JP2006510743A - トランス−9,10−デヒドロエポチロンcおよびd、それらのアナログ、ならびにそれらを作製する方法 - Google Patents
トランス−9,10−デヒドロエポチロンcおよびd、それらのアナログ、ならびにそれらを作製する方法 Download PDFInfo
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- JP2006510743A JP2006510743A JP2005507102A JP2005507102A JP2006510743A JP 2006510743 A JP2006510743 A JP 2006510743A JP 2005507102 A JP2005507102 A JP 2005507102A JP 2005507102 A JP2005507102 A JP 2005507102A JP 2006510743 A JP2006510743 A JP 2006510743A
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- Prior art keywords
- compound
- dehydroepothilone
- epothilone
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- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 6
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- ZOOODBUHSVUZEM-UHFFFAOYSA-N ethoxymethanedithioic acid Chemical compound CCOC(S)=S ZOOODBUHSVUZEM-UHFFFAOYSA-N 0.000 claims description 5
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
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- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 37
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- XOZIUKBZLSUILX-GIQCAXHBSA-N epothilone D Chemical compound O1C(=O)C[C@H](O)C(C)(C)C(=O)[C@H](C)[C@@H](O)[C@@H](C)CCC\C(C)=C/C[C@H]1C(\C)=C\C1=CSC(C)=N1 XOZIUKBZLSUILX-GIQCAXHBSA-N 0.000 description 25
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
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- WRIKHQLVHPKCJU-UHFFFAOYSA-N sodium bis(trimethylsilyl)amide Chemical compound C[Si](C)(C)N([Na])[Si](C)(C)C WRIKHQLVHPKCJU-UHFFFAOYSA-N 0.000 description 23
- 238000004587 chromatography analysis Methods 0.000 description 22
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- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 14
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Landscapes
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Abstract
Description
本発明は、トランス−9,10−デヒドロエポチロンCおよびD、ならびにそれらのアナログを作製するための方法に関し、そして当該方法により作製される化合物、当該化合物を含む組成物、および過剰増殖性疾患の処置のための方法に関する。
エポチロンとして知られるポリケチドのクラスは、パクリタキセルに類似の作用形態を有する、治療可能性のある化合物の供給源として現れた(Bollagら,Cancer Res.55:2325−2333(1995);Service,Science 274(5295):2009(1996);CowdenおよびPaterson,Nature 387(6630):238−9(1997))。エポチロンおよびエポチロンアナログにおける関心は、特定のエポチロンが、パクリタキセルに対して耐性を発現した腫瘍に対して活性であること、ならびに望ましくない副作用に関する可能性を減少したことの所見と共に増大している(MuhlradtおよびSasse Cancer Res.57(16):3344−6(1997))。治療効力について調べられているエポチロンおよびエポチロンアナログの中には、エポチロンB 1および半合成エポチロンBアナログ、BMS−247550 2(「アザエポチロンB」としても知られる)(Colevasら,Oncology(Huntingt).15(9):1168−9,1172−5(2001);Leeら,Clin Cancer Res.7(5):1429−37(2001);McDaidら,Clin Cancer Res.8(7):2035−43(2002);Yamaguchiら,Cancer Res.62(2):466−71(2002))およびBMS−310705 3がある。
