JP2007027331A - 駆動装置及びこれを用いた露光装置並びにデバイス製造方法 - Google Patents

駆動装置及びこれを用いた露光装置並びにデバイス製造方法 Download PDF

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Publication number
JP2007027331A
JP2007027331A JP2005206126A JP2005206126A JP2007027331A JP 2007027331 A JP2007027331 A JP 2007027331A JP 2005206126 A JP2005206126 A JP 2005206126A JP 2005206126 A JP2005206126 A JP 2005206126A JP 2007027331 A JP2007027331 A JP 2007027331A
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Japan
Prior art keywords
coil
electromagnetic actuator
unit
stage
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005206126A
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English (en)
Japanese (ja)
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JP2007027331A5 (enExample
Inventor
Yoshiyuki Okada
芳幸 岡田
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Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005206126A priority Critical patent/JP2007027331A/ja
Priority to US11/485,360 priority patent/US7602086B2/en
Publication of JP2007027331A publication Critical patent/JP2007027331A/ja
Publication of JP2007027331A5 publication Critical patent/JP2007027331A5/ja
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K16/00—Machines with more than one rotor or stator

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005206126A 2005-07-14 2005-07-14 駆動装置及びこれを用いた露光装置並びにデバイス製造方法 Withdrawn JP2007027331A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005206126A JP2007027331A (ja) 2005-07-14 2005-07-14 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
US11/485,360 US7602086B2 (en) 2005-07-14 2006-07-13 Driving device, exposure apparatus using the same, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005206126A JP2007027331A (ja) 2005-07-14 2005-07-14 駆動装置及びこれを用いた露光装置並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007027331A true JP2007027331A (ja) 2007-02-01
JP2007027331A5 JP2007027331A5 (enExample) 2008-08-28

Family

ID=37661363

Family Applications (1)

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JP2005206126A Withdrawn JP2007027331A (ja) 2005-07-14 2005-07-14 駆動装置及びこれを用いた露光装置並びにデバイス製造方法

Country Status (2)

Country Link
US (1) US7602086B2 (enExample)
JP (1) JP2007027331A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012019213A (ja) * 2010-07-09 2012-01-26 Asml Netherlands Bv 可変リラクタンスデバイス、ステージ装置、リソグラフィ装置及びデバイス製造方法
JP2012235026A (ja) * 2011-05-06 2012-11-29 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2014192254A (ja) * 2013-03-26 2014-10-06 Canon Inc ステージ装置、リソグラフィ装置及びデバイス製造方法
JP2016502124A (ja) * 2012-10-15 2016-01-21 エーエスエムエル ネザーランズ ビー．ブイ． 作動機構、光学装置、リソグラフィ装置及びデバイス製造方法
JPWO2018181912A1 (ja) * 2017-03-31 2020-02-13 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法
US11349273B2 (en) 2018-01-17 2022-05-31 Cymer, Llc Apparatus for tuning discharge performance in a laser chamber

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4366386B2 (ja) 2006-09-07 2009-11-18 キヤノン株式会社 露光装置およびデバイス製造方法
US7579793B2 (en) * 2007-02-14 2009-08-25 Honeywell International Inc. System and method for efficient wide dynamic range coil drive
US20080285005A1 (en) * 2007-05-15 2008-11-20 Jean-Marc Gery System and method for measuring and mapping a sideforce for a mover
JP5180555B2 (ja) * 2007-10-04 2013-04-10 キヤノン株式会社 位置決め装置、露光装置及びデバイス製造方法
JP2009094163A (ja) * 2007-10-04 2009-04-30 Canon Inc 温度制御装置、露光装置およびデバイス製造方法
EP2492928A3 (en) * 2011-02-22 2017-08-30 ASML Netherlands BV Electromagnetic actuator, stage apparatus and lithographic apparatus
US9116834B2 (en) * 2011-03-23 2015-08-25 Asml Netherlands B.V. Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
WO2014044496A2 (en) * 2012-09-19 2014-03-27 Asml Netherlands B.V. Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator
NL2010611C2 (en) * 2013-04-10 2014-10-13 Univ Delft Tech Magnetic actuator and method of controlling such a magnetic actuator.
WO2015163886A1 (en) * 2014-04-24 2015-10-29 Empire Technology Development, Llc Broadcasting a message using modulated power

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Publication number Priority date Publication date Assignee Title
US3689885A (en) * 1970-09-15 1972-09-05 Transitag Corp Inductively coupled passive responder and interrogator unit having multidimension electromagnetic field capabilities
US4463354A (en) * 1981-12-09 1984-07-31 Sears Lawrence M Apparatus for communicating utility usage related information from a utility usage location to a portable utility usage registering device
GB8627241D0 (en) * 1986-11-14 1986-12-17 Chubb Lips Nederland Bv Identification token
US4922200A (en) * 1989-08-25 1990-05-01 Ldj Electronics, Inc. Apparatus for measuring the hysteresis loop of magnetic film
US5008664A (en) * 1990-01-23 1991-04-16 Quantum Solutions, Inc. Apparatus for inductively coupling signals between a downhole sensor and the surface
NL9100407A (nl) 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JP2728018B2 (ja) * 1995-04-18 1998-03-18 日本電気株式会社 送信回路
US6486941B1 (en) 2000-04-24 2002-11-26 Nikon Corporation Guideless stage
JP2002280801A (ja) * 2001-03-16 2002-09-27 Mitsubishi Electric Corp アンテナ装置及び導波管回転結合器

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012019213A (ja) * 2010-07-09 2012-01-26 Asml Netherlands Bv 可変リラクタンスデバイス、ステージ装置、リソグラフィ装置及びデバイス製造方法
US9081307B2 (en) 2010-07-09 2015-07-14 Asml Netherlands B.V. Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method
JP2012235026A (ja) * 2011-05-06 2012-11-29 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
JP2016502124A (ja) * 2012-10-15 2016-01-21 エーエスエムエル ネザーランズ ビー．ブイ． 作動機構、光学装置、リソグラフィ装置及びデバイス製造方法
JP2014192254A (ja) * 2013-03-26 2014-10-06 Canon Inc ステージ装置、リソグラフィ装置及びデバイス製造方法
US10036965B2 (en) 2013-03-26 2018-07-31 Canon Kabushiki Kaisha Stage apparatus, lithography apparatus, and device manufacturing method
JPWO2018181912A1 (ja) * 2017-03-31 2020-02-13 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び移動体の駆動方法
JP2023029356A (ja) * 2017-03-31 2023-03-03 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
JP7472958B2 (ja) 2017-03-31 2024-04-23 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
US11349273B2 (en) 2018-01-17 2022-05-31 Cymer, Llc Apparatus for tuning discharge performance in a laser chamber

Also Published As

Publication number Publication date
US20070013895A1 (en) 2007-01-18
US7602086B2 (en) 2009-10-13

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