ES2282728T3 - Bomba ionica de pulverizacion catodica que comprende un conjunto de imanes mejorado. - Google Patents
Bomba ionica de pulverizacion catodica que comprende un conjunto de imanes mejorado. Download PDFInfo
- Publication number
- ES2282728T3 ES2282728T3 ES03796479T ES03796479T ES2282728T3 ES 2282728 T3 ES2282728 T3 ES 2282728T3 ES 03796479 T ES03796479 T ES 03796479T ES 03796479 T ES03796479 T ES 03796479T ES 2282728 T3 ES2282728 T3 ES 2282728T3
- Authority
- ES
- Spain
- Prior art keywords
- magnets
- pump
- magnet
- anode cells
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005507 spraying Methods 0.000 title description 9
- 108010083687 Ion Pumps Proteins 0.000 claims abstract description 38
- 230000005684 electric field Effects 0.000 claims abstract description 6
- 150000002500 ions Chemical class 0.000 claims description 45
- 238000005086 pumping Methods 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 10
- 239000007921 spray Substances 0.000 description 24
- 238000010586 diagram Methods 0.000 description 10
- 230000009471 action Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 102000006391 Ion Pumps Human genes 0.000 description 6
- 230000004907 flux Effects 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 230000000712 assembly Effects 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 244000045947 parasite Species 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
- H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
Landscapes
- Electron Tubes For Measurement (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US322991 | 2002-12-18 | ||
| US10/322,991 US6835048B2 (en) | 2002-12-18 | 2002-12-18 | Ion pump having secondary magnetic field |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2282728T3 true ES2282728T3 (es) | 2007-10-16 |
Family
ID=32593082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES03796479T Expired - Lifetime ES2282728T3 (es) | 2002-12-18 | 2003-11-25 | Bomba ionica de pulverizacion catodica que comprende un conjunto de imanes mejorado. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6835048B2 (https=) |
| EP (1) | EP1573773B1 (https=) |
| JP (1) | JP2006511921A (https=) |
| CN (1) | CN100369178C (https=) |
| DE (1) | DE60313888T2 (https=) |
| ES (1) | ES2282728T3 (https=) |
| WO (1) | WO2004061889A2 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE602006002264D1 (de) * | 2006-06-01 | 2008-09-25 | Varian Spa | Magnetanordnung für eine Sputter-Ionenpumpe |
| US20070286738A1 (en) * | 2006-06-12 | 2007-12-13 | Varian, Inc. | Vacuum ion-getter pump with cryogenically cooled cathode |
| US7850432B2 (en) * | 2006-09-14 | 2010-12-14 | Gamma Vacuum, Llc | Ion pump having emission containment |
| JP4831548B2 (ja) * | 2007-02-16 | 2011-12-07 | 独立行政法人情報通信研究機構 | イオンポンプ及び真空運搬装置 |
| JP4835756B2 (ja) * | 2008-02-14 | 2011-12-14 | 独立行政法人情報通信研究機構 | イオンポンプシステム及び電磁場発生装置 |
| EP2151849B1 (en) * | 2008-08-08 | 2011-12-14 | Agilent Technologies Italia S.p.A. | Vacuum pumping system comprising a plurality of sputter ion pumps |
| US8153997B2 (en) * | 2009-05-05 | 2012-04-10 | General Electric Company | Isotope production system and cyclotron |
| US8374306B2 (en) | 2009-06-26 | 2013-02-12 | General Electric Company | Isotope production system with separated shielding |
| US8453493B2 (en) | 2010-11-02 | 2013-06-04 | Agilent Technologies, Inc. | Trace gas sensing apparatus and methods for leak detection |
| CN104952685B (zh) * | 2015-01-19 | 2017-11-21 | 中国航天员科研训练中心 | 轻量化大抽速离子泵 |
| US10665437B2 (en) * | 2015-02-10 | 2020-05-26 | Hamilton Sundstrand Corporation | System and method for enhanced ion pump lifespan |
| US10550829B2 (en) * | 2016-09-08 | 2020-02-04 | Edwards Vacuum Llc | Ion trajectory manipulation architecture in an ion pump |
| CN110491764B (zh) * | 2019-09-02 | 2022-03-29 | 北京卫星环境工程研究所 | 溅射离子泵的磁轭组件 |
| US12389520B2 (en) | 2021-06-14 | 2025-08-12 | National Institute Of Advanced Industrial Science And Technology | Plasma source, and atomic clock employing plasma source |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB924919A (en) * | 1958-06-16 | 1963-05-01 | Varian Associates | Electrical vacuum pump apparatus |
| NL232314A (https=) * | 1958-10-15 | |||
| US3091717A (en) * | 1960-12-23 | 1963-05-28 | Varian Associates | Cathodes for magnetically-confined glow discharge devices |
