JP2007123295A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2007123295A
JP2007123295A JP2005308968A JP2005308968A JP2007123295A JP 2007123295 A JP2007123295 A JP 2007123295A JP 2005308968 A JP2005308968 A JP 2005308968A JP 2005308968 A JP2005308968 A JP 2005308968A JP 2007123295 A JP2007123295 A JP 2007123295A
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JP
Japan
Prior art keywords
exposure apparatus
exhaust heat
liquid refrigerant
flow rate
circulation system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005308968A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007123295A5 (enExample
Inventor
Makoto Nomoto
誠 野元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005308968A priority Critical patent/JP2007123295A/ja
Priority to US11/552,007 priority patent/US7679716B2/en
Publication of JP2007123295A publication Critical patent/JP2007123295A/ja
Publication of JP2007123295A5 publication Critical patent/JP2007123295A5/ja
Priority to US12/628,252 priority patent/US8373844B2/en
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005308968A 2005-10-24 2005-10-24 露光装置 Pending JP2007123295A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005308968A JP2007123295A (ja) 2005-10-24 2005-10-24 露光装置
US11/552,007 US7679716B2 (en) 2005-10-24 2006-10-23 Exposure apparatus and device manufacturing method
US12/628,252 US8373844B2 (en) 2005-10-24 2009-12-01 Exposure apparatus having an element to be cooled

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005308968A JP2007123295A (ja) 2005-10-24 2005-10-24 露光装置

Publications (2)

Publication Number Publication Date
JP2007123295A true JP2007123295A (ja) 2007-05-17
JP2007123295A5 JP2007123295A5 (enExample) 2008-12-11

Family

ID=37984259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005308968A Pending JP2007123295A (ja) 2005-10-24 2005-10-24 露光装置

Country Status (2)

Country Link
US (2) US7679716B2 (enExample)
JP (1) JP2007123295A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009206112A (ja) * 2008-02-26 2009-09-10 Canon Inc 冷却装置および冷却装置の運転方法
JP2010192896A (ja) * 2009-02-17 2010-09-02 Asml Netherlands Bv 流体供給システム、リソグラフィ装置、流体流量を変動させる方法及びデバイス製造方法
JP2021077838A (ja) * 2019-11-11 2021-05-20 靖洋科技股▲ふん▼有限公司 圧力調整装置及び半導体製造システム

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007123295A (ja) 2005-10-24 2007-05-17 Canon Inc 露光装置
US7916267B2 (en) * 2006-08-29 2011-03-29 Asml Netherlands B.V. Lithographic apparatus, and motor cooling device
JP4490459B2 (ja) 2007-06-29 2010-06-23 キヤノン株式会社 露光装置及びデバイス製造方法
KR101768983B1 (ko) * 2008-06-10 2017-08-17 에이에스엠엘 네델란즈 비.브이. 광학 요소를 열적으로 컨디셔닝하는 방법 및 시스템
US9372407B2 (en) * 2013-04-18 2016-06-21 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
EP3299731B1 (en) * 2015-05-22 2019-01-30 Daikin Industries, Ltd. Temperature-adjusting fluid supply apparatus
EP3995896A1 (en) * 2020-11-10 2022-05-11 ASML Netherlands B.V. Conditioning apparatus and method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08167554A (ja) * 1994-12-14 1996-06-25 Nikon Corp リニアモータ
JP2002186242A (ja) * 2000-12-14 2002-06-28 Nikon Corp 電磁アクチュエータ装置、ステージ装置、露光装置及びデバイス
JP2004247688A (ja) * 2003-02-17 2004-09-02 Canon Inc 冷媒供給装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002206833A (ja) 2001-01-05 2002-07-26 Nikon Corp 液体冷却系の振動低減方法、荷電粒子線露光装置及び半導体デバイスの製造方法
JP2004128213A (ja) 2002-10-02 2004-04-22 Canon Inc 温調システム及びそれを組み込んだ露光装置
JP2005142382A (ja) 2003-11-07 2005-06-02 Canon Inc 露光装置
US7362415B2 (en) * 2004-12-07 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006222165A (ja) 2005-02-08 2006-08-24 Canon Inc 露光装置
JP2007123295A (ja) 2005-10-24 2007-05-17 Canon Inc 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08167554A (ja) * 1994-12-14 1996-06-25 Nikon Corp リニアモータ
JP2002186242A (ja) * 2000-12-14 2002-06-28 Nikon Corp 電磁アクチュエータ装置、ステージ装置、露光装置及びデバイス
JP2004247688A (ja) * 2003-02-17 2004-09-02 Canon Inc 冷媒供給装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009206112A (ja) * 2008-02-26 2009-09-10 Canon Inc 冷却装置および冷却装置の運転方法
JP2010192896A (ja) * 2009-02-17 2010-09-02 Asml Netherlands Bv 流体供給システム、リソグラフィ装置、流体流量を変動させる方法及びデバイス製造方法
JP2021077838A (ja) * 2019-11-11 2021-05-20 靖洋科技股▲ふん▼有限公司 圧力調整装置及び半導体製造システム
JP7515846B2 (ja) 2019-11-11 2024-07-16 靖洋科技股▲ふん▼有限公司 圧力調整装置及び半導体製造システム

Also Published As

Publication number Publication date
US7679716B2 (en) 2010-03-16
US20070089853A1 (en) 2007-04-26
US20100073649A1 (en) 2010-03-25
US8373844B2 (en) 2013-02-12

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