JP2006511921A - スパッタイオンポンプ用磁石アセンブリ - Google Patents

スパッタイオンポンプ用磁石アセンブリ Download PDF

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Publication number
JP2006511921A
JP2006511921A JP2004565119A JP2004565119A JP2006511921A JP 2006511921 A JP2006511921 A JP 2006511921A JP 2004565119 A JP2004565119 A JP 2004565119A JP 2004565119 A JP2004565119 A JP 2004565119A JP 2006511921 A JP2006511921 A JP 2006511921A
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JP
Japan
Prior art keywords
magnet
anode
pump
disposed
primary
Prior art date
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Pending
Application number
JP2004565119A
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English (en)
Japanese (ja)
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JP2006511921A5 (https=
Inventor
パーキンス，チャールズ
マンレー，バリー
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Varian Inc
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Varian Inc
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Publication date
Application filed by Varian Inc filed Critical Varian Inc
Publication of JP2006511921A publication Critical patent/JP2006511921A/ja
Publication of JP2006511921A5 publication Critical patent/JP2006511921A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes

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  • Electron Tubes For Measurement (AREA)
  • Physical Vapour Deposition (AREA)
JP2004565119A 2002-12-18 2003-11-25 スパッタイオンポンプ用磁石アセンブリ Pending JP2006511921A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/322,991 US6835048B2 (en) 2002-12-18 2002-12-18 Ion pump having secondary magnetic field
PCT/US2003/037878 WO2004061889A2 (en) 2002-12-18 2003-11-25 Magnet assembly for sputter ion pump

Publications (2)

Publication Number Publication Date
JP2006511921A true JP2006511921A (ja) 2006-04-06
JP2006511921A5 JP2006511921A5 (https=) 2007-02-08

Family

ID=32593082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004565119A Pending JP2006511921A (ja) 2002-12-18 2003-11-25 スパッタイオンポンプ用磁石アセンブリ

Country Status (7)

Country Link
US (1) US6835048B2 (https=)
EP (1) EP1573773B1 (https=)
JP (1) JP2006511921A (https=)
CN (1) CN100369178C (https=)
DE (1) DE60313888T2 (https=)
ES (1) ES2282728T3 (https=)
WO (1) WO2004061889A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022264603A1 (https=) * 2021-06-14 2022-12-22

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602006002264D1 (de) * 2006-06-01 2008-09-25 Varian Spa Magnetanordnung für eine Sputter-Ionenpumpe
US20070286738A1 (en) * 2006-06-12 2007-12-13 Varian, Inc. Vacuum ion-getter pump with cryogenically cooled cathode
US7850432B2 (en) * 2006-09-14 2010-12-14 Gamma Vacuum, Llc Ion pump having emission containment
JP4831548B2 (ja) * 2007-02-16 2011-12-07 独立行政法人情報通信研究機構 イオンポンプ及び真空運搬装置
JP4835756B2 (ja) * 2008-02-14 2011-12-14 独立行政法人情報通信研究機構 イオンポンプシステム及び電磁場発生装置
EP2151849B1 (en) * 2008-08-08 2011-12-14 Agilent Technologies Italia S.p.A. Vacuum pumping system comprising a plurality of sputter ion pumps
US8153997B2 (en) * 2009-05-05 2012-04-10 General Electric Company Isotope production system and cyclotron
US8374306B2 (en) 2009-06-26 2013-02-12 General Electric Company Isotope production system with separated shielding
US8453493B2 (en) 2010-11-02 2013-06-04 Agilent Technologies, Inc. Trace gas sensing apparatus and methods for leak detection
CN104952685B (zh) * 2015-01-19 2017-11-21 中国航天员科研训练中心 轻量化大抽速离子泵
US10665437B2 (en) * 2015-02-10 2020-05-26 Hamilton Sundstrand Corporation System and method for enhanced ion pump lifespan
US10550829B2 (en) * 2016-09-08 2020-02-04 Edwards Vacuum Llc Ion trajectory manipulation architecture in an ion pump
CN110491764B (zh) * 2019-09-02 2022-03-29 北京卫星环境工程研究所 溅射离子泵的磁轭组件