1つの局面では、本発明は、微小管安定化活性を有し、かつ癌および細胞過剰増殖によって特徴付けられる他の疾患の処置において有用な新規な化合物であって、以下の式(I)の化合物、およびそれらの薬学的に受容可能な塩もしくはプロドラッグを提供する:
R1は、Hであるか、または置換されたもしくは置換されていない低級アルキル、低級アルケニル、もしくは低級アルキニルであり;
Arは、置換されたもしくは置換されていないヘテロアリールであり;
但し、Rがメチルまたはトリフルオロメチルであり、そしてArが
特定のトランス−9,10−デヒドロエポチロンCおよびトランス−9,10−デヒドロエポチロンDベースの誘導体によって、チューブリン活性がインビトロまたはインビボで破壊され得ることが、いまや驚くべきことに発見された。従って、本発明は、インビトロで細胞過剰増殖を阻害および/または微小管を安定化する、およびインビボでの過剰増殖性疾患の処置の、新規な化合物、組成物および方法を提供する。1つの局面では、本発明は、以下の式(I)の新規化合物、およびそれらの薬学的に受容可能な塩もしくはプロドラッグを提供する:
R1は、Hであるか、または置換されたもしくは置換されていない低級アルキル、低級アルケニル、もしくは低級アルキニルであり;そして
Arは、置換されたもしくは置換されていないヘテロアリールであり;
但し、Rがメチルまたはトリフルオロメチルであり、そしてArが
本明細書中で使用される「低級アルキル」とは、1〜10の炭素原子、好ましくは1〜6の炭素原子、およびよりずっと好ましくは1〜4の炭素原子(C1−C4アルキル)を含む、分枝状または直鎖状のアルキル基をいう。
(3,7−ジオールの保護)
(化合物(2);R=Me;P=Et3Si)
クロロトリエチルシランを、9−オキソエポチロンDおよび2,6−ルチジンの溶液(ジクロロメタン中)に周囲温度で添加し、そして有機合成分野において公知の方法(例えば、薄層クロマトグラフィー(「TLC」)または液体クロマトグラフィー(「LC」)によるモニタリング)を用いて決定されるように、その反応が実質的に完了するまで(代表的には、一晩)、攪拌する。次いで、この生成物溶液をジクロロメタンで希釈し、そして水、飽和炭酸水素ナトリウム水溶液(「sat.aq.NaHCO3」)、およびブラインで順次洗浄し、そして次いで硫酸マグネシウム(「MgSO4」)で乾燥し、濾過し、そして乾燥までエバポレートする。所望の生成物を、適切な溶媒系(例えば、ヘキサン中の酢酸エチルの勾配のような)を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(tert−ブチルジメチルシリル)−9−オキソエポチロンD)
(化合物(2);R=Me;P=tBuMe2Si)
上記実施例1に提供した詳細と同様に、tert−ブチルジメチルシリルトリフルオロメタンスルホネートを、9−オキソエポチロンDおよび2,6−ルチジンの溶液(ジクロロメタン中)に周囲温度で添加し、そして一晩攪拌する。この混合物を、ジクロロメタンで希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−オキソエポチロンD)
(化合物(2);R=Me;P=CO2CH2CCl3)
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−8−エピ−9−オキソエポチロンD)
(II.経路1:ケト還元および排除)
(3,7−ビス−O−(トリエチルシリル)−9−ヒドロキシエポチロンD)
(化合物(3);R=Me;P=Et3Si;X=S)
0℃で3,7−ビス−O−(トリエチルシリル)−9−オキソエポチロンDの溶液(メタノール中)に、1当量の水素化ホウ素ナトリウムを添加する。この溶液を0℃で40分間攪拌し、その後、sat.aq.NH4Clを添加する。この有機物を酢酸エチルで抽出して合わせ、その後乾燥し(Na2SO4)、濾過し、そして減圧下で濃縮する。カラムクロマトグラフィー(シリカ、EtOAc−ヘキサン)により、生成物を得る。
(3,7−ビス−O−(tert−ブチルジメチルシリル)−9−ヒドロキシエポチロンD)
(化合物(3);R=Me;P=tBuMe2Si;X=S)
0℃で3,7−ビス−O−(tert−ブチルジメチルシリル)−9−オキソエポチロンDの溶液(メタノール中)に、1当量の水素化ホウ素ナトリウムを添加する。この溶液を0℃で40分間攪拌し、その後、sat.aq.NH4Clを添加する。この有機物を酢酸エチルで抽出して合わせ、その後乾燥し(Na2SO4)、濾過し、そして減圧下で濃縮する。カラムクロマトグラフィー(シリカ、EtOAc−ヘキサン)により、生成物を得る。
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−ヒドロキシエポチロンD)
(化合物(3);R=Me;P=CO2CH2CCl3;X=S)
