JP2007099600A - 三フッ化窒素の製造方法 - Google Patents
三フッ化窒素の製造方法 Download PDFInfo
- Publication number
- JP2007099600A JP2007099600A JP2005295498A JP2005295498A JP2007099600A JP 2007099600 A JP2007099600 A JP 2007099600A JP 2005295498 A JP2005295498 A JP 2005295498A JP 2005295498 A JP2005295498 A JP 2005295498A JP 2007099600 A JP2007099600 A JP 2007099600A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- nitrogen trifluoride
- reactor
- producing nitrogen
- solid product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 270
- 238000004519 manufacturing process Methods 0.000 claims abstract description 79
- 238000006243 chemical reaction Methods 0.000 claims abstract description 55
- 239000012265 solid product Substances 0.000 claims abstract description 50
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 47
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000011737 fluorine Substances 0.000 claims abstract description 46
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000000047 product Substances 0.000 claims abstract description 16
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims abstract description 14
- 230000002378 acidificating effect Effects 0.000 claims abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 50
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 42
- 239000001301 oxygen Substances 0.000 claims description 42
- 150000001875 compounds Chemical class 0.000 claims description 32
- 239000007787 solid Substances 0.000 claims description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 23
- 239000003085 diluting agent Substances 0.000 claims description 16
- 238000010790 dilution Methods 0.000 claims description 16
- 239000012895 dilution Substances 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 229910018503 SF6 Inorganic materials 0.000 claims description 11
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 11
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 11
- 230000003197 catalytic effect Effects 0.000 claims description 8
- 238000003860 storage Methods 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims description 7
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 4
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 4
- 229960004065 perflutren Drugs 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims description 3
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 claims description 2
- 238000003682 fluorination reaction Methods 0.000 abstract description 6
- 229910021529 ammonia Inorganic materials 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract description 3
- 238000007865 diluting Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 description 20
- 238000004817 gas chromatography Methods 0.000 description 17
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 14
- 238000002360 preparation method Methods 0.000 description 14
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 12
- 238000000926 separation method Methods 0.000 description 11
- 239000012535 impurity Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 7
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 239000003507 refrigerant Substances 0.000 description 5
- 238000004821 distillation Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 238000004880 explosion Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910017855 NH 4 F Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 and at the same time Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295498A JP2007099600A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法 |
| KR1020087007173A KR100975490B1 (ko) | 2005-08-26 | 2006-08-25 | 삼불화질소의 제조 방법 및 제조 장치 |
| US12/064,927 US7820127B2 (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
| TW095131376A TW200722370A (en) | 2005-08-26 | 2006-08-25 | Method and apparatus for producing nitrogen trifluoride |
| PCT/JP2006/316778 WO2007023968A1 (ja) | 2005-08-26 | 2006-08-25 | 三フッ化窒素の製造方法および製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005295498A JP2007099600A (ja) | 2005-10-07 | 2005-10-07 | 三フッ化窒素の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007099600A true JP2007099600A (ja) | 2007-04-19 |
| JP2007099600A5 JP2007099600A5 (enExample) | 2008-11-27 |
Family
ID=38026893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005295498A Pending JP2007099600A (ja) | 2005-08-26 | 2005-10-07 | 三フッ化窒素の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007099600A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009084475A1 (ja) * | 2007-12-27 | 2009-07-09 | Central Glass Co., Ltd. | フッ素化気体化合物の製造方法及び装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62138338A (ja) * | 1985-12-09 | 1987-06-22 | Sumitomo Electric Ind Ltd | 堆積物自動除去装置 |
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JPH09255650A (ja) * | 1996-03-28 | 1997-09-30 | Toyo Eng Corp | 分離器内部の付着防止方法 |
| JP2001322806A (ja) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | 三フッ化窒素の製造方法及びその用途 |
| JP2003089890A (ja) * | 2001-09-18 | 2003-03-28 | Kawasaki Steel Corp | 焙焼炉用付着物除去装置及びそれを備えた焙焼炉 |
-
2005
- 2005-10-07 JP JP2005295498A patent/JP2007099600A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62138338A (ja) * | 1985-12-09 | 1987-06-22 | Sumitomo Electric Ind Ltd | 堆積物自動除去装置 |
| JPH05105411A (ja) * | 1991-10-22 | 1993-04-27 | Onoda Cement Co Ltd | 三フツ化窒素の製造方法 |
| JPH09255650A (ja) * | 1996-03-28 | 1997-09-30 | Toyo Eng Corp | 分離器内部の付着防止方法 |
| JP2001322806A (ja) * | 2000-05-12 | 2001-11-20 | Showa Denko Kk | 三フッ化窒素の製造方法及びその用途 |
| JP2003089890A (ja) * | 2001-09-18 | 2003-03-28 | Kawasaki Steel Corp | 焙焼炉用付着物除去装置及びそれを備えた焙焼炉 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009084475A1 (ja) * | 2007-12-27 | 2009-07-09 | Central Glass Co., Ltd. | フッ素化気体化合物の製造方法及び装置 |
| KR101163894B1 (ko) | 2007-12-27 | 2012-07-09 | 샌트랄 글래스 컴퍼니 리미티드 | 불소화 기체화합물의 제조방법 및 장치 |
| JP5413201B2 (ja) * | 2007-12-27 | 2014-02-12 | セントラル硝子株式会社 | フッ素化気体化合物の製造方法及び装置 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2586761B1 (en) | Method for manufacturing 2,3,3,3-tetrafluoropropene | |
| KR100654286B1 (ko) | Ｎｆ3의 정제 방법 | |
| US20040015022A1 (en) | Production and use of hexafluoroethane | |
| US20210047184A1 (en) | Method and apparatus for effective preparation of trifluoroamine oxide | |
| JP4828180B2 (ja) | 三フッ化窒素の製造方法 | |
| JP5013692B2 (ja) | フルオロメタンの製造方法およびその製品 | |
| KR100867582B1 (ko) | 삼플루오르화 질소의 제조방법 | |
| JP4624905B2 (ja) | 三フッ化窒素の製造方法 | |
| KR100975490B1 (ko) | 삼불화질소의 제조 방법 및 제조 장치 | |
| JP4624920B2 (ja) | 三フッ化窒素の製造方法 | |
| JP2007099600A (ja) | 三フッ化窒素の製造方法 | |
| JP2007099599A (ja) | 三フッ化窒素の製造方法および製造装置 | |
| JP4785532B2 (ja) | ハイドロフルオロカーボンの製造方法、その製品およびその用途 | |
| JP4484572B2 (ja) | ヘキサフルオロエタンの製造方法およびその用途 | |
| WO2001085603A2 (en) | Process for producing nitrogen trifluoride and use thereof | |
| JP2007119292A (ja) | 三フッ化窒素の製造方法および製造装置 | |
| JP2022538048A (ja) | ビス（フルオロスルホニル）イミドのアルカリ塩の製造方法 | |
| JP2007084370A (ja) | 三フッ化窒素の製造方法 | |
| WO2005056472A1 (ja) | フッ化カルボニルの製造方法および製造装置 | |
| US6162955A (en) | Manufacturing method for perfluoroethane | |
| EP0714849B1 (en) | Production process for refined hydrogen iodide | |
| KR100961587B1 (ko) | 할로겐화 질소의 합성방법 | |
| JP2739763B2 (ja) | パーフルオロ化合物の製造法 | |
| JP2007099600A5 (enExample) | ||
| JP3512285B2 (ja) | 精ヨウ化水素の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081007 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20081007 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20120203 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120327 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120724 |