JP2006326991A5 - - Google Patents
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- Publication number
- JP2006326991A5 JP2006326991A5 JP2005152975A JP2005152975A JP2006326991A5 JP 2006326991 A5 JP2006326991 A5 JP 2006326991A5 JP 2005152975 A JP2005152975 A JP 2005152975A JP 2005152975 A JP2005152975 A JP 2005152975A JP 2006326991 A5 JP2006326991 A5 JP 2006326991A5
- Authority
- JP
- Japan
- Prior art keywords
- mold
- gimbal
- frame
- piezo
- movable body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007246 mechanism Effects 0.000 description 46
- 238000000465 moulding Methods 0.000 description 21
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 238000003825 pressing Methods 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000006073 displacement reaction Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 230000005484 gravity Effects 0.000 description 4
- 238000005339 levitation Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000005394 sealing glass Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005152975A JP4732801B2 (ja) | 2005-05-25 | 2005-05-25 | ジンバル機構を備えた転写装置及び同装置を用いた転写方法 |
| US11/403,984 US7648354B2 (en) | 2005-04-28 | 2006-04-14 | Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus |
| TW095114106A TWI295623B (en) | 2005-04-28 | 2006-04-20 | Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus |
| KR1020060037888A KR100747855B1 (ko) | 2005-04-28 | 2006-04-27 | 짐벌 기구를 구비한 전사 장치 및 전사 장치를 이용한 전사방법 |
| DE102006019644.9A DE102006019644B4 (de) | 2005-04-28 | 2006-04-27 | Übertragungseinrichung mit einem Kardangelenkmechanismus und Übertragungsverfahren unter Verwendung der Übertragungseinrichtung |
| US12/633,183 US8318074B2 (en) | 2005-04-28 | 2009-12-08 | Transfer apparatus having gimbal mechanism and transfer method using the transfer apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005152975A JP4732801B2 (ja) | 2005-05-25 | 2005-05-25 | ジンバル機構を備えた転写装置及び同装置を用いた転写方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006326991A JP2006326991A (ja) | 2006-12-07 |
| JP2006326991A5 true JP2006326991A5 (enExample) | 2008-05-08 |
| JP4732801B2 JP4732801B2 (ja) | 2011-07-27 |
Family
ID=37549198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005152975A Expired - Fee Related JP4732801B2 (ja) | 2005-04-28 | 2005-05-25 | ジンバル機構を備えた転写装置及び同装置を用いた転写方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4732801B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7641467B2 (en) * | 2007-05-02 | 2010-01-05 | Asml Netherlands B.V. | Imprint lithography |
| JP6294686B2 (ja) * | 2014-02-04 | 2018-03-14 | キヤノン株式会社 | インプリント装置、インプリント方法及び物品の製造方法 |
| US10996561B2 (en) * | 2017-12-26 | 2021-05-04 | Canon Kabushiki Kaisha | Nanoimprint lithography with a six degrees-of-freedom imprint head module |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63261405A (ja) * | 1987-04-17 | 1988-10-28 | Sanyo Mach Works Ltd | 昇降位置決め装置 |
| NL9100366A (nl) * | 1991-02-28 | 1992-09-16 | Philips & Du Pont Optical | Werkwijze voor het vervaardigen van een schijfvormige informatiedrager, informatiedrager vervaardigd volgens de werkwijze en inrichting voor het uitvoeren van de werkwijze. |
| JPH08259245A (ja) * | 1995-03-24 | 1996-10-08 | Olympus Optical Co Ltd | 光学素子成形装置の偏芯調整機構 |
| JPH11314231A (ja) * | 1998-03-06 | 1999-11-16 | Toshiba Corp | 光学部品製造方法及びその装置 |
| JP3558936B2 (ja) * | 1999-11-10 | 2004-08-25 | 日本電信電話株式会社 | 薄膜形成装置 |
| JP3901529B2 (ja) * | 2002-01-31 | 2007-04-04 | 東レエンジニアリング株式会社 | 接合装置 |
| JP4395704B2 (ja) * | 2002-05-17 | 2010-01-13 | コニカミノルタホールディングス株式会社 | 成形装置 |
| US6939120B1 (en) * | 2002-09-12 | 2005-09-06 | Komag, Inc. | Disk alignment apparatus and method for patterned media production |
| WO2004093171A1 (ja) * | 2003-04-11 | 2004-10-28 | Scivax Corporation | パターン形成装置、パターン形成方法 |
| JP4313109B2 (ja) * | 2003-08-01 | 2009-08-12 | 明昌機工株式会社 | 高精度プレス機 |
| JP2005101201A (ja) * | 2003-09-24 | 2005-04-14 | Canon Inc | ナノインプリント装置 |
| JP4713102B2 (ja) * | 2004-07-29 | 2011-06-29 | Scivax株式会社 | 傾き調整機能付きプレス装置、傾き調整機能付きパターン形成装置、型の傾き調整方法 |
-
2005
- 2005-05-25 JP JP2005152975A patent/JP4732801B2/ja not_active Expired - Fee Related
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