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル−8−エピ−9−ヒドロキシエポチロンD)
(工程2.活性化)
(3,7−ビス−O−(トリエチルシリル)−9−(メタンスルホニルオキシ)エポチロンD)
(化合物(4):R=Me;P=Et3Si;X=S;Y=MeSO2O)
塩化メタンスルホニルを、3,7−ビス−O−(トリエチルシリル)−9−ヒドロキシ−エポチロンDおよび4−(ジメチルアミノ)ピリジンの溶液(ジクロロメタン中)に添加する。12時間攪拌した後、混合物をジクロロメタンで希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(tert−ブチルジメチルシリル)−9−(メタンスルホニルオキシ)エポチロンD)
(化合物(4);R=Me;P=tBuMe2Si;X=S;Y=MeSO2O)
塩化メタンスルホニルを、3,7−ビス−O−(tert−ブチルジメチルシリル)−9−ヒドロキシエポチロンDおよび4−(ジメチルアミノ)ピリジンの溶液(ジクロロメタン中)に添加する。12時間攪拌した後、混合物をジクロロメタンで希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−(メタンスルホニルオキシ)エポチロンD)
(化合物(4);R=Me;P=CO2CH2CCl3;X=S;Y=MeSO2O)
塩化メタンスルホニルを、3,7−ビス−O−(2,2,2−トリクロロエトキシ−カルボニル)−9−ヒドロキシエポチロンDおよび4−(ジメチルアミノ)ピリジンの溶液(ジクロロメタン中)に添加する。12時間攪拌した後、混合物をジクロロメタンで希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4上で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(トリエチルシリル)−9−(トリフルオロメタンスルホニルオキシ)エポチロンD)
(化合物(4);R=Me;P=Et3Si;X=S;Y=CF3SO2O)
ナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)を、3,7−ビス−O−(トリエチルシリル)−9−ヒドロキシエポチロンDの溶液(THF中)に−78℃で滴下により添加する。30分後、トリフルオロメタンスルホン酸無水物を滴下により添加し、そしてこの混合物を周囲温度にまで暖める。この混合物をエーテルに希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、さらに精製することなく使用する。
(3,7−ビス−O−(tert−ブチルジメチルシリル)−9−(トリフルオロメタンスルホニルオキシ)エポチロンD)
(化合物(4);R=Me;P=tBuMe2Si;X=S;Y=CF3SO2O)
ナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)を、3,7−ビス−O−(tert−ブチルジメチルシリル)−9−ヒドロキシエポチロンDの溶液(THF中)に−78℃で滴下により添加する。30分後、トリフルオロメタンスルホン酸無水物を滴下により添加し、そしてこの混合物を周囲温度にまで暖める。この混合物をエーテルに希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、さらに精製することなく使用する。
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−(トリフルオロメタンスルホニルオキシ)エポチロンD)
(化合物(4);R=Me;P=CO2CH2CCl3;X=S;Y=CF3SO2O)
ナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)を、3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−ヒドロキシエポチロンDの溶液(THF中)に−78℃で滴下により添加する。30分後、トリフルオロメタンスルホン酸無水物を滴下により添加し、そしてこの混合物を周囲温度にまで暖める。この混合物をエーテルに希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、さらに精製することなく使用する。
(工程3.排除)
(メシレート排除を介した3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5);R=Me;P=Et3Si;X=S)
3,7−ビス−O−(トリエチルシリル)−9−(メタンスルホニルオキシ)エポチロンDの溶液(THF中)を−78℃に冷却し、そしてナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)1当量で処理する。この混合物を周囲温度にまで暖め、そして次いでsat.aq.NH4Clに注ぎ、そして酢酸エチルで抽出する。この抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(tert−ブチルジメチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5);R=Me;P=tBuMe2Si;X=S)
