WO2004061889A2 - Magnet assembly for sputter ion pump - Google Patents

Magnet assembly for sputter ion pump Download PDF

Info

Publication number
WO2004061889A2
WO2004061889A2 PCT/US2003/037878 US0337878W WO2004061889A2 WO 2004061889 A2 WO2004061889 A2 WO 2004061889A2 US 0337878 W US0337878 W US 0337878W WO 2004061889 A2 WO2004061889 A2 WO 2004061889A2
Authority
WO
WIPO (PCT)
Prior art keywords
magnets
anode
magnet
cells
primary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2003/037878
Other languages
English (en)
French (fr)
Other versions
WO2004061889A3 (en
Inventor
Charles Perkins
Barry Manley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Inc
Original Assignee
Varian Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Inc filed Critical Varian Inc
Priority to EP03796479A priority Critical patent/EP1573773B1/en
Priority to JP2004565119A priority patent/JP2006511921A/ja
Priority to DE60313888T priority patent/DE60313888T2/de
Publication of WO2004061889A2 publication Critical patent/WO2004061889A2/en
Publication of WO2004061889A3 publication Critical patent/WO2004061889A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes

Definitions

  • Fig. 3 is a simplified schematic diagram of a sputter ion pump in accordance with an embodiment of the invention.
  • Fig. 5 is a top view of the sputter ion pump shown in Fig. 4;
  • FIG. 3 A simplified schematic diagram of a sputter ion pump in accordance with an embodiment of the invention is shown in Fig. 3.
  • Anode cells 120a, 120b, ... 120n are located between and are spaced from cathode plates 124 and 126.
  • the ion pump may include one or more anode cells.
  • Each anode cell may have a cylindrical configuration and may be fabricated of stainless steel.
  • the anode cells 120a, 120b, ... 120n are oriented with their axes parallel to each other and perpendicular to cathode plates 124, 126.
  • Cathode plates 124 and 126 may be fabricated of titanium or tantalum, for example.
  • primary magnet 142 is affixed to an inner surface of end 150a of magnet yoke 150
  • primary magnet 144 is affixed to an inner surface of end 150b of magnet yoke 150
  • Secondary magnets 160 and 162 are affixed to an inner surface of side 150c of magnet yoke 150
  • secondary magnets 164 and 166 are affixed to an inner surface of side 150d of magnet yoke 150.
  • magnets 160 and 162 of opposite polarities are located on side 150c of magnet yoke 150
  • secondary magnets 164 and 166 of opposite polarities are located on side 150d of magnet yoke 150.
  • Each of the secondary magnets 160, 162, 164 and 166 is located adj acent to a primary magnet of like polarity.

Landscapes

  • Electron Tubes For Measurement (AREA)
  • Physical Vapour Deposition (AREA)
PCT/US2003/037878 2002-12-18 2003-11-25 Magnet assembly for sputter ion pump Ceased WO2004061889A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP03796479A EP1573773B1 (en) 2002-12-18 2003-11-25 Sputter ion pump comprising an improved magnet assembly
JP2004565119A JP2006511921A (ja) 2002-12-18 2003-11-25 スパッタイオンポンプ用磁石アセンブリ
DE60313888T DE60313888T2 (de) 2002-12-18 2003-11-25 Sputterionenpumpe mit verbesserter Magnetanordnung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/322,991 US6835048B2 (en) 2002-12-18 2002-12-18 Ion pump having secondary magnetic field
US10/322,991 2002-12-18

Publications (2)

Publication Number Publication Date
WO2004061889A2 true WO2004061889A2 (en) 2004-07-22
WO2004061889A3 WO2004061889A3 (en) 2004-09-30

Family

ID=32593082

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/037878 Ceased WO2004061889A2 (en) 2002-12-18 2003-11-25 Magnet assembly for sputter ion pump

Country Status (7)

Country Link
US (1) US6835048B2 (https=)
EP (1) EP1573773B1 (https=)
JP (1) JP2006511921A (https=)
CN (1) CN100369178C (https=)
DE (1) DE60313888T2 (https=)
ES (1) ES2282728T3 (https=)
WO (1) WO2004061889A2 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1863068A1 (en) * 2006-06-01 2007-12-05 VARIAN S.p.A. Magnet assembly for a sputter ion pump
EP2151849A1 (en) 2008-08-08 2010-02-10 VARIAN S.p.A. Vacuum pumping system comprising a plurality of sputter ion pumps
US12389520B2 (en) 2021-06-14 2025-08-12 National Institute Of Advanced Industrial Science And Technology Plasma source, and atomic clock employing plasma source

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070286738A1 (en) * 2006-06-12 2007-12-13 Varian, Inc. Vacuum ion-getter pump with cryogenically cooled cathode
US7850432B2 (en) * 2006-09-14 2010-12-14 Gamma Vacuum, Llc Ion pump having emission containment
JP4831548B2 (ja) * 2007-02-16 2011-12-07 独立行政法人情報通信研究機構 イオンポンプ及び真空運搬装置
JP4835756B2 (ja) * 2008-02-14 2011-12-14 独立行政法人情報通信研究機構 イオンポンプシステム及び電磁場発生装置
US8153997B2 (en) * 2009-05-05 2012-04-10 General Electric Company Isotope production system and cyclotron
US8374306B2 (en) 2009-06-26 2013-02-12 General Electric Company Isotope production system with separated shielding
US8453493B2 (en) 2010-11-02 2013-06-04 Agilent Technologies, Inc. Trace gas sensing apparatus and methods for leak detection
CN104952685B (zh) * 2015-01-19 2017-11-21 中国航天员科研训练中心 轻量化大抽速离子泵
US10665437B2 (en) * 2015-02-10 2020-05-26 Hamilton Sundstrand Corporation System and method for enhanced ion pump lifespan
US10550829B2 (en) * 2016-09-08 2020-02-04 Edwards Vacuum Llc Ion trajectory manipulation architecture in an ion pump
CN110491764B (zh) * 2019-09-02 2022-03-29 北京卫星环境工程研究所 溅射离子泵的磁轭组件