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58193557U (ja) * 1982-06-18 1983-12-23 三菱製鋼磁材株式会社 イオンポンプ用磁石装置
JPS61218120A (ja) * 1985-03-23 1986-09-27 Sumitomo Special Metals Co Ltd 磁界発生装置
JPS62177903A (ja) * 1986-01-31 1987-08-04 Fuji Electric Co Ltd 永久磁石形均一磁場マグネツト
JPH01502632A (ja) * 1987-03-03 1989-09-07 コミッサレ・ア・レナジイ・アトミック 永久磁石装置
JPH0822803A (ja) * 1994-07-08 1996-01-23 Ulvac Japan Ltd スパッタイオンポンプ
JPH0927294A (ja) * 1995-07-12 1997-01-28 Ebara Corp イオンポンプ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB924919A (en) * 1958-06-16 1963-05-01 Varian Associates Electrical vacuum pump apparatus
NL232314A (https=) * 1958-10-15
US3091717A (en) * 1960-12-23 1963-05-28 Varian Associates Cathodes for magnetically-confined glow discharge devices
US3416722A (en) * 1967-04-05 1968-12-17 Varian Associates High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator
US3994625A (en) * 1975-02-18 1976-11-30 Varian Associates Sputter-ion pump having improved cooling and improved magnetic circuitry
US4334829A (en) * 1980-02-15 1982-06-15 Rca Corporation Sputter-ion pump for use with electron tubes having thoriated tungsten cathodes
DE3566185D1 (en) * 1984-04-11 1988-12-15 Sumitomo Spec Metals Magnetic field generating device for nmr-ct
US5262028A (en) * 1992-06-01 1993-11-16 Sierra Applied Sciences, Inc. Planar magnetron sputtering magnet assembly
CN1166811C (zh) * 1996-01-05 2004-09-15 日本真空技术株式会社 离子溅射泵
US6004104A (en) * 1997-07-14 1999-12-21 Duniway Stockroom Corp. Cathode structure for sputter ion pump
US6616417B2 (en) * 2000-03-13 2003-09-09 Ulvac, Inc. Spatter ion pump

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58193557U (ja) * 1982-06-18 1983-12-23 三菱製鋼磁材株式会社 イオンポンプ用磁石装置
JPS61218120A (ja) * 1985-03-23 1986-09-27 Sumitomo Special Metals Co Ltd 磁界発生装置
JPS62177903A (ja) * 1986-01-31 1987-08-04 Fuji Electric Co Ltd 永久磁石形均一磁場マグネツト
JPH01502632A (ja) * 1987-03-03 1989-09-07 コミッサレ・ア・レナジイ・アトミック 永久磁石装置
JPH0822803A (ja) * 1994-07-08 1996-01-23 Ulvac Japan Ltd スパッタイオンポンプ
JPH0927294A (ja) * 1995-07-12 1997-01-28 Ebara Corp イオンポンプ

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022264603A1 (https=) * 2021-06-14 2022-12-22
WO2022264603A1 (ja) * 2021-06-14 2022-12-22 国立研究開発法人産業技術総合研究所 プラズマ源及び当該プラズマ源を用いた原子時計
JP7544415B2 (ja) 2021-06-14 2024-09-03 国立研究開発法人産業技術総合研究所 プラズマ源及び当該プラズマ源を用いた原子時計
US12389520B2 (en) 2021-06-14 2025-08-12 National Institute Of Advanced Industrial Science And Technology Plasma source, and atomic clock employing plasma source

Also Published As

Publication number Publication date
WO2004061889A3 (en) 2004-09-30
WO2004061889A2 (en) 2004-07-22
US6835048B2 (en) 2004-12-28
ES2282728T3 (es) 2007-10-16
CN1708822A (zh) 2005-12-14
EP1573773B1 (en) 2007-05-16
DE60313888T2 (de) 2008-01-17
EP1573773A2 (en) 2005-09-14
US20040120826A1 (en) 2004-06-24
CN100369178C (zh) 2008-02-13
DE60313888D1 (de) 2007-06-28

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