3,7−ビス−O−(tert−ブチルジメチルシリル)−9−(メタンスルホニルオキシ)エポチロンDの溶液(THF中)を−78℃に冷却し、そしてナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)1当量で処理する。この混合物を周囲温度にまで暖め、そして次いでsat.aq.NH4Clに注ぎ、そして酢酸エチルで抽出する。この抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9,10−デヒドロエポチロンD)
(化合物(5);R=Me;P=CO2CH2CCl3;X=S)
3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9−(メタンスルホニルオキシ)エポチロンDの溶液(THF中)を−78℃に冷却し、そしてナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)1当量で処理する。この混合物を周囲温度にまで暖め、そして次いでsat.aq.NH4Clに注ぎ、そして酢酸エチルで抽出する。この抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(トリフレート排除を介した3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5);R=Me;P=Et3Si;X=S)
3,7−ビス−O−(トリエチルシリル)−9−(トリフルオロメタンスルホニルオキシ)エポチロンDの溶液(THF中)を0℃で2,6−ジ−tert−ブチル−4−メチルピリジンで処理する。この混合物を周囲温度にまで暖め、そして次いでsat.aq.NH4Clに注ぎ、そして酢酸エチルで抽出する。この抽出物を水、冷1N HCl、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(工程4.脱保護)
(9,10−デヒドロエポチロンD(P=Et3Siを介する))
(化合物(6);R=Me;X=S)
3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンDの溶液(アセトニトリルおよび水中)を氷上で冷却し、そして48%フッ化水素酸で処理する。この反応を、薄層クロマトグラフィーによってモニタリングする。完了の際に、sat.aq.NaHCO3の添加により反応を中和し、そして濃縮して水性スラリーにする。このスラリーを酢酸エチルで抽出し、そしてこの抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(9,10−デヒドロエポチロンD(P=tBuMe2Siを介する))
(化合物(6);R=Me;X=S)
3,7−ビス−O−(tert−ブチルジメチルシリル)−9,10−デヒドロエポチロンDの溶液(アセトニトリルおよび水中)を氷上で冷却し、そして48%フッ化水素酸で処理する。この反応を、薄層クロマトグラフィーによってモニタリングする。完了の際に、sat.aq.NaHCO3の添加により反応を中和し、そして濃縮して水性スラリーにする。このスラリーを酢酸エチルで抽出し、そしてこの抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(9,10−デヒドロエポチロンD(P=CO2CH2CCl3を介する))
(化合物(6);R=Me;X=S)
亜鉛粉末を室温で3,7−ビス−O−(2,2,2−トリクロロエトキシカルボニル)−9,10−デヒドロエポチロンDの溶液(酢酸およびテトラヒドロフランの混合物中)に添加する。溶液を室温で1時間攪拌し、その後、さらなる亜鉛を添加し、一晩室温で攪拌する。この溶液を酢酸エチルと水との間で分配し、そして水相を酢酸エチルで抽出する。合わせた有機物をブラインで洗浄し、そして乾燥し(Na2SO4)、その後減圧下で濃縮する。ヘキサン中酢酸エチル勾配を用いるシリカゲル上のカラムクロマトグラフィーにより、9,10−デヒドロエポチロンDを得る。
(III.経路2:熱分解排除)
(3,7−ビス−O−(トリエチルシリル)−9−((メチルチオ)チオカルボニルオキシ)エポチロンD)
(化合物(7);R=Me;P=Et3Si;X=S;Y=S−Me)
3,7−ビス−O−(トリエチルシリル)−9−ヒドロキシエポチロンDの溶液(THF中)を−78℃に冷却し、そしてナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)1当量で処理する。30分後、二硫化炭素を添加し、そしてこの混合物を周囲温度にまで暖める。1時間後、ヨウ化メチルを添加し、そしてこの反応を12時間進行させ、sat.aq.NH4Clに注ぎ、そして酢酸エチルで抽出する。この抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
3,7−ビス−O−(トリエチルシリル)−9−((ジメチルアミノ)チオカルボニルオキシ)エポチロンD)
(化合物(7);R=Me;P=Et3Si:X=S;Y=NMe2)
3,7−ビス−O−(トリエチルシリル)−9−ヒドロキシエポチロンD、塩化ジメチルチオカルバモイル、およびピリジンの混合物を12時間反応させる。この混合物を水に注ぎ、そして酢酸エチルで抽出する。この抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。生成物を、ヘキサン中の酢酸エチルの勾配を用いたシリカゲルクロマトグラフィーによって精製する。
(工程2.熱分解)
