャック |
-
2006
- 2006-10-06 JP JP2006274848A patent/JP5093745B2/ja not_active Expired - Fee Related
- 2006-10-10 US US12/083,065 patent/US7897268B2/en not_active Expired - Fee Related
- 2006-10-10 KR KR1020087008410A patent/KR100983952B1/ko not_active Expired - Fee Related
- 2006-10-10 CN CN2006800375538A patent/CN101283118B/zh not_active Expired - Fee Related
- 2006-10-10 WO PCT/JP2006/320203 patent/WO2007043520A1/ja not_active Ceased
- 2006-10-12 TW TW095137582A patent/TWI315356B/zh not_active IP Right Cessation
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