JP2007109967A - 半導体処理装置 - Google Patents
半導体処理装置 Download PDFInfo
- Publication number
- JP2007109967A JP2007109967A JP2005300637A JP2005300637A JP2007109967A JP 2007109967 A JP2007109967 A JP 2007109967A JP 2005300637 A JP2005300637 A JP 2005300637A JP 2005300637 A JP2005300637 A JP 2005300637A JP 2007109967 A JP2007109967 A JP 2007109967A
- Authority
- JP
- Japan
- Prior art keywords
- authority
- display
- operator
- semiconductor processing
- screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 71
- 238000012545 processing Methods 0.000 claims abstract description 66
- 238000003860 storage Methods 0.000 claims abstract description 27
- 238000007689 inspection Methods 0.000 claims description 59
- 230000008859 change Effects 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 description 21
- 230000007246 mechanism Effects 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 230000008520 organization Effects 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 239000000523 sample Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Storage Device Security (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005300637A JP2007109967A (ja) | 2005-10-14 | 2005-10-14 | 半導体処理装置 |
| US12/089,309 US20090037699A1 (en) | 2005-10-14 | 2006-10-13 | Apparatus and method for processing semiconductor |
| PCT/JP2006/320454 WO2007043646A1 (ja) | 2005-10-14 | 2006-10-13 | 半導体処理装置、および方法 |
| CNA2006800382029A CN101288153A (zh) | 2005-10-14 | 2006-10-13 | 半导体处理装置以及方法 |
| KR1020087008352A KR20080053365A (ko) | 2005-10-14 | 2006-10-13 | 반도체 처리 장치 및 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005300637A JP2007109967A (ja) | 2005-10-14 | 2005-10-14 | 半導体処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007109967A true JP2007109967A (ja) | 2007-04-26 |
| JP2007109967A5 JP2007109967A5 (enExample) | 2008-09-18 |
Family
ID=37942867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005300637A Withdrawn JP2007109967A (ja) | 2005-10-14 | 2005-10-14 | 半導体処理装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20090037699A1 (enExample) |
| JP (1) | JP2007109967A (enExample) |
| KR (1) | KR20080053365A (enExample) |
| CN (1) | CN101288153A (enExample) |
| WO (1) | WO2007043646A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011021984A (ja) * | 2009-07-15 | 2011-02-03 | Micronics Japan Co Ltd | 検査システム |
| JP2013153216A (ja) * | 2008-03-18 | 2013-08-08 | Hitachi Kokusai Electric Inc | 基板処理装置及びその制御方法並びにプログラム |
| US8806370B2 (en) | 2006-10-04 | 2014-08-12 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4737472B2 (ja) * | 2009-10-26 | 2011-08-03 | シャープ株式会社 | 製品の製造方法、および製造システム |
| US8173451B1 (en) * | 2011-02-16 | 2012-05-08 | Tokyo Electron Limited | Etch stage measurement system |
| US9281251B2 (en) | 2013-08-09 | 2016-03-08 | Tokyo Electron Limited | Substrate backside texturing |
| KR20220078733A (ko) | 2015-08-22 | 2022-06-10 | 도쿄엘렉트론가부시키가이샤 | 기판 배면 텍스처링 |
| JP6934407B2 (ja) * | 2017-11-27 | 2021-09-15 | 株式会社ディスコ | 加工装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08227835A (ja) * | 1995-02-20 | 1996-09-03 | Tokyo Electron Ltd | 半導体製造装置の操作システム、液晶ディスプレイ基板製造装置の操作システム、制御装置の操作システム及び制御装置の操作方法 |
| DK0932398T3 (da) * | 1996-06-28 | 2006-09-25 | Ortho Mcneil Pharm Inc | Anvendelse af topiramat eller derivater deraf til fremstilling af et lægemiddel til behandling af maniodepressive bipolære forstyrrelser |
| JPH1195878A (ja) * | 1997-09-25 | 1999-04-09 | Casio Comput Co Ltd | データ処理装置、ネットワークシステム、及び記録媒体 |
| US6198996B1 (en) * | 1999-01-28 | 2001-03-06 | International Business Machines Corporation | Method and apparatus for setting automotive performance tuned preferences set differently by a driver |
| US6615123B2 (en) * | 2000-12-01 | 2003-09-02 | Hewlett-Packard Development Company, L.P. | Personality module for configuring a vehicle |
| US6998956B2 (en) * | 2000-12-28 | 2006-02-14 | Cnh America Llc | Access control system for a work vehicle |
-
2005
- 2005-10-14 JP JP2005300637A patent/JP2007109967A/ja not_active Withdrawn
-
2006
- 2006-10-13 US US12/089,309 patent/US20090037699A1/en not_active Abandoned
- 2006-10-13 KR KR1020087008352A patent/KR20080053365A/ko not_active Ceased
- 2006-10-13 CN CNA2006800382029A patent/CN101288153A/zh active Pending
- 2006-10-13 WO PCT/JP2006/320454 patent/WO2007043646A1/ja not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8806370B2 (en) | 2006-10-04 | 2014-08-12 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus |
| JP2013153216A (ja) * | 2008-03-18 | 2013-08-08 | Hitachi Kokusai Electric Inc | 基板処理装置及びその制御方法並びにプログラム |
| JP2011021984A (ja) * | 2009-07-15 | 2011-02-03 | Micronics Japan Co Ltd | 検査システム |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090037699A1 (en) | 2009-02-05 |
| KR20080053365A (ko) | 2008-06-12 |
| WO2007043646A1 (ja) | 2007-04-19 |
| CN101288153A (zh) | 2008-10-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080731 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080731 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20100209 |