(キサンテートを介する3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5):R=Me;P=Et3Si;X=S)
3,7−ビス−O−(トリエチルシリル)−9−((メチルチオ)チオカルボニルオキシ)エポチロンDを高真空(約0.1トール)下に置き、そして170℃に加熱し、その間に出発物質が薄層クロマトグラフィー分析によって決定されるように消失する。この反応を周囲温度に冷却し、そして残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(チオカルバメートを介する3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5):R=Me;P=Et3Si;X=S)
3,7−ビス−O−(トリエチルシリル)−9−((ジメチルアミノ)チオカルボニルオキシ)エポチロンDを高真空(約0.1トール)下に置き、そして170℃に加熱し、その間に出発物質が薄層クロマトグラフィー分析によって決定されるように消失する。この反応を周囲温度に冷却し、そして残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(IV.ビニルトリフレート還元)
(化合物(8);R=Me;P=Et3Si;X=S)
トリフルオロメタンスルホン酸無水物を0℃で3,7−ビス−O−(トリエチルシリル)−9−オキソエポチロンDおよび2,6−ジ−tert−ブチル−4−メチルピリジンの溶液(ジクロロメタン中)に滴下により添加する。添加の完了後、この混合物を周囲温度にまでゆっくりと暖め、そして一晩攪拌する。この反応を薄層クロマトグラフィーによってモニタリングし、そしてさらなるトリフルオロメタンスルホン酸無水物を、出発物質が消耗されるまで添加する。この混合物をエバポレートし、そして残渣を酢酸エチルと合わせる。沈殿した塩を濾過により除去し、そしてエーテル溶液を水、氷冷1N HCl、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。
(3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロ−9−(トリフルオロメタンスルホニルオキシ)エポチロンD)
(化合物(8);R=Me;P=Et3Si;X=S)
3,7−ビス−O−(トリエチルシリル)−9−オキソエポチロンDの溶液(THF中)を−78℃でナトリウムビス(トリメチルシリル)アミドの1.0M溶液(THF中)に滴下により添加する。添加の完了後、この混合物を−78℃で30分間維持し、そしてN−(5−クロロ−2−ピリジル)トリフリミド(Organic Syntheses 74:77−83(1996))の溶液を滴下により添加する。この混合物を2時間維持し、次いで周囲温度にまでゆっくりと暖める。混合物をエバポレートし、そして残渣を酢酸エチルと合わせる。エーテル溶液を水、氷冷5%NaOH、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。
(3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロエポチロンD)
(化合物(5);R=Me;P=Et3Si;X=S)
3,7−ビス−O(トリエチルシリル)−9,10−デヒドロ−9−(トリフルオロメタンスルホニルオキシ)−エポチロンD、トリブチルアミン、酢酸パラジウム、およびトリフェニルホスフィンの混合物(ジメチルホルムアミド中)を、不活性ガス雰囲気下に置き、そしてスパージャーによって脱気する(degassed by sparging)。ギ酸を、シリンジを介して添加し、そしてその混合物を1時間60℃に加熱する。この混合物を周囲温度に冷却し、エーテルに希釈し、そして水、氷冷1N HCl、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(V.ビニルトリフレートへのカップリング)
(化合物(9);R=Me;R1=CH2CH=CH2;P=Et3Si;X=S)
テトラキス(トリフェニルホスフィン)パラジウム(0)および塩化リチウムの混合物(無水THF中)を15分間、不活性ガス雰囲気下で攪拌し、次いで、3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロ−9−(トリフルオロメタンスルホニルオキシ)−エポチロンDおよびアリル−トリブチルスズの溶液(THF中)を添加する。この混合物を穏やかな還流で48時間加熱する。この混合物を周囲温度に冷却し、エーテルに希釈し、そして水、氷冷1N HCl、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(9,10−デヒドロ−9−アリルエポチロンD)
(化合物(10);R=Me;R1=CH2CH=CH2;X=S)
3,7−ビス−O−(トリエチルシリル)−9,10−デヒドロ−9−アリルエポチロンDの溶液(アセトニトリルおよび水中)を氷上で冷却し、そして48%フッ化水素酸で処理する。この反応を薄層クロマトグラフィーによってモニタリングする。完了の際に、この反応をsat.aq.NaHCO3の添加により中和し、そして濃縮して水性スラリーにする。このスラリーを酢酸エチルで抽出し、そしてこの抽出物を水、sat.aq.NaHCO3、およびブラインで順次洗浄し、次いでMgSO4で乾燥し、濾過し、そして乾燥までエバポレートする。残渣をシリカゲルクロマトグラフィー(酢酸エチル−ヘキサン)に供し、生成物を単離する。
