JP2007016191A5 - - Google Patents
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- Publication number
- JP2007016191A5 JP2007016191A5 JP2005201924A JP2005201924A JP2007016191A5 JP 2007016191 A5 JP2007016191 A5 JP 2007016191A5 JP 2005201924 A JP2005201924 A JP 2005201924A JP 2005201924 A JP2005201924 A JP 2005201924A JP 2007016191 A5 JP2007016191 A5 JP 2007016191A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- active energy
- alkyl group
- energy ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 239000008119 colloidal silica Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 239000008199 coating composition Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 5
- -1 alkyl silicates Chemical class 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000003700 epoxy group Chemical group 0.000 claims description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 3
- 150000001282 organosilanes Chemical class 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims 2
- 239000007787 solid Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005201924A JP2007016191A (ja) | 2005-07-11 | 2005-07-11 | コーティング用組成物、保護被膜形成方法および積層物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005201924A JP2007016191A (ja) | 2005-07-11 | 2005-07-11 | コーティング用組成物、保護被膜形成方法および積層物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007016191A JP2007016191A (ja) | 2007-01-25 |
| JP2007016191A5 true JP2007016191A5 (enExample) | 2008-07-31 |
Family
ID=37753631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005201924A Pending JP2007016191A (ja) | 2005-07-11 | 2005-07-11 | コーティング用組成物、保護被膜形成方法および積層物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007016191A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5048395B2 (ja) * | 2007-06-05 | 2012-10-17 | 日本ペイント株式会社 | 無機有機複合コーティング組成物 |
| JP2009275129A (ja) * | 2008-05-15 | 2009-11-26 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物及び積層体 |
| JP2010100819A (ja) * | 2008-09-25 | 2010-05-06 | Panasonic Electric Works Co Ltd | 指紋汚れの防止方法、並びに耐指紋性コーティング材組成物及びその塗装品 |
| JP5336925B2 (ja) * | 2009-05-20 | 2013-11-06 | 三菱レイヨン株式会社 | 活性エネルギー線硬化性被覆材組成物及び積層体 |
| JP5596960B2 (ja) * | 2009-11-06 | 2014-09-24 | 旭化成イーマテリアルズ株式会社 | 絶縁膜の形成方法 |
| TW201120103A (en) * | 2009-06-24 | 2011-06-16 | Asahi Kasei E Materials Corp | Polysiloxane condensation reaction product |
| JP4746704B2 (ja) * | 2009-06-24 | 2011-08-10 | 旭化成イーマテリアルズ株式会社 | ポリシロキサン縮合反応物 |
| JP2012223910A (ja) * | 2011-04-15 | 2012-11-15 | Mitsubishi Rayon Co Ltd | 積層体およびその製造方法 |
| WO2017171033A1 (ja) * | 2016-03-31 | 2017-10-05 | 新日鉄住金化学株式会社 | 積層体、その中間体、およびその製造方法、それに用いる硬化性樹脂組成物 |
| JP6679388B2 (ja) * | 2016-03-31 | 2020-04-15 | 日鉄ケミカル&マテリアル株式会社 | 透明積層体およびその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5385955A (en) * | 1992-11-05 | 1995-01-31 | Essilor Of America, Inc. | Organosilane coating composition for ophthalmic lens |
| JP4058808B2 (ja) * | 1998-06-18 | 2008-03-12 | Jsr株式会社 | 光硬化性組成物および硬化膜 |
| JP2003266605A (ja) * | 2002-03-13 | 2003-09-24 | Sumitomo Chem Co Ltd | 硬化被膜が形成された透明基材 |
-
2005
- 2005-07-11 JP JP2005201924A patent/JP2007016191A/ja active Pending
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