JP2007123295A5 - - Google Patents
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- Publication number
- JP2007123295A5 JP2007123295A5 JP2005308968A JP2005308968A JP2007123295A5 JP 2007123295 A5 JP2007123295 A5 JP 2007123295A5 JP 2005308968 A JP2005308968 A JP 2005308968A JP 2005308968 A JP2005308968 A JP 2005308968A JP 2007123295 A5 JP2007123295 A5 JP 2007123295A5
- Authority
- JP
- Japan
- Prior art keywords
- pump
- liquid refrigerant
- jacket
- circulation system
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims 19
- 239000003507 refrigerant Substances 0.000 claims 19
- 238000011144 upstream manufacturing Methods 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 230000001276 controlling effect Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005308968A JP2007123295A (ja) | 2005-10-24 | 2005-10-24 | 露光装置 |
| US11/552,007 US7679716B2 (en) | 2005-10-24 | 2006-10-23 | Exposure apparatus and device manufacturing method |
| US12/628,252 US8373844B2 (en) | 2005-10-24 | 2009-12-01 | Exposure apparatus having an element to be cooled |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005308968A JP2007123295A (ja) | 2005-10-24 | 2005-10-24 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007123295A JP2007123295A (ja) | 2007-05-17 |
| JP2007123295A5 true JP2007123295A5 (enExample) | 2008-12-11 |
Family
ID=37984259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005308968A Pending JP2007123295A (ja) | 2005-10-24 | 2005-10-24 | 露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7679716B2 (enExample) |
| JP (1) | JP2007123295A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007123295A (ja) | 2005-10-24 | 2007-05-17 | Canon Inc | 露光装置 |
| US7916267B2 (en) * | 2006-08-29 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus, and motor cooling device |
| JP4490459B2 (ja) | 2007-06-29 | 2010-06-23 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| JP2009206112A (ja) * | 2008-02-26 | 2009-09-10 | Canon Inc | 冷却装置および冷却装置の運転方法 |
| KR101768983B1 (ko) * | 2008-06-10 | 2017-08-17 | 에이에스엠엘 네델란즈 비.브이. | 광학 요소를 열적으로 컨디셔닝하는 방법 및 시스템 |
| NL2004162A (en) * | 2009-02-17 | 2010-08-18 | Asml Netherlands Bv | A fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method. |
| US9372407B2 (en) * | 2013-04-18 | 2016-06-21 | E I Du Pont De Nemours And Company | Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element |
| EP3299731B1 (en) * | 2015-05-22 | 2019-01-30 | Daikin Industries, Ltd. | Temperature-adjusting fluid supply apparatus |
| TWI826581B (zh) * | 2019-11-11 | 2023-12-21 | 靖洋科技股份有限公司 | 壓力調控裝置以及半導體生產系統 |
| EP3995896A1 (en) * | 2020-11-10 | 2022-05-11 | ASML Netherlands B.V. | Conditioning apparatus and method |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3475973B2 (ja) * | 1994-12-14 | 2003-12-10 | 株式会社ニコン | リニアモータ、ステージ装置、及び露光装置 |
| JP2002186242A (ja) * | 2000-12-14 | 2002-06-28 | Nikon Corp | 電磁アクチュエータ装置、ステージ装置、露光装置及びデバイス |
| JP2002206833A (ja) | 2001-01-05 | 2002-07-26 | Nikon Corp | 液体冷却系の振動低減方法、荷電粒子線露光装置及び半導体デバイスの製造方法 |
| JP2004128213A (ja) | 2002-10-02 | 2004-04-22 | Canon Inc | 温調システム及びそれを組み込んだ露光装置 |
| JP2004247688A (ja) * | 2003-02-17 | 2004-09-02 | Canon Inc | 冷媒供給装置 |
| JP2005142382A (ja) | 2003-11-07 | 2005-06-02 | Canon Inc | 露光装置 |
| US7362415B2 (en) * | 2004-12-07 | 2008-04-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006222165A (ja) | 2005-02-08 | 2006-08-24 | Canon Inc | 露光装置 |
| JP2007123295A (ja) | 2005-10-24 | 2007-05-17 | Canon Inc | 露光装置 |
-
2005
- 2005-10-24 JP JP2005308968A patent/JP2007123295A/ja active Pending
-
2006
- 2006-10-23 US US11/552,007 patent/US7679716B2/en not_active Expired - Fee Related
-
2009
- 2009-12-01 US US12/628,252 patent/US8373844B2/en not_active Expired - Fee Related
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