(開環中間体を介する9,10−デヒドロエポチロンD)
(化合物(10);R=Me;R1=H;X=S)
(工程1.開環)水素化ジイソブチルアルミニウムの溶液を、−78℃に冷却した3,7−ビス−O−(tert−ブチルジメチルシリル)−9−オキソエポチロンDの溶液(テトラヒドロフラン中)に添加する。この反応をTLCまたはLCによってモニタリングし、そして出発物質を消耗した際に、リン酸緩衝液の添加によりクエンチングし、そして周囲温度にまで暖める。この混合物を酢酸エチルで抽出し、そしてこの抽出物を乾燥し、濾過し、そしてエバポレートする。生成物をシリカゲル上のクロマトグラフィーにより精製する。
(開環中間体、代替経路を介した9,10−デヒドロエポチロンD)
(化合物(10);R=Me;R1=H;X=S)
(工程1.開環)3,7−ビス−O−(tert−ブチルジメチルシリル)−9−オキソ−エポチロンDの溶液(メタノール中)を周囲温度で1N NaOHで処理する。この反応をTLCまたはLCによってモニタリングし、そして出発物質を消耗した際に、リン酸緩衝液(pH4)の添加によりクエンチングする。メタノールを真空下でロータリーエバポレーションによって除去し、そして水性残渣を酢酸エチルで抽出する。この抽出物を乾燥し、濾過し、そしてエバポレートする。生成物をシリカゲル上のクロマトグラフィーにより精製する。
(開環中間体を介する9,10−デヒドロエポチロンH2)
(化合物(10);R=Me:R1=H:X=O)
(工程1.保護)9−オキソエポチロンH2および2,6−ルチジンの溶液(ジクロロメタン中)を、周囲温度でtert−ブチルジメチルシリルトリフルオロメタンスルホネートで処理する。一晩攪拌した後、この混合物をジクロロメタンで希釈し、そして水、sat.aq.NaHCO3、およびブラインで順次洗浄する。この溶液を乾燥し、濾過し、そしてエバポレートし、そして生成物をシリカゲルクロマトグラフィーにより精製する。
(化合物(24);R=Me;X=S)
(工程1.ケトン還元)実施例32の工程3の生成物の溶液(メタノール中)を0℃に冷却し、そして1当量の水素化ホウ素ナトリウムで処理する。この溶液を0℃で40分間攪拌し、その後sat.aq.NH4Clを添加する。有機物を酢酸エチルで抽出し、そしてこの抽出物を乾燥し、濾過し、そして乾燥までエバポレートする。生成物をシリカゲルクロマトグラフィーにより精製する。
(化合物(24);R=Me;X=O)
(工程1.ケトン還元)実施例33の工程4の生成物の溶液(メタノール中)を0℃に冷却し、そして1当量の水素化ホウ素ナトリウムで処理する。この溶液を0℃で40分間攪拌し、その後sat.aq.NH4Clを添加する。有機物を酢酸エチルで抽出し、そしてこの抽出物を乾燥し、濾過し、そして乾燥までエバポレートする。生成物をシリカゲルクロマトグラフィーにより精製する。
(2−(ピバロリイル(pivalolyl)オキシメチル)−4−(クロロメチル)チアゾール)
(2−(tert−ブチルジメチルシリルオキシメチル)−4−(クロロメチル)チアゾール)
([(2−(tert−ブチルジメチルシリルオキシメチル)−4−チアゾリル)メチル]トリブチルホスホニウムクロライド)
(21−ヒドロキシ−9,10−デヒドロ−エポチロンDの調製)
(21−アジド−9,10−デヒドロ−エポチロンDの調製)
(21−アミノ−9,10−デヒドロ−エポチロンDの調製)
(21−アジド−9,10−デヒドロ−26−トリフルオロエポチロンDの調製)
(21−アミノ−9,10−デヒドロ−26−トリフルオロエポチロンDの調製)
(17−デス(2−メチル−4−チアゾリル)−17−(2−ピリジル)−9,10−デヒドロエポチロン(peothilone)D)(KOSN 1632)
(細胞傷害性データ)
(細胞株および培養条件)
ヒト乳癌細胞株MCF−7、多薬耐性乳癌細胞株NCI/ADRをNational Cancer Instituteから入手した。ヒト非小細胞肺癌細胞株A549およびヒト卵巣癌細胞株SKOV−3をAmerican Type Culture Collection(Manassas,VA)から入手した。全ての細胞株をRPMI−1640培地(Gibco/BRL,Rockville,MD)(2mM L−グルタミン、25mM HEPES、および10% FBS(Hyclone,Logan,UT)を補足した)中で維持した。細胞を5%CO2中37℃で加湿インキュベーター中で維持した。
腫瘍細胞を、96ウェルプレート中でウェル当たり5000(MCF−7)、7500(NCI/ADR),5000(A549)、および7500(SKOV3)細胞で、100μl中に播種した。細胞を24時間接着させた。0.001〜1000nM(100μl中)の範囲の各化合物を二連ウェル中で細胞に添加した。3日後、細胞を4℃で1時間10%トリクロロ酢酸で固定し、そして次いで、室温で20分間、0.2%スルホローダミンB(SRB)/1%酢酸で染色した。結合していない染料を1%酢酸ですすいで流し、そして次いで未結合のSRBを200μlの10mM Tris塩基で抽出した。吸光度を、96ウェルマイクロタイタープレート読取器(Spectra Max 250,Molecular Devices)を用いて515nmで測定した。IC50値をKaleidaGraphプログラムを用いて算定した。この実験を2回実施した。この結果を以下の表1中に示す。
(さらなる9,10−デヒドロエポチロンDアナログ)