| US3416722A (en) * | 1967-04-05 | 1968-12-17 | Varian Associates | High vacuum pump employing apertured penning cells driving ion beams into a target covered by a getter sublimator |
| US3994625A (en) * | 1975-02-18 | 1976-11-30 | Varian Associates | Sputter-ion pump having improved cooling and improved magnetic circuitry |
| US4334829A (en) * | 1980-02-15 | 1982-06-15 | Rca Corporation | Sputter-ion pump for use with electron tubes having thoriated tungsten cathodes |
| JPS58193557U (ja) * | 1982-06-18 | 1983-12-23 | 三菱製鋼磁材株式会社 | イオンポンプ用磁石装置 |
| DE3566185D1 (en) * | 1984-04-11 | 1988-12-15 | Sumitomo Spec Metals | Magnetic field generating device for nmr-ct |
| JPS61218120A (ja) * | 1985-03-23 | 1986-09-27 | Sumitomo Special Metals Co Ltd | 磁界発生装置 |
| JPH079845B2 (ja) * | 1986-01-31 | 1995-02-01 | 富士電機株式会社 | 永久磁石形均一磁場マグネット |
| FR2611975B1 (fr) * | 1987-03-03 | 1995-02-17 | Commissariat Energie Atomique | Systeme d'aimants permanents pour un champ magnetique intense |
| US5262028A (en) * | 1992-06-01 | 1993-11-16 | Sierra Applied Sciences, Inc. | Planar magnetron sputtering magnet assembly |
| JPH0822803A (ja) * | 1994-07-08 | 1996-01-23 | Ulvac Japan Ltd | スパッタイオンポンプ |
| JPH0927294A (ja) * | 1995-07-12 | 1997-01-28 | Ebara Corp | イオンポンプ |
| CN1166811C (zh) * | 1996-01-05 | 2004-09-15 | 日本真空技术株式会社 | 离子溅射泵 |
| US6004104A (en) * | 1997-07-14 | 1999-12-21 | Duniway Stockroom Corp. | Cathode structure for sputter ion pump |
| US6616417B2 (en) * | 2000-03-13 | 2003-09-09 | Ulvac, Inc. | Spatter ion pump |
-
2002
- 2002-12-18 US US10/322,991 patent/US6835048B2/en not_active Expired - Lifetime
-
2003
- 2003-11-25 CN CNB2003801002428A patent/CN100369178C/zh not_active Expired - Fee Related
- 2003-11-25 DE DE60313888T patent/DE60313888T2/de not_active Expired - Lifetime
- 2003-11-25 WO PCT/US2003/037878 patent/WO2004061889A2/en not_active Ceased
- 2003-11-25 EP EP03796479A patent/EP1573773B1/en not_active Expired - Lifetime
- 2003-11-25 JP JP2004565119A patent/JP2006511921A/ja active Pending
- 2003-11-25 ES ES03796479T patent/ES2282728T3/es not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004061889A3 (en) | 2004-09-30 |
| WO2004061889A2 (en) | 2004-07-22 |
| US6835048B2 (en) | 2004-12-28 |
| CN1708822A (zh) | 2005-12-14 |
| EP1573773B1 (en) | 2007-05-16 |
| DE60313888T2 (de) | 2008-01-17 |
| EP1573773A2 (en) | 2005-09-14 |
| US20040120826A1 (en) | 2004-06-24 |
| JP2006511921A (ja) | 2006-04-06 |
| CN100369178C (zh) | 2008-02-13 |
| DE60313888D1 (de) | 2007-06-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES2282728T3 (es) | Bomba ionica de pulverizacion catodica que comprende un conjunto de imanes mejorado. | |
| JP3869680B2 (ja) | イオン注入装置 | |
| JP5822767B2 (ja) | イオン源装置及びイオンビーム生成方法 | |
| JP5393696B2 (ja) | イオンビーム注入装置用のプラズマ電子フラッドシステム | |
| ES2600252T3 (es) | Dispositivo y procedimiento de producción y/o de confinamiento de un plasma | |
| ES2589109T3 (es) | Dispositivo y procedimiento de producción y/o de confinamiento de un plasma | |
| US11742191B2 (en) | System and method for enhanced ion pump lifespan | |
| Zelenski et al. | High-intensity polarized and un-polarized sources and injector developments at BNL Linac | |
| US20190259559A1 (en) | Plasma bridge neutralizer for ion beam etching | |
| US9181935B2 (en) | Plasma thrusters | |
| Keller et al. | Ion-source and low-energy beam-transport issues with the front-end systems for the spallation neutron source | |
| JP3079869B2 (ja) | イオン源 | |
| Midttun et al. | A magnetized Einzel lens electron dump for the Linac4 H− ion source | |
| KR102785595B1 (ko) | 이온 건 및 진공 처리 장치 | |
| JP4171026B2 (ja) | スパッタイオンポンプ | |
| US10358713B2 (en) | Surrounding field sputtering source | |
| Behtenev et al. | Comission of Electron Cooler EC‐300 for HIRFL‐CSR | |
| JP6847267B2 (ja) | プラズマ源 | |
| RU208147U1 (ru) | Ионный микродвигатель | |
| Nehra et al. | Electron gun design for multi-beam pulsed amplifier | |
| Gavrilov et al. | Ion-Emission Properties of a Plasma in a Gaseous-Ion Source with a Plasma Cathode. | |
| RU2205467C2 (ru) | Ионный источник | |
| RU76163U1 (ru) | Газоразрядный источник ионов | |
| Bocharov et al. | First tests of LEIR-Cooler at BINP | |
| Tanisho et al. | A Miniaturized Ion Thruster and Neutralizer With M... |