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB924919A (en) * 1958-06-16 1963-05-01 Varian Associates Electrical vacuum pump apparatus
NL232314A (https=) * 1958-10-15
US3091717A (en) * 1960-12-23 1963-05-28 Varian Associates Cathodes for magnetically-confined glow discharge devices
US3416722A (en) * 1967-04-05 1968-12-17 Varian Associates High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator
US3994625A (en) * 1975-02-18 1976-11-30 Varian Associates Sputter-ion pump having improved cooling and improved magnetic circuitry
US4334829A (en) * 1980-02-15 1982-06-15 Rca Corporation Sputter-ion pump for use with electron tubes having thoriated tungsten cathodes
JPS58193557U (ja) * 1982-06-18 1983-12-23 三菱製鋼磁材株式会社 イオンポンプ用磁石装置
DE3566185D1 (en) * 1984-04-11 1988-12-15 Sumitomo Spec Metals Magnetic field generating device for nmr-ct
JPS61218120A (ja) * 1985-03-23 1986-09-27 Sumitomo Special Metals Co Ltd 磁界発生装置
JPH079845B2 (ja) * 1986-01-31 1995-02-01 富士電機株式会社 永久磁石形均一磁場マグネット
FR2611975B1 (fr) * 1987-03-03 1995-02-17 Commissariat Energie Atomique Systeme d'aimants permanents pour un champ magnetique intense
US5262028A (en) * 1992-06-01 1993-11-16 Sierra Applied Sciences, Inc. Planar magnetron sputtering magnet assembly
JPH0822803A (ja) * 1994-07-08 1996-01-23 Ulvac Japan Ltd スパッタイオンポンプ
JPH0927294A (ja) * 1995-07-12 1997-01-28 Ebara Corp イオンポンプ
CN1166811C (zh) * 1996-01-05 2004-09-15 日本真空技术株式会社 离子溅射泵
US6004104A (en) * 1997-07-14 1999-12-21 Duniway Stockroom Corp. Cathode structure for sputter ion pump
US6616417B2 (en) * 2000-03-13 2003-09-09 Ulvac, Inc. Spatter ion pump

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1863068A1 (en) * 2006-06-01 2007-12-05 VARIAN S.p.A. Magnet assembly for a sputter ion pump
EP2151849A1 (en) 2008-08-08 2010-02-10 VARIAN S.p.A. Vacuum pumping system comprising a plurality of sputter ion pumps
US12389520B2 (en) 2021-06-14 2025-08-12 National Institute Of Advanced Industrial Science And Technology Plasma source, and atomic clock employing plasma source

Also Published As

Publication number Publication date
WO2004061889A3 (en) 2004-09-30
US6835048B2 (en) 2004-12-28
ES2282728T3 (es) 2007-10-16
CN1708822A (zh) 2005-12-14
EP1573773B1 (en) 2007-05-16
DE60313888T2 (de) 2008-01-17
EP1573773A2 (en) 2005-09-14
US20040120826A1 (en) 2004-06-24
JP2006511921A (ja) 2006-04-06
CN100369178C (zh) 2008-02-13
DE60313888D1 (de) 2007-06-28

Similar Documents

Publication Publication Date Title
US6835048B2 (en) Ion pump having secondary magnetic field
US5241244A (en) Cyclotron resonance ion engine
US4163151A (en) Separated ion source
EP3293753B1 (en) Ion trajectory manipulation architecture in an ion pump
US20210327695A1 (en) System and method for enhanced ion pump lifespan
US4466242A (en) Ring-cusp ion thruster with shell anode
Zelenski et al. High-intensity polarized and un-polarized sources and injector developments at BNL Linac
US8823263B2 (en) Microwave tube with device for extracting ions produced in the tube
US20070280834A1 (en) Sputter ion pump having an improved magnet assembly
US20180306175A1 (en) Magnetic focusing in an ion pump using internal ferrous materials
US3452923A (en) Tetrode ion pump
Barshick et al. An improved ion guide for external ion injection in glow discharge—fourier transform ion cyclotron resonance mass spectrometry
JPH10275566A (ja) イオン源
US6220821B1 (en) Ion pump having protective mask components overlying the cathode elements
US5028837A (en) Low energy ion trap
CN112582248B (zh) 一种用于汞离子微波频标的电子枪装置
CN112928002B (zh) 一种基于网状阳极结构的小型化真空弧离子源
JP2002540563A (ja) ダイオードスパッタイオンポンプ用のマフィン型状電極素子
RU76164U1 (ru) Газоразрядный источник ионов
Gavrilov et al. Ion-Emission Properties of a Plasma in a Gaseous-Ion Source with a Plasma Cathode.
RU2205467C2 (ru) Ионный источник
JPH05234698A (ja) 加速管
Variale et al. First tests of the Trapped Ion Source
WO2024243194A3 (en) Electric propulsion system for space applications
JP2002541618A (ja) イオンポンプ用の波型陽極素子

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): CN JP

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR

WWE Wipo information: entry into national phase

Ref document number: 2003796479

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 20038A02428

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2004565119

Country of ref document: JP

WWP Wipo information: published in national office

Ref document number: 2003796479

Country of ref document: EP

WWG Wipo information: grant in national office

Ref document number: 2003796479

Country of ref document: EP