実施例39(R=メチルの場合)および42(R=CF3の場合)の手順に従って、表2中に示すさらなる化合物を、(2−(tert−ブチルジメチル−シリルオキシ)−メチルチアゾル−4−イル)メチルトリ−n−ブチル−ホスホニウムクロライドを対応するホスホニウムクロライドと置き換えることにより、作製した。細胞傷害性データ(表2)を、実施例48に記載のようにして得た。シトクロームP450阻害データ(表3)を、BFC基質に対する初期速度方法を用いて得た。
(薬理学パラメーター)
シトクロームP450阻害測定を、CYP3A4に対する基質としてBFCを用いて、市販のキット(BD GenTest,Woburn,MA)を用いて実施した。そのようにして得られたμMでのIC50値を表3中に列挙する。
Claims (21)
- 請求項1に記載の化合物であって、ここでArが、置換されたもしくは置換されていないチアゾリル、オキサゾリル、イミダゾリル、イソチアゾリル、イソキサゾリル、ピラゾリル、ピリジル、ピラジニル、ピリミジニル、ピリダジニル、インドリジニル、インドリル、インダゾリル、プリニル、キノリル、キノリジニル、フタラジニル、ナフチリジニル、キノキサリニル、キナゾリニル、ベンゾチアゾリル、オキサジアゾリル、チアジアゾリル、またはベンゾトリアゾリルである、化合物。
- 請求項1に記載の化合物であって、ここでRが、ハロ、ヒドロキシル、アミノ、およびアジドから独立して選択される1つ以上の基と置換された低級アルキルである、化合物。
- 請求項1に記載の化合物であって、ここでRが、メチルまたはトリフルオロメチルである、化合物。
- 請求項1に記載の化合物であって、ここでR1が、ハロ、ヒドロキシル、アミノ、およびアジドから独立して選択される1つ以上の基と置換された低級アルキルである、化合物。
- 請求項1に記載の化合物を、それらに投与される場合にヒトまたは動物被験体において細胞過剰増殖を減少させるのに有効な量で、薬学的に受容可能なキャリアと共に含む、組成物。
- 請求項1に記載の化合物に付加して、1つ以上の活性剤を含む、請求項8に記載の組成物。
- ヒトまたは動物被験体において過剰増殖性疾患を処置する方法であって、該ヒトまたは動物被験体に、該被験体において細胞過剰増殖を減少させるのに有効な量の請求項8に記載の組成物を投与する工程を包含する、方法。
- 前記過剰増殖性疾患が、癌、乾癬、多発性硬化症、慢性関節リウマチ、アテローム硬化症、および再狭窄から選択される、請求項10に記載の方法。
- 前記過剰増殖性疾患が、乳癌、結腸直腸癌、および非小細胞肺癌からなる群から選択される癌である、請求項11に記載の方法。
- トランス−9,10−デヒドロエポチロンを合成する方法であって、9−オキソ−エポチロンを該トランス−9,10−デヒドロエポチロンに変換する工程を包含する、方法。
- 請求項13に記載の方法であって、前記9−オキソ−エポチロンが前記トランス−9,10−デヒドロエポチロンに変換されるのが、該9−オキソ−エポチロンの遊離ヒドロキシル基を保護し、該9−オキソ−エポチロンの9−オキソ基を還元して9−ヒドロキシル保護化合物を得、該9−ヒドロキシル保護化合物を活性化基で活性化し、該活性化基を排除して保護9,10−デヒドロエポチロンを得、そして次いで該保護9,10−デヒドロエポチロンを脱保護して該9,10−デヒドロエポチロンを得ることによってである、方法。
- 前記活性化基がキサンテートまたはチオカルバメートであり、そして前記活性化基を排除する工程が熱分解によって実施される、請求項14に記載の方法。
- 請求項13に記載の方法であって、前記9−オキソ−エポチロンが前記トランス−9,10−デヒドロエポチロンに変換されるのが、該9−オキソ−エポチロンの遊離ヒドロキシル基を保護し、該保護9−オキソ−エポチロンをトリフレート剤(triflating agent)および塩基と反応させて9,10−デヒドロ−9−トリフルオロメタンスルホニルオキシ中間体化合物を得、そして次いで該9,10−デヒドロ−9−トリフルオロメタンスルホニルオキシ中間体の9−トリフルオロメタンスルホニルオキシ基を還元し、そして次いで該保護9,10−デヒドロエポチロン化合物を脱保護して該9,10−デヒドロエポチロンを得ることによってである、方法。
- 請求項13に記載の方法であって、前記9−オキソエポチロンが前記トランス−9,10−デヒドロエポチロンに変換されるのが、該9−オキソエポチロンの遊離ヒドロキシル基を保護し、該保護9−オキソエポチロンをトリフレート試薬および塩基と反応させて、9,10−デヒドロ−9−トリフルオロメタンスルホニルオキシエポチロンを得、該9,10−デヒドロ−9−トリフルオロメタンスルホニルオキシエポチロンとアルキル有機金属化合物またはアルケニル有機金属化合物とを、該トリフレート基がアルキルまたはアルケニル基によって置換される条件下で反応させ、そして脱保護して9−アルキルまたは9−アルケニル9,10−デヒドロエポチロンを提供することによってである、方法。
- 製剤として使用するための、請求項1に記載の化合物。
- 過剰増殖性疾患の処置のための医薬品の製造における、請求項1に記載の化合物の使用。
- 前記過剰増殖性疾患が、癌、乾癬、多発性硬化症、慢性関節リウマチ、アテローム硬化症、および再狭窄から選択される、請求項19に記載の使用。
- 前記過剰増殖性疾患が、乳癌、結腸直腸癌、および非小細胞肺癌からなる群から選択される癌である、請求項19に記載の使用。
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JP2010228356A Expired - Fee Related JP5679757B2 (ja) | 2002-11-07 | 2010-10-08 | トランス−9,10−デヒドロエポチロンcおよびd、それらのアナログ、ならびにそれらを作製する方法 |
JP2013147528A Pending JP2013213054A (ja) | 2002-11-07 | 2013-07-16 | トランス−9,10−デヒドロエポチロンcおよびd、それらのアナログ、ならびにそれらを作製する方法 |
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JP2013147528A Pending JP2013213054A (ja) | 2002-11-07 | 2013-07-16 | トランス−9,10−デヒドロエポチロンcおよびd、それらのアナログ、ならびにそれらを作製する方法 |
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EP (3) | EP1562941B1 (ja) |
JP (3) | JP4641941B2 (ja) |
KR (2) | KR100966667B1 (ja) |
AT (1) | ATE452888T1 (ja) |
AU (1) | AU2003291337B2 (ja) |
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DE (1) | DE60330703D1 (ja) |
DK (1) | DK1562941T3 (ja) |
ES (2) | ES2336911T3 (ja) |
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KR102112373B1 (ko) | 2012-02-15 | 2020-05-18 | 에일러론 테라퓨틱스 인코포레이티드 | 펩티드모방체 마크로사이클 |
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WO2016049359A1 (en) | 2014-09-24 | 2016-03-31 | Aileron Therapeutics, Inc. | Peptidomimetic macrocycles and uses thereof |
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US9969757B2 (en) | 2012-04-05 | 2018-05-15 | Hydro-Quebec | Ionic compounds having a silyloxy group |
Also Published As
Publication number | Publication date |
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JP5679757B2 (ja) | 2015-03-04 |
US20090186927A1 (en) | 2009-07-23 |
KR100996996B1 (ko) | 2010-11-25 |
EP1562941A2 (en) | 2005-08-17 |
KR20050084959A (ko) | 2005-08-29 |
DE60330703D1 (de) | 2010-02-04 |
JP2011006480A (ja) | 2011-01-13 |
PT1562941E (pt) | 2010-01-25 |
JP2013213054A (ja) | 2013-10-17 |
KR20100018075A (ko) | 2010-02-16 |
DK1562941T3 (da) | 2010-04-19 |
EP2135867B1 (en) | 2013-09-25 |
SI1562941T1 (sl) | 2010-05-31 |
ES2436296T3 (es) | 2013-12-30 |
ES2336911T3 (es) | 2010-04-19 |
CA2505368C (en) | 2011-09-20 |
EP1562941B1 (en) | 2009-12-23 |
WO2004043954A3 (en) | 2004-11-18 |
AU2003291337B2 (en) | 2010-09-09 |
KR100966667B1 (ko) | 2010-06-29 |
AU2003291337A1 (en) | 2004-06-03 |
CA2505368A1 (en) | 2004-05-27 |
CY1110295T1 (el) | 2015-01-14 |
EP2135867A1 (en) | 2009-12-23 |
EP2135868A1 (en) | 2009-12-23 |
JP4641941B2 (ja) | 2011-03-02 |
ATE452888T1 (de) | 2010-01-15 |
WO2004043954A2 (en) | 2004-05-27 |
US20040152708A1 (en) | 2004-08-05 |
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